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1. 发明申请

WO2004068555A3 REPAIR AND RESTORATION OF DAMAGED DIELECTRIC MATERIALS AND FILMS 审中-公开
标题翻译：损坏的电介质材料和膜的修复和恢复
公开(公告)号：WO2004068555A3
公开(公告)日：2005-02-03
申请号：PCT/US2004002252
申请日：2004-01-26
申请人： HONEYWELL INT INC , FAN WENYA , LU VICTOR , THOMAS MICHAEL , DANIELS BRIAN , NGUYEN TIFFANY , ZHOU DE-LING , NAMAN ANANTH , JIN LEI , BHANAP ANIL
发明人： FAN WENYA , LU VICTOR , THOMAS MICHAEL , DANIELS BRIAN , NGUYEN TIFFANY , ZHOU DE-LING , NAMAN ANANTH , JIN LEI , BHANAP ANIL
IPC分类号： H01L21/312 , H01L21/47 , H01L21/76
CPC分类号： H01L21/31058 , H01L21/3105 , H01L21/76801 , H01L2924/0002 , H01L2924/00
摘要： Methods of repairing voids in a material are described herein that include: a) providing a material having a plurality of reactive silanol groups; b) providing at least one reactive surface modification agent; and c) chemically capping at least some of the plurality of reactive silanol groups with the at least one of the reactive surface modification agents. Methods of carbon restoration in a material are also described that include: a) providing a carbon-deficient material having a plurality of reactive silanol groups; b) providing at least one reactive surface modification agent; and c)chemically capping at least some of the plurality of reactive silanol groups with the at least one of the reactive surface modification agents. In addition, methods are described herein for reducing the condensation of a film and/or a carbon-deficient film that include: a) providing a film having a plurality of reactive silanol groups; b) placing the film into a plasma chamber; c) introducing a plurality of reactive organic moieties-containing silanes into the chamber; and d) allowing the silanes to react with at least some of the reactive silanol groups. Dielectric materials and low-k dielectric materials are described herein that comprise: a) an inorganic material having a plurality of silicon atoms; and b) a plurality of organic moiety-containing silane compounds, wherein the silane compounds are coupled to the inorganic material through at least some of the silicon atoms.
摘要翻译：本文描述了修复材料中空隙的方法，其包括：a）提供具有多个反应性硅烷醇基团的材料; b）提供至少一种反应性表面改性剂; 和c）使所述多个反应性硅烷醇基团中的至少一些与至少一种反应性表面改性剂化学封端。还描述了材料中碳修复的方法，其包括：a）提供具有多个反应性硅烷醇基团的缺碳材料; b）提供至少一种反应性表面改性剂; 和c）使所述多个反应性硅烷醇基团中的至少一些与至少一种反应性表面改性剂化学封端。此外，本文描述了用于减少膜和/或缺碳膜的冷凝的方法，其包括：a）提供具有多个反应性硅烷醇基团的膜; b）将膜放入等离子体室中; c）将多个含反应性有机部分的硅烷引入所述室中; 和d）允许硅烷与至少一些反应性硅烷醇基团反应。介质材料和低k介电材料在本文中描述，其包括：a）具有多个硅原子的无机材料; 和b）多个含有机部分的硅烷化合物，其中硅烷化合物通过至少一些硅原子与无机材料偶联。

2. 发明申请

WO2004024979B1 SENSOR SYSTEM AND METHODS USED TO DETECT MATERIAL WEAR AND SURFACE DETERIORATION 审中-公开
标题翻译：传感器系统和方法用于检测材料磨损和表面缺陷
公开(公告)号：WO2004024979B1
公开(公告)日：2004-05-27
申请号：PCT/US0328832
申请日：2003-09-12
申请人： HONEYWELL INT INC , BONNE ULRICH , MOSHER JOHN , POBLANO PHILIP , GRABMEIER SUSANNE , THOMAS MICHAEL , STROTHERS SUSAN
发明人： BONNE ULRICH , MOSHER JOHN , POBLANO PHILIP , GRABMEIER SUSANNE , THOMAS MICHAEL , STROTHERS SUSAN
IPC分类号： C23C14/34
CPC分类号： H01J37/3479 , C23C14/3407
摘要： A sensor system has been developed for measuring erosion of a sputtering target (510) in a vacuum chamber that includes: a) a sputtering target, b) a wafer, c) a vacuum atmosphere located between the sputtering target and the wafer, and d) a sensor device (525) directly coupled to the sputtering target (510), wherein the sensor device (525) is exposed to the vacuum atmosphere and comprises a data collection apparatus that is exposed to atmospheric pressure. A method of detecting erosion in a sputtering target (510) has also been developed that includes: a) providing a sputtering target (510), b) providing a wafer (550), c) initiating a vacuum atmosphere and a plasma that are located between the sputtering target (510) and the wafer (550), d) providing a sensor device (525) directly coupled to the sputtering target (510), wherein the sensor device (525) is partly exposed to the vacuum atmosphere and comprises a data collection apparatus that is exposed to atmospheric pressure, e) collecting data from the data collection apparatus; and f) automatically terminating the operation of the plasma once the data collection apparatus determines that the sputtering target (510) has sufficiently eroded.
摘要翻译：已经开发了用于测量真空室中的溅射靶（510）的侵蚀的传感器系统，所述真空室包括：a）溅射靶，b）晶片，c）位于溅射靶和晶片之间的真空气氛，以及d ）直接耦合到溅射靶（510）的传感器装置（525），其中传感器装置（525）暴露于真空气氛并且包括暴露于大气压的数据收集装置。还已经开发了检测溅射靶（510）中的侵蚀的方法，该方法包括：a）提供溅射靶（510），b）提供晶片（550），c）引发位于其中的真空气氛和等离子体在所述溅射靶（510）和所述晶片（550）之间，d）提供直接耦合到所述溅射靶（510）的传感器装置（525），其中所述传感器装置（525）部分地暴露于所述真空气氛并且包括数据收集装置，其暴露于大气压力，e）从数据收集装置收集数据; 以及f）一旦数据采集装置确定溅射靶（510）已经充分侵蚀，则自动终止等离子体的操作。

3. 发明申请

WO2004024979A9 SENSOR SYSTEM AND METHODS USED TO DETECT MATERIAL WEAR AND SURFACE DETERIORATION 审中-公开
标题翻译：传感器系统和用于检测材料磨损和表面检测的方法
公开(公告)号：WO2004024979A9
公开(公告)日：2004-07-15
申请号：PCT/US0328832
申请日：2003-09-12
申请人： HONEYWELL INT INC , BONNE ULRICH , MOSHER JOHN , POBLANO PHILIP , GRABMEIER SUSANNE , THOMAS MICHAEL , STROTHERS SUSAN
发明人： BONNE ULRICH , MOSHER JOHN , POBLANO PHILIP , GRABMEIER SUSANNE , THOMAS MICHAEL , STROTHERS SUSAN
IPC分类号： C23C14/34
CPC分类号： H01J37/3479 , C23C14/3407
摘要： A sensor system has been developed for measuring erosion of a sputtering target (510) in a vacuum chamber that includes: a) a sputtering target, b) a wafer, c) a vacuum atmosphere located between the sputtering target and the wafer, and d) a sensor device (525) directly coupled to the sputtering target (510), wherein the sensor device (525) is exposed to the vacuum atmosphere and comprises a data collection apparatus that is exposed to atmospheric pressure. A method of detecting erosion in a sputtering target (510) has also been developed that includes: a) providing a sputtering target (510), b) providing a wafer (550), c) initiating a vacuum atmosphere and a plasma that are located between the sputtering target (510) and the wafer (550), d) providing a sensor device (525) directly coupled to the sputtering target (510), wherein the sensor device (525) is partly exposed to the vacuum atmosphere and comprises a data collection apparatus that is exposed to atmospheric pressure, e) collecting data from the data collection apparatus; and f) automatically terminating the operation of the plasma once the data collection apparatus determines that the sputtering target (510) has sufficiently eroded.
摘要翻译：已经开发了用于测量真空室中的溅射靶（510）的侵蚀的传感器系统，其包括：a）溅射靶，b）晶片，c）位于溅射靶和晶片之间的真空气氛，d ）直接耦合到所述溅射靶（510）的传感器装置（525），其中所述传感器装置（525）暴露于所述真空气氛，并且包括暴露于大气压的数据采集装置。还开发了一种检测溅射靶（510）中的侵蚀的方法，包括：a）提供溅射靶（510），b）提供晶片（550），c）启动位于在所述溅射靶（510）和所述晶片（550）之间，d）提供直接耦合到所述溅射靶（510）的传感器装置（525），其中所述传感器装置（525）部分地暴露于所述真空气氛并且包括暴露于大气压的数据收集装置，e）从数据收集装置收集数据; 以及f）一旦数据收集装置确定溅射靶（510）已被充分侵蚀，则自动终止等离子体的操作。

4. 发明申请

WO0194660A3 SPUTTERING TARGET 审中-公开
标题翻译：飞溅目标
公开(公告)号：WO0194660A3
公开(公告)日：2002-05-30
申请号：PCT/US0117798
申请日：2001-05-31
申请人： HONEYWELL INT INC , SEGAL VLADIMIR , THOMAS MICHAEL , LI JIANXING , FERRASSE STEPHANE , ALFORD FRANK , SCOTT TIM , TURNER STEPHEN
发明人： SEGAL VLADIMIR , THOMAS MICHAEL , LI JIANXING , FERRASSE STEPHANE , ALFORD FRANK , SCOTT TIM , TURNER STEPHEN
IPC分类号： C23C14/34 , B22F1/00
CPC分类号： C23C14/3414 , B21C23/001
摘要： A material may include grains of sizes such that at least 99 % of a measured area contains grains that exhibit grain areas less than 10 times an area of a mean grain size of the measured area. As examples, at least 99 % of the measured area may contain grains with grain areas less than 8, 6, or 3 times the area of the mean grain size. The grains may also have a mean grain size of less than 3 times a minimum statically recrystallized grain size, for example, a mean grain size less than about 50 microns, 10 microns, or 1 micron. The material may be comprised by a sputtering target and a thin film may be deposited on a substrate from such a sputtering target. A micro-are reduction method may include sputtering a film from a sputtering target comprising grains of sizes as described. A sputtering target forming method may include deforming a sputtering material. After the deforming, the sputtering material may be shaped into at least a portion of a sputtering target. The sputtering target may include grains of sizes as described. Also, the deforming may induce a strain level corresponding to epsilon of at least about 4. Further, the deforming may include equal channel angular extrusion.
摘要翻译：材料可以包括尺寸使得测量面积的至少99％含有表现出小于测量区域的平均粒度的面积的10倍的颗粒的颗粒。作为实例，测量面积的至少99％可以含有晶粒面积小于平均晶粒尺寸面积的8,6或3倍的晶粒。颗粒的平均粒度也可以小于最小静态再结晶晶粒尺寸的3倍，例如，平均粒度小于约50微米，10微米或1微米。该材料可以由溅射靶材组成，并且薄膜可以从这样的溅射靶材沉积在衬底上。微观还原方法可以包括从包括如上所述尺寸的晶粒的溅射靶溅射膜。溅射靶的形成方法可以包括使溅射材料变形。在变形之后，溅射材料可以被成形为溅射靶的至少一部分。溅射靶可以包括如上所述的尺寸的晶粒。此外，变形可以引起对应于至少约4的ε的应变水平。此外，变形可以包括相等的通道角挤压。

5. 发明申请

WO0201621A3 METHOD TO RESTORE HYDROPHOBICITY IN DIELECTRIC FILMS AND MATERIALS 审中-公开
标题翻译：在电介质膜和材料中恢复疏水性的方法
公开(公告)号：WO0201621A3
公开(公告)日：2002-03-21
申请号：PCT/US0119466
申请日：2001-06-19
申请人： HONEYWELL INT INC , HACKER NIGEL P , THOMAS MICHAEL , DRAGE JAMES S
发明人： HACKER NIGEL P , THOMAS MICHAEL , DRAGE JAMES S
IPC分类号： B08B7/00 , B32B3/10 , G03F7/16 , G03F7/40 , H01L21/02 , H01L21/3105 , H01L21/312 , H01L21/316 , H01L21/768
CPC分类号： H01L21/76814 , H01L21/02063 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02304 , H01L21/02337 , H01L21/0234 , H01L21/02343 , H01L21/02359 , H01L21/02362 , H01L21/3105 , H01L21/31058 , H01L21/3122 , H01L21/31695 , H01L21/7682 , H01L21/76826 , H01L21/76831 , Y10T428/24802
摘要： Silica dielectric films, whether nonporous foamed silica dielectrics or nonporous silica dielectrics are readily damaged by fabrication methods and reagents that reduce or remove hydrophobic properties from the dielectric surface. The invention provides for methods of imparting hydrophobic properties to such damaged silica dielectric films present on a substrate. The invention also provides plasma-based methods for imparting hydrophobicity to both new and damaged silica dielectric films. Semiconductor devices prepared by the inventive processes are also provided.
摘要翻译：二氧化硅电介质薄膜，无论是无孔泡沫硅石电介质还是无孔二氧化硅电介质，都容易被制造方法和试剂损坏，这些制造方法和试剂减少或消除介电表面的疏水性。本发明提供了赋予衬底上存在的这种损坏的二氧化硅介电膜疏水性的方法。本发明还提供了用于赋予新的和损坏的二氧化硅介电薄膜疏水性的基于等离子体的方法。还提供了通过本发明方法制备的半导体器件。

6. 发明申请

WO2009117102A2 BACKGROUND LIGHT DETECTION SYSTEM FOR A FLOW CYTOMETER 审中-公开
标题翻译：背景技术流式细胞仪的光检测系统
公开(公告)号：WO2009117102A2
公开(公告)日：2009-09-24
申请号：PCT/US2009001701
申请日：2009-03-17
申请人： NPE SYSTEMS INC , THOMAS RICHARD , THOMAS MICHAEL
发明人： THOMAS RICHARD , THOMAS MICHAEL
IPC分类号： C12M3/00
CPC分类号： G01N15/1429 , G01N15/1459 , G01N2015/1477
摘要： A flow cytometer and system having an array of processing elements that detect and convert energy entering the detector into a digital signal which has had background energy filtered.
摘要翻译：一种具有处理元件阵列的流式细胞仪和系统，该处理元件检测并将进入检测器的能量转换成具有过滤能力的数字信号。

7. 发明申请

WO2008140615A3 MODIFIED MESSENGER RNA STABILIZING SEQUENCES FOR EXPRESSING GENES IN BACTERIAL CELLS 审中-公开
标题翻译：用于在细菌细胞中表达基因的修饰信使RNA稳定序列
公开(公告)号：WO2008140615A3
公开(公告)日：2009-05-14
申请号：PCT/US2007088060
申请日：2007-12-19
申请人： NOVOZYMES INC , THOMAS MICHAEL , ERICHSEN GLORIA , WIDNER WILLIAM
发明人： THOMAS MICHAEL , ERICHSEN GLORIA , WIDNER WILLIAM
IPC分类号： C12N15/75
CPC分类号： C07K14/32 , C12N15/75
摘要： The present invention relates to methods of producing a polypeptide having biological activity in a bacterial cell, comprising: (a) cultivating a bacterial host cell in a medium conducive for production of the polypeptide, wherein the bacterial host cell comprises a nucleic acid construct comprising a promoter region operably linked to a polynucleotide sequence encoding the polypeptide and a modified mRNA processing/stabilizing sequence located downstream of the promoter region and upstream of the ribosome binding site of the polynucleotide sequence encoding the polypeptide, wherein the modified mRNA processing/stabilizing sequence promotes higher expression of the polynucleotide sequence compared to an unmodified mRNA processing/stabilizing sequence; and (b) isolating the polypeptide having biological activity from the cultivation medium. The present invention also relates to such modified mRNA processing/stabilizing sequences, nucleic acid constructs, and bacterial host cells and to methods of obtaining such bacterial host cells.
摘要翻译：本发明涉及生产在细菌细胞中具有生物活性的多肽的方法，包括：（a）在有助于产生多肽的培养基中培养细菌宿主细胞，其中细菌宿主细胞包含核酸构建体，其包含与编码多肽的多核苷酸序列可操作地连接的启动子区和位于编码多肽的多核苷酸序列的启动子区域的下游和修饰的mRNA加工/稳定序列的修饰的mRNA加工/稳定序列，其中修饰的mRNA加工/稳定序列促进更高与未修饰的mRNA加工/稳定序列相比，多核苷酸序列的表达; 和（b）从培养基中分离具有生物活性的多肽。本发明还涉及这种修饰的mRNA加工/稳定序列，核酸构建体和细菌宿主细胞以及获得这种细菌宿主细胞的方法。

8. 发明申请

WO2008067423A2 METHODS OF IMPROVING THE INTRODUCTION OF DNA INTO BACTERIAL CELLS 审中-公开
标题翻译：将DNA引入细菌细胞的方法
公开(公告)号：WO2008067423A2
公开(公告)日：2008-06-05
申请号：PCT/US2007085840
申请日：2007-11-29
申请人： NOVOZYMES INC , THOMAS MICHAEL , REY MICHAEL
发明人： THOMAS MICHAEL , REY MICHAEL
IPC分类号： C12N15/09
CPC分类号： C12N9/22 , C12N9/1007 , C12P21/00
摘要： The present invention relates to methods of improving the introduction of DNA into bacterial host cells.
摘要翻译：本发明涉及改进将DNA引入细菌宿主细胞的方法。

9. 发明申请

WO2008014915A3 METHOD FOR THE PLASMA TREATMENT OF A SURFACE 审中-公开
标题翻译：等离子体处理表面的方法
公开(公告)号：WO2008014915A3
公开(公告)日：2008-05-08
申请号：PCT/EP2007006615
申请日：2007-07-19
申请人： FRAUNHOFER GES FORSCHUNG , THOMAS MICHAEL , SCHLITTENHARDT EUGEN
发明人： THOMAS MICHAEL , SCHLITTENHARDT EUGEN
IPC分类号： B05D7/22 , B05D7/24 , C08J7/18 , C23C16/04 , C23C16/507 , H01J37/32
CPC分类号： C23C16/401 , B05D1/62 , B05D7/227 , C08J7/123 , C08J2323/12 , C23C16/045 , H01J37/32366 , H01J37/32449 , H01J37/32825
摘要： The invention relates to a method for the plasma treatment of a surface in a hollow body (4), in which firstly the hollow body (4) which has a wall of dielectric material is filled with a process gas, after which the hollow body (4) is sealed gas-tight and introduced into a space (5) between at least two electrodes (1, 2), with the external pressure prevailing in this space (5) being above 0.5 bar, while an internal pressure likewise of at least 0.5 bar prevails in an inner chamber of the hollow body (4), and the space (5) between the electrodes (1, 2) being filled with a gas which has at the external pressure a higher ignition voltage than the process gas at the internal pressure. Finally, a plasma is ignited in the inner chamber of the hollow body (4) by applying a sufficiently high alternating voltage between the electrodes (1, 2).
摘要翻译：本发明涉及一种用于等离子体在中空主体（4）处理的表面，其中，第一中空体（4），其具有电介质材料制成的壁，填充有处理气体，然后将中空主体（4）以气密方式和在一个室（5）被插入至少两个电极（1,2），在该空间（5）有大约0.5巴的外部压力之间，而在所述中空主体（4）中，同样地至少0.5的内部压力的内部空间并且其中电极（1,2）之间的空间（5）填充有在外部压力下具有比在内部压力下的处理气体更高的点火电压的气体。最后，通过在电极（1,2）之间施加足够高的交流电压，在中空体（4）的内部点燃等离子体。

10. 发明申请

WO2006124090A3 CUTTING DEVICE FOR SUBCUTANEOUS INCISIONS 审中-公开
标题翻译：切割设备用于不规则入侵
公开(公告)号：WO2006124090A3
公开(公告)日：2009-04-16
申请号：PCT/US2006005976
申请日：2006-02-21
申请人： HAUSMAN MICHAEL , THOMAS MICHAEL , ADAMS BRIAN , PEPPER JOHN
发明人： HAUSMAN MICHAEL , THOMAS MICHAEL , ADAMS BRIAN , PEPPER JOHN
IPC分类号： A61B17/32
CPC分类号： A61B17/320036 , A61B17/320016 , A61B17/3496 , A61B2017/00867 , A61B2090/033 , A61B2090/062
摘要： A cutting device is provided for making subcutaneous incisions. The cutting device has a housing forming a handle. A tubular blade sub-assembly extends from the housing. A trocar passes through the tubular blade sub-assembly and is configured to be positioned in a first active position, with a tip of the trocar extending beyond the end of the tubular blade sub-assembly and a second retracted position where the tip of the trocar is held within the end of tubular blade sub-assembly.
摘要翻译：提供切割装置用于进行皮下切口。切割装置具有形成手柄的壳体。管状叶片子组件从壳体延伸。套管针穿过管状刀片子组件并构造成定位在第一主动位置，其中套管针的尖端延伸超过管状刀片子组件的端部，并且第二缩回位置位于套管针的尖端被保持在管状叶片子组件的端部内。

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