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1. 发明申请

WO2009113726A3 PHASE GRATING USED FOR X-RAY PHASE IMAGING, IMAGING APPARATUS FOR X-RAY PHASE CONTRAST IMAGE USING PHASE GRATING, AND X-RAY COMPUTED TOMOGRAPHY SYSTEM 审中-公开
标题翻译：用于X射线相位成像的相位磨削，使用相位磨粒和X射线计算机图像系统的X射线相位对比图像的成像装置
公开(公告)号：WO2009113726A3
公开(公告)日：2009-12-03
申请号：PCT/JP2009055375
申请日：2009-03-12
申请人： CANON KK , NAKAMURA TAKASHI , IMADA AYA , ITOH HIDENOSUKE
发明人： NAKAMURA TAKASHI , IMADA AYA , ITOH HIDENOSUKE
IPC分类号： G21K1/06 , G02B5/18
CPC分类号： G21K1/06 , A61B6/06 , A61B6/4291 , A61B6/484 , G02B5/1814 , G02B5/1871 , G21K2207/005
摘要： A phase grating used for X-ray phase imaging is provided, in which a pitch can be narrowed by using a diffraction grating with a low aspect ratio. A phase grating used for X-ray phase imaging, characterized in that the phase grating includes a first diffraction grating (2) in which a first projection part whose thickness is formed so that an in-coming X-ray (1) transmits with a phase -shifted, and a first aperture part with the same aperture width as a. width of the first projection part are cyclically periodically arranged, and a second diffraction grating. (3) in which a second projection part with the same width as a width of the first projection part, and a second aperture part with the same aperture width as' the aperture width of the first aperture part are cyclically (periodically) arranged, and the second diffraction grating (3) is formed as displaced on the first diffraction grating (2).
摘要翻译：提供了用于X射线相位成像的相位光栅，其中可以通过使用具有低纵横比的衍射光栅来缩小间距。一种用于X射线相位成像的相位光栅，其特征在于，相位光栅包括第一衍射光栅（2），其中形成厚度的第一突出部分使得入射X射线（1）以相移的第一开口部分和与其相同的孔径宽度。第一投影部分的宽度被循环周期性地布置，并且第二衍射光栅。（3），其中布置具有与第一突出部分的宽度相同的宽度的第二突出部分和具有与第一开口部分的孔径宽度相同的孔径宽度的第二开口部分被周期性地（周期性地）布置，并且第二衍射光栅（3）形成为在第一衍射光栅（2）上移位。

2. 发明申请

WO2009128550A1 SOURCE GRATING FOR X-RAYS, IMAGING APPARATUS FOR X-RAY PHASE CONTRAST IMAGE AND X-RAY COMPUTED TOMOGRAPHY SYSTEM 审中-公开
标题翻译： X射线源扫描，X射线相位对比图像和X射线计算机图像系统成像装置
公开(公告)号：WO2009128550A1
公开(公告)日：2009-10-22
申请号：PCT/JP2009057807
申请日：2009-04-13
申请人： CANON KK , ITOH HIDENOSUKE , ICHIMURA YOSHIKATSU , NAKAMURA TAKASHI , IMADA AYA
发明人： ITOH HIDENOSUKE , ICHIMURA YOSHIKATSU , NAKAMURA TAKASHI , IMADA AYA
IPC分类号： G21K1/02 , G21K7/00
CPC分类号： G21K1/025 , G21K7/00 , G21K2207/005
摘要： A source grating for X-rays and the like which can enhance spatial coherence and is used for X-ray phase contrast imaging is provided. The source grating for X-rays is disposed between an X-ray source and a test object and is used for X-ray phase contrast imaging. The source grating for X-rays includes a plurality of sub-gratings (130,120) formed by periodically arranging projection parts each having a thickness (140) shielding an X-ray (110) at constant intervals (A'). The plurality of sub-gratings are stacked in layers by being shifted (1/2 A').
摘要翻译：提供了可以增强空间相干性并用于X射线相位成像的用于X射线等的源光栅。用于X射线的源光栅设置在X射线源和测试对象之间，并用于X射线相位成像。用于X射线的源光栅包括通过以恒定间隔（A'）周期性地布置具有屏蔽X射线（110）的厚度（140）的突出部分而形成的多个子光栅（130,120）。多个子光栅通过移位（1/2A'）层叠。

3. 发明申请

WO2007029845A2 METHOD AND DEVICE FOR MANUFACTURING STRUCTURE HAVING PATTERN, AND METHOD FOR MANUFACTURING MOLD 审中-公开
标题翻译：用于制造具有图案的结构的方法和装置以及用于制造模具的方法
公开(公告)号：WO2007029845A2
公开(公告)日：2007-03-15
申请号：PCT/JP2006317938
申请日：2006-09-05
申请人： CANON KK , IMADA AYA , DEN TORU , NAKAMURA TAKASHI
发明人： IMADA AYA , DEN TORU , NAKAMURA TAKASHI
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/09
摘要： A structure having a pattern is manufactured. An elastically deformable process target is elastically deformed in an inplane direction from a first state. A first pattern is formed on the process target deformed. The elastically deformed process target is made close to or returned to the first state, thereby to form a second pattern having a size and a shape at least one of which differs from those of the first pattern.
摘要翻译：制造具有图案的结构。可弹性变形的处理目标从第一状态沿面内方向弹性变形。在处理目标上形成第一图案变形。使弹性变形的处理对象接近或回到第一状态，由此形成具有至少一个与第一图案不同的尺寸和形状的第二图案。

4. 发明申请

WO2011110912A1 CATALYST DEGRADATION DETECTION APPARATUS 审中-公开
标题翻译：催化剂降解检测装置
公开(公告)号：WO2011110912A1
公开(公告)日：2011-09-15
申请号：PCT/IB2011000367
申请日：2011-02-24
申请人： TOYOTA MOTOR CO LTD , NAKAMURA TAKASHI
发明人： NAKAMURA TAKASHI
IPC分类号： F01N11/00 , F02D41/02
CPC分类号： F01N11/007 , F01N2550/02 , F02D41/0295 , F02D41/1441 , F02D41/2454 , F02D2200/0808 , F02D2200/0814 , Y02T10/47
摘要： A catalyst degradation detection apparatus includes: calculation means for calculating, as an oxygen storage amount of a catalyst (16), an amount of oxygen stored into or desorbed from the catalyst (16) during a period from when a change that corresponds to a change in an air/fuel ratio occurs in the signal of a pre-catalyst sensor (17) to when the signal of a post-catalyst sensor (18) reaches a criterion value regarding the change in the air/fuel ratio; catalyst degradation determination means for determining of degradation of the catalyst (16) on the basis of the oxygen storage amount; and correction means for correcting the oxygen storage amount calculated for use for determining of degradation of the catalyst (16) more to a decrease side as a measured responsiveness of the post-catalyst sensor (18) becomes more deteriorated relative to a reference value.
摘要翻译：本发明的催化剂劣化检测装置具备：计算单元，该计算单元将从催化剂（16）的氧吸附量变化为与变化量相对应的变化期间在催化剂前传感器（17）的信号中发生空气/燃料比时，催化剂后传感器（18）的信号达到与空气/燃料比的变化有关的标准值; 催化剂劣化确定装置，用于基于氧气储存量确定催化剂（16）的劣化; 以及校正装置，用于随着所述催化剂后传感器（18）的所测量的响应性相对于参考值变得更恶化，将计算用于确定所述催化剂（16）的劣化的氧气储存量更多地减小到减少侧。

5. 发明申请

WO2015033552A4 ABSORPTION GRATING AND TALBOT INTERFEROMETER 审中-公开
标题翻译：吸收式和TALBOT干燥仪
公开(公告)号：WO2015033552A4
公开(公告)日：2015-05-14
申请号：PCT/JP2014004496
申请日：2014-09-02
申请人： CANON KK
发明人： NAKAMURA TAKASHI , SATO GENTA
IPC分类号： A61B6/00 , G02B5/18 , G21K1/06
CPC分类号： G21K1/06 , A61B6/4291 , G02B5/1823 , G21K2207/005
摘要： An absorption grating (3) includes a plurality of small absorption gratings in which transmitting portions configured to transmit X-rays and shielding portions configured to block the X-rays are arranged. Each of the plurality of small absorption gratings includes a two-dimensional grating area in which the transmitting portions and the shielding portions are arranged in two intersecting directions, and a one-dimensional grating area in which the transmitting portions and the shielding portions are arranged in one direction. The one-dimensional grating area is provided in at least a part of an outer periphery of the two-dimensional grating area. At least parts of the one-dimensional grating areas included in the adjacent small absorption gratings are superposed to form an overlapping area. The arrangement directions in the small absorption gratings intersect in the overlapping area.
摘要翻译：吸收光栅（3）包括多个小的吸收光栅，其中配置有透射X射线的透射部分和被配置为阻挡X射线的屏蔽部分。多个小吸收光栅中的每一个包括其中透射部分和屏蔽部分布置在两个相交方向上的二维光栅区域和其中透射部分和屏蔽部分布置在其中的一维光栅区域一个方向。一维光栅区域设置在二维光栅区域的外周的至少一部分中。包括在相邻的小吸收光栅中的一维光栅区域的至少一部分被叠加以形成重叠区域。小吸收光栅中的布置方向在重叠区域相交。

6. 发明申请

WO2014104186A1 INTERFEROMETER AND INSPECTION SUBJECT INFORMATION ACQUISITION SYSTEM 审中-公开
标题翻译：干扰仪和检查对象信息采集系统
公开(公告)号：WO2014104186A1
公开(公告)日：2014-07-03
申请号：PCT/JP2013084871
申请日：2013-12-26
申请人： CANON KK
发明人： NAKAMURA TAKASHI , KONDOH TAKESHI
IPC分类号： A61B6/00 , G01T7/00
CPC分类号： G01T1/16 , A61B6/4291 , A61B6/4452 , A61B6/484 , G21K1/06 , G21K1/10 , G21K2207/005
摘要： In the present invention, an interferometer is provided with a diffraction grating, a shield grid, a detector and a scanning unit. The diffraction grating forms a first pattern by diffracting X-rays. The shield grid forms a second pattern by shielding some of the X-rays forming the first pattern. The detector detects the information of the second pattern by detecting the X-rays from the shield grid. The scanning unit changes the relative location between a measurement range in which information on an inspection subject can be acquired and the inspection subject, the measurement range being a part of the inspection range of the detector. The detector acquires a first detection result by carrying out a first detection when the measurement range and the inspection subject have a first relative location. The detector acquires a second detection result by carrying out second detection when the measurement range and the inspection subject have a second relative location. The scanning unit changes the relative location between the measurement range and the inspection subject so that the first detection result pattern and the second detection result pattern have continuity.
摘要翻译：在本发明中，干涉仪设置有衍射光栅，屏蔽栅，检测器和扫描单元。衍射光栅通过衍射X射线形成第一图案。屏蔽网格通过屏蔽形成第一图案的一些X射线形成第二图案。检测器通过检测来自屏蔽网格的X射线来检测第二图案的信息。扫描单元在可以获取检查对象的信息的测量范围与检查对象之间改变相对位置，测量范围是检测器的检查范围的一部分。当测量范围和检查对象具有第一相对位置时，检测器通过执行第一检测来获取第一检测结果。当测量范围和检查对象具有第二相对位置时，检测器通过执行第二检测器来获取第二检测结果。扫描单元改变测量范围和检查对象之间的相对位置，使得第一检测结果图案和第二检测结果图案具有连续性。

7. 发明申请

WO2007004595A3 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF 审中-公开
标题翻译：半导体器件及其制造方法
公开(公告)号：WO2007004595A3
公开(公告)日：2007-05-24
申请号：PCT/JP2006313167
申请日：2006-06-26
申请人： NISSAN MOTOR , ROHM CO LTD , SHIMOIDA YOSHIO , TANAKA HIDEAKI , HAYASHI TETSUYA , HOSHI MASAKATSU , YAMAGAMI SHIGEHARU , KAWAMOTO NORIAKI , KITOU TAKAYUKI , MIURA MINEO , NAKAMURA TAKASHI
发明人： SHIMOIDA YOSHIO , TANAKA HIDEAKI , HAYASHI TETSUYA , HOSHI MASAKATSU , YAMAGAMI SHIGEHARU , KAWAMOTO NORIAKI , KITOU TAKAYUKI , MIURA MINEO , NAKAMURA TAKASHI
IPC分类号： H01L29/78 , H01L21/04 , H01L29/24 , H01L29/267 , H01L29/772
CPC分类号： H01L21/049 , H01L29/1608 , H01L29/267 , H01L29/66068 , H01L29/772 , H01L29/7828
摘要： A method for producing a semiconductor device (20) is disclosed. The semiconductor device (20) includes: 1) a semiconductor substrate (1, 2) , 2) a hetero semiconductor area (3) configured to contact a first main face (2A) of the semiconductor substrate (1, 2) and different from the semiconductor substrate (1, 2) in band gap, 3) a gate electrode (7) contacting, via a gate insulating film (6) , a part of a junction part (13) between the hetero semiconductor area (3) and the semiconductor substrate (1, 2) , 4) a source electrode (8) configured to connect to the hetero semiconductor area (3) , and 5) a drain electrode (9) configured to make an ohmic connection with the semiconductor substrate (1, 2) . The method includes the following sequential operations: i) forming the gate insulating film (6) ; and ii) nitriding the gate insulating film (6) .
摘要翻译：公开了一种用于制造半导体器件（20）的方法。半导体器件（20）包括：1）半导体衬底（1,2），2）异质半导体区域（3），被配置为接触半导体衬底（1,2）的第一主面（2A）所述半导体衬底（1,2）具有带隙，3）栅电极（7）经由栅极绝缘膜（6）与所述异质半导体区域（3）之间的接合部分（13）的一部分半导体衬底（1,2），4）构造成连接到所述异质半导体区域（3）的源电极（8），以及5）被配置为与所述半导体衬底（1,2）形成欧姆连接的漏电极（9） 2）。该方法包括以下顺序操作：i）形成栅极绝缘膜（6）; 和ii）氮化所述栅极绝缘膜（6）。

8. 发明申请

WO0214324A3 DIAZEPINONES AS ANTIVIRAL AGENTS 审中-公开
标题翻译： DIAZEPINONES作为抗病毒药物
公开(公告)号：WO0214324A3
公开(公告)日：2002-05-02
申请号：PCT/US0124731
申请日：2001-08-07
申请人： WARNER LAMBERT CO , JAPAN TOBACCO INC , CHO HIDETSURA , GOGLIOTTI ROCCO DEAN , HAMILTON HARRIET WALL , KRASUTSKY ALEXEI , NAKAMURA TAKASHI , TADE HIROKI , WEBER PETER CRAIG
发明人： CHO HIDETSURA , GOGLIOTTI ROCCO DEAN , HAMILTON HARRIET WALL , KRASUTSKY ALEXEI , NAKAMURA TAKASHI , TADE HIROKI , WEBER PETER CRAIG
IPC分类号： C07D491/04 , C07D495/04 , A61K31/55 , C07D233/20 , C07D233/22 , C07D333/70 , C07D471/04
CPC分类号： C07D491/04 , C07D495/04
摘要： The invention is novel compounds of formula (I) which exhibit an improved therapeutic index and improved metabolic stability which are useful in the treatment and/or prevention of herpes viral infections. Novel intermediates useful in the synthesis of the final compounds are also part of the invention.
摘要翻译：本发明是式（I）的新型化合物，其显示改善的治疗指数和改善的代谢稳定性，其可用于治疗和/或预防疱疹病毒感染。用于合成最终化合物的新中间体也是本发明的一部分。

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