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    • 3. 发明申请
    • LASER MICROMACHINING THROUGH A SACRIFICIAL PROTECTIVE MEMBER
    • 通过牺牲保护部件实现激光微机器人
    • WO2009120541A2
    • 2009-10-01
    • PCT/US2009/037411
    • 2009-03-17
    • ELECTRO SCIENTIFIC INDUSTRIES, INC.BALDWIN, Leo
    • BALDWIN, Leo
    • B23K26/04B23K26/42B23K26/36
    • B23K26/0624B23K26/082B23K26/0861B23K26/361B23K26/364B23K26/40B23K26/60B23K37/06B23K2203/50
    • A small feature at a target location (106) on a working surface (108) of a workpiece (110) is laser machined. A laser beam (104) propagating along a beam path is directed for incidence at the target location (106) on the working surface (108) to machine the small feature. A focusing lens (112) sized to converge the laser beam (104) on the working surface (108) is set in the beam path at a short working distance (x1) from the working surface (108) to laser machine the small feature and thereby eject target material from the workpiece back toward the focusing lens (112). A sacrificial protective member (114) positioned between the focusing lens (112) and the working surface (108) transmits without appreciable distortion or adsorption the laser beam (104) focused by the focusing lens (112) and incident on the working surface (108). The sacrificial protective member (114) intercepts the ejected target material to prevent a sufficient amount of it from reaching and thereby appreciably contaminating the focusing lens (112).
    • 激光加工工件(110)的工作表面(108)上的目标位置(106)处的小特征。 沿着光束路径传播的激光束(104)被引导入射到工作表面(108)上的目标位置(106)以加工小特征。 定尺寸为将激光束(104)会聚在工作表面(108)上的聚焦透镜(112)以距工作表面(108)较短的工作距离(x1)设置在光束路径中以激光加工小特征并且 从而将来自工件的目标材料朝着聚焦透镜(112)回射。 位于聚焦透镜(112)和工作表面(108)之间的牺牲保护构件(114)透射没有明显的变形或吸收由聚焦透镜(112)聚焦并入射到工作表面(108)上的激光束 )。 牺牲保护构件(114)拦截喷出的目标材料以防止其足够量到达并由此明显地污染聚焦透镜(112)。
    • 5. 发明申请
    • OPTIMIZING USE AND PERFORMANCE OF OPTICAL SYSTEMS IMPLEMENTED WITH TELECENTRIC ON-AXIS DARK FIELD ILLUMINATION
    • 光电系统的优化使用和性能实现与电场在线场景照明
    • WO2007008742A1
    • 2007-01-18
    • PCT/US2006/026649
    • 2006-07-07
    • ELECTRO SCIENTIFIC INDUSTRIES, INC.BALDWIN, LeoEMERY, Joseph, J.
    • BALDWIN, LeoEMERY, Joseph, J.
    • G01N21/88
    • G01N21/9501G01N21/47G01N2021/8822G02B13/22
    • Systems and methods are provided for imaging a planar specular object (102) such as a semiconductor wafer. In one embodiment, an imaging system (100) for imaging a defect on a planar specular object (102) includes a telecentric lens (110) having a sufficiently aspherical surface such that the telecentric lens (110) is substantially corrected for an optical aberration. The imaging system (100) also includes a telecentric stop (116) including an aperture therein to block light reflected from the planar specular object (102) while allowing light reflected from the defect to pass through the aperture. The imaging system (100) further includes a lens group (108) having a system stop positioned between the telecentric stop (116) and the lens group (108). The lens group (108) is substantially corrected for the optical aberration independent of the telecentric lens (110).
    • 提供了用于对诸如半导体晶片的平面镜面物体(102)进行成像的系统和方法。 在一个实施例中,用于对平面镜面物体(102)上的缺陷成像的成像系统(100)包括具有足够非球面的远心透镜(110),使得远心透镜(110)被基本上校正为光学像差。 成像系统(100)还包括远心止动件(116),其包括其中的孔,以阻挡从平面镜面物体(102)反射的光,同时允许从缺陷反射的光穿过孔。 成像系统(100)还包括具有定位在远心止动件(116)和透镜组(108)之间的系统止动件的透镜组(108)。 对于与远心透镜(110)无关的光学像差,基本上校正了透镜组(108)。
    • 6. 发明申请
    • COAXIAL NARROW ANGLE DARK FIELD LIGHTING
    • 同轴狭窄角度暗场照明
    • WO2004077336A2
    • 2004-09-10
    • PCT/US2004/002284
    • 2004-01-27
    • ELECTRO SCIENTIFIC INDUSTRIES, INC.BALDWIN, Leo
    • BALDWIN, Leo
    • G06K
    • G01N21/8806G02B21/10
    • A coaxial narrow angle dark field imaging system is provided. The system utilizes a telecentric lens to illuminate objects with symmetric coaxial narrow angle dark field illumination. The illumination technique is particularly suited to highlight minor features or defects on planar specular objects. In particular, the coaxial light source directs light rays towards a telecentric lens which redirects the light rays towards the substantially planar specular object. The light rays are reflected back through the telecentric lens towards a camera. To the extent that the light rays are reflected from a planar specular portion of the object the light rays are blocked by a telecentric stop. Light rays reflected from a defect or feature in the planar specular object will pass through an aperture in the stop to a camera.
    • 提供了一种同轴窄角暗场成像系统。 该系统利用远心透镜来照射具有对称同轴窄角暗场照明的物体。 照明技术特别适用于突出平面镜面物体上的次要特征或缺陷。 具体地说,同轴光源将光线引向远心透镜,该远心透镜将光线改向为朝向基本上平面的镜面物体。 光线通过远心镜头反射回相机。 就光线从物体的平面镜面反射部分反射而言,光线被远心光阑阻挡。 从平面镜面物体中的缺陷或特征反射的光线将通过光阑上的光圈传送到相机。
    • 8. 发明申请
    • IMAGE SUBTRACTION OF ILLUMINATION ARTIFACTS
    • 照明艺术的图像放置
    • WO2005076213A1
    • 2005-08-18
    • PCT/US2004/027167
    • 2004-12-06
    • ELECTRO SCIENTIFIC INDUSTRIES, INC.BALDWIN, Leo
    • BALDWIN, Leo
    • G06T5/00
    • G06K9/2036
    • A method of removing an artifact resulting from an in-line illumination device of an imaging system from an object image. It includes obtaining a first image of the artifact using a first artifact illumination level and imaging the object using the imaging system wherein the illumination device is using an object illumination level. An artifact image is independent of the object and has pixel values related to the illumination level. Thus, the artifact can be removed by subtracting respective pixel values of an artifact image from respective values of the object image on a pixel address-by-pixel address basis. Various illumination levels can be used to create more than one artifact image. The artifact image for the subtraction can be one of the images taken or can be a scaled image where an artifact image is scaled to the object illumination level.
    • 一种从对象图像中去除由成像系统的在线照明装置产生的伪影的方法。 它包括使用第一假象照明级别获得伪像的第一图像,并且使用其中照明装置正在使用对象照明级别的成像系统对对象进行成像。 伪影图像与对象无关,具有与照明级别相关的像素值。 因此,可以通过从像素地址逐像素地址的对象图像的各个值中减去伪影图像的各个像素值来去除伪像。 可以使用各种照明级别来创建多个伪像。 用于减法的伪影图像可以是所拍摄的图像之一,也可以是将伪像图像缩放到对象照明级别的缩放图像。