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    • 3. 发明申请
    • DETECTION OF CONTAMINATING SUBSTANCES IN AN EUV LITHOGRAPHY APPARATUS
    • 在EUV光刻设备中检测污染物质
    • WO2010022815A1
    • 2010-03-04
    • PCT/EP2009/004811
    • 2009-07-03
    • CARL ZEISS SMT AGKRAUS, DieterEHM, Dirk HeinrichSCHMIDT, Stefan-Wolfgang
    • KRAUS, DieterEHM, Dirk HeinrichSCHMIDT, Stefan-Wolfgang
    • G03F7/20H01J49/00
    • G03F7/70916G03F7/7085G03F7/70983
    • The invention relates to an EUV lithography apparatus (1), comprising: a housing (1a) enclosing an interior (15), at least one reflective optical element (5, 6, 8, 9, 10, 14.1 to 14.6) arranged in the interior (15), a vacuum generating unit (1b) for generating a residual gas atmosphere in the interior (15), and also a residual gas analyzer (18a, 18b) for detecting at least one contaminating substance (17a) in the residual gas atmosphere. The residual gas analyzer (18a) has a storage device (21) for storing the contaminating substance (17a). The invention also relates to a method for detecting at least one contaminating substance by residual gas analysis of a residual gas atmosphere of an EUV lithography apparatus (1) having a housing (1a) having an interior (15), in which at least one reflective optical element (5, 6, 8, 9, 10, 14.1 to 14.6), is arranged, wherein the contaminating substance (17a) is stored in a storage device (21) in order to carry out the residual gas analysis.
    • 本发明涉及一种EUV光刻设备(1),包括:一个封装内部(15)的外壳(1a),至少一个反射光学元件(5,6,8,9,10,14.1至14.6) 内部(15),用于在内部(15)中产生残余气体气氛的真空发生单元(1b),以及用于检测残留气体中的至少一种污染物质(17a)的残留气体分析器(18a,18b) 大气层。 残留气体分析器(18a)具有用于储存污染物质(17a)的储存装置(21)。 本发明还涉及一种用于通过具有具有内部(15)的壳体(1a)的EUV光刻设备(1)的残余气体气体的残余气体分析来检测至少一种污染物质的方法,其中至少一个反射 配置光学元件(5,6,8,9,10,14.1至14.6),其中污染物质(17a)被存储在存储装置(21)中以便进行残留气体分析。