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1. 发明申请

WO2006108263A1 METHOD AND SYSTEM FOR SAMPLE TESTING 审中-公开
标题翻译：用于样品测试的方法和系统
公开(公告)号：WO2006108263A1
公开(公告)日：2006-10-19
申请号：PCT/CA2006/000122
申请日：2006-02-01
申请人： THERMO CRS LTD. , HERTZ, Roger B. , HAAS, Hansjoerg W. , DANIELS, Brian W. , LADINE, James R. , STELZER, Andreas L. , LEDUC, Blair D.
发明人： HERTZ, Roger B. , HAAS, Hansjoerg W. , DANIELS, Brian W. , LADINE, James R. , STELZER, Andreas L. , LEDUC, Blair D.
IPC分类号： G01N35/00
CPC分类号： G01N35/00871 , G01N35/0092
摘要： The invention provides a system and method for testing samples and, in one embodiment, a system for directing and coordinating the operations of hardware components and performance of tasks of laboratory personnel. The system includes a user interface for receiving requests from one or more users. Each request comprises a list of one or more samples to be tested and specifies one or more tests to be conducted on each sample. The system also includes a sample preparation station for maintaining a library of all received samples and creating a sublibrary of samples based on the test(s) to be conducted. The system directs hardware components and laboratory personnel (collectively, laboratory resources) to conduct the requested tests and reports test results to the user(s) who have requested the test(s).
摘要翻译：本发明提供了用于测试样本的系统和方法，并且在一个实施例中，用于指导和协调硬件组件的操作和实验室人员的任务的执行的系统。该系统包括用于接收来自一个或多个用户的请求的用户界面。每个请求包括一个或多个要测试的样本的列表，并指定对每个样本进行一个或多个测试。该系统还包括一个样本准备站，用于维护所有接收到的样本的库，并根据要进行的测试创建样本的子库。系统指导硬件组件和实验室人员（统称为实验室资源）进行所要求的测试，并向测试用户报告测试结果。

2. 发明申请

WO2004032184A3 LOW TEMPERATURE SALICIDE FORMING MATERIALS AND SPUTTERING TARGETS FORMED THEREFROM 审中-公开
公开(公告)号：WO2004032184A3
公开(公告)日：2004-04-15
申请号：PCT/US2003/024968
申请日：2003-08-06
申请人： HONEYWELL INTERNATIONAL, INC. , THOMAS, Michael, A. , DANIELS, Brian , TURNER, Stephen, P. , LEE, Eal, H.
发明人： THOMAS, Michael, A. , DANIELS, Brian , TURNER, Stephen, P. , LEE, Eal, H.
IPC分类号： C22C19/03
摘要： Metal-based precursor materials as described herein have an overall Curie temperature and include: a) a first material constituent having a first Curie temperature component; and b) at least one additional material constituent having a second Curie temperature component, wherein the overall Curie temperature is lower than the first Curie temperature component. Methods are also described of forming a metal-based salicide precursor material having an overall Curie temperature including: a) providing a first material constituent having a first Curie temperature component; b) providing at least one additional material constituent having a second Curie temperature component; and c) combining the first material constituent and the at least one additional material constituent such that the overall Curie temperature is lower than the first Curie temperature.

3. 发明申请

WO2021061692A1 ANTI-SLIDE BODY SUPPORT 审中-公开
公开(公告)号：WO2021061692A1
公开(公告)日：2021-04-01
申请号：PCT/US2020/052086
申请日：2020-09-23
申请人： DANIELS, Brian, P. , DANIELS, Nicholas, B.
发明人： DANIELS, Brian, P. , DANIELS, Nicholas, B.
IPC分类号： A47C20/00 , A47C20/08 , A61G7/05 , A61G7/075 , B66F3/12 , A61G5/12
摘要： A body support for use with a bed having a top end, a bottom end and a mattress, including a back vertical wall removably mountable at the bottom end of the bed in a fixed position in which the wall extends across the bed and above the mattress, a front vertical wall extending parallel to the back wall above the mattress, and a scissor jack disposed between, secured to and connecting the front wall and the back wall so as to be capable of expanding and contracting horizontally to move the front wall away from and toward the back wall above the mattress in maintained parallel relation to the back wall, whereby the front wall serves as a foot support for an individual lying on the bed and is positionally adjustable in accordance with the individual's height. A pad may be removably mounted on the front wall.

4. 发明申请

WO2006101578A8 VAPOR PHASE TREATMENT OF DIELECTRIC MATERIALS 审中-公开
标题翻译：电介质材料的蒸汽相处理
公开(公告)号：WO2006101578A8
公开(公告)日：2008-02-07
申请号：PCT/US2006001561
申请日：2006-01-17
申请人： HONEYWELL INT INC , BHANAP ANIL S , GOLECKI ILAN , ENDISCH DENIS H , DANIELS BRIAN J , BURNHAM KIKUE S , ROTH ROBERT R
发明人： BHANAP ANIL S , GOLECKI ILAN , ENDISCH DENIS H , DANIELS BRIAN J , BURNHAM KIKUE S , ROTH ROBERT R
IPC分类号： H01L21/316 , C23C16/40 , C23C16/56 , H01L21/3105
CPC分类号： H01L21/02126 , C23C16/56 , H01L21/02203 , H01L21/02216 , H01L21/02219 , H01L21/02222 , H01L21/02282 , H01L21/02337 , H01L21/02359 , H01L21/3105 , H01L21/76814
摘要： The invention concerns a method for applying a surface modification agent composition for organosilicat
摘要翻译：本发明涉及一种应用有机硅酸盐的表面改性剂组合物的方法

5. 发明申请

WO2004032184A2 LOW TEMPERATURE SALICIDE FORMING MATERIALS AND SPUTTERING TARGETS FORMED THEREFROM 审中-公开
标题翻译：低温杀菌剂形成材料和溅射目标
公开(公告)号：WO2004032184A2
公开(公告)日：2004-04-15
申请号：PCT/US0324968
申请日：2003-08-06
申请人： HONEYWELL INT INC , THOMAS MICHAEL A , DANIELS BRIAN , TURNER STEPHEN P , LEE EAL H
发明人： THOMAS MICHAEL A , DANIELS BRIAN , TURNER STEPHEN P , LEE EAL H
IPC分类号： C23C14/14 , C23C14/34 , H01L
CPC分类号： C23C14/3414 , C23C14/14
摘要： Metal-based precursor materials as described herein have an overall Curie temperature and include: a) a first material constituent having a first Curie temperature component; and b) at least one additional material constituent having a second Curie temperature component, wherein the overall Curie temperature is lower than the first Curie temperature component. Methods are also described of forming a metal-based salicide precursor material having an overall Curie temperature including: a) providing a first material constituent having a first Curie temperature component; b) providing at least one additional material constituent having a second Curie temperature component; and c) combining the first material constituent and the at least one additional material constituent such that the overall Curie temperature is lower than the first Curie temperature.
摘要翻译：本文所述的基于金属的前体材料具有总体居里温度，并且包括：a）具有第一居里温度分量的第一材料成分; 和b）具有第二居里温度分量的至少一种另外的材料成分，其中总体居里温度低于第一居里温度分量。还描述了形成总体居里温度的基于金属的自对准硅化物前体材料的方法，包括：a）提供具有第一居里温度分量的第一材料成分; b）提供具有第二居里温度分量的至少一种另外的材料成分; 以及c）将所述第一材料成分和所述至少一种附加材料成分相结合，使得居里温度的总体温度低于第一居里温度。

6. 发明申请

WO2005021828A2 PVD TARGETS COMPRISING COPPER IN TERNARY MIXTURES, AND METHODS OF FORMING COPPER-CONTAINING PVD TARGETS 审中-公开
标题翻译：在三元混合物中包含铜的PVD目标和形成含铜PVD靶材的方法
公开(公告)号：WO2005021828A2
公开(公告)日：2005-03-10
申请号：PCT/US2004027090
申请日：2004-08-20
申请人： HONEYWELL INT INC , DANIELS BRIAN J , HAUSMAN CHRISTIE J , HUTCHISON CARA L , LEE EAL H , YI WUWEN , STROTHERS SUSAN D , PINTER MICHAEL R , THOMAS MICHAEL E
发明人： DANIELS BRIAN J , HAUSMAN CHRISTIE J , HUTCHISON CARA L , LEE EAL H , YI WUWEN , STROTHERS SUSAN D , PINTER MICHAEL R , THOMAS MICHAEL E
IPC分类号： C23C14/16 , C23C14/34 , H01L21/285 , H01L21/768 , H01L23/532 , C23C14/14 , C23C14/32
CPC分类号： C23C14/3414 , B32B15/012 , C23C14/16 , C23C14/185 , C23C14/3407 , H01L21/2855 , H01L21/76841 , H01L21/76843 , H01L21/76871 , H01L21/76877 , H01L23/53233 , H01L2924/0002 , H01L2924/00
摘要： The invention includes a physical vapor deposition target containing copper and at least two additional elements selected from Ag, Al, As, Au, B, Be, Ca, Cd, Co, Cr, Fe, Ga, Ge, Hf, Hg, In, Ir, Li, Mg, Mn, Nb, Ni, Pb, Pd, Pt, Sb, Sc, Si, Sn, Ta, Te, Ti, V, W, Zn and Zr, a total amount of the at least two additional elements being from 100 ppm to 10 atomic %. The invention additionally includes thin films and interconnects which contain the mixture of copper and at least two added elements. The invention also includes forming a copper-containing target. A mixture of copper and two or more elements is formed. The mixture is cast by melting and is subsequently cooled to form a billet which is worked utilizing one or both of equal channel angular extrusion and thermornechanical processing to form a target.
摘要翻译：本发明包括含有铜和至少两种选自Ag，Al，As，Au，B，Be，Ca，Cd，Co，Cr，Fe，Ga，Ge，Hf，Hg，In， Ir，Li，Mg，Mn，Nb，Ni，Pb，Pd，Pt，Sb，Sc，Si，Sn，Ta，Te，Ti，V，W，Zn和Zr中的至少两种添加元素为100〜10原子％。本发明还包括含有铜和至少两种添加元素的混合物的薄膜和互连。本发明还包括形成含铜靶。形成铜和两种或更多种元素的混合物。混合物通过熔化铸造并随后冷却以形成坯料，其使用等通道角挤压和热机械加工中的一种或两种来形成靶。

7. 发明申请

WO2004032184A9 LOW TEMPERATURE SALICIDE FORMING MATERIALS AND SPUTTERING TARGETS FORMED THEREFROM 审中-公开
公开(公告)号：WO2004032184A9
公开(公告)日：2004-10-21
申请号：PCT/US0324968
申请日：2003-08-06
申请人： HONEYWELL INT INC , THOMAS MICHAEL A , DANIELS BRIAN , TURNER STEPHEN P , LEE EAL H
发明人： THOMAS MICHAEL A , DANIELS BRIAN , TURNER STEPHEN P , LEE EAL H
IPC分类号： C23C14/14 , C23C14/34 , C22C19/03 , C22C19/07 , C22C22/00
CPC分类号： C23C14/3414 , C23C14/14
摘要： Metal-based precursor materials as described herein have an overall Curie temperature and include: a) a first material constituent having a first Curie temperature component; and b) at least one additional material constituent having a second Curie temperature component, wherein the overall Curie temperature is lower than the first Curie temperature component. Methods are also described of forming a metal-based salicide precursor material having an overall Curie temperature including: a) providing a first material constituent having a first Curie temperature component; b) providing at least one additional material constituent having a second Curie temperature component; and c) combining the first material constituent and the at least one additional material constituent such that the overall Curie temperature is lower than the first Curie temperature.

8. 发明申请

WO2004068555A2 REPAIR AND RESTORATION OF DAMAGED DIELECTRIC MATERIALS AND FILMS 审中-公开
标题翻译：损坏的电介质材料和膜的修复和恢复
公开(公告)号：WO2004068555A2
公开(公告)日：2004-08-12
申请号：PCT/US2004/002252
申请日：2004-01-26
申请人： HONEYWELL INTERNATIONAL INC , FAN, Wenya , LU, Victor , THOMAS, Michael , DANIELS, Brian , NGUYEN, Tiffany , ZHOU, De-Ling , NAMAN, Ananth , JIN, Lei , BHANAP, Anil
发明人： FAN, Wenya , LU, Victor , THOMAS, Michael , DANIELS, Brian , NGUYEN, Tiffany , ZHOU, De-Ling , NAMAN, Ananth , JIN, Lei , BHANAP, Anil
IPC分类号： H01L
CPC分类号： H01L21/31058 , H01L21/3105 , H01L21/76801 , H01L2924/0002 , H01L2924/00
摘要： Methods of repairing voids in a material are described herein that include: a) providing a material having a plurality of reactive silanol groups; b) providing at least one reactive surface modification agent; and c) chemically capping at least some of the plurality of reactive silanol groups with the at least one of the reactive surface modification agents. Methods of carbon restoration in a material are also described that include: a) providing a carbon-deficient material having a plurality of reactive silanol groups; b) providing at least one reactive surface modification agent; and c)chemically capping at least some of the plurality of reactive silanol groups with the at least one of the reactive surface modification agents. In addition, methods are described herein for reducing the condensation of a film and/or a carbon-deficient film that include: a) providing a film having a plurality of reactive silanol groups; b) placing the film into a plasma chamber; c) introducing a plurality of reactive organic moieties-containing silanes into the chamber; and d) allowing the silanes to react with at least some of the reactive silanol groups. Dielectric materials and low-k dielectric materials are described herein that comprise: a) an inorganic material having a plurality of silicon atoms; and b) a plurality of organic moiety-containing silane compounds, wherein the silane compounds are coupled to the inorganic material through at least some of the silicon atoms.
摘要翻译：本文描述了修复材料中空隙的方法，其包括：a）提供具有多个反应性硅烷醇基团的材料; b）提供至少一种反应性表面改性剂; 和c）使所述多个反应性硅烷醇基团中的至少一些与至少一种反应性表面改性剂化学封端。还描述了材料中碳修复的方法，其包括：a）提供具有多个反应性硅烷醇基团的缺碳材料; b）提供至少一种反应性表面改性剂; 和c）使所述多个反应性硅烷醇基团中的至少一些与至少一种反应性表面改性剂化学封端。此外，本文描述了用于减少膜和/或缺碳膜的冷凝的方法，其包括：a）提供具有多个反应性硅烷醇基团的膜; b）将膜放入等离子体室中; c）将多个含反应性有机部分的硅烷引入所述室中; 和d）允许硅烷与至少一些反应性硅烷醇基团反应。介质材料和低k介电材料在本文中描述，其包括：a）具有多个硅原子的无机材料; 和b）多个含有机部分的硅烷化合物，其中硅烷化合物通过至少一些硅原子与无机材料偶联。

9. 发明申请

WO2010088416A1 STACKABLE MINE ROCK SHIELDS 审中-公开
标题翻译：可堆放的矿山岩石
公开(公告)号：WO2010088416A1
公开(公告)日：2010-08-05
申请号：PCT/US2010/022441
申请日：2010-01-28
申请人： THREE RIVERS PACKAGING, INC. , DANIELS, Brian P.
发明人： DANIELS, Brian P.
IPC分类号： E02D29/045
CPC分类号： E21D23/03 , E21D21/0086
摘要： Disclosed is a stackable mine rock shield. The mine rock shield includes a body having a first surface and a second surface, an aperture positioned at about the center of the body for receiving a fastening mechanism, a continuous protuberance extending outwardly from the first surface of the periphery of the body and defining a recess wherein the continuous protuberance intersects the first surface of the body to form an angle of intersection with such first surface, and an edge portion at the perimeter of the body. The mine rock shield may further include a rigid notch at the periphery of the body.
摘要翻译：公开了一种可堆叠的矿山岩盾。矿岩盾包括具有第一表面和第二表面的主体，位于主体中心附近的孔，用于接收紧固机构，从主体周边的第一表面向外延伸的连续突起，凹部，其中连续突起与本体的第一表面相交以形成与该第一表面的交叉角，以及在该主体的周边处的边缘部分。矿岩盾还可以包括在身体周围的刚性切口。

10. 发明申请

WO2009015119A3 METHODS OF MAKING LOW-REFRACTIVE INDEX AND/OR LOW-K ORGANOSILICATE COATINGS 审中-公开
公开(公告)号：WO2009015119A3
公开(公告)日：2009-01-29
申请号：PCT/US2008/070714
申请日：2008-07-22
申请人： HONEYWELL INTERNATIONAL INC. , ZHOU, De-Ling , FAN, Wenya , RAMOS, Teresa A. , LEUNG, Roger Y. , SMITH, Peter A. , APEN, Paul G. , DANIELS, Brian J. , NAMAN, Ananth , ROTH, Robert R.
发明人： LEUNG, Roger Y. , SMITH, Peter A. , APEN, Paul G. , DANIELS, Brian J. , NAMAN, Ananth , ROTH, Robert R.
IPC分类号： C08G77/32 , C08G77/44
摘要： A method for forming a substantially transparent nanoporous organosilicate film on a substantially transparent substrate, for use in optical lighting devices such as organic light emitting diodes (OLEDs). The method includes first preparing a composition comprising a silicon containing pre-polymer, a porogen, and a catalyst. The composition is coated onto a substrate which is substantially transparent to visible light, forming a film thereon. The film is then gelled by crosslinking and cured by heating, such that the resulting cured film is substantially transparent to visible light. It is preferred that both the substrate and the nanoporous film are at least 98% transparent to visible light. Optical devices which include the resulting structures of this invention exhibit improved light extraction and illuminance where the nanoporous organosilicate film has a low refractive index in the range of 1.05 to 1.4, serving as an impedance matching layer in such devices.

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