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1. 发明申请

WO2009051654A2 AMBIENT PLASMA TREAMENT OF PRINTER COMPONENTS 审中-公开
标题翻译：打印机组件的等离子体等离子体处理
公开(公告)号：WO2009051654A2
公开(公告)日：2009-04-23
申请号：PCT/US2008/011595
申请日：2008-10-08
申请人： EASTMAN KODAK COMPANY , SIEBER, Kurt, D. , GRACE, Jeremy , HAWKINS, Gilbert, Allen
发明人： SIEBER, Kurt, D. , GRACE, Jeremy , HAWKINS, Gilbert, Allen
IPC分类号： B41J2/16
CPC分类号： B41J2/1606 , B41J2/1631 , B41J2/1637 , B41J2202/33 , B41J2202/34
摘要： A method of treating a printer component, a printhead, and a printer are provided. The method includes providing an electrode proximate to the printer component to be treated; introducing a plasma treatment gas in an area proximate to the printer component to be treated; and treating the printer component by applying power to the electrode thereby producing a micro-scale plasma at near atmospheric pressure, the micro-scale plasma acting on the printer component.
摘要翻译：提供了一种处理打印机组件，打印头和打印机的方法。该方法包括提供靠近待处理的打印机部件的电极; 在接近待处理的打印机部件的区域中引入等离子体处理气体; 以及通过向所述电极施加电力来处理所述打印机部件，从而在接近大气压下产生微尺度等离子体，所述微量等离子体作用在所述打印机部件上。

2. 发明申请

WO2013036424A1 PRINTHEAD FOR INKJET PRINTING DEVICE 审中-公开
标题翻译：喷墨打印设备
公开(公告)号：WO2013036424A1
公开(公告)日：2013-03-14
申请号：PCT/US2012/053012
申请日：2012-08-30
申请人： EASTMAN KODAK COMPANY , SIEBER, Kurt, D.
发明人： SIEBER, Kurt, D.
IPC分类号： B41J2/16 , B41J2/03 , B41J2/14
CPC分类号： B41J2/1606 , B41J2/03 , B41J2/14129 , B41J2/1601 , B41J2/1642 , B41J2/1646 , B41J2202/22 , C23C16/405
摘要： An inkjet printhead is provided for a digitally controlled inkjet printing apparatus wherein the inkjet printhead is comprised of a material layer and a drop formation mechanism positioned in or on the material layer, that is substantially improved in chemical resistance and thermally stability. A chemically resistant and thermally stable multilayer coating is provided onto and in contact with the inkjet printhead, wherein the multilayer coating includes one or more thin film layers comprised primarily of hafnium oxide or zirconium oxide and one or more thin film layers comprised primarily of tantalum oxide, the multilayer coating being located on the material layer. The corrosion resistant film used in the invention is particularly beneficial because it can be formed on the printhead using atomic layer deposition film forming methods that produce conformal films that cover complex geometries, thereby enabling the corrosion resistant film to be formed on all surfaces of the printhead that come in contact with inks or other fluids employed in the printing system.
摘要翻译：为数字控制的喷墨打印设备提供喷墨打印头，其中喷墨打印头包括位于材料层中或材料层上的材料层和液滴形成机构，其基本上改善了耐化学性和热稳定性。在喷墨打印头上提供耐化学性和热稳定性的多层涂层，其中多层涂层包括主要由氧化铪或氧化锆组成的一个或多个薄膜层和主要由氧化钽组成的一个或多个薄膜层，多层涂层位于材料层上。本发明中使用的耐腐蚀膜是特别有益的，因为它可以使用产生覆盖复杂几何形状的保形膜的原子层沉积膜形成方法在打印头上形成，从而使耐腐蚀膜能够形成在打印头的所有表面上其与印刷系统中使用的油墨或其它流体接触。

3. 发明申请

WO2013036508A1 MICROFLUIDIC DEVICE WITH MULTILAYER COATING 审中-公开
标题翻译：具有多层涂层的微流体装置
公开(公告)号：WO2013036508A1
公开(公告)日：2013-03-14
申请号：PCT/US2012/053745
申请日：2012-09-05
申请人： EASTMAN KODAK COMPANY , SIEBER, Kurt, D.
发明人： SIEBER, Kurt, D.
IPC分类号： B41J2/14
CPC分类号： B41J2/14129 , Y10T428/24322 , Y10T428/24612
摘要： A microfluidic device is provided comprised of a material layer and a fluid transport feature having at least one characteristic dimension of less than 500 micrometers formed in or on the material layer, that is substantially improved in chemical resistance, thermally stability, and biocompatibility. A chemically resistant, thermally stable and biocompatible multilayer coating is provided onto and in contact with the microfluidic device, wherein the multilayer coating includes one or more thin film layers comprised primarily of hafnium oxide or zirconium oxide and one or more thin film layers comprised primarily of tantalum oxide, the multilayer coating being located on a surface of the fluid transport feature. The corrosion resistant film used in the invention is particularly beneficial because it can be formed on the surfaces of fluid transport features of microfluidic devices using atomic layer deposition film forming methods that produce conformal films that cover complex geometries, thereby enabling the corrosion resistant film to be formed on all surfaces of the fluid transport features of the microfluidic device that come in contact with reactants, analytes, inks or other fluids employed in the microfluidic device.
摘要翻译：提供了一种微流体装置，其由材料层和流体输送特征组成，其具有在材料层中或材料层上形成的至少一个小于500微米的特征尺寸，其在耐化学性，热稳定性和生物相容性方面基本上得到改善。在微流体装置上并与微流体装置接触的是耐化学性，热稳定和生物相容的多层涂层，其中多层涂层包括主要由氧化铪或氧化锆组成的一个或多个薄膜层和主要由氧化钽，多层涂层位于流体输送特征的表面上。本发明中使用的耐腐蚀膜是特别有益的，因为它可以使用产生覆盖复杂几何形状的保形膜的原子层沉积膜形成方法在微流体装置的流体输送特征的表面上形成，从而使耐腐蚀膜成为在与微流体装置中使用的反应物，分析物，油墨或其它流体接触的微流体装置的流体输送特征的所有表面上形成。

4. 发明申请

WO2016178819A1 RADIAL -FLOW PLASMA TREATMENT SYSTEM 审中-公开
标题翻译：径向流动等离子体处理系统
公开(公告)号：WO2016178819A1
公开(公告)日：2016-11-10
申请号：PCT/US2016/028359
申请日：2016-04-20
申请人： EASTMAN KODAK COMPANY
发明人： SIEBER, Kurt, D. , COK, Ronald, Steven
IPC分类号： H05H1/46 , H01J37/32
CPC分类号： H01J37/32449 , C23C16/452 , C23C16/45508 , C23C16/50 , H01J37/32036 , H01J37/32541 , H01J37/32733 , H01J37/32825 , H01J2237/332 , H05H1/2475 , H05H1/46 , H05H2001/2481 , H05H2001/466 , H05H2001/4675
摘要： An atmospheric-pressure plasma treatment system includes a plasma source including at least one electrode, a gas in a gas chamber, and an AC power supply that supplies power to the at least one electrode to form a plasma in the gas. A radial -flow surface has a jet nozzle through which the gas flows, the jet nozzle having a diameter and the radial-flow surface having an effective minimum radius that is at least two times greater than the nozzle diameter, and the radial-flow surface separated from a treatment surface of an object by a gap that is less than or equal to two times the nozzle diameter so that the gas flows radially outward from the jet nozzle and between the radial -flow surface and the treatment surface.
摘要翻译：大气压等离子体处理系统包括等离子体源，其包括至少一个电极，气体室中的气体和向该至少一个电极供电以在气体中形成等离子体的AC电源。径向流动表面具有喷嘴，气体流过该喷嘴，喷嘴具有直径，径向流动表面具有至少比喷嘴直径大两倍的有效最小半径，径向流动表面通过小于或等于喷嘴直径的两倍的间隙从物体的处理表面分离，使得气体从射流喷嘴径向向外流动，并且在径向流动表面和处理表面之间。

5. 发明申请

WO2015073064A1 PATTERNING FOR SELECTIVE AREA DEPOSITION 审中-公开
标题翻译：选择区域沉积的方法
公开(公告)号：WO2015073064A1
公开(公告)日：2015-05-21
申请号：PCT/US2014/041197
申请日：2014-06-06
申请人： EASTMAN KODAK COMPANY
发明人： ELLINGER, Carolyn, R. , NELSON, Shelby, F. , SIEBER, Kurt, D.
IPC分类号： H01L21/02 , H01L21/311 , H01L21/32 , C23C16/04
CPC分类号： H01L21/02642 , C23C16/042 , C23C16/403 , C23C16/407 , C23C16/45551 , H01L21/0228 , H01L21/02422 , H01L21/02554 , H01L21/02576 , H01L21/02579 , H01L21/31138 , H01L21/32
摘要： A method of producing a patterned inorganic thin film element includes providing a substrate. A thin layer of polymeric inhibitor is uniformly depositing on the substrate. A patterned mask having open areas is provided on the thin layer of polymeric inhibitor. The thin layer of polymeric inhibitor is patterned by removing inhibitor from areas exposed by the open areas of the patterned mask using a highly reactive oxygen process. An inorganic thin film layer is deposited on the substrate in the areas exposed by the removal of the thin layer of polymeric inhibitor using an atomic layer deposition process.
摘要翻译：制造图案化无机薄膜元件的方法包括提供基板。聚合物抑制剂的薄层均匀地沉积在基底上。在聚合物抑制剂的薄层上提供具有开放区域的图案化掩模。通过使用高活性氧气过程，通过从图案化掩模的开放区域暴露的区域除去抑制剂来图案化该聚合物抑制剂的薄层。通过使用原子层沉积工艺去除聚合物抑制剂的薄层而暴露在的区域中，在衬底上沉积无机薄膜层。

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