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1. 发明申请

WO2004024979A9 SENSOR SYSTEM AND METHODS USED TO DETECT MATERIAL WEAR AND SURFACE DETERIORATION 审中-公开
标题翻译：传感器系统和用于检测材料磨损和表面检测的方法
公开(公告)号：WO2004024979A9
公开(公告)日：2004-07-15
申请号：PCT/US0328832
申请日：2003-09-12
申请人： HONEYWELL INT INC , BONNE ULRICH , MOSHER JOHN , POBLANO PHILIP , GRABMEIER SUSANNE , THOMAS MICHAEL , STROTHERS SUSAN
发明人： BONNE ULRICH , MOSHER JOHN , POBLANO PHILIP , GRABMEIER SUSANNE , THOMAS MICHAEL , STROTHERS SUSAN
IPC分类号： C23C14/34
CPC分类号： H01J37/3479 , C23C14/3407
摘要： A sensor system has been developed for measuring erosion of a sputtering target (510) in a vacuum chamber that includes: a) a sputtering target, b) a wafer, c) a vacuum atmosphere located between the sputtering target and the wafer, and d) a sensor device (525) directly coupled to the sputtering target (510), wherein the sensor device (525) is exposed to the vacuum atmosphere and comprises a data collection apparatus that is exposed to atmospheric pressure. A method of detecting erosion in a sputtering target (510) has also been developed that includes: a) providing a sputtering target (510), b) providing a wafer (550), c) initiating a vacuum atmosphere and a plasma that are located between the sputtering target (510) and the wafer (550), d) providing a sensor device (525) directly coupled to the sputtering target (510), wherein the sensor device (525) is partly exposed to the vacuum atmosphere and comprises a data collection apparatus that is exposed to atmospheric pressure, e) collecting data from the data collection apparatus; and f) automatically terminating the operation of the plasma once the data collection apparatus determines that the sputtering target (510) has sufficiently eroded.
摘要翻译：已经开发了用于测量真空室中的溅射靶（510）的侵蚀的传感器系统，其包括：a）溅射靶，b）晶片，c）位于溅射靶和晶片之间的真空气氛，d ）直接耦合到所述溅射靶（510）的传感器装置（525），其中所述传感器装置（525）暴露于所述真空气氛，并且包括暴露于大气压的数据采集装置。还开发了一种检测溅射靶（510）中的侵蚀的方法，包括：a）提供溅射靶（510），b）提供晶片（550），c）启动位于在所述溅射靶（510）和所述晶片（550）之间，d）提供直接耦合到所述溅射靶（510）的传感器装置（525），其中所述传感器装置（525）部分地暴露于所述真空气氛并且包括暴露于大气压的数据收集装置，e）从数据收集装置收集数据; 以及f）一旦数据收集装置确定溅射靶（510）已被充分侵蚀，则自动终止等离子体的操作。

2. 发明申请

WO2004024979B1 SENSOR SYSTEM AND METHODS USED TO DETECT MATERIAL WEAR AND SURFACE DETERIORATION 审中-公开
标题翻译：传感器系统和方法用于检测材料磨损和表面缺陷
公开(公告)号：WO2004024979B1
公开(公告)日：2004-05-27
申请号：PCT/US0328832
申请日：2003-09-12
申请人： HONEYWELL INT INC , BONNE ULRICH , MOSHER JOHN , POBLANO PHILIP , GRABMEIER SUSANNE , THOMAS MICHAEL , STROTHERS SUSAN
发明人： BONNE ULRICH , MOSHER JOHN , POBLANO PHILIP , GRABMEIER SUSANNE , THOMAS MICHAEL , STROTHERS SUSAN
IPC分类号： C23C14/34
CPC分类号： H01J37/3479 , C23C14/3407
摘要： A sensor system has been developed for measuring erosion of a sputtering target (510) in a vacuum chamber that includes: a) a sputtering target, b) a wafer, c) a vacuum atmosphere located between the sputtering target and the wafer, and d) a sensor device (525) directly coupled to the sputtering target (510), wherein the sensor device (525) is exposed to the vacuum atmosphere and comprises a data collection apparatus that is exposed to atmospheric pressure. A method of detecting erosion in a sputtering target (510) has also been developed that includes: a) providing a sputtering target (510), b) providing a wafer (550), c) initiating a vacuum atmosphere and a plasma that are located between the sputtering target (510) and the wafer (550), d) providing a sensor device (525) directly coupled to the sputtering target (510), wherein the sensor device (525) is partly exposed to the vacuum atmosphere and comprises a data collection apparatus that is exposed to atmospheric pressure, e) collecting data from the data collection apparatus; and f) automatically terminating the operation of the plasma once the data collection apparatus determines that the sputtering target (510) has sufficiently eroded.
摘要翻译：已经开发了用于测量真空室中的溅射靶（510）的侵蚀的传感器系统，所述真空室包括：a）溅射靶，b）晶片，c）位于溅射靶和晶片之间的真空气氛，以及d ）直接耦合到溅射靶（510）的传感器装置（525），其中传感器装置（525）暴露于真空气氛并且包括暴露于大气压的数据收集装置。还已经开发了检测溅射靶（510）中的侵蚀的方法，该方法包括：a）提供溅射靶（510），b）提供晶片（550），c）引发位于其中的真空气氛和等离子体在所述溅射靶（510）和所述晶片（550）之间，d）提供直接耦合到所述溅射靶（510）的传感器装置（525），其中所述传感器装置（525）部分地暴露于所述真空气氛并且包括数据收集装置，其暴露于大气压力，e）从数据收集装置收集数据; 以及f）一旦数据采集装置确定溅射靶（510）已经充分侵蚀，则自动终止等离子体的操作。

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