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1. 发明申请

WO2005099072A1 RECIPROCATING DRIVE SYSTEM FOR SCANNING A WORKPIECE 审中-公开
标题翻译：用于扫描工作的再现驱动系统
公开(公告)号：WO2005099072A1
公开(公告)日：2005-10-20
申请号：PCT/US2005/011600
申请日：2005-04-05
申请人： AXCELIS TECHNOLOGIES, INC. , VANDERPOT, John , POLLACK, John , BERRIAN, Donald
发明人： VANDERPOT, John , POLLACK, John , BERRIAN, Donald
IPC分类号： H02K16/00
CPC分类号： H01L21/67069 , H01J2237/20228 , H01J2237/31701 , H01L21/68707
摘要： A reciprocating drive system, method, and apparatus for scanning a workpiece are provided, wherein a motor comprising a rotor and stator operable to individually rotate about a first axis is operable to reciprocally translate the workpiece with respect to a stationary reference. A shaft rotatably driven by the rotor extends along the first axis, and a scan arm is operably coupled to the shaft, wherein the scan arm is operable to support the workpiece thereon. Cyclical counter rotations of the shaft by the motor are operable to rotate the scan arm, therein scanning the workpiece through the ion beam along a first scan path, wherein the stator acts as a reaction mass to the rotation of the rotor. A controller is further operable to control an electromagnetic force between the rotor and the stator, therein generally determining a rotational position of the rotor and the stator.
摘要翻译：提供了一种用于扫描工件的往复驱动系统，方法和装置，其中包括可操作以围绕第一轴线单独旋转的转子和定子的马达可操作以相对于固定基准往复平移工件。由转子可旋转地驱动的轴沿着第一轴线延伸，并且扫描臂可操作地联接到轴，其中扫描臂可操作以在其上支撑工件。电动机的轴的周期性旋转可操作以旋转扫描臂，其中沿着第一扫描路径扫描工件穿过离子束，其中定子充当转子的旋转的反作用质量。控制器还可操作以控制转子和定子之间的电磁力，其中通常确定转子和定子的旋转位置。

2. 发明申请

WO2006133038A3 PARTICULATE PREVENTION IN ION IMPLANTATION 审中-公开
标题翻译：离子注入中的颗粒预防
公开(公告)号：WO2006133038A3
公开(公告)日：2007-02-01
申请号：PCT/US2006021643
申请日：2006-06-02
申请人： AXCELIS TECH INC , VANDERPOT JOHN , BERRIAN DONALD
发明人： VANDERPOT JOHN , BERRIAN DONALD
IPC分类号： H01J37/317 , H01J37/08 , H01J37/304
CPC分类号： H01J37/244 , H01J37/045 , H01J37/09 , H01J37/302 , H01J37/3171 , H01J2237/022 , H01J2237/026 , H01J2237/028 , H01J2237/30433 , H01J2237/31705
摘要： A system and method for mitigating contamination in an ion implantation system is provided. The system comprises an ion source (200), a power supply (216) operable to supply power to a filament (214) and mirror electrode (218) of the ion source, a workpiece handling system, and a controller (228), wherein the ion source is selectively tunable via the controller to provide rapid control of a formation of an ion beam. The controller is operable to selectively rapidly control power to the ion source, therein modulating a power of the ion beam between an implantation power and a minimal power in less than approximately 20 microseconds based, at least in part, to a signal associated with a workpiece position. Control of the ion source therefore mitigates particle contamination in the ion implantation system by minimizing an amount of time at which the ion beam is at the implantation current.
摘要翻译：提供了一种减轻离子注入系统污染的系统和方法。该系统包括离子源（200），可操作以向离子源的细丝（214）和镜电极（218）供电的电源（216），工件处理系统和控制器（228），其中离子源可以经由控制器选择性地调节，以提供对离子束形成的快速控制。控制器可操作以选择性地快速地控制离子源的功率，其中至少部分地基于与工件相关联的信号，在小于约20微秒内在注入功率和最小功率之间调制离子束的功率位置。因此，离子源的控制因此通过使离子束处于注入电流的时间量最小化来减轻离子注入系统中的颗粒污染。

3. 发明申请

WO2005097640A2 METHOD FOR RECIPROCATING A WORKPIECE THROUGH AN ION BEAM 审中-公开
标题翻译：通过离子束重新加工工件的方法
公开(公告)号：WO2005097640A2
公开(公告)日：2005-10-20
申请号：PCT/US2005/011581
申请日：2005-04-05
申请人： AXCELIS TECHNOLOGIES, INC. , POLLACK, John , BERRIAN, Donald , VANDERPOT, John
发明人： VANDERPOT, John
IPC分类号： B65H1/00
CPC分类号： H01J37/20 , H01J37/3171 , H01J2237/0216 , H01J2237/20228 , H01J2237/20292 , H01J2237/31703 , H01L21/67069 , H01L21/67259 , H01L21/68764 , H01L21/68792
摘要： A method for reciprocally transporting a workpiece on a scan arm through an ion beam is provided, wherein the scan arm is operable coupled to a motor comprising a rotor and stator that are individually rotatable about a first axis. An electromagnetic force applied between the rotor and stator rotates the rotor about the first axis and translates the workpiece through the ion beam along a first scan path. A position of the workpiece is sensed and the electromagnetic force between the rotor and stator is controlled in order to reverse the direction of motion of the workpiece along the first scan path, and wherein the control is based, at least in part, on the sensed position of the workpiece. The stator further rotates about the first axis in reaction to the rotation of the rotor, particularly in the reversal of direction of motion of the workpiece, thus acting as a reaction mass to the rotation of one or more of the rotor, scan arm, and workpiece.
摘要翻译：提供一种用于通过离子束在扫描臂上相互传送工件的方法，其中扫描臂可操作地联接到包括转子和定子的电机，所述电机可独立地围绕第一轴线旋转。施加在转子和定子之间的电磁力使转子围绕第一轴旋转并且使工件沿着第一扫描路径平移通过离子束。感测工件的位置并且控制转子与定子之间的电磁力以便沿着第一扫描路径反转工件的运动方向，并且其中控制至少部分地基于感测的工件的位置。定子进一步围绕第一轴线旋转，以响应转子的旋转，特别是在工件的运动方向的反转中，因此用作对转子，扫描臂和旋转臂中的一个或多个的旋转的反作用物质。工件

4. 发明申请

WO2006133038A2 PARTICULATE PREVENTION IN ION IMPLANTATION 审中-公开
标题翻译：离子注入中的颗粒预防
公开(公告)号：WO2006133038A2
公开(公告)日：2006-12-14
申请号：PCT/US2006/021643
申请日：2006-06-02
申请人： AXCELIS TECHNOLOGIES, INC. , VANDERPOT, John , BERRIAN, Donald
发明人： VANDERPOT, John , BERRIAN, Donald
IPC分类号： H01J37/317 , H01J37/08 , H01J37/304
CPC分类号： H01J37/244 , H01J37/045 , H01J37/09 , H01J37/302 , H01J37/3171 , H01J2237/022 , H01J2237/026 , H01J2237/028 , H01J2237/30433 , H01J2237/31705
摘要： A system and method for mitigating contamination in an ion implantation system is provided. The system comprises an ion source, a power supply operable to supply power to a filament and mirror electrode of the ion source, a workpiece handling system, and a controller, wherein the ion source is selectively tunable via the controller to provide rapid control of a formation of an ion beam. The controller is operable to selectively rapidly control power to the ion source, therein modulating a power of the ion beam between an implantation power and a minimal power in less than approximately 20 microseconds based, at least in part, to a signal associated with a workpiece position. Control of the ion source therefore mitigates particle contamination in the ion implantation system by minimizing an amount of time at which the ion beam is at the implantation current.
摘要翻译：提供了一种减轻离子注入系统污染的系统和方法。该系统包括离子源，可操作以向离子源的细丝和反射镜电极供电的电源，工件处理系统和控制器，其中离子源可经由控制器选择性地调节以提供快速控制形成离子束。控制器可操作以选择性地快速地控制离子源的功率，其中至少部分地基于与工件相关联的信号，在小于约20微秒内在注入功率和最小功率之间调制离子束的功率位置。因此，离子源的控制因此通过使离子束处于注入电流的时间量最小化来减轻离子注入系统中的颗粒污染。

5. 发明申请

WO1997005298A1 TITANIUM-BASED FILMS FORMED BY CHEMICAL VAPOR DEPOSITION 审中-公开
标题翻译：通过化学蒸气沉积形成的基于钛的薄膜
公开(公告)号：WO1997005298A1
公开(公告)日：1997-02-13
申请号：PCT/US1996012589
申请日：1996-07-31
申请人： MULTILEVEL METALS, INC. , KAIM, Robert , VANDERPOT, John, W.
发明人： MULTILEVEL METALS, INC.
IPC分类号： C23C16/34
CPC分类号： H01L21/76862 , C23C16/14 , C23C16/34 , C23C16/42 , H01L21/76841 , H01L21/76843
摘要： A gaseous mixture of a titanium halide and silane is introduced to a plasma or thermal CVD reactor to induce a reaction such that a conformal and pure titanium film is deposided onto a semiconductor device within the reactor. The titanium halide has a chemical form of TiX4, where X is a halogen. Other gaseous mixtures of the titanium halide and silane are subjected to plasma or thermal CVD to induce a reaction to deposit titanium silicide films onto the semiconductor device. Hydrogen is sometimes added to the gaseous mixture as a reactant to reduce the silicon content in the resulting titanium silicide layer. Other gaseous combinations of the titanium halide, ammonia, hydrogen, a halogen and silane are subjected to plasma or thermal CVD to induce a reaction to deposit titanium silicide and titanium nitride films onto the semiconductor device. Successive CVD processes create bilayers of TiSix/TiN or Ti/TiN, and/or trilayers of TiSix/Ti/TiN onto the semiconductor device. The invention also includes processes and systems for depositing a titanium-based semiconductor film onto a workpiece surface. A gaseous flow is created and includes a titanium tetrahalide and a hydrogen-bearing gas that is reactive with the titanium halide. This flow is transformed through chemical vapor deposition to deposit the titanium-based film onto the surface. To anneal, the titanium halide is inhibited from the flow so as to remove residual halogen atoms from the surface. The invention provides for annealing of Ti, TiN films, as well as bilayers such as Ti/TiSi2. Plasma and/or thermal CVD are used.
摘要翻译：将钛卤化物和硅烷的气体混合物引入等离子体或热CVD反应器以引起反应，使得保形和纯钛膜沉积在反应器内的半导体器件上。钛卤化物具有化学形式的TiX4，其中X是卤素。将卤化钛和硅烷的其它气体混合物进行等离子体或热CVD以引起将硅化钛膜沉积到半导体器件上的反应。有时将氢气作为反应物加入到气态混合物中以降低所得钛硅化物层中的硅含量。将卤化钛，氨，氢，卤素和硅烷的其它气体组合进行等离子体或热CVD以引起将硅化钛和氮化钛膜沉积到半导体器件上的反应。连续CVD工艺将TiSix / TiN或Ti / TiN的双层和/或TiSix / Ti / TiN的三层制造到半导体器件上。本发明还包括将钛基半导体膜沉积到工件表面上的工艺和系统。产生气流并且包括四卤化钛和与卤化钛反应的含氢气体。该流动通过化学气相沉积转化，以将钛基膜沉积在表面上。为了退火，卤化钛从流动中被抑制，从而从表面去除残留的卤素原子。本发明提供Ti，TiN膜以及Ti / TiSi 2等双层的退火。使用等离子体和/或热CVD。

6. 发明申请

WO1987006391A1 ION BEAM SCANNING METHOD AND APPARATUS 审中-公开
标题翻译：离子束扫描方法和装置
公开(公告)号：WO1987006391A1
公开(公告)日：1987-10-22
申请号：PCT/US1987000804
申请日：1987-04-08
申请人： ECLIPSE ION TECHNOLOGY, INC. , BERRIAN, Donald, W. , KAIM, Robert, E. , VANDERPOT, John, W.
发明人： ECLIPSE ION TECHNOLOGY, INC.
IPC分类号： H01J37/08
CPC分类号： H01J37/304 , H01J37/147 , H01J37/3171 , H01J2237/31703
摘要： An ion beam scanning method and apparatus produces a parallel scanned ion beam (12) with a magnetic deflector (26) having in one instance wedge-shaped pole pieces (28, 30) that develop a uniform magnetic field. A beam accelerator (68) for the scanned beam has a slot-shaped passage (42a, 44a) which the scanned beam traverses. The beam scan and the beam traverse over a target object (64) are controlled to attain selected beam current, and correspondingly ion dose, on a target object.
摘要翻译：离子束扫描方法和装置产生具有磁导流器（26）的平行扫描离子束（12），该偏转器在一个实例中形成均匀磁场的楔形极片（28,30）。用于扫描光束的光束加速器（68）具有扫描光束横穿的槽形通道（42a，44a）。控制束扫描和穿过目标物体（64）的光束，以获得目标物体上的所选束流，并相应地离子剂量。

7. 发明申请

WO2006133040A3 CHARGED BEAM DUMP AND PARTICLE ATTRACTOR 审中-公开
标题翻译：充电梁和颗粒吸引器
公开(公告)号：WO2006133040A3
公开(公告)日：2007-04-12
申请号：PCT/US2006021646
申请日：2006-06-02
申请人： AXCELIS TECH INC , VANDERPOT JOHN , HUANG YONGZHANG
发明人： VANDERPOT JOHN , HUANG YONGZHANG
IPC分类号： H01J37/317 , H01J37/244
CPC分类号： H01J37/244 , H01J37/045 , H01J37/09 , H01J37/302 , H01J37/3171 , H01J2237/022 , H01J2237/026 , H01J2237/028 , H01J2237/30433 , H01J2237/31705
摘要： A system, method, and apparatus for mitigating contamination during ion implantation are provided. An ion source (112) , end station (117) , and mass analyzer (106) positioned between the ion source and the end station are provided, wherein an ion beam (110) is formed from the ion source and travels through the mass analyzer to the end station. An ion beam dump assembly comprising a particle collector, particle attractor, and shield are associated with the mass analyzer, wherein an electrical potential of the particle attractor is operable to attract and constrain contamination particles within the particle collector, and wherein the shield is operable to shield the electrical potential of the particle attractor from an electrical potential of an ion beam within the mass analyzer.
摘要翻译：提供了一种用于减少离子注入期间污染的系统，方法和装置。提供了一种位于离子源和终端之间的离子源（112），端站（117）和质量分析器（106），其中离子束（110）由离子源形成并且通过质量分析器到终点站。包括粒子收集器，颗粒吸引子和屏蔽的离子束转储组件与质量分析器相关联，其中，所述粒子吸引子的电位可操作以吸引和约束所述颗粒收集器内的污染颗粒，并且其中所述屏蔽件可操作为屏蔽质子分析仪内离子束电位的吸引子的电位。

8. 发明申请

WO2006133041A2 BEAM STOP AND BEAM TUNING METHODS 审中-公开
标题翻译：梁停止和波束调谐方法
公开(公告)号：WO2006133041A2
公开(公告)日：2006-12-14
申请号：PCT/US2006/021647
申请日：2006-06-02
申请人： AXCELIS TECHNOLOGIES, INC. , VANDERPOT, John , HUANG, YongZhang
发明人： VANDERPOT, John , HUANG, YongZhang
IPC分类号： H01J37/244
CPC分类号： H01J37/244 , H01J37/045 , H01J37/09 , H01J37/302 , H01J37/3171 , H01J2237/022 , H01J2237/026 , H01J2237/028 , H01J2237/30433 , H01J2237/31705
摘要： A system, method, and apparatus for mitigating contamination associated with ion implantation are provided. An ion source, end station, and mass analyzer positioned between the ion source and the end station are provided, wherein an ion beam is formed from the ion source and selectively travels through the mass analyzer to the end station, based on a position of a beam stop assembly. The beam stop assembly selectively prevents the ion beam from entering and/or exiting the mass analyzer, therein minimizing contamination associated with an unstable ion source during transition periods such as a start-up of the ion implantation system.
摘要翻译：提供了用于减轻与离子注入相关的污染的系统，方法和装置。提供了一种位于离子源和终端之间的离子源，终端站和质量分析器，其中离子源由离子源形成，并且基于位置，选择性地通过质量分析器传送到终端站光束停止组件。束停止组件选择性地防止离子束进入和/或离开质量分析器，其中最小化在诸如离子注入系统的启动的过渡期间与不稳定离子源相关联的污染。

9. 发明申请

WO2005097640A3 METHOD FOR RECIPROCATING A WORKPIECE THROUGH AN ION BEAM 审中-公开
标题翻译：通过离子束接收工件的方法
公开(公告)号：WO2005097640A3
公开(公告)日：2005-12-08
申请号：PCT/US2005011581
申请日：2005-04-05
申请人： AXCELIS TECH INC , VANDERPOT JOHN , POLLACK JOHN , BERRIAN DONALD
发明人： VANDERPOT JOHN
IPC分类号： A61N5/00 , B65H1/00 , H01J37/317 , H01L21/00 , H01L21/687
CPC分类号： H01J37/20 , H01J37/3171 , H01J2237/0216 , H01J2237/20228 , H01J2237/20292 , H01J2237/31703 , H01L21/67069 , H01L21/67259 , H01L21/68764 , H01L21/68792
摘要： A method for reciprocally transporting a workpiece on a scan arm through an ion beam is provided, wherein the scan arm is operable coupled to a motor comprising a rotor and stator that are individually rotatable about a first axis. An electromagnetic force applied between the rotor and stator rotates the rotor about the first axis and translates the workpiece through the ion beam along a first scan path. A position of the workpiece is sensed and the electromagnetic force between the rotor and stator is controlled in order to reverse the direction of motion of the workpiece along the first scan path, and wherein the control is based, at least in part, on the sensed position of the workpiece. The stator further rotates about the first axis in reaction to the rotation of the rotor, particularly in the reversal of direction of motion of the workpiece, thus acting as a reaction mass to the rotation of one or more of the rotor, scan arm, and workpiece.
摘要翻译：提供了一种用于通过离子束在扫描臂上往复运输工件的方法，其中扫描臂可操作地联接到包括转子和定子的电动机，所述电动机可以围绕第一轴线单独地旋转。施加在转子和定子之间的电磁力围绕第一轴线旋转转子，并使工件沿第一扫描路径平移离子束。感测工件的位置，并且控制转子和定子之间的电磁力以便沿着第一扫描路径反转工件的运动方向，并且其中控制至少部分地基于感测到的工件位置。定子进一步围绕第一轴线转动，以反应转子的旋转，特别是在反转工件的运动方向上，从而作为与转子，扫描臂和转子中的一个或多个的旋转反应的质量工件。

10. 发明申请

WO2006133041A3 BEAM STOP AND BEAM TUNING METHODS 审中-公开
标题翻译：梁停止和光束调谐方法
公开(公告)号：WO2006133041A3
公开(公告)日：2007-11-22
申请号：PCT/US2006021647
申请日：2006-06-02
申请人： AXCELIS TECH INC , VANDERPOT JOHN , HUANG YONGZHANG
发明人： VANDERPOT JOHN , HUANG YONGZHANG
IPC分类号： H01J37/244
CPC分类号： H01J37/244 , H01J37/045 , H01J37/09 , H01J37/302 , H01J37/3171 , H01J2237/022 , H01J2237/026 , H01J2237/028 , H01J2237/30433 , H01J2237/31705
摘要： A system, method, and apparatus for mitigating contamination associated with ion implantation are provided. An ion source (208), end station(210), and mass analyzer (204) positioned between the ion source and the end station are provided, wherein an ion beam is formed from the ion source and selectively travels through the mass analyzer to the end station, based on a position of a beam stop assembly (220). The beam stop assembly selectively prevents the ion beam from entering and/or exiting the mass analyzer, therein minimizing contamination associated with an unstable ion source during transition periods such as a start-up of the ion implantation system.
摘要翻译：提供了用于减轻与离子注入相关的污染的系统，方法和装置。提供了一种位于离子源和终端之间的离子源（208），终端站（210）和质量分析器（204），其中离子束由离子源形成并选择性地通过质量分析器传送到终端站，基于梁挡块组件（220）的位置。光束停止组件选择性地防止离子束进入和/或离开质量分析器，其中在诸如离子注入系统的启动的过渡期间最小化与不稳定离子源相关联的污染。

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