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    • 7. 发明申请
    • III-NITRIDE SEMICONDUCTOR LIGHT EMITTING DEVICE
    • III-NITRIDE半导体发光器件
    • WO2007126282A1
    • 2007-11-08
    • PCT/KR2007/002120
    • 2007-04-30
    • EPIVALLEY CO., LTD.KIM, Chang TaeCHOI, Byeong Kyun
    • KIM, Chang TaeCHOI, Byeong Kyun
    • H01L33/00
    • H01L27/15
    • The present invention relates to a III-nitride semiconductor light emitting device including a plurality of nitride semiconductor layers including an active Iayer for generating light by recombination of electrons and holes, a light emitting diode region defined by separating the plurality of nitride semiconductor layers by etching, a protection element region separated from the light emitting diode region by the etching, for protecting the light emitting diode region from a voltage applied in a reverse direction, and a heat generation restriction portion formed at the center portion of the plurality of nitride semiconductor layers by the et ching, the light emission being not performed on the heat generation restriction portion, the protection element region being positioned at the heat generation restriction portion.
    • 本发明涉及一种III族氮化物半导体发光器件,其包括多个氮化物半导体层,该氮化物半导体层包括通过电子和空穴的复合产生光的有源层,通过蚀刻分离多个氮化物半导体层而限定的发光二极管区 ,通过蚀刻与发光二极管区域分离的保护元件区域,用于保护发光二极管区域免受逆向施加的电压;以及形成在多个氮化物半导体层的中心部分的发热限制部分 通过等待,在发热限制部分上不进行发光,保护元件区域位于发热限制部分。
    • 9. 发明申请
    • III-NITRIDE LIGHT EMITTING DIODE AND METHOD OF MANUFACTURING IT
    • III-NITRIDE发光二极管及其制造方法
    • WO2005124880A1
    • 2005-12-29
    • PCT/KR2005/000715
    • 2005-03-14
    • EPIVALLEY CO., LTD.YOO, Tae KyungKIM, Chang TaeKIM, Keuk
    • YOO, Tae KyungKIM, Chang TaeKIM, Keuk
    • H01L33/00
    • H01L27/15H01L33/32H01L2224/32245H01L2224/48091H01L2224/48137H01L2224/48247H01L2224/73265H01L2924/01046H01L2924/01077H01L2924/01078H01L2924/01079H01L2924/12032H01L2924/12041H01L2924/00H01L2924/00014
    • The present invention relates to an AlGalnN-based light-emitting diode and a manufacturing method of the diode comprising a first region comprising a first n-type AlGaInN layer, a first active layer formed on the first n-type AlGaInN layer, a first p-type AlGaInN layer formed on the first active layer, a first p-type electrode electrically connected with the first p-type AlGaInN layer, and a first n-type electrode electrically connected with the first n-type AlGaInN layer; a second region electrically insulated from the first region and comprising a second n-type AlGaInN layer, a second active layer formed on the second n-type AlGaInN layer, a second p-type AlGaInN layer formed on the second active layer, a p-type metal electrode formed on the second p-type AlGaInN layer and forming a Schottky diode with the second p-type AlGaInN layer, a second p-type electrode formed on the p-type metal electrode, and a second n-type electrode electrically connected with the second n-type AlGaInN layer; a first connection for connecting the first p-type electrode to the second n-type electrode; and a second connection for connecting the first n-type electrode to the second p-type electrode.
    • 本发明涉及一种基于AlGalnN的发光二极管和二极管的制造方法,该二极管包括第一区域,该第一区域包括第一n型AlGaInN层,形成在第一n型AlGaInN层上的第一有源层,第一p型 形成在第一有源层上的第一p型AlGaInN层,与第一p型AlGaInN层电连接的第一p型电极和与第一n型AlGaInN层电连接的第一n型电极; 与第一区域电绝缘的第二区域,包括第二n型AlGaInN层,形成在第二n型AlGaInN层上的第二有源层,形成在第二有源层上的第二p型AlGaInN层, 形成在第二p型AlGaInN层上并形成具有第二p型AlGaInN层的肖特基二极管的第一p型金属电极,形成在p型金属电极上的第二p型电极和电连接的第二n型电极 与第二n型AlGaInN层; 用于将第一p型电极连接到第二n型电极的第一连接; 以及用于将第一n型电极连接到第二p型电极的第二连接。
    • 10. 发明申请
    • III -NITRIDE SEMICONDUCTOR LIGHT EMITTING DEVICE
    • III -NITRIDE半导体发光器件
    • WO2005086244A1
    • 2005-09-15
    • PCT/KR2005/000618
    • 2005-03-04
    • EPIVALLEY CO., LTD.YOO, Tae KyungKIM, Chang TaePARK, Eun HyunJEON, Soo Kun
    • YOO, Tae KyungKIM, Chang TaePARK, Eun HyunJEON, Soo Kun
    • H01L33/00
    • H01L33/32
    • The present invention relates to a III-nitride semiconductor light emitting device comprising a plurality of III-nitride semiconductor layers including an active layer emitting light by recombination of electrons and holes, the plurality of III-nitride semiconductor layers having a p-type III-nitride semiconductor layer at the top thereof, an Si a C b N c (a.≥- 0,b>0,c ≥ O,a+c>0) layer grown on the p-type III-nitride semiconductor layer, the SiaCbNc (a ≥O,b>0,c ≥ 0,a+c>0) layer having an n-type conductivity and a thickness of l0 5ú to 500ú for the holes to be injected into the p-type III-nitride semiconductor layer by tunneling, and a p-side electrode formed on the SiaCbNc (a ≥- 0,b>0,c ≥ 0,a+c>0) layer. Generally, in III-nitride semiconductor light emitting devices, if a p-side electrode is formed directly on a p-type nitride semiconductor, high contact resistance is generated due to a high energy bandgap and low doping efficiency of the p-type nitride semiconductor. This makes the efficiency of the device degraded. According to the present invention, however, a Si a C b N c (a ≥ 0,b>0,c ≥- 0,a+c>O) layer which can be doped with a high concentration is intervened between a p-type nitride semiconductor and a p-side electrode. Therefore, the present invention can solve the conventional problem.
    • 本发明涉及包含多个III族氮化物半导体层的III族氮化物半导体发光器件,所述III族氮化物半导体层包括通过电子和空穴的复合发射光的有源层,所述多个III族氮化物半导体层具有p型III- 氮化物半导体层,在p型III族氮化物半导体层上生长的SiaCbNc(a => 0,b> 0,c> = O,a + c> 0)层,SiaCbNc(a > = 0,b> 0,c> = 0,a + c> 0)层,对于注入到p型III族氮化物半导体层中的空穴,具有n型导电性和105ú至500μ的厚度 以及形成在SiaCbNc(a> = - 0,b> 0,c> = 0,a + c> 0)层上的p侧电极。 通常,在III族氮化物半导体发光器件中,如果p侧电极直接形成在p型氮化物半导体上,则由于p型氮化物半导体的高能带隙和低掺杂效率而产生高接触电阻 。 这使得设备的效率降低。 然而,根据本发明,可以掺杂高浓度的SiaCbNc(a> = 0,b> 0,c> = - ,a + c> O)层介于p型氮化物半导体 和p侧电极。 因此,本发明可以解决常规问题。