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1. 发明申请

WO2016139055A3 RADIATION SYSTEM 审中-公开
标题翻译：辐射系统
公开(公告)号：WO2016139055A3
公开(公告)日：2016-10-27
申请号：PCT/EP2016053216
申请日：2016-02-16
申请人： ASML NETHERLANDS BV
发明人： NIENHUYS HAN-KWANG , BOGAART ERIK WILLEM , DONKER RILPHO LUDOVICUS , KRUIZINGA BORGERT , LOOPSTRA ERIK ROELOF , BOTMA HAKO , DE VRIES GOSSE CHARLES , FRIJNS OLAV WALDEMAR VLADIMIR , BASELMANS JOHANNES JACOBUS MATHEUS
IPC分类号： G03F7/20 , G02B5/02
CPC分类号： G03F7/70191 , G02B5/0221 , G02B5/0268 , G02B5/0284 , G03F7/70025 , G03F7/7005 , G03F7/70075 , G03F7/70991 , H01S3/2308 , H05G2/008
摘要： A radiation system comprising a beam splitting apparatus configured to receive a main radiation beam and split the main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.
摘要翻译：一种辐射系统，包括分束装置，其被配置为接收主辐射束并将主辐射束分裂成多个分支辐射束，以及布置成接收输入辐射束并输出修改的辐射束的辐射改变装置，其中辐射改变装置被配置为提供与所接收的输入辐射束相比具有增加的光密度的输出修改的辐射束，其中所述辐射改变装置被布置成使得由所述辐射改变装置接收的输入辐射束是主辐射束和辐射改变装置被配置为向分束装置提供修改的主辐射束，或者其中辐射改变装置被布置成使得由辐射改变装置接收的输入辐射束是分支辐射束输出从分束装置。

2. 发明申请

WO2015044182A3 BEAM DELIVERY APPARATUS AND METHOD 审中-公开
标题翻译：光束传输装置和方法
公开(公告)号：WO2015044182A3
公开(公告)日：2015-09-24
申请号：PCT/EP2014070335
申请日：2014-09-24
申请人： ASML NETHERLANDS BV
发明人： BANINE VADIM , BARTRAIJ PETRUS , VAN GORKOM RAMON , AMENT LUCAS , DE JAGER PIETER , DE VRIES GOSSE , DONKER RILPHO , ENGELEN WOUTER , FRIJNS OLAV , GRIMMINCK LEONARDUS , KATALENIC ANDELKO , LOOPSTRA ERIK , NIENHUYS HAN-KWANG , NIKIPELOV ANDREY , RENKENS MICHAEL , JANSSEN FRANCISCUS , KRUIZINGA BORGERT
IPC分类号： G03F7/20 , G01N21/956 , G02B5/18 , G02B27/00 , G02B27/09 , G02B27/10 , G02B27/12 , G02B27/14 , G02B27/42 , G03F1/84 , G21K1/06 , H01S3/09 , H05H7/04
CPC分类号： G21K1/067 , G01N2021/95676 , G02B5/1814 , G02B5/1823 , G02B27/0025 , G02B27/0938 , G02B27/10 , G02B27/1086 , G02B27/12 , G02B27/14 , G02B27/142 , G02B27/146 , G02B27/4272 , G03F1/84 , G03F7/70025 , G03F7/70208 , G03F7/70566 , G03F7/70891 , G03F7/70991 , G21K2201/065 , H01S3/0903 , H05H7/04
摘要： A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
摘要翻译：用于光刻系统的传送系统。光束传送系统包括被配置为从辐射源接收辐射束并且沿着一个或多个方向反射辐射部分的光学元件，以形成用于提供给一个或多个工具的一个或多个分支辐射束。

3. 发明申请

WO2016134892A3 RADIATION BEAM APPARATUS 审中-公开
标题翻译：辐射光束装置
公开(公告)号：WO2016134892A3
公开(公告)日：2016-10-20
申请号：PCT/EP2016051174
申请日：2016-01-21
申请人： ASML NETHERLANDS BV
发明人： DE VRIES GOSSE CHARLES , DONKER RILPHO LUDOVICUS , NIENHUYS HAN-KWANG , VAN OOSTEN ANTON BERNHARD , KRUIZINGA BORGERT
IPC分类号： G03F7/20 , G02B5/18
CPC分类号： G03F7/70158 , G02B5/1861 , G02B27/4222 , G02B27/4255 , G03F7/702 , G03F7/70558 , G03F7/70991
摘要： An apparatus for receiving an input radiation beam at a beam receiving location and outputting from the beam receiving location one or more output radiation beams. The apparatus comprises: an optical element; and a movement mechanism. The optical element comprises a plurality of portions for receiving the input radiation beam. The movement mechanism is operable to move the plurality of portions so as selectively position each of the plurality of portions at the beam receiving location. When one of the plurality of portions is disposed in the beam receiving location it is configured to receive the input radiation beam and to scatter the input radiation beam so as to form the one or more output radiation beams. A direction of each of the one or more output radiation beams formed by each of the plurality of portions is substantially the same as a direction of a corresponding output radiation beam formed by each of the other portions. One or more properties of each of the plurality of portions differs from that of the other portions such that a power of at least one of the one or more output radiation beams formed by each of the plurality of portions is different to that of the corresponding output radiation beam formed by at least one of the other portions.
摘要翻译：一种用于在波束接收位置接收输入辐射束并从波束接收位置输出一个或多个输出辐射束的装置。该装置包括：光学元件; 和运动机制。光学元件包括用于接收输入辐射束的多个部分。移动机构可操作以移动多个部分，以便选择性地将多个部分中的每一个位置放置在束接收位置处。当多个部分中的一个部分设置在光束接收位置时，其被配置为接收输入辐射束并散射输入辐射束，以便形成一个或多个输出辐射束。由多个部分中的每一个形成的一个或多个输出辐射束中的每一个的方向基本上与由每个其它部分形成的对应的输出辐射束的方向相同。多个部分中的每个部分的一个或多个属性与其他部分的不同之处在于，由多个部分中的每一个部分形成的一个或多个输出辐射束中的至少一个的功率与相应输出的功率不同辐射束由至少一个其它部分形成。

4. 发明申请

WO2014202585A3 LITHOGRAPHIC METHOD AND SYSTEM 审中-公开
标题翻译： LITHOGRAPHIC方法和系统
公开(公告)号：WO2014202585A3
公开(公告)日：2015-08-20
申请号：PCT/EP2014062691
申请日：2014-06-17
申请人： ASML NETHERLANDS BV
发明人： NIKIPELOV ANDREY , FRIJNS OLAV , DE VRIES GOSSE , LOOPSTRA ERIK , BANINE VADIM , DE JAGER PIETER , DONKER RILPHO , NIENHUYS HAN-KWANG , KRUIZINGA BORGERT , ENGELEN WOUTER , LUITEN OTGER , AKKERMANS JOHANNES , GRIMMINCK LEONARDUS , LITVINENKO VLADIMIR
IPC分类号： H01S3/09 , G01J1/04 , G02B1/06 , G02B5/20 , G02B26/02 , G03F7/20 , G21K1/10 , H01S3/00 , H05H7/04
CPC分类号： G03F7/70033 , G01J1/0407 , G01J1/0418 , G01J1/26 , G01J1/429 , G02B1/06 , G02B5/205 , G02B26/023 , G03F7/70008 , G03F7/7055 , G03F7/70558 , G03F7/7085 , G21K1/10 , H01S3/005 , H01S3/0085 , H01S3/0903 , H05H7/04
摘要： A method of patterning lithographic substrates, the method comprising using a free electron laser (FEL) to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus (LA) which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop (CT) to monitor the free electron laser and adjust operation of the free electron laser accordingly.
摘要翻译：一种图案化平版印刷基板的方法，所述方法包括使用自由电子激光器（FEL）产生EUV辐射并将EUV辐射传送到将EUV辐射投影到平版印刷基板上的光刻设备（LA），其中所述方法还包括减小波动通过使用基于反馈的控制回路（CT）来监测自由电子激光器并相应地调节自由电子激光器的操作，将EUV辐射的功率传递到光刻基板。

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