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1. 发明申请

WO2013062770A1 DUAL ZONE COMMON CATCH HEAT EXCHANGER/CHILLER 审中-公开
标题翻译：双区通用热交换器/冷却器
公开(公告)号：WO2013062770A1
公开(公告)日：2013-05-02
申请号：PCT/US2012/059573
申请日：2012-10-10
申请人： APPLIED MATERIALS, INC. , SILVEIRA, Fernando , MAYS, Brad L.
发明人： SILVEIRA, Fernando , MAYS, Brad L.
IPC分类号： H05H1/28 , H05H1/34 , H05H1/46
CPC分类号： F28F27/02 , F28D2021/0077 , H01J37/32724
摘要： Methods and systems for controlling temperatures in plasma processing chamber via pulsed application of heating power and pulsed application of cooling power. In an embodiment, fluid levels in each of a hot and cold reservoir coupled to the temperature controlled component are maintained in part by a coupling each of the reservoirs to a common secondary reservoir. Heat transfer fluid is pumped from the secondary reservoir to either the hot or cold reservoir in response to a low level sensed in the reservoir. In an embodiment, both the hot and cold reservoirs are contained in a same platform as the secondary reservoir with the hot and cold reservoirs disposed above the secondary reservoir to permit the secondary reservoir to catch gravity driven overflow from either the hot or cold reservoir.
摘要翻译：通过脉冲施加加热功率和脉冲施加冷却功率来控制等离子体处理室中的温度的方法和系统。在一个实施例中，通过将每个储存器联接到公共二次储存器来部分地保持耦合到温度受控部件的热储存器和冷储存器中的每一个中的流体液位。响应于在储层中感测到的低水平，将传热流体从次级储存器泵送到热储存器或冷储存器。在一个实施例中，热蓄冷池和冷水箱都包含在与次级储存器相同的平台中，其中热储存器和冷储存器设置在次级储存器上方，以允许二级储存器从热储存器或冷储存器捕获重力驱动的溢流。

2. 发明申请

WO2016085826A1 SUBSTRATE CARRIER USING A PROPORTIONAL THERMAL FLUID DELIVERY SYSTEM 审中-公开
标题翻译：使用比例热流体输送系统的基座载体
公开(公告)号：WO2016085826A1
公开(公告)日：2016-06-02
申请号：PCT/US2015/062010
申请日：2015-11-20
申请人： APPLIED MATERIALS, INC.
发明人： CRIMINALE, Phillip , PHI, Justin , MAROHL, Dan A. , SHOJI, Sergio Fukuda , MAYS, Brad L.
IPC分类号： H01J37/32
CPC分类号： H01L21/67248 , H01J37/32724 , H01L21/67017 , H01L21/67109 , H01L21/6831
摘要： A substrate carrier is described that uses a proportional thermal fluid delivery system. In one example the apparatus includes a heat exchanger to provide a thermal fluid to a fluid channel of a substrate carrier and to receive the thermal fluid from the fluid channel, the thermal fluid in the fluid channel to control the temperature of the carrier during substrate processing. A proportional valve controls the rate of flow of thermal fluid from the heat exchanger to the fluid channel. A temperature controller receives a measured temperature from a thermal sensor of the carrier and controls the proportional valve in response to the measured temperature to adjust the rate of flow.
摘要翻译：描述了使用比例热流体输送系统的基底载体。在一个示例中，设备包括热交换器，以将热流体提供给衬底载体的流体通道并且从流体通道接收热流体，流体通道中的热流体在衬底处理期间控制载体的温度。比例阀控制从热交换器到流体通道的热流体的流速。温度控制器从载体的热传感器接收测量的温度，并响应于测量的温度控制比例阀以调节流速。

3. 发明申请

WO2017062087A1 SHOWERHEAD WITH REDUCED BACKSIDE PLASMA IGNITION 审中-公开
标题翻译：具有减少背面等离子体点火的淋浴
公开(公告)号：WO2017062087A1
公开(公告)日：2017-04-13
申请号：PCT/US2016/044080
申请日：2016-07-26
申请人： APPLIED MATERIALS, INC.
发明人： WANG, Haitao , NOORBAKHSH, Hamid , ZHANG, Chunlei , SHOJI, Sergio Fukuda , RAMASWAMY, Kartik , SMITH, Roland , MAYS, Brad L.
IPC分类号： H01L21/02 , H01L21/205 , H05H1/46
CPC分类号： C23C16/45565 , C23C16/4401 , H01J37/3244
摘要： Embodiments of the present disclosure relate to a showerhead assembly for use in a processing chamber. The showerhead assembly includes a porous insert disposed in a space defined between a gas distribution plate and a base plate to moderate the corrosive radicals resulting from plasma ignition to reduce particle issues and metal contamination in the chamber. The porous insert is a conductive material, such as metal, used to reduce the gap electrical field strength, or may be a dielectric material such as ceramic, polytetrafluoroethylene, polyamide-imide, or other materials with a low dielectric loss and high electrical field strength under conditions of high frequency and strong electric fields. As such, the electrical breakdown threshold is enhanced. The porous insert may reduce and/or eliminate showerhead backside plasma ignition and may include multiple concentric narrow rings that cover gas holes of the gas distribution plate.
摘要翻译：本公开的实施例涉及一种用于处理室的喷头组件。喷头组件包括设置在气体分配板和基板之间的空间中的多孔插件，以缓和由等离子体点火引起的腐蚀性自由基，以减少腔室中的颗粒问题和金属污染。多孔插入物是用于减小间隙电场强度的导电材料，例如金属，或者可以是诸如陶瓷，聚四氟乙烯，聚酰胺 - 酰亚胺或具有低介电损耗和高电场强度的其它材料的介电材料在高频和强电场的条件下。因此，电击穿阈值增强。多孔插入件可以减少和/或消除喷头背面等离子体点火，并且可以包括覆盖气体分配板的气孔的多个同心的窄环。

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