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    • 3. 发明申请
    • METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY
    • 使用充电颗粒光栅成像形成图案的方法和系统
    • WO2012118616A3
    • 2012-12-06
    • PCT/US2012025149
    • 2012-02-15
    • D2S INCFUJIMURA AKIRAZABLE HAROLD ROBERT
    • FUJIMURA AKIRAZABLE HAROLD ROBERT
    • H01L21/027G03F1/36
    • H01J37/3026B82Y10/00B82Y40/00H01J37/3174H01J2237/31764H01J2237/31776
    • A method and system for fracturing or mask data preparation or optical proximity correction or proximity effect correction or mask process correction is disclosed in which a set of shaped beam shots is determined that is capable of forming a pattern on a surface, where a plurality of shots in the same exposure pass overlap, and where the dose margin from the set of shots is calculated. A method and system for fracturing or mask data preparation or optical proximity correction or proximity effect correction or mask process correction is disclosed in which a set of shaped beam shots is determined that is capable of forming a pattern on a surface, where the set of shots provides different dosages to different parts of the pattern, and where the dose margin from the set of shots is calculated. A method for forming patterns on a surface is also disclosed.
    • 公开了一种用于压裂或掩模数据准备或光学邻近校正或接近效应校正或掩模处理校正的方法和系统,其中确定一组成形的射束,其能够在表面上形成图案,其中多个镜头 在相同的曝光通过重叠中,并且计算来自该组拍摄的剂量余量。 公开了一种用于压裂或掩模数据准备或光学邻近校正或接近效应校正或掩模处理校正的方法和系统,其中确定一组成形的射束,其能够在表面上形成图案,其中所述一组镜头 对图案的不同部分提供不同的剂量,并且计算来自该组照射的剂量余量。 还公开了在表面上形成图案的方法。
    • 7. 发明申请
    • METHOD FOR OPTICAL PROXIMITY CORRECTION, DESIGN AND MANUFACTURING OF A RETICLE USING VARIABLE SHAPED BEAM LITHOGRAPHY
    • 用于光学接近度校正的方法,使用可变形光束光刻法设计和制造光学元件的方法
    • WO2010025032A3
    • 2010-06-17
    • PCT/US2009053328
    • 2009-08-10
    • D2S INCFUJIMURA AKIRAGLASSER LANCE
    • FUJIMURA AKIRAGLASSER LANCE
    • H01L21/027G03F7/20
    • B82Y40/00B82Y10/00G03F1/36G03F1/68G03F1/78H01J37/3174
    • The present invention describes a method for using variable shaped beam (VSB) shots to form a desired pattern on a surface, where the union of the plurality of VSB shots deviates from the desired pattern. Additionally, the VSB shots are allowed to overlap each other, and the dosages of the shots are allowed to vary. Similar methods are disclosed for optical proximity correction (OPC), fracturing, mask data preparation, and proximity effect correction. A method for creating glyphs is also disclosed, in which patterns that would result on a surface from one or a group of VSB shots are pre-calculated. In some embodiments, an optimization technique may be used to minimize shot count. The method of the present disclosure may be used, for example, in the process of manufacturing an integrated circuit by optical lithography using a reticle, or in the process of manufacturing an integrated circuit using direct write.
    • 本发明描述了一种使用可变形束(VSB)发射在表面上形成所需图案的方法,其中多个VSB发射的并集偏离所需图案。 此外,VSB镜头允许彼此重叠,镜头的剂量可以变化。 公开了类似的方法用于光学邻近校正(OPC),压裂,掩模数据准备和邻近效应校正。 还公开了一种用于创建字形的方法,其中预先计算将在一个或一组VSB镜头的表面上产生的图案。 在一些实施例中,可以使用优化技术来使击发次数最小化。 例如,本公开的方法可用于通过使用光罩的光刻制造集成电路的过程中,或者在使用直接写入的制造集成电路的过程中。