会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明申请
    • APPARATUS AND METHOD FOR ELECTRO CHEMICAL PLATING USING BACKSIDE ELECTRICAL CONTACTS
    • 使用背面电气接触的电化学镀层的装置和方法
    • WO2003034478A2
    • 2003-04-24
    • PCT/US2002/030503
    • 2002-09-26
    • APPLIED MATERIALS, INC.
    • OLGADO, Donald, J., K.WOOD, MichaelLUBOMIRSKY, Dmitry
    • H01L21/288
    • C25D7/123C25D5/028C25D17/001C25D17/06H01L21/2885
    • An apparatus and method for securing and electrically contacting a substrate on a non-production surface of the substrate. The apparatus includes a substrate holder assembly having a substrate engaging surface formed thereon, the substrate engaging surface being configured to engage a substrate on the non-production surface. The apparatus further includes an electrical contact device positioned on the substrate engaging surface, the electrical contact device including a plurality of radially spaced electrically conductive members configured to electrically communicate with the non-production surface of the substrate positioned on the substrate engaging surface. The method includes depositing a conductive seed layer on a production surface of the substrate, and depositing a backside conductive layer on a portion of the non-production side of the substrate, the backside conductive layer extending around a bevel of the substrate to electrically communicate with the seed layer. The method further includes securing the substrate in a chuck configured to engage the non-production surface of the substrate, contacting the backside conductive layer with an electrical cathode contact on the non-production side of the substrate, and plating over the conductive seed layer via application of an electrolyte to the production surface of the substrate and applying an electrical bias to the electrical cathode contact and an anode in communication with the electrolyte.
    • 一种用于固定和电接触衬底的非生产表面上的衬底的装置和方法。 该设备包括具有形成在其上的衬底接合表面的衬底保持器组件,衬底接合表面被配置为接合非生产表面上的衬底。 所述装置还包括位于所述基板接合表面上的电接触装置,所述电接触装置包括多个径向隔开的导电构件,所述导电构件构造成与位于所述基板接合表面上的所述基板的非生产表面电连通。 该方法包括在衬底的生产表面上沉积导电种子层,以及在衬底的非生产侧的一部分上沉积背面导电层,所述背面导电层围绕衬底的斜面延伸以与 种子层。 该方法还包括将衬底固定在配置成接合衬底的非生产表面的卡盘中,使背面导电层与衬底的非生产侧上的电阴极接触接触,并且在导电种子层上电镀 将电解质施加到基材的生产表面上,并将电偏压施加到电阴极接触件和与电解质连通的阳极。
    • 6. 发明申请
    • APPARATUS AND METHOD FOR ELECTRO CHEMICAL PLATING USING BACKSIDE ELECTRICAL CONTACTS
    • WO2003034478A3
    • 2003-04-24
    • PCT/US2002/030503
    • 2002-09-26
    • APPLIED MATERIALS, INC.
    • OLGADO, Donald, J., K.WOOD, MichaelLUBOMIRSKY, Dmitry
    • H01L21/288
    • An apparatus and method for securing and electrically contacting a substrate on a non-production surface of the substrate. The apparatus includes a substrate holder assembly (500) having a substrate engaging surface formed thereon, the substrate engaging surface being configured to engage a substrate on the non-production surface. The apparatus further includes an electrical contact device positioned on the substrate engaging surface, the electrical contact device (502) including a plurality of radially spaced electrically conductive members configured to electrically communicate with the non-production surface of the substrate positioned on the substrate engaging surface. The method includes depositing a conductive seed layer on a production surface of the substrate, and depositing a backside conductive layer on a portion of the non-production side of the substrate, the backside conductive layer extending around a bevel of the substrate to electrically communicate with the seed layer. The method further includes securing the substrate in a chuck configured to engage the non-production surface of the substrate, contacting the backside conductive layer with an electrical cathode contact on the non-production side of the substrate, and plating over the conductive seed layer via application of an electrolyte to the production surface of the substrate and applying an electrical bias to the electrical cathode contact and an anode in communication with the electrolyte.