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1. 发明申请

WO2012050682A2 ELECTROSPINNING FOR INTEGRATED SEPARATOR FOR LITHIUM-ION BATTERIES 审中-公开
标题翻译：用于锂离子电池的集成分离器的电控
公开(公告)号：WO2012050682A2
公开(公告)日：2012-04-19
申请号：PCT/US2011/050394
申请日：2011-09-02
申请人： APPLIED MATERIALS, INC. , ORILALL, Mahendra C. , TALWAR, Raman , BROWN, Karl, M. , YANG, Lu , BOLANDI, Hooman , PEBENITO, Victor , WANG, Connie, P. , BACHRACH, Robert, Z.
发明人： ORILALL, Mahendra C. , TALWAR, Raman , BROWN, Karl, M. , YANG, Lu , BOLANDI, Hooman , PEBENITO, Victor , WANG, Connie, P. , BACHRACH, Robert, Z.
IPC分类号： H01M10/0525 , H01M2/14 , H01M10/04 , H01M4/36 , H01M4/04
CPC分类号： H01M2/1666 , B05B5/0255 , H01M2/162 , H01M2/1646 , H01M2/1686 , H01M4/485 , H01M4/505 , H01M4/525 , H01M4/5815 , H01M4/5825 , H01M10/0525 , H01M2220/10 , H01M2220/20 , H01M2220/30 , Y02E60/122
摘要： Embodiments of the present invention relate generally to lithium-ion batteries, and more specifically, to batteries having integrated separators and methods of fabricating such batteries. In one embodiment, a lithium-ion battery having an electrode structure is provided. The lithium-ion battery comprises an anode stack, a cathode stack, and a porous electrospun polymer separator comprising a nano-fiber backbone structure. The anode stack comprises an anodic current collector and an anode structure formed over a first surface of the anodic current collector. The cathode stack comprises a cathodic current collector and a cathode structure formed over a first surface of the cathodic current collector. The porous electrospun polymer separator is positioned between the anode structure and the cathode structure.
摘要翻译：本发明的实施例通常涉及锂离子电池，并且更具体地涉及具有集成隔离器的电池以及制造这种电池的方法。在一个实施例中，提供了具有电极结构的锂离子电池。锂离子电池包括阳极叠层，阴极叠层和包含纳米纤维主链结构的多孔电纺聚合物分隔体。阳极堆叠体包括阳极集流体和形成在阳极集流体的第一表面上的阳极结构。阴极叠层包括阴极集流体和在阴极集流体的第一表面上形成的阴极结构。多孔电纺聚合物隔板位于阳极结构和阴极结构之间。

2. 发明申请

WO2012026952A1 IN-SITU SYNTHESIS AND DEPOSITION OF BATTERY ACTIVE LITHIUM MATERIALS BY SPRAYING 审中-公开
标题翻译：电喷活性锂离子电池的现场合成与沉积
公开(公告)号：WO2012026952A1
公开(公告)日：2012-03-01
申请号：PCT/US2010/058493
申请日：2010-12-01
申请人： APPLIED MATERIALS, INC. , SHANG, Quanyuan , YANG, Lu , BROWN, Karl, M. , OLGADO, Donald, J., K. , PEBENITO, Victor , BOLANDI, Hooman , ISHIKAWA, Tetsuya , BACHRACH, Robert, Z. , CHEN, Liang-Yuh
发明人： SHANG, Quanyuan , YANG, Lu , BROWN, Karl, M. , OLGADO, Donald, J., K. , PEBENITO, Victor , BOLANDI, Hooman , ISHIKAWA, Tetsuya , BACHRACH, Robert, Z. , CHEN, Liang-Yuh
IPC分类号： H01M4/04 , H01M10/0525 , H01G9/04
CPC分类号： H01G11/50 , H01G11/06 , H01M4/0419 , H01M10/04 , Y02E60/13
摘要： A method and apparatus for forming an electrochemical layer of a thin film battery is provided. A liquid precursor mixture comprising electrochemically active metals is reacted with oxygen to form electrochemically active metal oxides, which are deposited in a layer on a substrate. Carbon may be added to the mixture to control energy input to the reaction and to provide adhesion and conductivity between crystals deposited on the substrate. Conversion of precursors to deposition crystals may be accomplished in a two-stage process.
摘要翻译：提供一种用于形成薄膜电池的电化学层的方法和装置。将包含电化学活性金属的液体前体混合物与氧气反应以形成沉积在基底上的层中的电化学活性金属氧化物。可以向混合物中加入碳以控制反应的能量输入并提供沉积在基底上的晶体之间的粘附和导电性。前体转化为沉积晶体可以在两阶段工艺中完成。

3. 发明申请

WO2012036908A3 SPRAY DEPOSITION MODULE FOR AN IN-LINE PROCESSING SYSTEM 审中-公开
公开(公告)号：WO2012036908A3
公开(公告)日：2012-03-22
申请号：PCT/US2011/049984
申请日：2011-08-31
申请人： APPLIED MATERIALS, INC. , BACHRACH, Robert, Z. , WANG, Connie, P. , LOPATIN, Sergey, D. , BOLANDI, Hooman , BABAYANTS, Ruben , BROWN, Karl, M. , KUTNEY, Michael, C. , OLGADO, Donald, J., K.
发明人： BACHRACH, Robert, Z. , WANG, Connie, P. , LOPATIN, Sergey, D. , BOLANDI, Hooman , BABAYANTS, Ruben , BROWN, Karl, M. , KUTNEY, Michael, C. , OLGADO, Donald, J., K.
IPC分类号： H01M4/04 , B05C5/02 , B05D1/26 , H01M10/04 , H01M10/052
摘要： In one embodiment, an apparatus for simultaneously depositing an anodically or cathodically active material on opposing sides of a flexible conductive substrate is provided. The apparatus comprises a chamber body defining one or more processing regions in which a flexible conductive substrate is exposed to a dual sided spray deposition process, wherein each of the one or more processing regions are further divided into a first spray deposition region and a second spray deposition region for simultaneously spraying an anodically active or cathodically active material onto opposing sides of a portion of the flexible conductive substrate, wherein each of the first and second spray deposition regions comprise a spray dispenser cartridge for delivering the activated material toward the flexible conductive substrate and a movable collection shutter.

4. 发明申请

WO2010019430A2 ELECTROSTATIC CHUCK ASSEMBLY 审中-公开
标题翻译：静电块组件
公开(公告)号：WO2010019430A2
公开(公告)日：2010-02-18
申请号：PCT/US2009/052917
申请日：2009-08-06
申请人： APPLIED MATERIALS, INC. , SANSONI, Steven, V. , TSAI, Cheng-Hsiung , ROY, Shambhu, N. , BROWN, Karl, M. , PARKHE, Vijay, D. , PONNEKANTI, Hari, K.
发明人： SANSONI, Steven, V. , TSAI, Cheng-Hsiung , ROY, Shambhu, N. , BROWN, Karl, M. , PARKHE, Vijay, D. , PONNEKANTI, Hari, K.
IPC分类号： H01L21/687 , B23Q3/15 , H02N13/00 , H01L21/68
CPC分类号： H01L21/6833 , H01J37/32431 , H01L21/67103 , H01L21/67109 , H01L21/6831 , H01L21/68785 , H01L2924/0002 , H02N13/00 , H01L2924/00
摘要： Embodiments of the present invention provide a cost effective electrostatic chuck assembly capable of operating over a wide temperature range in an ultra-high vacuum environment while minimizing thermo-mechanical stresses within the electrostatic chuck assembly. In one embodiment, the electrostatic chuck assembly includes a dielectric body having chucking electrodes which comprise a metal matrix composite material with a coefficient of thermal expansion (CTE) that is matched to the CTE of the dielectric body.
摘要翻译：本发明的实施例提供了一种经济高效的静电卡盘组件，其能够在超高真空环境中在宽的温度范围内运行，同时使静电卡盘组件内的热机械应力最小化。在一个实施例中，静电卡盘组件包括具有夹持电极的介电体，该夹持电极包括与电介质体的CTE匹配的具有热膨胀系数（CTE）的金属基质复合材料。

5. 发明申请

WO2006083332A1 APPARATUS FOR METAL PLASMA VAPOR DEPOSITION AND RE-SPUTTER WITH SOURCE AND BIAS POWER FREQUENCIES APPLIED THROUGH THE WORKPIECE 审中-公开
标题翻译：用于金属等离子体蒸发沉积的装置和通过工件应用的源和偏置功率频率的重新喷射器
公开(公告)号：WO2006083332A1
公开(公告)日：2006-08-10
申请号：PCT/US2005/036794
申请日：2005-10-12
申请人： APPLIED MATERIALS, INC.
发明人： BROWN, Karl, M. , PIPITONE, John , MEHTA, Vineet
IPC分类号： H01J37/34 , C23C14/34
CPC分类号： H01J37/3405 , C23C14/046 , C23C14/352 , H01J37/32082
摘要： A plasma reactor includes a vacuum chamber including a sidewall, a ceiling and a wafer support pedestal near a floor of the chamber, and a vacuum pump coupled to the chamber. A process gas inlet is coupled to the chamber and a process gas source coupled to the process gas inlet. The reactor further includes a metal sputter target at the ceiling, a high voltage D.C. source coupled to the sputter target, an RF plasma source power generator coupled to the wafer support pedestal and having a frequency suitable for exciting kinetic electrons, and an RF plasma bias power generator coupled to the wafer support pedestal and having a frequency suitable for coupling energy to plasma ions.
摘要翻译：等离子体反应器包括真空室，真空室包括侧壁，天花板和靠近室底部的晶片支撑台座，以及耦合到该室的真空泵。工艺气体入口连接到腔室和连接到工艺气体入口的工艺气体源。反应器还包括在天花板处的金属溅射靶，耦合到溅射靶的高压DC源，耦合到晶片支撑基座并具有适于激发动电子的频率的RF等离子体源功率发生器，以及RF等离子体偏置发电机耦合到晶片支撑基座并且具有适于将能量耦合到等离子体离子的频率。

6. 发明申请

WO2006083929A2 A PHYSICAL VAPOR DEPOSITION PLASMA REACTOR WITH RF SOURCE POWER APPLIED TO THE TARGET 审中-公开
标题翻译：具有应用于目标的射频源功率的物理蒸气沉积式等离子体反应器
公开(公告)号：WO2006083929A2
公开(公告)日：2006-08-10
申请号：PCT/US2006/003495
申请日：2006-01-30
申请人： APPLIED MATERIALS, INC.
发明人： BROWN, Karl, M. , PIPITONE, John , MEHTA, Vineet
IPC分类号： B01J19/08
CPC分类号： C23C14/185 , C23C14/046 , C23C14/354 , H01J37/321 , H01J37/3405
摘要： A physical vapor deposition reactor includes a vacuum chamber including a sidewall, a ceiling and a wafer support pedestal near a floor of the chamber, a vacuum pump coupled to the chamber, a process gas inlet coupled to the chamber and a process gas source coupled to the process gas inlet. A metal sputter target is located at the ceiling and a high voltage D. C. source coupled to the sputter target. An RF plasma source power generator is coupled to the metal sputter target and has a frequency suitable for exciting kinetic electrons. Preferably, the wafer support pedestal comprises an electrostatic chuck and an RF plasma bias power generator is coupled to the wafer support pedestal having a frequency suitable for coupling energy to plasma ions. Preferably, a solid metal RF feed rod having a diameter in excess of about 0.5 inches engages the metal sputter target, the RF feed rod extending axially above the target through the ceiling and being coupled to the RF plasma source power generator.
摘要翻译：物理气相沉积反应器包括真空室，其包括侧壁，天花板和靠近室底部的晶片支撑台座，耦合到该室的真空泵，耦合到该室的工艺气体入口以及耦合到工艺气体入口。金属溅射靶位于天花板和耦合到溅射靶的高电压D.C.源。 RF等离子体源功率发生器耦合到金属溅射靶并且具有适于激发动电子的频率。优选地，晶片支撑基座包括静电卡盘，并且RF等离子体偏置功率发生器耦合到具有适于将能量耦合到等离子体离子的频率的晶片支撑基座。优选地，具有超过约0.5英寸的直径的固体金属RF馈送棒与金属溅射靶接合，RF馈送杆通过天花板轴向延伸到目标上方并且耦合到RF等离子体源发电机。

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