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1. 发明申请

WO2012058005A2 APPARATUS HAVING IMPROVED SUBSTRATE TEMPERATURE UNIFORMITY USING DIRECT HEATING METHODS 审中-公开
标题翻译：使用直接加热方法改善基片温度均匀性的装置
公开(公告)号：WO2012058005A2
公开(公告)日：2012-05-03
申请号：PCT/US2011/055900
申请日：2011-10-12
申请人： APPLIED MATERIALS, INC. , OLGADO, Donald J.K. , NGUYEN, Tuan Anh , DUBOUST, Alain
发明人： OLGADO, Donald J.K. , NGUYEN, Tuan Anh , DUBOUST, Alain
IPC分类号： H01L21/683
CPC分类号： H01L21/67115 , H01L21/68764 , H01L21/68771
摘要： Embodiments of the present invention generally relate to an apparatus and methods for uniformly heating substrates in a processing chamber. In one embodiment, an apparatus generally includes a substrate supporting structure that is able to help minimize the temperature variation across each of the substrates during thermal processing. In one configuration, a substrate supporting structure is adapted to selectively support a substrate carrier to control the heat lost from regions of each of the substrates disposed on the substrate carrier. The substrate supporting structure is thus configured to provide a uniform temperature profile across each of the plurality of substrates during processing.
摘要翻译：本发明的实施例一般涉及用于在处理室中均匀加热衬底的设备和方法。在一个实施例中，设备通常包括衬底支撑结构，该衬底支撑结构能够帮助在热处理期间最小化在每个衬底上的温度变化。在一种配置中，基板支撑结构适于选择性地支撑基板载体以控制从设置在基板载体上的每个基板的区域损失的热量。衬底支撑结构因此被配置为在处理期间在多个衬底中的每个衬底上提供均匀的温度分布。

2. 发明申请

WO2012134663A2 METHOD AND APPARATUS UTILIZING A SINGLE LIFT MECHANISM FOR PROCESSING AND TRANSFER OF SUBSTRATES 审中-公开
标题翻译：使用单个提升机械的方法和装置，用于处理和转移基板
公开(公告)号：WO2012134663A2
公开(公告)日：2012-10-04
申请号：PCT/US2012/025960
申请日：2012-02-21
申请人： APPLIED MATERIALS, INC , OLGADO, Donald J.K. , NGUYEN, Tuan Anh
发明人： OLGADO, Donald J.K. , NGUYEN, Tuan Anh
CPC分类号： H01L21/67115 , C23C16/4584 , C23C16/54 , H01L21/68742
摘要： Embodiments of the present invention relate to apparatus and methods for loading substrates into processing chambers, processing the substrates in the processing chamber, and transferring the substrates out of the processing chamber using a single lift mechanism. One embodiment of the present invention provides an apparatus processing multiple substrates. The apparatus includes a chamber body having an internal sidewall, a liner assembly disposed on the internal sidewall defining a processing volume, and a plurality of chamber support features coupled to an interior surface of the liner assembly and extending into the processing volume. The apparatus also includes an edge ring disposed in the processing volume, the edge ring comprising an annular body, a shoulder portion defining an inside diameter of the annular body, and a plurality of tabs disposed on the shoulder portion in a circular pattern having a diameter that is less than the inside diameter of the annular body.
摘要翻译：本发明的实施例涉及将基板装载到处理室中的装置和方法，处理处理室中的基板，以及使用单个升降机构将基板转移到处理室外。本发明的一个实施例提供了一种处理多个基板的装置。该装置包括具有内部侧壁的室主体，设置在限定处理容积的内侧壁上的衬套组件，以及耦合到衬套组件的内表面并延伸到处理体积中的多个室支撑特征。该设备还包括设置在处理容积中的边缘环，边缘环包括环形体，限定环形体的内径的肩部和以圆形图案设置在肩部上的多个突片，其具有直径小于环形体的内径。

3. 发明申请

WO2012125771A2 SUBSTRATE SUPPORT ASSEMBLY FOR THIN FILM DEPOSITION SYSTEMS 审中-公开
标题翻译：用于薄膜沉积系统的基底支撑组件
公开(公告)号：WO2012125771A2
公开(公告)日：2012-09-20
申请号：PCT/US2012/029134
申请日：2012-03-14
申请人： APPLIED MATERIALS, INC. , NGUYEN, Tuan Anh , OLGADO, Donald J.K. , QUACH, David H.
发明人： NGUYEN, Tuan Anh , OLGADO, Donald J.K. , QUACH, David H.
IPC分类号： H01L21/683 , H01L21/205 , C23C16/458
CPC分类号： C30B25/12 , C23C16/4583
摘要： Substrate support assemblies and deposition chambers employing such support assemblies to improve temperature uniformity during film depositions, such as epitaxial growths of group-V material stacks for LEDs. In one embodiment, the support assembly includes a first component having a first thermal resistance and a top surface upon which the substrate is to be disposed at a first location. The support assembly further includes a second component to be disposed over the first component to cover a second location of the susceptor while the substrate is disposed over the first location and having a second thermal resistance to insulate regions of the susceptor adjacent to the substrate by an amount approximating that of the substrate during a deposition process. In embodiments, the second component is removable from the first component and supports the substrate in absence of the first component during transfer of the substrate between multiple deposition systems.
摘要翻译：采用这种支撑组件的衬底支撑组件和沉积室在薄膜沉积期间改善温度均匀性，例如用于LED的V族材料堆叠的外延生长。在一个实施例中，支撑组件包括具有第一热阻的第一部件和衬底将布置在第一位置处的顶表面。所述支撑组件还包括第二部件，所述第二部件设置在所述第一部件上方以覆盖所述基座的第二位置，同时所述基板设置在所述第一位置上方并且具有第二热阻以使所述基座的邻近所述基板的区域通过量在沉积过程中接近基板的量。在实施例中，第二部件可从第一部件移除并且在多个沉积系统之间的衬底转移期间在没有第一部件的情况下支撑衬底。

4. 发明申请

WO2010048227A2 ULTRAVIOLET-TRANSMITTING MICROWAVE REFLECTOR COMPRISING A MICROMESH SCREEN 审中-公开
标题翻译：包含MICROMESH屏幕的超紫外线发射微波反射器
公开(公告)号：WO2010048227A2
公开(公告)日：2010-04-29
申请号：PCT/US2009/061380
申请日：2009-10-20
申请人： APPLIED MATERIALS, INC. , NGUYEN, Tuan Anh , YANG, Yao-Hung , BALUJA, Sanjeev , NOWAK, Thomas , ROCHA-ALVAREZ, Juan Carlos
发明人： NGUYEN, Tuan Anh , YANG, Yao-Hung , BALUJA, Sanjeev , NOWAK, Thomas , ROCHA-ALVAREZ, Juan Carlos
IPC分类号： H01L21/324 , H01L21/205 , H01L21/203
CPC分类号： C25D5/022 , C25D1/08
摘要： An ultraviolet-transmitting microwave reflector for a substrate processing chamber, comprises a micromesh screen extending across the metallic frame. In one version, the micromesh screen comprises at least one electroformed layer. A method of fabricating the microwave reflector comprises electroforming a metallic frame surrounding a micromesh screen such that the micromesh screen comprises an open area of greater than 80% of the total area.
摘要翻译：用于基板处理室的紫外线透射微波反射器包括跨过金属框架延伸的微镜屏幕。在一个版本中，微镜屏幕包括至少一个电铸层。制造微波反射器的方法包括电铸微型屏幕周围的金属框架，使得微型屏幕包括大于总面积的80％的开放面积。

5. 发明申请

WO2010048237A2 ULTRAVIOLET REFLECTOR WITH COOLANT GAS HOLES AND METHOD 审中-公开
标题翻译：具有冷却剂气体孔的紫外线反射器和方法
公开(公告)号：WO2010048237A2
公开(公告)日：2010-04-29
申请号：PCT/US2009/061391
申请日：2009-10-20
申请人： APPLIED MATERIALS, INC. , YANG, Yao-Hung , NGUYEN, Tuan Anh , BALUJA, Sanjeev , KASZUBA, Andrzej , ROCHA, Juan Carlos , NOWAK, Thomas , HO, Dustin W.
发明人： YANG, Yao-Hung , NGUYEN, Tuan Anh , BALUJA, Sanjeev , KASZUBA, Andrzej , ROCHA, Juan Carlos , NOWAK, Thomas , HO, Dustin W.
IPC分类号： H01L21/324 , H01L21/205
CPC分类号： G21K1/062 , B82Y10/00 , G21K2201/064 , G21K2201/065 , G21K2201/067
摘要： A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a longitudinal strip extending the length of the ultraviolet lamp. The longitudinal strip has a curved reflective surface and comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.
摘要翻译：用于紫外线灯的反射器可用于基板处理设备中。反射器包括延伸紫外线灯长度的纵向条。纵向条具有弯曲的反射表面并且包括多个通孔以将冷却剂气体导向紫外线灯。还描述了使用具有反射器的紫外线灯模块的室和紫外线处理方法。

6. 发明申请

WO2022269444A1 APPARATUS FOR ORGANIC WASTE TREATMENT 审中-公开
公开(公告)号：WO2022269444A1
公开(公告)日：2022-12-29
申请号：PCT/IB2022/055678
申请日：2022-06-19
申请人： NGUYEN, Tuan Anh , TRAN, Thi Minh Hanh
发明人： NGUYEN, Tuan Anh , TRAN, Thi Minh Hanh
IPC分类号： C05F9/02 , C05F17/914 , B02C18/00 , B02C18/14 , B02C18/22 , B65F1/00 , B09B5/00 , B09B101/70 , B65F1/14 , B02C18/0084 , B02C18/142 , B02C18/2216 , B02C18/2233 , B09B2101/70 , B65F1/1405 , B65F2001/1489 , B65F2210/12
摘要： The present invention relates to an organic waste treatment apparatus consisting of a garbage receiving unit (5), a probing door (4.2), a garbage compactor unit (7), a crushing unit fixed to the upper part of the structure frame (1), a mixing unit positioned underneath the crushing unit (8), a motor (9) that drives all movements of the apparatus using belt drive and gear drive, and a control panel (13) controlling the functions of this device.

7. 发明申请

WO2012135859A2 METHOD AND APPARATUS FOR RESTRICTING FLOW THROUGH AN OPENING IN THE SIDE WALL OF A BODY LUMEN, AND/OR FOR REINFORCING A WEAKNESS IN THE SIDE WALL OF A BODY LUMEN, WHILE STILL MAINTAINING SUBSTANTIALLY NORMAL FLOW THROUGH THE BODY LUMEN 审中-公开
标题翻译：用于通过在身体壁的侧壁中打开流动来限制流动的方法和装置，和/或用于增强身体壁的侧壁中的弱点，同时维持通过身体的大量的大量正常流动
公开(公告)号：WO2012135859A2
公开(公告)日：2012-10-04
申请号：PCT/US2012/031899
申请日：2012-04-02
申请人： CORNELL UNIVERSITY , RIINA, Howard , MILSOM, Jeffrey , COMHILL, J., Frederick , NGUYEN, Tuan Anh , SMITH, Kevin , KEOUGH, Kevin , ANDREWS, Robert
发明人： RIINA, Howard , MILSOM, Jeffrey , COMHILL, J., Frederick , NGUYEN, Tuan Anh , SMITH, Kevin , KEOUGH, Kevin , ANDREWS, Robert
IPC分类号： A61M29/00
CPC分类号： A61B17/12172 , A61B17/12022 , A61B17/12118 , A61B17/12131 , A61B2017/00867 , A61B2017/12054 , A61F2/82 , A61F2/86 , A61F2/91 , A61F2/95 , A61F2002/30242 , A61F2002/823 , A61F2230/005 , A61F2230/0071 , A61F2230/0091 , A61F2230/0095 , A61H23/00 , A61N5/0616 , C22F1/006
摘要： A method for making a device for causing thrombosis of an aneurysm, wherein said device comprises a single elastic filament configurable between (i) an elongated, substantially linear configuration, and (ii) a longitudinally-contracted, substantially three-dimensional configuration, said method comprising: providing a sheet of shape memory material; producing a single filament, two-dimensional interim structure from said sheet of shape memory material; mounting said single filament, two-dimensional interim structure to a fixture so that said single filament, two-dimensional interim structure is transformed into said longitudinally-contracted, substantially three-dimensional configuration; and heat treating said single filament, two- dimensional interim structure while it is mounted to said fixture so as to produce said device in its longitudinally-contracted, substantially three- dimensional configuration.
摘要翻译：一种用于制造用于引起动脉瘤血栓形成的装置的方法，其中所述装置包括在（i）细长的，基本上线性的构型和（ii）纵向收缩的基本上三维构型之间可配置的单个弹性丝，所述方法包括：提供一片形状记忆材料; 从所述形状记忆材料片产生单丝，二维中间结构; 将所述单丝，二维临时结构安装到固定装置，使得所述单丝，二维中间结构转变成所述纵向收缩的基本三维构型; 以及在安装到所述固定装置的同时对所述单丝进行热处理，二维中间结构，以便在其纵向收缩的基本三维构造中产生所述装置。

8. 发明申请

WO2020236235A1 HEATER SUPPORT KIT FOR BEVEL ETCH CHAMBER 审中-公开
公开(公告)号：WO2020236235A1
公开(公告)日：2020-11-26
申请号：PCT/US2020/019150
申请日：2020-02-21
申请人： APPLIED MATERIALS, INC.
发明人： NGUYEN, Tuan Anh , LEE, Jeongmin , PATEL, Anjana M. , KHAJA, Abdul Aziz
IPC分类号： H01L21/02 , B08B7/00 , H01L21/3065 , H01J37/32 , H01L21/67
摘要： Embodiments described herein generally relate to apparatuses for processing a substrate. In one or more embodiments, a heater support kit includes a heater assembly contains a heater plate having an upper surface and a lower surface, a chuck ring disposed on at least a portion of the upper surface of the heater plate, a heater arm assembly contains a heater arm and supporting the heater assembly, and a heater support plate disposed between the heater plate and the heater arm and in contact with at least a portion of the lower surface of the heater plate.

9. 发明申请

WO2018067297A1 DYNAMIC LEVELING PROCESS HEATER LIFT 审中-公开
标题翻译：动态平整过程加热器升降机
公开(公告)号：WO2018067297A1
公开(公告)日：2018-04-12
申请号：PCT/US2017/052023
申请日：2017-09-18
申请人： APPLIED MATERIALS, INC.
发明人： SCHALLER, Jason M. , ROHRER, Michael , FREEMAN, Greg , VOPAT, Robert Brent , NGUYEN, Tuan Anh , WEAVER, William Tyler
IPC分类号： H01L21/687 , H01L21/683
CPC分类号： H01L21/68 , C23C16/45565 , C23C16/458 , C23C16/4584 , C23C16/52 , G05B19/418 , G05B2219/45031 , H01L21/022 , H01L21/02271 , H01L21/67103 , H01L21/68742 , H01L21/68764 , H01L21/68785 , H01L21/68792
摘要： A method and apparatus for of improving processing results in a processing chamber by orienting a substrate support relative to a surface within the processing chamber. The method comprising orienting a supporting surface of a substrate support in a first orientation relative to an output surface of a showerhead, where the first orientation of the supporting surface relative to the output surface is not coplanar, and depositing a first layer of material on a substrate disposed on the supporting surface that is oriented in the first orientation
摘要翻译：通过使衬底支撑件相对于处理室内的表面定向而改善处理结果的方法和装置导致处理室中。该方法包括将基板支撑件的支撑表面相对于喷头的输出表面定向成第一定向，其中支撑表面相对于输出表面的第一定向不共面，并且将第一层材料沉积在设置在以第一取向定向的支撑表面上的基板

10. 发明申请

WO2021025913A1 RADIO FREQUENCY POWER RETURN PATH 审中-公开
公开(公告)号：WO2021025913A1
公开(公告)日：2021-02-11
申请号：PCT/US2020/043982
申请日：2020-07-29
申请人： APPLIED MATERIALS, INC.
发明人： BONECUTTER, Luke , BLAHNIK, David , NGUYEN, Tuan Anh , BANSAL, Amit Kumar
IPC分类号： C23C16/458 , C23C16/509 , H01J37/32
摘要： Embodiments presented herein are directed to radio frequency (RF) grounding in process chambers. In one embodiment, a dielectric plate is disposed between a chamber body and a lid of a process chamber. The dielectric plate extends laterally into a volume defined by the chamber body and the lid. A substrate support is disposed in the volume opposite the lid. The substrate support includes a support body disposed on a stem. The support body includes a central region and a peripheral region. The peripheral region is radially outward of the central region. The central region has a thickness less than a thickness of the peripheral region. A flange is disposed adjacent to a bottom surface of the peripheral region. The flange extends radially outward from an outer edge of the peripheral region. A bellows is disposed on the flange and configured to sealingly couple to the dielectric plate.

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