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1. 发明申请

WO2010008747A2 BIG FOOT LIFT PIN 审中-公开
标题翻译：大脚提升密码
公开(公告)号：WO2010008747A2
公开(公告)日：2010-01-21
申请号：PCT/US2009/047690
申请日：2009-06-17
申请人： APPLIED MATERIALS, INC. , DU BOIS, Dale, R. , FODOR, Mark, A. , JANAKIRAMAN, Karthik , ROCHA-ALVAREZ, Juan, Carlos
发明人： DU BOIS, Dale, R. , FODOR, Mark, A. , JANAKIRAMAN, Karthik , ROCHA-ALVAREZ, Juan, Carlos
IPC分类号： H01L21/683 , H01L21/687 , H01L21/205
CPC分类号： H01L21/68742
摘要： Embodiments described herein generally provide a lift pin assembly having increased wafer placement accuracy, repeatability, reliability, and corrosion resistance. In one embodiment, a lift pin assembly for positioning a substrate relative to a substrate support is provided. The lift pin assembly comprises a lift pin comprising a pin shaft, a pin head coupled with a first end of the pin shaft for supporting the substrate, and a shoulder coupled with a second end of the pin shaft. The lift pin assembly further comprises a cylindrical body slidably coupled with the pin shaft and a locking pin for preventing the cylindrical body from sliding along the shaft, wherein the shoulder has a through-hole dimensioned to accommodate the locking pin.
摘要翻译：这里描述的实施例通常提供具有增加的晶片放置精度，可重复性，可靠性和耐腐蚀性的升降销组件。在一个实施例中，提供了用于相对于基板支撑件定位基板的升降销组件。升降销组件包括升降销，该升降销包括销轴，与销轴的第一端联接以用于支撑基板的销头，以及与销轴的第二端联接的台肩。升降销组件还包括可滑动地与销轴联接的圆柱形本体和用于防止圆柱形本体沿着轴滑动的锁定销，其中，肩部具有尺寸适于容纳锁定销的通孔。

2. 发明申请

WO2009009611A2 SYSTEMS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AND BEVEL EDGE ETCHING 审中-公开
标题翻译：等离子体增强化学气相沉积和水平蚀刻系统
公开(公告)号：WO2009009611A2
公开(公告)日：2009-01-15
申请号：PCT/US2008/069551
申请日：2008-07-09
申请人： APPLIED MATERIALS, INC. , SHAH, Ashish , DU BOIS, Dale, R. , BALASUBRAMANIAN, Ganesh , FODOR, Mark, A. , KIM, Eui, Kyoon , CHAN, Chiu , JANAKIRAMAN, Karthik , NOWAK, Thomas , WERNER, Joseph, C. , SIVARAMAKRISHNAN, Visweswaren , AYOUB, Mohamad , AL-BAYATI, Amir , ZHOU, Jianhua
发明人： SHAH, Ashish , DU BOIS, Dale, R. , BALASUBRAMANIAN, Ganesh , FODOR, Mark, A. , KIM, Eui, Kyoon , CHAN, Chiu , JANAKIRAMAN, Karthik , NOWAK, Thomas , WERNER, Joseph, C. , SIVARAMAKRISHNAN, Visweswaren , AYOUB, Mohamad , AL-BAYATI, Amir , ZHOU, Jianhua
IPC分类号： C23F1/02
CPC分类号： H01L21/6719 , H01J37/32366 , H01J2237/3321 , H01L21/67201 , H01L21/67207
摘要： Embodiments described herein relate to a substrate processing system that integrates substrate edge processing capabilities. Illustrated examples of the processing system include, without limitations, a factory interface, a loadlock chamber, a transfer chamber, and one or more twin process chambers having two or more processing regions that are isolatable from each other and share a common gas supply and a common exhaust pump. The processing regions in each twin process chamber include separate gas distribution assemblies and RF power sources to provide plasma at selective regions on a substrate surface in each processing region. Each twin process chamber is thereby configured to allow multiple, isolated processes to be performed concurrently on at least two substrates in the processing regions.
摘要翻译：本文所述的实施例涉及集成衬底边缘处理能力的衬底处理系统。处理系统的说明性示例包括但不限于工厂接口，负载锁定室，传送室和具有两个或更多个处理区域的一个或多个双处理室，其可彼此隔离并且共享公共气体供应和普通排气泵。每个双处理室中的处理区域包括单独的气体分配组件和RF功率源，以在每个处理区域中的衬底表面上的选择性区域提供等离子体。因此，每个双处理室被配置为允许在处理区域中的至少两个基板上同时执行多个隔离过程。

3. 发明申请

WO2009009606A1 APPARATUS AND METHOD FOR CENTERING A SUBSTRATE IN A PROCESS CHAMBER 审中-公开
标题翻译：用于在过程室中设置基板的装置和方法
公开(公告)号：WO2009009606A1
公开(公告)日：2009-01-15
申请号：PCT/US2008/069545
申请日：2008-07-09
申请人： APPLIED MATERIALS, INC. , DU BOIS, Dale, R. , BALASUBRAMANIAN, Ganesh , FODOR, Mark, A. , CHAN, Chiu , JANAKIRAMAN, Karthik
发明人： DU BOIS, Dale, R. , BALASUBRAMANIAN, Ganesh , FODOR, Mark, A. , CHAN, Chiu , JANAKIRAMAN, Karthik
IPC分类号： B08B3/04
CPC分类号： H01L21/68 , Y10S414/136
摘要： The present invention comprises an apparatus and method for centering a substrate in a process chamber. In one embodiment, the apparatus comprises a substrate support having a support surface adapted to receive the placement of a substrate and a reference axis substantially perpendicular to the support surface, and a plurality of centering members extending above the support surface. Each centering member is biased into a first position and is movable to a second position by interacting with an opposing member. A movement between the first position and the second position thereby causes each centering member to releasably engage with a peripheral edge of the substrate to push the substrate in a direction toward the reference axis.
摘要翻译：本发明包括用于使处理室中的衬底居中的装置和方法。在一个实施例中，该装置包括具有适于接收基板的放置和基本上垂直于支撑表面的参考轴的支撑表面的基板支撑件，以及在支撑表面上方延伸的多个定心构件。每个定心构件被偏压到第一位置，并且通过与相对构件相互作用而可移动到第二位置。第一位置和第二位置之间的移动使得每个定心构件可释放地与衬底的周缘接合，以沿着基准轴线的方向推动衬底。

4. 发明申请

WO2015138094A1 WAFER ROTATION IN A SEMICONDUCTOR CHAMBER 审中-公开
标题翻译：半导体室中的波形旋转
公开(公告)号：WO2015138094A1
公开(公告)日：2015-09-17
申请号：PCT/US2015/016199
申请日：2015-02-17
申请人： APPLIED MATERIALS, INC.
发明人： BALASUBRAMANIAN, Ganesh , ROCHA-ALVAREZ, Juan Carlos , SANKARAKRISHNAN, Ramprakash , KIM, Robert , DU BOIS, Dale, R. , FLOYD, Kirby Hane , BANSAL, Amit Kumar , NGUYEN, Tuan Anh
IPC分类号： H01L21/02
CPC分类号： H01L21/02274 , C23C16/4584 , C23C16/4585 , C23C16/505 , C23C16/5096 , H01J37/32082 , H01J37/32568 , H01J37/32623 , H01J37/32715 , H01J37/32724 , H01J37/32743 , H01J2237/3321 , H01L21/67103 , H01L21/68735 , H01L21/68742 , H01L21/68764 , H01L21/68792
摘要： A method and apparatus for processing a substrate are provided. The apparatus includes a pedestal and rotation member, both of which are moveably disposed within a processing chamber. The rotation member is adapted to rotate a substrate disposed in the chamber. The substrate may be supported by an edge ring during processing. The edge ring may selectively engage either the pedestal or the rotation member. In one embodiment, the edge ring engages the pedestal during a deposition process and the edge ring engages the rotation member during rotation of the substrate. The rotation of the substrate during processing may be discrete or continuous.
摘要翻译：提供了一种用于处理衬底的方法和设备。该装置包括基座和旋转构件，两者都可移动地设置在处理室内。旋转构件适于旋转设置在腔室中的衬底。衬底可以在加工过程中被边缘环支撑。边缘环可以选择性地接合基座或旋转构件。在一个实施例中，边缘环在沉积工艺期间接合基座，并且边缘环在基底旋转期间接合旋转构件。处理过程中衬底的旋转可以是离散的或连续的。

5. 发明申请

WO2018156290A1 GAS DISTRIBUTION APPARATUS FOR PROCESSING CHAMBERS 审中-公开
公开(公告)号：WO2018156290A1
公开(公告)日：2018-08-30
申请号：PCT/US2018/014852
申请日：2018-01-23
申请人： APPLIED MATERIALS, INC.
发明人： DU BOIS, Dale, R. , CHUC, Kien, N. , JANAKIRAMAN, Karthik
IPC分类号： H01L21/67 , C23C16/44 , H01L21/02
摘要： Implementations described herein generally relate to a method and apparatus for depositing material on a substrate. In one implementation, a processing chamber for processing a substrate includes a chamber body and a substrate support disposed within the chamber body and adapted to support the substrate thereon. The processing chamber includes a plurality of gas inlets positioned above the substrate support to direct a process gas above the substrate support. A movable diffuser is pivotally mounted adjacent the substrate support via a pivoting mount. The movable diffuser includes a deposition head having a plurality of inlet openings for directing process gas toward the substrate support and a plurality of exhaust openings for providing an exhaust to process gas disposed above the substrate support by the movable diffuser.

6. 发明申请

WO1995030031A1 WELDED SUSCEPTOR ASSEMBLY 审中-公开
标题翻译：焊接的SUSCEPTOR总成
公开(公告)号：WO1995030031A1
公开(公告)日：1995-11-09
申请号：PCT/US1995005434
申请日：1995-05-02
申请人： APPLIED MATERIALS, INC.
发明人： APPLIED MATERIALS, INC. , CHEW, Sandy , DU BOIS, Dale, R. , ROSE, Ronald, L. , WONG, Manus
IPC分类号： C23C16/50
CPC分类号： H01L21/68764 , C23C16/458 , H01L21/68707 , H01L21/68785 , H01L21/68792
摘要： A susceptor support arm assembly (30) in a substrate processing chamber includes a secure ground connection between the susceptor (32) and ground. An aluminum wire rope (123) is welded to a winged terminal which is welded to the susceptor hub (94). The wire rope is routed through an opening in the susceptor end of a ceramic susceptor arm (131), through a channel (155) in the susceptor arm to the susceptor arm support device, and to ground. The channel in the susceptor arm has grooves in its sides to receive a paddle-shaped ceramic cover (166) to enclose the channel. The cover insulates, isolates and shields the grounding wire and thermocouple leads. Conical spring washers (186) and shoulder screws (188) attach the metallic pieces (e.g. the susceptor hub) to the ceramic susceptor arm allowing for the differential thermal expansion between pieces without overstressing the ceramic material clamped.
摘要翻译：衬底处理室中的感受器支撑臂组件（30）包括在基座（32）和接地之间的牢固接地连接。将铝丝绳（123）焊接到焊接到基座毂（94）上的翼形端子上。钢丝绳穿过陶瓷基座臂（131）的基座端的开口，穿过基座臂中的通道（155）到基座支撑装置并接地。基座臂中的通道在其侧面具有凹槽，以容纳用于封闭通道的桨形陶瓷盖（166）。盖子绝缘，隔离和屏蔽接地线和热电偶引线。圆锥形弹簧垫圈（186）和肩螺钉（188）将金属片（例如，基座毂）连接到陶瓷基座臂上，允许片之间的不同热膨胀，而不会使夹持的陶瓷材料过度应力。

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