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1. 发明申请

WO2005040927A2 DEVICE FOR ADJUSTING THE ILLUMINATION DOSE ON A PHOTOSENSITIVE LAYER AND METHOD FOR THE MICROLITHOGRAPHIC PRODUCTION OF MICROSTRUCTURED COMPONENTS 审中-公开
标题翻译：用于调节感光层上的照射剂量的装置和用于微结构化组分的微观制造的方法
公开(公告)号：WO2005040927A2
公开(公告)日：2005-05-06
申请号：PCT/EP2004/010554
申请日：2004-09-21
申请人： CARL ZEISS SMT AG , GRUNER, Toralf , DEGÜNTHER, Markus
发明人： GRUNER, Toralf , DEGÜNTHER, Markus
IPC分类号： G03F7/20
CPC分类号： G03F7/70066 , G03F7/70558
摘要： A device for adjusting the illumination dose on a photosensitive layer (26), which is applied to a support (28) that can be displaced in a microlithographic projection exposure system (10) in a scanning direction (22) relative to a projection lens (16) of the projection exposure system (10), comprises an arrangement of a plurality of stop elements (52, 52') which are arranged next to one another perpendicularly to the scanning direction (22) and can respectively be displaced individually in the scanning direction (22) into a light field (60) produced by the projection exposure system (10). At least one stop element (52) is partially transparent for the projection light (14) being used in the projection exposure system (10), at least inside a subregion (69). This procedure substantially avoids pulse quantisation effects, which occur when using pulsed light sources (30) and can lead to inhomogeneous illumination of the reticle (20).
摘要翻译：一种用于调节感光层（26）上的照射剂量的装置，其被施加到在微光刻投影曝光系统（10）中相对于投影透镜在扫描方向（22）上移位的支撑件（28）投影曝光系统（10）的图16（16）包括沿垂直于扫描方向（22）彼此相邻布置的多个停止元件（52,52'）的布置，并且可以分别在扫描方向（22）投射到由投影曝光系统（10）产生的光场（60）中。至少一个止动元件（52）对于在投影曝光系统（10）中使用的至少在子区域（69）内的投影光（14）是部分透明的。该过程基本上避免了当使用脉冲光源（30）时发生的脉冲量化效应并且可能导致光罩（20）的不均匀照明。

2. 发明申请

WO2006084479A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置
公开(公告)号：WO2006084479A1
公开(公告)日：2006-08-17
申请号：PCT/EP2005/001435
申请日：2005-02-12
申请人： CARL ZEISS SMT AG , GRUNER, Toralf , EPPLE, Alexander , DEGÜNTHER, Markus
发明人： GRUNER, Toralf , EPPLE, Alexander , DEGÜNTHER, Markus
IPC分类号： G03F7/20
CPC分类号： G03F7/70108 , G03F7/70141 , G03F7/70191
摘要： A projection exposure apparatus has a projection lens (10) with an object plane (34), an image plane, an optical axis (28) and a non-telecentric entrance pupil (32). The apparatus further comprises an illumination system (12) having an intermediate field plane (80) and a field stop (36; 36'). The field stop is positioned in or in close proximity to the intermediate field plane (80) and defines an illuminated field (14) in the object plane (34) that does not contain the optical axis (28) of the projection lens (24). The illumination system (12) is configured such that, in the object plane (34), a mean of the angles formed between all principal rays (42) emanating from the intermediate field plane (80) on the one hand and the optical axis (28) of the projection lens (24) on the other hand differs from 0 ° .
摘要翻译：投影曝光装置具有具有物平面（34），像平面，光轴（28）和非远心入射光瞳（32）的投影透镜（10）。该装置还包括具有中间场平面（80）和场停止（36; 36'）的照明系统（12）。场停止件位于中间场平面（80）中或紧邻中间场平面（80），并且在物平面（34）中限定不包含投影透镜（24）的光轴（28）的照明场（14）。照明系统（12）被配置为使得在物平面（34）中，一方面从中间场平面（80）发射的所有主光线（42）和光轴（42）之间形成的平均角另一方面，投影透镜（24）的光束（28）不同于0°。

3. 发明申请

WO2009065819A2 OPTICAL SYSTEM 审中-公开
标题翻译：光学系统
公开(公告)号：WO2009065819A2
公开(公告)日：2009-05-28
申请号：PCT/EP2008/065733
申请日：2008-11-18
申请人： CARL ZEISS SMT AG , MÜLLER, Ralf , GRUNER, Toralf
发明人： MÜLLER, Ralf , GRUNER, Toralf
IPC分类号： G02B5/30 , G02B1/08 , G03F7/20
CPC分类号： G02B5/3083 , G02B1/08 , G03F7/70141 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70566 , G03F7/70966
摘要： The invention concerns, according to one aspect, an optical system having an optical axis OA (OA) and comprising at least one polarization manipulator (100, 200) having a first subelement (110, 210) which has a non-planar, optically effective surface and for light passing therethrough causes a change in the polarization state, wherein a maximum effective retardation introduced by the first subelement along the optical axis (OA) is less than a quarter of the working wavelength of the optical system, and a second subelement (120, 220), wherein said first subelement and said second subelement have mutually facing surfaces (110a, 120a; 210a, 220a) which are mutually complementary, and a position manipulator (150, 250) for manipulation of the relative position of said first subelement (110, 210) and said second subelement (120, 220).
摘要翻译：根据一个方面，本发明涉及一种具有光轴OA（OA）并且包括至少一个具有第一子元件（110,210）的偏振操纵器（100,200）的光学系统，该第一子元件具有非平面的，光学有效的表面和穿过其的光引起偏振状态的变化，其中由第一子元件沿着光轴（OA）引入的最大有效延迟小于光学系统的工作波长的四分之一，以及第二子元件 120,220），其中所述第一子元件和所述第二子元件具有相互互补的相互面对的表面（110a，120a; 210a，220a）和用于操纵所述第一子元件的相对位置的位置操纵器（150,250）（110,210）和所述第二子元件（120,220）。

4. 发明申请

WO2008152087A1 PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY 审中-公开
标题翻译：投影曝光系统
公开(公告)号：WO2008152087A1
公开(公告)日：2008-12-18
申请号：PCT/EP2008/057369
申请日：2008-06-12
申请人： CARL ZEISS SMT AG , HETZLER, Jochen , GRUNER, Toralf
发明人： HETZLER, Jochen , GRUNER, Toralf
IPC分类号： G03F7/20
CPC分类号： G03F7/70825 , G03F7/70258 , G03F7/70308
摘要： A projection exposure system for microlithography comprises at least one optical system, for example a lithography lens comprising at least one bi-asphere (1) with two aspheres (2,3). In accordance with the invention, the projection exposure system has a manipulator which compensates tilting of the aspherical axes A2, A3 of the two aspheres (2,3) by tilting bi-asphere (1) about two mutually perpendicular axes RX and RY such that the projection properties of the optical system are optimized. In addition, a centering manipulator can be provided that executes translations TX and TY for the purpose of aligning the axes A2 and A3 with respect to the optical axis OA. With the aid of the inventive system, it is possible, with the bi-asphere (1) already mounted at the lens, using the projection parameters from the system itself, to perform an alignment of the lens (1), in particular tilting, for the purpose of optimizing the projection parameters of the lithography lens.
摘要翻译：用于微光刻的投影曝光系统包括至少一个光学系统，例如包括至少一个具有两个非球面（2,3）的双 - 非球面（1）的光刻透镜。根据本发明，投影曝光系统具有通过围绕两个相互垂直的轴线RX和RY倾斜双非球面（1）来补偿两个非球面（2,3）的非球面轴线A2，A3的倾斜的操纵器，使得优化了光学系统的投影特性。此外，可以提供定心操纵器，其执行平移TX和TY以便相对于光轴OA对准轴A2和A3。借助于本发明的系统，借助于系统本身的投影参数，双透镜（1）已经安装在透镜上，可以执行透镜（1）的对准，特别是倾斜，为了优化光刻透镜的投影参数。

5. 发明申请

WO2005036272A1 VERFAHREN ZUR STRAHLUNGSBEHANDLUNG EINES OPTISCHEN SYSTEMS 审中-公开
标题翻译：方法的光学系统的放射治疗
公开(公告)号：WO2005036272A1
公开(公告)日：2005-04-21
申请号：PCT/EP2003/010362
申请日：2003-09-18
申请人： CARL ZEISS SMT AG , GRUNER, Toralf , DOCHNAHL, Axel
发明人： GRUNER, Toralf , DOCHNAHL, Axel
IPC分类号： G03F7/20
CPC分类号： G03F7/70091 , G03F7/70925
摘要： Die Erfindung bezieht sich auf ein Verfahren zur Behandlung eines optischen Systems mit Strahlung eines vorgeschalteten Beleuchtungssystems. Erfindungsgemäss werden nacheinander verschiedene Teilbeleuchtungsaperturen des Beleuchtungssystems eingestellt, die jeweils nur einen Teilbereich des Gesamtbehandlungsbereichs des optischen Systems strahlungsbehandelnd beleuchten, wobei sich die nacheinander strahlungsbehandelnd beleuchteten Teilbereiche zum Gesamtfeld des optischen Systems ergänzen. Verwendung z.B. zur Photoreinigung von Projektionsobjektiven in Lithographiebelichtungsanlagen.
摘要翻译：本发明涉及治疗具有上游辐射照明系统的光学系统的方法。根据照明系统的相继不同Teilbeleuchtungsaperturen设置本发明，每个仅照亮光学系统中的治疗放射线的总治疗区域的一部分，其特征在于，连续地处理所述光学系统的总场的辐射照射部分之间的互补性。例如使用照片在光刻曝光工具的投影镜头的清洁。

6. 发明申请

WO2003077011A1 OPTICAL SYSTEM WITH BIREFRINGENT OPTICAL ELEMENTS 审中-公开
标题翻译：具有双重光学元件的光学系统
公开(公告)号：WO2003077011A1
公开(公告)日：2003-09-18
申请号：PCT/EP2002/012446
申请日：2002-11-07
申请人： CARL ZEISS SMT AG , FIOLKA, Damian , DITTMAN, Olaf , TOTZECK, Michael , DIECKMANN, Nils , KÖHLER, Jess , GRUNER, Toralf , KRÄHMER, Daniel
发明人： FIOLKA, Damian , DITTMAN, Olaf , TOTZECK, Michael , DIECKMANN, Nils , KÖHLER, Jess , GRUNER, Toralf , KRÄHMER, Daniel
IPC分类号： G02B27/28
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/286 , G02B27/288 , G03F7/70075 , G03F7/70191 , G03F7/70241 , G03F7/70566 , G03F7/70966
摘要： Optical system (1) : with a first optical subsystem (3) comprising at least a first birefringent optical element (7), with a second optical subsystem (5) comprising at least a second birefringent optical element (9), wherein between the first optical subsystem and the second optical subsystem an optical retarding system (13) with at least a first optical retarding element (15) is arranged, which introduces a ratardation of one-half of a wavelength between two mutually orthogonal states of polarization.
摘要翻译：光学系统（1）：具有包括至少第一双折射光学元件（7）的第一光学子系统（3），其中第二光学子系统（5）包括至少第二双折射光学元件（9），其中在第一光学子系统和第二光学子系统，布置有至少具有第一光学延迟元件（15）的光学延迟系统（13），其引入在两个相互正交的极化状态之间的波长的一半的估计。

7. 发明申请

WO2008119794A1 OPTICAL SYSTEM, IN PARTICULAR ILLUMINATION DEVICE OR PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：光学系统，特别是照明设备或投影微波投影曝光装置的目标
公开(公告)号：WO2008119794A1
公开(公告)日：2008-10-09
申请号：PCT/EP2008/053847
申请日：2008-03-31
申请人： CARL ZEISS SMT AG , TOTZECK, Michael , GRUNER, Toralf , FIOLKA, Damian
发明人： TOTZECK, Michael , GRUNER, Toralf , FIOLKA, Damian
IPC分类号： G03F7/20
CPC分类号： G03F7/70566
摘要： The invention relates to an optical system, in particular an illumination device or a projection objective of a microlithographic projection exposure apparatus, comprising a polarization compensator (100, 200, 300, 400, 800, 900), which has at least one polarization-modifying partial element (110-140, 210-240, 310-340, 410-440, 810-840, 910-940), and a manipulator (150, 250, 722, 851-854, 951a-954a, 951b-954b), by means of which the position of the at least one partial element can be altered, wherein, in the optical system, at least one operating mode (501-504) can be set in which the intensity, over a region which belongs to a plane perpendicular to the optical axis (OA) and which can be illuminated with light from said light source, does not exceed 20% of the maximum intensity in said plane, and wherein the manipulator (150, 250, 722, 851-854, 951a-954a, 951b-954b) is arranged in said region.
摘要翻译：本发明涉及光学系统，特别是微光刻投影曝光装置的照明装置或投影物镜，该光学装置或投影物镜包括极化补偿器（100,200,300,400,800,900），其具有至少一个偏振修正部分元件（110-140,210-240,310-340,410-440,810-840,910-940）和操纵器（150,250,722,851-854,951a-954a，951b-954b），借助于此可以改变至少一个部分元件的位置，其中在光学系统中，可以设置至少一个操作模式（501-504），其中强度在属于垂直于光轴（OA）的并且可以用来自所述光源的光照射的平面不超过所述平面中最大强度的20％，并且其中所述操纵器（150,250,722,851-854,951a -954a，951b-954b）布置在所述区域中。

8. 发明申请

WO2008037496A3 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHY APPARATUS WITH IMPROVED IMAGING PROPERTIES AND METHOD FOR IMPROVING THE IMAGING PROPERTIES OF THE PROJECTION OBJECTIVE 审中-公开
公开(公告)号：WO2008037496A3
公开(公告)日：2008-04-03
申请号：PCT/EP2007/008476
申请日：2007-09-28
申请人： CARL ZEISS SMT AG , BECKENBACH, Mariella , RIEF, Klaus , BERTELE, Andreas , SIGEL, Benjamin , BLEIDISTEL, Sascha , HUMMEL, Wolfgang , FROMMEYER, Andreas , GRUNER, Toralf , SCHWAER, Jochen , SCHWAER, Baerbel , SCHLETTERER, Thomas , HOEGELE, Artur , SCHOEPPACH, Armin
发明人： BECKENBACH, Mariella , RIEF, Klaus , BERTELE, Andreas , SIGEL, Benjamin , BLEIDISTEL, Sascha , HUMMEL, Wolfgang , FROMMEYER, Andreas , GRUNER, Toralf , SCHWAER, Jochen , SCHWAER, Baerbel , SCHLETTERER, Thomas , HOEGELE, Artur , SCHOEPPACH, Armin
IPC分类号： G03F7/20 , G02B7/02
摘要： A projection objective for microlithography comprises a plurality of lenses (32, 34, 36, 38, 42) which in each case have a local optical axis (40), a first manipulator (60) with a first actuator (46, 72) and at least one second actuator (48, 74) being assigned to at least one first lens (42) from the plurality of lenses (32, 34, 36, 38). A first force input and/or moment input can be realized by means of the first actuator (46, 72) and a second force input and/or moment input can be realized by means of the second actuator (48, 74), wherein the first force input and/or moment input and the second force input and/or moment input differ with regard to at least one of the parameters: intensity of the force and/or moment input, direction of the force input relative to the local optical axis (40), direction of the moment input relative to a periphery of the first lens (42).

9. 发明申请

WO2008023071A1 METHOD AND SYSTEM FOR CORRECTING IMAGE CHANGES 审中-公开
标题翻译：用于校正图像变化的方法和系统
公开(公告)号：WO2008023071A1
公开(公告)日：2008-02-28
申请号：PCT/EP2007/058852
申请日：2007-08-25
申请人： CARL ZEISS SMT AG , CONRADI, Olaf , GRUNER, Toralf
发明人： CONRADI, Olaf , GRUNER, Toralf
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70258
摘要： The present invention relates to a method for compensating imaging errors, generated by intensity distributions in optical systems, in particular, in projection lens arrays (3) of microlithography systems, comprising the steps in the following sequence: - determining the location- and time dependent intensity distributions in at least one optical element of the optical system; - determining the location- and/or time based absorbed energy in at least the optical element, for which the intensity distribution has been determined; - determining the deformations and/or changes of the optical properties of the optical element caused by the induced energy; and - selecting one or several compensation measures, depending on the results of the preceding steps. And the invention relates to an optical system for imaging an object, in particular to a projection lens for microlithography, preferably for applying the described method with at least one, preferably several, optical elements (4, 5), wherein at least one image detector (6, 7), which can be located in the optical path, is provided for intensity measurement, which directly measures the location- and/or time resolved intensity distribution in the optical path of the optical system.
摘要翻译：本发明涉及一种用于补偿由光学系统中的强度分布产生的成像误差的方法，特别是在微光刻系统的投影透镜阵列（3）中，包括以下步骤的步骤： - 确定位置和时间相关在光学系统的至少一个光学元件中的强度分布; - 确定至少已经确定了强度分布的至少光学元件中基于位置和/或时间的吸收能量; - 确定由所述感应能量引起的所述光学元件的光学特性的变形和/或变化; 以及 - 根据上述步骤的结果，选择一个或多个补偿措施。本发明涉及一种用于对物体进行成像的光学系统，特别涉及一种用于微光刻的投影透镜，优选地用至少一个，优选几个光学元件（4,5）应用所描述的方法，其中至少一个图像检测器（6,7）可以位于光路中，用于强度测量，其直接测量光学系统的光路中的位置和/或时间分辨强度分布。

10. 发明申请

WO2006111319A3 PROJECTION EXPOSURE SYSTEM, METHOD FOR MANUFACTURING A MICRO-STRUCTURED STRUCTURAL MEMBER BY THE AID OF SUCH A PROJECTION EXPOSURE SYSTEM AND POLARIZATION-OPTICAL ELEMENT ADAPTED FOR USE IN SUCH A SYSTEM 审中-公开
公开(公告)号：WO2006111319A3
公开(公告)日：2006-10-26
申请号：PCT/EP2006/003401
申请日：2006-04-12
申请人： CARL ZEISS SMT AG , MANN, Hans-Juergen , SINGER, Wolfgang , GRUNER, Toralf , DITTMANN, Olaf , TOTZECK, Michael
发明人： MANN, Hans-Juergen , SINGER, Wolfgang , GRUNER, Toralf , DITTMANN, Olaf , TOTZECK, Michael
IPC分类号： G03F7/20
摘要： The invention relates to a projection exposure system, in particular for micro-lithography. The projection exposure system according to the invention comprises a light source (18) for producing light in the EUV region. The projection exposure system further comprises a first optical system (19, 20, 21, 22, 23, 24) for illuminating a mask (25) by the light of the light source (18) and a second optical system (26, 27, 28, 29, 30, 31) for imaging the mask (25) on a component (32). At least one polarization-optical element (1) is disposed on the beam path between the light source (18) and the component (32).

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