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    • 7. 发明申请
    • FABRICATION OF P-TYPE GROUP II-VI SEMICONDUCTORS
    • P型II-VI族半导体的制造
    • WO2004105097A3
    • 2005-06-16
    • PCT/US2004015882
    • 2004-05-20
    • BURGENER ROBERT IIFELIX ROGER LRENLUND GARY M
    • BURGENER ROBERT IIFELIX ROGER LRENLUND GARY M
    • H01L20060101H01L21/00H01L21/363H01L21/365H01L21/368
    • H01L21/02631H01L21/0237H01L21/02554H01L21/02557H01L21/02579H01L21/02628
    • Commercially viable methods of manufacturing p-type group II-VI semiconductor materials are disclosed. A thin film of group II-VI semiconductor atoms is deposited on a self supporting substrate surface. The semiconductor material includes atoms of group II elements, group VI elements, and one or more p-type dopants. The semiconductor material may be deposited on the substrate surface under deposition conditions in which the group II atoms, group VI atoms, and p-type dopant atoms are in a gaseous phase prior to combining as the thin film. Alternatively, a liquid deposition process may be used to deposit the group II atoms, group VI atoms, and p-type dopant atoms in a predetermined orientation to result in the fabrication of the group II-VI semiconductor material. The resulting semiconductor thin film is a persistent .p-type semiconductor, and the p-type dopant concentration is greater than about 10 atoms cm . The semiconductor resistivity is less than about 0.5 ohm.cm.
    • 公开了制造p型II-VI族半导体材料的商业上可行的方法。 II-VI族半导体原子的薄膜沉积在自支撑衬底表面上。 半导体材料包括II族元素的原子,VI族元素和一种或多种p型掺杂剂。 半导体材料可以在组合作为薄膜之前的第二组原子,第VI族原子和p型掺杂剂原子处于气相的沉积条件下沉积在衬底表面上。 或者,可以使用液体沉积工艺以预定方向沉积第II族原子,第VI族原子和p型掺杂剂原子,以导致II-VI族半导体材料的制造。 得到的半导体薄膜是持续的p型半导体,p型掺杂剂浓度大于约10 16原子cm -3。 半导体电阻率小于约0.5欧姆·厘米。