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1. 发明申请

WO2012051121A3 BUILDING A LIBRARY OF SPECTRA FOR OPTICAL MONITORING 审中-公开
标题翻译：建立光学监测光谱图书馆
公开(公告)号：WO2012051121A3
公开(公告)日：2012-06-21
申请号：PCT/US2011055642
申请日：2011-10-10
申请人： APPLIED MATERIALS INC , DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , HU XIAOYUAN
发明人： DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , HU XIAOYUAN
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： H01L22/26 , B24B37/013 , B24B49/12 , H01L21/3212 , H01L22/12
摘要： A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra. Finding a best matching reference spectrum may include performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.
摘要翻译：控制抛光的方法包括：存储具有多个参考光谱的库，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，对于光谱序列的每个测量光谱，使用除了平方差的和以产生最佳匹配参考光谱的序列之外的匹配技术，以及基于最佳匹配参考光谱的序列来确定抛光终点或抛光速率的调整中的至少一个。找到最佳匹配的参考光谱可以包括执行所测量的光谱与来自文库的多个参考光谱中的两个或更多个的互相关，并且选择与所测量的光谱具有最大相关性的参考光谱作为最佳匹配参考光谱。

2. 发明申请

WO2012019044A3 TECHNIQUES FOR MATCHING MEASURED SPECTRA TO REFERENCE SPECTRA FOR IN-SITU OPTICAL MONITORING 审中-公开
标题翻译：将测量光谱匹配到用于现场光学监测的参考光谱的技术
公开(公告)号：WO2012019044A3
公开(公告)日：2012-05-18
申请号：PCT/US2011046646
申请日：2011-08-04
申请人： APPLIED MATERIALS INC , HU XIAOYUAN , WANG ZHIHONG , LEE HARRY Q , ZHU ZHIZE , DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , ZHANG JIMIN , TU WEN-CHIANG
发明人： HU XIAOYUAN , WANG ZHIHONG , LEE HARRY Q , ZHU ZHIZE , DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , ZHANG JIMIN , TU WEN-CHIANG
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/013 , B24B37/042 , B24B37/107 , B24B37/205 , B24B49/045 , B24B49/12
摘要： A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra. Finding a best matching reference spectrum may include performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.
摘要翻译：控制抛光的方法包括：存储具有多个参考光谱的库，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，对于光谱序列的每个测量光谱，使用除了平方差的和以产生最佳匹配参考光谱的序列之外的匹配技术，以及基于最佳匹配参考光谱的序列来确定抛光终点或抛光速率的调整中的至少一个。找到最佳匹配的参考光谱可以包括执行所测量的光谱与来自文库的多个参考光谱中的两个或更多个的互相关，并选择与所测量的光谱具有最大相关性的参考光谱作为最佳匹配参考光谱。

3. 发明申请

WO2012148716A3 VARYING COEFFICIENTS AND FUNCTIONS FOR POLISHING CONTROL 审中-公开
标题翻译：改变系统和功能的抛光控制
公开(公告)号：WO2012148716A3
公开(公告)日：2012-12-20
申请号：PCT/US2012033677
申请日：2012-04-13
申请人： APPLIED MATERIALS INC , DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , HU XIAOYUAN
发明人： DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , HU XIAOYUAN
IPC分类号： H01L21/304
CPC分类号： B24B37/005 , B24B37/042 , G01N21/274 , G01N21/41 , H01L21/3212 , H01L22/12 , H01L22/26
摘要： A method of generating a library of reference spectra includes storing an optical model for a layer stack having at a plurality of layers, and for each combination of a refractive index function from a set of refractive index functions and an extinction coefficient function from a set of extinction coefficient functions, calculating a reference spectrum using the optical model. Another method of generating a library of reference spectra includes receiving user input identifying a plurality of different contribution percentages for at least one of a first stack or a second stack on the substrate, and for each contribution percentage from the plurality of different contribution percentages, calculating a reference spectrum from a first spectrum for the first stack, a second spectrum for the second stack, and the contribution percentage.
摘要翻译：产生参考光谱库的方法包括：存储具有多个层的层叠层的光学模型，以及对于来自一组折射率函数的折射率函数和来自一组折射率函数的消光系数函数的折射率函数的每个组合消光系数函数，使用光学模型计算参考光谱。生成参考光谱库的另一种方法包括：接收用户输入，其识别基板上的第一堆叠或第二堆叠中的至少一个的多个不同贡献百分比，以及对于来自多个不同贡献百分比的每个贡献百分比，计算来自第一堆叠的第一光谱的参考光谱，第二堆叠的第二光谱和贡献百分比。

4. 发明申请

WO2007024807A3 APPARATUS AND METHODS FOR SPECTRUM BASED MONITORING OF CHEMICAL MECHANICAL POLISHING 审中-公开
标题翻译：用于基于频谱监测化学机械抛光的装置和方法
公开(公告)号：WO2007024807A3
公开(公告)日：2007-07-12
申请号：PCT/US2006032659
申请日：2006-08-21
申请人： APPLIED MATERIALS INC , BENVEGNU DOMINIC J , DAVID JEFFREY DRUE , SWEDEK BOGDAN , LEE HARRY Q , KARUPPIAH LAKSHMANAN
发明人： BENVEGNU DOMINIC J , DAVID JEFFREY DRUE , SWEDEK BOGDAN , LEE HARRY Q , KARUPPIAH LAKSHMANAN
IPC分类号： B24B37/04 , B24B49/12
CPC分类号： B24B37/042 , B24B37/205 , B24B49/12
摘要： Apparatus and methods for spectrum based monitoring of chemical mechanical polishing, including spectrum based endpointing, spectrum based polishing rate adjustment, flushing a top surface of an optical head (53), or a pad (30) with a window. The spectrum-based endpointing uses a reference spectrum which is empirically selected for particular spectrum based endpoint determination logic so that the target thickness is achieved when endpoint is called by applying the particular spectrum based endpoint logic. The polishing endpoint can be determined using a difference trace or a sequence of index values. The flushing system creates a laminar gas flow across the top surface of the optical head (53) . The vacuum nozzle (308) and vacuum sources (312) are configured so that the flow of gas is laminar. The window includes a soft plastic portion and a crystalline or glass like portion. The spectrum based polishing rate adjustment includes obtaining spectra for different zones on a substrate.
摘要翻译：用于基于频谱的化学机械抛光监测的装置和方法，包括基于光谱的终点，基于光谱的抛光速率调整，冲洗光学头（53）的顶表面或具有窗口的垫（30）。基于频谱的终点使用参考频谱，该参考频谱是针对特定的基于频谱的端点确定逻辑进行经验选择的，以便通过应用特定的基于频谱的端点逻辑来调用端点时实现目标厚度。可以使用差异迹线或索引值序列来确定抛光终点。冲洗系统在光学头（53）的顶表面上产生层流气流。真空喷嘴（308）和真空源（312）构造成使得气体流是层流的。窗口包括软塑料部分和结晶或玻璃状部分。基于光谱的抛光速率调节包括获得基底上不同区域的光谱。

5. 发明申请

WO2008070736A8 DETERMINING COPPER CONCENTRATION IN SPECTRA 审中-公开
标题翻译：确定光谱中的铜浓度
公开(公告)号：WO2008070736A8
公开(公告)日：2008-08-07
申请号：PCT/US2007086535
申请日：2007-12-05
申请人： APPLIED MATERIALS INC , BENVEGNU DOMINIC J , DAVID JEFFREY DRUE , SWEDEK BOGUSLAW A , ZHANG JIMIN , LEE HARRY Q
发明人： BENVEGNU DOMINIC J , DAVID JEFFREY DRUE , SWEDEK BOGUSLAW A , ZHANG JIMIN , LEE HARRY Q
IPC分类号： G01N21/55 , G01B11/06 , G01N21/84
CPC分类号： G01B11/0683 , G01N21/55
摘要： Methods of subtracting the contribution of anon-dielectric, e.g., copper, to spectra obtained from a substrate during chemical mechanical polishing are described A method of optically determining the amount of area on a substrate that includes a non-dielectric material by making use of a broad band reflectance spectrum of the surface and in particular to determining the concentration of metal such as copper coverage on the surface of a substrate as the substrate is polished. The method is directed to reliably determining the endpoint via the spectral interference pattern resulting from reflections from dielectric regions when adjacent regions of the substrate are covered by metal which reflects strongly over the whole wavelength range considered and which tend to mask the reflectance spectrum from the adjacent dielectric regions.
摘要翻译：在化学机械抛光期间减去非电介质（例如铜）对从衬底获得的光谱的贡献的方法描述了一种通过利用以下方法光学确定包括非介电材料的衬底上的面积的量的方法：特别是确定衬底抛光后的衬底表面上金属的浓度，例如铜的覆盖范围。该方法旨在通过由介电区域的反射产生的光谱干涉图形可靠地确定端点，当基板的相邻区域被金属覆盖时，该金属在所考虑的整个波长范围内强烈反射，并且倾向于掩盖相邻的反射光谱电介质区域。

6. 发明申请

WO2007024807A2 APPARATUS AND METHODS FOR SPECTRUM BASED MONITORING OF CHEMICAL MECHANICAL POLISHING 审中-公开
标题翻译：用于基于频谱监测化学机械抛光的装置和方法
公开(公告)号：WO2007024807A2
公开(公告)日：2007-03-01
申请号：PCT/US2006032659
申请日：2006-08-21
申请人： APPLIED MATERIALS INC , BENVEGNU DOMINIC J , DAVID JEFFREY DRUE , SWEDEK BOGDAN , LEE HARRY Q , KARUPPIAH LAKSHMANAN
发明人： BENVEGNU DOMINIC J , DAVID JEFFREY DRUE , SWEDEK BOGDAN , LEE HARRY Q , KARUPPIAH LAKSHMANAN
IPC分类号： B24B37/04 , B24B49/12
CPC分类号： B24B37/042 , B24B37/205 , B24B49/12
摘要： Apparatus and methods for spectrum based monitoring of chemical mechanical polishing, including spectrum based endpointing, spectrum based polishing rate adjustment, flushing a top surface of an optical head, or a pad with a window. The spectrum-based endpointing uses a reference spectrum which is empirically selected for particular spectrum based endpoint determination logic so that the target thickness is achieved when endpoint is called by applying the particular spectrum based endpoint logic. The polishing endpoint can be determined using a difference trace or a sequence of index values. The flushing system creates a laminar gas flow across the top surface of the optical head. The vacuum nozzle and vacuum sources are configured so that the flow if gas is laminar. The window includes a soft plastic portion and a crystalline or glass like portion. The spectrum based polishing rate adjustment includes obtaining spectra for different zones on a substrate.
摘要翻译：用于基于频谱的化学机械抛光监测的装置和方法，包括基于光谱的终点，基于光谱的抛光速率调节，冲洗光学头的顶表面或具有窗口的垫。基于频谱的终点使用参考频谱，该参考频谱是针对特定的基于频谱的端点确定逻辑进行经验选择的，以便通过应用特定的基于频谱的端点逻辑来调用端点时实现目标厚度。可以使用差异迹线或索引值序列来确定抛光终点。冲洗系统在光学头的顶表面上产生层流气流。真空喷嘴和真空源被配置为使得气体是层流的流动。窗口包括软塑料部分和结晶或玻璃状部分。基于光谱的抛光速率调节包括获得基底上不同区域的光谱。

7. 发明申请

WO2011139575A3 ENDPOINT METHOD USING PEAK LOCATION OF MODIFIED SPECTRA 审中-公开
标题翻译：使用修改光谱的峰位置的端点方法
公开(公告)号：WO2011139575A3
公开(公告)日：2012-02-23
申请号：PCT/US2011033320
申请日：2011-04-20
申请人： APPLIED MATERIALS INC , DAVID JEFFREY DRUE , SIN GARRETT HO , LEE HARRY Q , BENVEGNU DOMINIC J
发明人： DAVID JEFFREY DRUE , SIN GARRETT HO , LEE HARRY Q , BENVEGNU DOMINIC J
IPC分类号： H01L21/304
CPC分类号： B24B37/013 , H01L22/12 , H01L22/26
摘要： A method of optically monitoring a substrate during polishing includes receiving an identification of a selected spectral feature and a characteristic of the selected spectral feature to monitor during polishing, measuring a first spectrum from the substrate during polishing, the first spectrum measured within an initial time following initiation of polishing, measuring a sequence of second spectra from the substrate during polishing, the sequence of second spectra measured after the initial time, for each second spectrum in the sequence of second spectra, removing the first spectrum from the second spectrum to generate a sequence of modified third spectra, determining a value of a characteristic of the selected spectral feature for each third spectrum in the sequence of third spectra to generate a sequence of values for the characteristic, and determining a polishing endpoint or an adjustment for a polishing rate based on the sequence of values.
摘要翻译：在抛光期间光学监测基底的方法包括接收所选择的光谱特征的标识和所选择的光谱特征的特征以在抛光期间监测，在抛光期间测量来自基底的第一光谱，在初始时间之后测量的第一光谱开始抛光，在抛光期间测量来自衬底的第二光谱序列，在初始时间之后测量的第二光谱序列，对于第二光谱序列中的每个第二光谱，从第二光谱去除第一光谱以产生序列修改的第三光谱，确定在第三光谱序列中的每个第三光谱的所选光谱特征的特征值，以产生该特征值的序列，以及基于以下步骤确定抛光终点或抛光速率的调整：值序列。

8. 发明申请

WO2010028180A3 ADJUSTING POLISHING RATES BY USING SPECTROGRAPHIC MONITORING OF A SUBSTRATE DURING PROCESSING 审中-公开
标题翻译：利用加工过程中基体的光谱监测来调整抛光速率
公开(公告)号：WO2010028180A3
公开(公告)日：2010-05-20
申请号：PCT/US2009055935
申请日：2009-09-03
申请人： APPLIED MATERIALS INC , DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , LEE HARRY Q , SWEDEK BOGUSLAW A
发明人： DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , LEE HARRY Q , SWEDEK BOGUSLAW A
IPC分类号： H01L21/304
CPC分类号： B24B37/005 , B24B37/013 , B24B49/12 , H01L21/302
摘要： A computer implemented method includes receiving a sequence of current spectra of reflected light from a substrate; comparing each current spectrum from the sequence of current spectra to a plurality of reference spectra from a reference spectra library to generate a sequence of best match reference spectra; determining a goodness of fit for the sequence of best match reference spectra; and determining at least one of whether to adjust a polishing rate or an adjustment for the polishing rate, based on the goodness of fit.
摘要翻译：一种计算机实现的方法包括：接收来自衬底的反射光的当前光谱的序列; 将来自当前光谱序列的每个当前光谱与来自参考光谱库的多个参考光谱进行比较以生成最佳匹配参考光谱的序列; 确定最佳匹配参考光谱序列的拟合度; 并基于拟合度来确定是调整抛光速率还是调整抛光速率中的至少一个。

9. 发明申请

WO2012102871A2 GATHERING SPECTRA FROM MULTIPLE OPTICAL HEADS 审中-公开
标题翻译：从多个光学头收集光谱
公开(公告)号：WO2012102871A2
公开(公告)日：2012-08-02
申请号：PCT/US2012021135
申请日：2012-01-12
申请人： APPLIED MATERIALS INC , DAVID JEFFREY DRUE , SWEDEK BOGUSLAW A , BENVEGNU DOMINIC J , DHANDAPANI SIVAKUMAR
发明人： DAVID JEFFREY DRUE , SWEDEK BOGUSLAW A , BENVEGNU DOMINIC J , DHANDAPANI SIVAKUMAR
IPC分类号： H01L21/304
CPC分类号： B24B49/12 , B24B37/013 , B24B37/105
摘要： A polishing apparatus includes a platen to hold a polishing pad having a plurality of optical apertures, a carrier head to hold a substrate against the polishing pad, a motor to generate relative motion between the carrier head and the platen, and an optical monitoring system. The optical monitoring system includes at least one light source, a common detector, and an optical assembly configured to direct light from the at least one light source to each of a plurality of separated positions in the platen, to direct light from each position of the plurality of separated positions to the substrate as the substrate passes over said each position, to receive reflected light from the substrate as the substrate passes over said each position, and to direct the reflected light from each of the plurality of separated positions to the common detector.
摘要翻译：抛光装置包括用于保持具有多个光学孔径的抛光垫的台板，用于将基板保持在抛光垫上的载体头，在载体头与台板之间产生相对运动的电机以及光学监测系统。该光学监测系统包括至少一个光源，公共检测器以及光学组件，该光学组件被配置为将来自至少一个光源的光引导至台板中的多个分离位置中的每一个，以引导来自当衬底经过所述每个位置时将多个分离位置提供给衬底，以便当衬底经过所述每个位置时接收来自衬底的反射光，并将来自多个分离位置中的每一个的反射光引导至公共检测器。

10. 发明申请

WO2012145336A3 ADAPTIVELY TRACKING SPECTRUM FEATURES FOR ENDPOINT DETECTION 审中-公开
标题翻译：用于端点检测的适应性追踪光谱特征
公开(公告)号：WO2012145336A3
公开(公告)日：2013-03-14
申请号：PCT/US2012033969
申请日：2012-04-17
申请人： APPLIED MATERIALS INC , DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , SWEDEK BOGUSLAW A , LEE HARRY Q
发明人： DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , SWEDEK BOGUSLAW A , LEE HARRY Q
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B49/12 , B24B37/013 , H01L22/12 , H01L22/26
摘要： A method of controlling polishing includes polishing a substrate, monitoring a substrate during polishing with an in-situ monitoring system, generating a sequence of values from measurements from the in-situ monitoring system, fitting a non-linear function to the sequence of values, determining a projected time at which the non-linear function reaches a target value; and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the projected time.
摘要翻译：控制抛光的方法包括抛光衬底，用原位监测系统在抛光过程中监测衬底，从原位监测系统的测量产生一系列值，将非线性函数拟合到数值序列，确定非线性函数达到目标值的预计时间; 以及基于所述预计时间确定抛光终点或抛光速率的调整中的至少一个。

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