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    • 5. 发明申请
    • METHOD AND APPARATUS FOR EUV LIGHT SOURCE TARGET MATERIAL HANDLING
    • EUV光源目标材料处理方法与装置
    • WO2006093687A1
    • 2006-09-08
    • PCT/US2006/005541
    • 2006-02-17
    • CYMER, INC.ALGOTS, John, MartinHEMBERG, OscarCHUNG, Tae, H.
    • ALGOTS, John, MartinHEMBERG, OscarCHUNG, Tae, H.
    • H01J35/20G21K5/10
    • H05G2/003H05G2/005H05G2/006H05G2/008
    • An EUV light source plasma source material handling system and method is disclosed which may comprise a droplet generator having droplet generator plasma source material reservoir (212) in fluid communication with a droplet formation capillary and maintained within a selected range of temperatures sufficient to keep the plasma source material in a liquid form; a plasma source material supply system having a supply reservoir (214) in fluid communication with the droplet generator plasma source material reservoir and holding at least a replenishing amount of plasma source material in liquid form for transfer to the droplet generator plasma source material reservoir, while the droplet generator is on line; a transfer mechanism (210) transferring liquid plasma source material from the supply reservoir to the droplet generator plasma source material reservoir, while the droplet generator is on line. The supply reservoir may comprise a solid form of the plasma source material used to periodically form from a portion of the material in solid form the material in liquid form.
    • 公开了一种EUV光源等离子体源材料处理系统和方法,其可以包括具有与液滴形成毛细管流体连通的液滴发生器等离子体源材料储存器(212)的液滴发生器,并保持在足以保持等离子体的温度的选定范围内 液体形式的原料; 等离子体源材料供应系统,其具有与液滴发生器等离子体源材料储存器流体连通的供给储存器(214),并且至少保持液体形式的补充量的等离子体源材料以转移到液滴发生器等离子体源材料储存器,同时 液滴发生器在线; 当液滴发生器在线时,传送机构(210)将液体等离子体源材料从供应储存器传送到液滴发生器等离子体源材料储存器。 供应储存器可以包括固体形式的等离子体源材料,其用于从液体形式的固体形式的固体形式的一部分周期性地形成。
    • 8. 发明申请
    • X-RAY WINDOW
    • WO2010083854A1
    • 2010-07-29
    • PCT/EP2009/000481
    • 2009-01-26
    • EXCILLUM ABHERTZ, HansHEMBERG, OscarTUOHIMAA, TomiOTENDAL, Mikael
    • HERTZ, HansHEMBERG, OscarTUOHIMAA, TomiOTENDAL, Mikael
    • H05G2/00G21K1/02
    • H01J35/18G21K1/02H01J2235/082
    • A self-cleaning X-ray window arrangement includes a primary X-ray- transparent window element, separating an ambient pressure region from an intermediate region, and a secondary X-ray-transparent window element, separating the intermediate region from a reduced pressure region. A contaminant is expected to deposit on a side of the secondary element facing the reduced pressure region. A heat source is adapted to heat a portion of the secondary window element for thereby evaporating contaminant. The secondary element shields the primary element from the reduced pressure region, in which contaminant is present, whereas the pressure-tight primary window element carries most of the differential pressure between the ambient pressure region and the reduced pressure region. Several features of the invention help to decrease the rate at which contaminant enters the intermediate region. By maintaining the pressure in the intermediate region close to the reduced pressure, the mechanical stress on the secondary window element can be limited as well as the exposure to harmful gases.
    • 自清洁X射线窗口装置包括:初级X射线透明窗口元件,将环境压力区域与中间区域分开;以及次X射线透明窗口元件,将中间区域与减压区域分离 。 预期污染物沉积在面向减压区域的次级元件的一侧上。 热源适于加热次窗口元件的一部分,从而蒸发污染物。 次要元件将主要元件从存在污染物的减压区域屏蔽,而压力密封的主窗口元件承载环境压力区域和减压区域之间的大部分差压。 本发明的几个特征有助于降低污染物进入中间区域的速率。 通过保持接近减压的中间区域的压力,可以限制次窗口元件上的机械应力以及暴露于有害气体。