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1. 发明申请

WO2010025068A3 COBALT DEPOSITION ON BARRIER SURFACES 审中-公开
标题翻译：铜棒沉积在阻挡层表面上
公开(公告)号：WO2010025068A3
公开(公告)日：2010-05-14
申请号：PCT/US2009054307
申请日：2009-08-19
申请人： APPLIED MATERIALS INC , LU JIANG , HA HYOUNG-CHAN , MA PAUL , GANGULI SESHADRI , AUBUCHON JOSEPH F , YU SANG HO , NARASIMHAN MURALI
发明人： LU JIANG , HA HYOUNG-CHAN , MA PAUL , GANGULI SESHADRI , AUBUCHON JOSEPH F , YU SANG HO , NARASIMHAN MURALI
IPC分类号： H01L21/28 , H01L21/205
CPC分类号： H01L21/76871 , C23C16/16 , C23C16/18 , C23C16/42 , C23C16/56 , H01L21/28556 , H01L21/28562 , H01L21/28568 , H01L21/76846 , H01L21/76862 , H01L21/76864 , H01L21/76873
摘要： Embodiments of the invention provide processes for depositing a cobalt layer on a barrier layer and subsequently depositing a conductive material, such as copper or a copper alloy, thereon. In one embodiment, a method for depositing materials on a substrate surface is provided which includes forming a barrier layer on a substrate, exposing the substrate to dicobalt hexacarbonyl butylacetylene (CCTBA) and hydrogen to form a cobalt layer on the barrier layer during a vapor deposition process (e.g., CVD or ALD), and depositing a conductive material over the cobalt layer. In some examples, the barrier layer and/or the cobalt layer may be exposed to a gas or a reagent during a treatment process, such as a thermal process, an in situ plasma process, or a remote plasma process.
摘要翻译：本发明的实施方案提供了在阻挡层上沉积钴层并随后在其上沉积诸如铜或铜合金的导电材料的方法。在一个实施例中，提供了一种用于在衬底表面上沉积材料的方法，其包括在衬底上形成阻挡层，将衬底暴露于六羰基丁基乙炔二钴（CCTBA）和氢，以在气相沉积期间在阻挡层上形成钴层工艺（例如，CVD或ALD），以及在钴层上沉积导电材料。在一些实例中，阻挡层和/或钴层可以在诸如热处理，原位等离子体处理或远程等离子体处理的处理过程中暴露于气体或试剂。

2. 发明申请

WO2007142690A3 APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION 审中-公开
标题翻译：等离子体增强原子层沉积的装置和方法
公开(公告)号：WO2007142690A3
公开(公告)日：2008-12-24
申请号：PCT/US2006060559
申请日：2006-11-06
申请人： APPLIED MATERIALS INC , MA PAUL , SHAH KAVITA , WU DIEN-YEH , GANGULI SESHADRI , MARCADAL CHRISTOPHE , WU FREDERICK C , CHU SCHUBERT S
发明人： MA PAUL , SHAH KAVITA , WU DIEN-YEH , GANGULI SESHADRI , MARCADAL CHRISTOPHE , WU FREDERICK C , CHU SCHUBERT S
IPC分类号： C23F1/00 , C23C16/22 , C23C16/26 , C23C16/44 , C23C16/50 , H01L21/306
CPC分类号： C23C16/45544 , C23C16/18 , C23C16/45536 , C23C16/45542 , C23C16/45553 , C23C16/45563 , C23C16/45565 , C23C16/509 , C23C16/5096 , H01J37/32082 , H01J37/3244 , H01J37/32449 , H01J37/32522 , H01J37/32623 , H01J37/32633 , H01L21/28562 , H01L21/76844 , H01L21/76846 , H01L21/76873 , H01L2221/1089 , H01L2924/0002 , H01L2924/00
摘要： Embodiments of the invention provide an apparatus configured to form a material during an atomic layer deposition (ALD) process, such as a plasma-enhanced ALD (PE- ALD) process. In one embodiment, a process chamber (50) is configured to expose a substrate to a sequence of gases and plasmas during a PE-ALD process. The process chamber (50) comprises components that are capable of being electrically insulated, electrically grounded or RP energized. In one example, a chamber (50) body and a gas manifold (800) assembly are grounded and separated by electrically insulated components, such as an insulation cap (700), a plasma screen insert (600) and an isolation ring (200). A showerhead (300), a plasma baffle (500) and a water box (400) are positioned between the insulated components and become RF hot when activated by a plasma generator (92). Other embodiments of the invention provide deposition processes to form layers of materials within the process chamber (50).
摘要翻译：本发明的实施例提供一种被配置为在原子层沉积（ALD）工艺（诸如等离子体增强型ALD（PE-ALD））工艺中形成材料的装置。在一个实施例中，处理室（50）被配置为在PE-ALD过程期间将衬底暴露于一系列气体和等离子体。处理室（50）包括能够被电绝缘，电接地或RP通电的部件。在一个示例中，腔室（50）主体和气体歧管（800）组件由诸如绝缘帽（700），等离子体屏幕插入件（600）和隔离环（200）的电绝缘部件接地并分离，。喷头（300），等离子体挡板（500）和水箱（400）位于绝缘部件之间，并且当被等离子体发生器（92）激活时变为RF热。本发明的其它实施例提供沉积工艺以在处理室（50）内形成材料层。

3. 发明申请

WO2007115000A3 CHEMICAL DELIVERY APPARATUS FOR CVD OR ALD 审中-公开
标题翻译：化学输送装置用于CVD或ALD
公开(公告)号：WO2007115000A3
公开(公告)日：2008-12-11
申请号：PCT/US2007064276
申请日：2007-03-19
申请人： APPLIED MATERIALS INC , NAKASHIMA NORMAN , MARCADAL CHRISTOPHE , GANGULI SESHADRI , MA PAUL , CHU SCHUBERT S
发明人： NAKASHIMA NORMAN , MARCADAL CHRISTOPHE , GANGULI SESHADRI , MA PAUL , CHU SCHUBERT S
IPC分类号： F16K3/36 , F16K11/20
CPC分类号： C23C16/4481 , C23C16/4408 , C23C16/45561 , Y10T137/3127 , Y10T137/4259 , Y10T137/87249 , Y10T137/877
摘要： An ampoule assembly is configured with a bypass line and valve to allow the purging of the lines and valves connected to the ampoule. The ampoule assembly, in one embodiment, includes an ampoule, an inlet line, an outlet line, and a bypass line connected between the inlet line and the outlet line, the bypass line having a shut-off valve disposed therein to fluidly couple or decouple the inlet line and the outlet line. The shut-off valve disposed in the bypass line may be remotely controllable. Also, additional remotely controllable shut-off valves may be provided in the inlet and the outlet lines.
摘要翻译：安瓿组件配置有旁通管线和阀，以允许清洗连接到安瓿的管线和阀。在一个实施例中，安瓿组件包括安瓿瓶，入口管线，出口管线和连接在入口管线和出口管线之间的旁通管线，旁通管线具有设置在其中的截止阀以流体耦合或解耦入口管线和出口管路。设置在旁路管路中的截止阀可以是远程控制的。此外，可以在入口和出口管线中设置附加的可远程控制的截止阀。

4. 发明申请

WO2007112085A3 SYSTEM AND METHOD OF REBALANCING A PORTFOLIO OF SEPARATELY MANAGED ACCOUNTS 审中-公开
标题翻译：独立管理账户组合的系统和方法
公开(公告)号：WO2007112085A3
公开(公告)日：2007-11-29
申请号：PCT/US2007007420
申请日：2007-03-26
申请人： ITG SOFTWARE SOLUTIONS INC , INALA NEIL , DEMBSKY IAN , HILDEBRANDT ZACHARY , MA PAUL
发明人： INALA NEIL , DEMBSKY IAN , HILDEBRANDT ZACHARY , MA PAUL
IPC分类号： G06Q40/00
CPC分类号： G06Q40/06
摘要： A system and method for rebalancing separately managed accounts utilizing sub-models. Sub-models can be generated automatically by analyzing the restrictions that exist on the individual accounts, or created manually by identifying particular stocks that might fall within a particular industry, sector or other arbitrary classification. An account can be classified as belonging to one or more sub-models. These sub-models allow for a more efficient rebalancing process by allowing transaction decisions to be made according to a particular sub-model rather than at the level of each individual account. These sub-models also allow for more efficient monitoring of large numbers of accounts by allowing analysis of account drift according to both restrictions associated with the account as well as the account's master model portfolio, rather than solely relative to the account's master model portfolio without incorporating the account's restrictions.
摘要翻译：使用子模型重新平衡单独管理的帐户的系统和方法。可以通过分析个人账户上存在的限制来自动生成子模型，或者通过识别可能属于特定行业，部门或其他任意分类的特定股票来手动创建子模型。一个帐户可以分为属于一个或多个子模型。这些子模型允许通过允许根据特定子模型进行事务决策而不是在每个单独帐户的级别进行更有效的重新平衡过程。这些子模型还允许通过根据与帐户相关联的限制以及帐户的主模型组合来分析帐户漂移，而不仅仅是相对于账户的主模型组合而不需要并入，来更有效地监视大量账户帐户的限制。

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