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1. 发明申请

WO2011021160A3 METHOD AND APPARATUS FOR MEASURING WAFER BIAS POTENTIAL 审中-公开
标题翻译：测量晶片偏置电位的方法和装置
公开(公告)号：WO2011021160A3
公开(公告)日：2011-08-11
申请号：PCT/IB2010053735
申请日：2010-08-18
申请人： LAM RES CORP , LAM RES AG , MAKHRATCHEV KONSTANTIN , VALCORE JOHN
发明人： MAKHRATCHEV KONSTANTIN , VALCORE JOHN
IPC分类号： H01L21/3065 , H01L21/205 , H01L21/66
CPC分类号： H01J37/32642 , H01J37/32935
摘要： A device for use in a wafer processing chamber having a plasma forming volume and a hot edge ring. The hot edge ring has a first surface and a second surface. The first surface is in contact with the plasma forming volume. The second surface is not in contact with the plasma forming volume. The device includes a detector operable to contact the second surface of the hot edge ring. The detector can detect a parameter of the hot edge ring and can provide a detected signal based on the detected parameter.
摘要翻译：一种用于具有等离子体形成体积和热边缘环的晶片处理室中的装置。热边缘环具有第一表面和第二表面。第一表面与等离子体形成体积接触。第二表面不与等离子体形成体积接触。该装置包括可操作以接触热边缘环的第二表面的检测器。检测器可以检测热边缘环的参数并且可以基于检测到的参数提供检测到的信号。

2. 发明申请

WO2011021160A2 METHOD AND APPARATUS FOR MEASURING WAFER BIAS POTENTIAL 审中-公开
标题翻译：测量水平偏移的方法和装置
公开(公告)号：WO2011021160A2
公开(公告)日：2011-02-24
申请号：PCT/IB2010/053735
申请日：2010-08-18
申请人： LAM RESEARCH CORPORATION , LAM RESEARCH AG , MAKHRATCHEV, Konstantin , VALCORE, John
发明人： MAKHRATCHEV, Konstantin , VALCORE, John
CPC分类号： H01J37/32642 , H01J37/32935
摘要： A device for use in a wafer processing chamber having a plasma forming volume and a hot edge ring. The hot edge ring has a first surface and a second surface. The first surface is in contact with the plasma forming volume. The second surface is not in contact with the plasma forming volume. The device includes a detector operable to contact the second surface of the hot edge ring. The detector can detect a parameter of the hot edge ring and can provide a detected signal based on the detected parameter.
摘要翻译：一种用于具有等离子体形成体积和热边缘环的晶片处理室中的装置。热边缘环具有第一表面和第二表面。第一表面与等离子体形成体积接触。第二表面不与等离子体形成体积接触。该装置包括可操作以接触热边缘环的第二表面的检测器。检测器可以检测热边缘环的参数，并可以根据检测到的参数提供检测信号。

3. 发明申请

WO2010128432A2 NON-DESTRUCTIVE SIGNAL PROPAGATION SYSTEM AND METHOD TO DETERMINE SUBSTRATE INTEGRITY 审中-公开
标题翻译：非破坏性信号传播系统和确定基板完整性的方法
公开(公告)号：WO2010128432A2
公开(公告)日：2010-11-11
申请号：PCT/IB2010/051855
申请日：2010-04-28
申请人： LAM RESEARCH CORPORATION , LAM RESEARCH AG , VALCORE, John
发明人： VALCORE, John
IPC分类号： H01L21/66 , G01N29/12
CPC分类号： G01N29/11 , G01N29/075 , G01N29/2475 , G01N2291/044 , G01N2291/106 , G01N2291/2697 , H01L22/12
摘要： In various exemplary embodiments described herein, a system and associated method relate to non-destructive signal propagation to detect one or more defects in a substrate. The system can be built into a semiconductor process tool such as a substrate handling mechanism. The system comprises a transducer configured to convert one or more frequencies from an electrical signal into at least one mechanical pulse. The mechanical pulse is coupled to the substrate through the substrate handling mechanism. A plurality of sensors is positioned distal to the transducer and configured to be coupled, acoustically or mechanically, to the substrate. The plurality of distal sensors is further configured to detect both the mechanical pulse and any distortions to the pulse. A signal analyzer is coupled to the plurality of distal sensors to compare the detected pulse and any distortions to the pulse with a baseline response.
摘要翻译：在本文描述的各种示例性实施例中，系统和相关联的方法涉及非破坏性信号传播以检测衬底中的一个或多个缺陷。该系统可以内置在诸如基板处理机构的半导体处理工具中。该系统包括被配置为将一个或多个频率从电信号转换成至少一个机械脉冲的换能器。机械脉冲通过基板处理机构耦合到基板。多个传感器位于换能器的远侧并且被配置为与声学或机械地耦合到基底。多个远端传感器还被配置为检测机械脉冲和对脉冲的任何失真。信号分析器耦合到多个远端传感器，以将检测到的脉冲和具有基线响应的脉冲的任何失真进行比较。

4. 发明申请

WO2011063262A3 METHODS AND APPARATUS FOR DETECTING THE CONFINEMENT STATE OF PLASMA IN A PLASMA PROCESSING SYSTEM 审中-公开
公开(公告)号：WO2011063262A3
公开(公告)日：2011-05-26
申请号：PCT/US2010/057478
申请日：2010-11-19
申请人： LAM RESEARCH CORPORATION , VALCORE, John, C., Jr. , ROGERS, James
发明人： VALCORE, John, C., Jr. , ROGERS, James
IPC分类号： H01L21/66 , H01L21/3065 , H01L21/687
摘要： Methods and systems for detecting a change in the state of plasma confinement within a capacitively coupled RF driven plasma processing chamber are disclosed. In one or more embodiments, the plasma unconfinement detection methods employ an analog or digital circuit that can actively poll the RF voltage at the powered electrode in the form of an Electrostatic Chuck(ESC) as well as the open loop response of the power supply(PSU) responsible for chucking a wafer to ESC. The circuit provides a means detecting both a change in RF voltage delivered to the ESC as well as a change in the open loop response of the PSU. By simultaneously monitoring these electrical signals, the disclosed algorithm can detect when plasma changes from a confined to an unconfined state.

5. 发明申请

WO2010128432A3 NON-DESTRUCTIVE SIGNAL PROPAGATION SYSTEM AND METHOD TO DETERMINE SUBSTRATE INTEGRITY 审中-公开
标题翻译：非破坏性信号传播系统和确定基板完整性的方法
公开(公告)号：WO2010128432A3
公开(公告)日：2011-03-03
申请号：PCT/IB2010051855
申请日：2010-04-28
申请人： LAM RES CORP , LAM RES AG , VALCORE JOHN
发明人： VALCORE JOHN
IPC分类号： H01L21/66 , G01N29/12
CPC分类号： G01N29/11 , G01N29/075 , G01N29/2475 , G01N2291/044 , G01N2291/106 , G01N2291/2697 , H01L22/12
摘要： In various exemplary embodiments described herein, a system and associated method relate to non-destructive signal propagation to detect one or more defects in a substrate. The system can be built into a semiconductor process tool such as a substrate handling mechanism. The system comprises a transducer configured to convert one or more frequencies from an electrical signal into at least one mechanical pulse. The mechanical pulse is coupled to the substrate through the substrate handling mechanism. A plurality of sensors is positioned distal to the transducer and configured to be coupled, acoustically or mechanically, to the substrate. The plurality of distal sensors is further configured to detect both the mechanical pulse and any distortions to the pulse. A signal analyzer is coupled to the plurality of distal sensors to compare the detected pulse and any distortions to the pulse with a baseline response.
摘要翻译：在本文描述的各种示例性实施例中，系统和相关联的方法涉及非破坏性信号传播以检测衬底中的一个或多个缺陷。该系统可以内置在诸如基板处理机构的半导体处理工具中。该系统包括被配置为将一个或多个频率从电信号转换成至少一个机械脉冲的换能器。机械脉冲通过基板处理机构耦合到基板。多个传感器位于换能器的远侧并且被配置为与声学或机械地耦合到基底。多个远端传感器还被配置为检测机械脉冲和对脉冲的任何失真。信号分析器耦合到多个远端传感器，以将检测到的脉冲和具有基线响应的脉冲的任何失真进行比较。

6. 发明申请

WO2011063262A2 METHODS AND APPARATUS FOR DETECTING THE CONFINEMENT STATE OF PLASMA IN A PLASMA PROCESSING SYSTEM 审中-公开
标题翻译：用于检测等离子体处理系统中等离子体约束状态的方法和装置
公开(公告)号：WO2011063262A2
公开(公告)日：2011-05-26
申请号：PCT/US2010057478
申请日：2010-11-19
申请人： LAM RES CORP , VALCORE JOHN C JR , ROGERS JAMES
发明人： VALCORE JOHN C JR , ROGERS JAMES
IPC分类号： H01L21/66 , H01L21/3065 , H01L21/687
CPC分类号： G01N27/62
摘要： Methods and systems for detecting a change in the state of plasma confinement within a capacitively coupled RF driven plasma processing chamber are disclosed. In one or more embodiments, the plasma unconfinement detection methods employ an analog or digital circuit that can actively poll the RF voltage at the powered electrode in the form of an Electrostatic Chuck(ESC) as well as the open loop response of the power supply(PSU) responsible for chucking a wafer to ESC. The circuit provides a means detecting both a change in RF voltage delivered to the ESC as well as a change in the open loop response of the PSU. By simultaneously monitoring these electrical signals, the disclosed algorithm can detect when plasma changes from a confined to an unconfined state.
摘要翻译：公开了用于检测电容耦合的RF驱动的等离子体处理室内的等离子体约束的状态变化的方法和系统。在一个或多个实施例中，等离子体非限制检测方法采用模拟或数字电路，其可以以静电卡盘（ESC）的形式主动轮询加电电极处的RF电压以及电源的开环响应（ PSU）负责将晶圆夹持到ESC。该电路提供了检测传递给ESC的RF电压的变化以及PSU的开环响应的变化的手段。通过同时监测这些电信号，所公开的算法可以检测等离子体何时从受限状态变为非受约束状态。

7. 发明申请

WO2011050117A3 SYSTEM AND METHOD FOR WAFER CARRIER VIBRATION REDUCTION 审中-公开
公开(公告)号：WO2011050117A3
公开(公告)日：2011-04-28
申请号：PCT/US2010/053455
申请日：2010-10-21
申请人： LAM RESEARCH CORPORATION , VALCORE, John , LITVAK, Valeriy , CYTERSKI, Christine
发明人： VALCORE, John , LITVAK, Valeriy , CYTERSKI, Christine
IPC分类号： H01L21/677 , B65G49/07 , H01L21/673 , H01L21/304
摘要： An aspect of the present invention provides a system and method for controlling a wafer cleaning system having a wafer carrier and a driving portion. The wafer carrier can move along a path in a first direction and a second direction. The driving portion can controllably move the wafer carrier in the first direction and the second direction. The control system includes a vibration sensor portion and a wafer carrier position controller. The vibration sensor portion can detect vibration of the wafer carrier and can output a vibration signal based on the detected vibration. The wafer carrier position controller can instruct the driving portion to modify motion of the wafer carrier based on the vibration signal to reduce the detected vibration.

8. 发明申请

WO2011050117A2 SYSTEM AND METHOD FOR WAFER CARRIER VIBRATION REDUCTION 审中-公开
标题翻译：用于晶片载波振动减小的系统和方法
公开(公告)号：WO2011050117A2
公开(公告)日：2011-04-28
申请号：PCT/US2010053455
申请日：2010-10-21
申请人： LAM RES CORP , VALCORE JOHN , LITVAK VALERIY , CYTERSKI CHRISTINE
发明人： VALCORE JOHN , LITVAK VALERIY , CYTERSKI CHRISTINE
IPC分类号： H01L21/677 , B65G49/07 , H01L21/304 , H01L21/673
CPC分类号： H01L21/67259 , H01L21/67028 , H01L21/67253
摘要： An aspect of the present invention provides a system and method for controlling a wafer cleaning system having a wafer carrier and a driving portion. The wafer carrier can move along a path in a first direction and a second direction. The driving portion can controllably move the wafer carrier in the first direction and the second direction. The control system includes a vibration sensor portion and a wafer carrier position controller. The vibration sensor portion can detect vibration of the wafer carrier and can output a vibration signal based on the detected vibration. The wafer carrier position controller can instruct the driving portion to modify motion of the wafer carrier based on the vibration signal to reduce the detected vibration.
摘要翻译：本发明的一个方面提供了一种用于控制具有晶片载体和驱动部分的晶片清洁系统的系统和方法。晶片载体可以沿第一方向和第二方向的路径移动。驱动部分可以在第一方向和第二方向上可控制地移动晶片载体。控制系统包括振动传感器部分和晶片载体位置控制器。振动传感器部分可以检测晶片载体的振动，并且可以基于检测到的振动输出振动信号。晶圆承载器位置控制器可以指示驱动部分基于振动信号来修改晶圆承载器的运动，以减少检测到的振动。

9. 发明申请

WO2011011266A2 SYSTEM AND METHOD FOR PLASMA ARC DETECTION, ISOLATION AND PREVENTION 审中-公开
标题翻译：用于等离子体电弧检测，隔离和预防的系统和方法
公开(公告)号：WO2011011266A2
公开(公告)日：2011-01-27
申请号：PCT/US2010/042205
申请日：2010-07-16
申请人： LAM RESEARCH CORPORATION , VALCORE, John C. Jr , SANTOS, Ed
发明人： VALCORE, John C. Jr , SANTOS, Ed
IPC分类号： H05H1/46 , H01L21/3065
CPC分类号： H01J37/3299 , H01J37/32091 , H01J37/32174 , H01J37/32935
摘要： A device for use with an RF generating source, a first electrode, a second electrode and an element. The RF generating source is operable to provide an RF signal to the first electrode and thereby create a potential between the first electrode and the second electrode. The device comprises a connecting portion and a current sink. The connecting portion is operable to electrically connect to one of the first electrode, the second electrode and an element. The current sink is in electrical connection with the connection portion and a path to ground. The current sink comprises a voltage threshold. The current sink is operable to conduct current from the connecting portion to ground when a voltage on the electrically connected one of the first electrode, the second electrode and the element is greater than the voltage threshold.
摘要翻译：用于与RF发生源，第一电极，第二电极和元件一起使用的装置。 RF生成源可操作用于向第一电极提供RF信号，从而在第一电极和第二电极之间产生电势。该装置包括连接部分和电流接收器。连接部分可操作以电连接到第一电极，第二电极和元件中的一个。电流接收器与连接部分和通往地面的路径电连接。电流吸收器包含电压阈值。当第一电极，第二电极和元件中的电连接的一个上的电压大于电压阈值时，电流吸收器可操作以将电流从连接部分传导到地。

10. 发明申请

WO2011011266A3 SYSTEM AND METHOD FOR PLASMA ARC DETECTION, ISOLATION AND PREVENTION 审中-公开
标题翻译：用于血浆ARC检测，分离和预防的系统和方法
公开(公告)号：WO2011011266A3
公开(公告)日：2011-04-21
申请号：PCT/US2010042205
申请日：2010-07-16
申请人： LAM RES CORP , VALCORE JOHN C JR , SANTOS ED
发明人： VALCORE JOHN C JR , SANTOS ED
IPC分类号： H05H1/46 , H01L21/3065
CPC分类号： H01J37/3299 , H01J37/32091 , H01J37/32174 , H01J37/32935
摘要： A device for use with an RF generating source, a first electrode, a second electrode and an element. The RF generating source is operable to provide an RF signal to the first electrode and thereby create a potential between the first electrode and the second electrode. The device comprises a connecting portion and a current sink. The connecting portion is operable to electrically connect to one of the first electrode, the second electrode and an element. The current sink is in electrical connection with the connection portion and a path to ground. The current sink comprises a voltage threshold. The current sink is operable to conduct current from the connecting portion to ground when a voltage on the electrically connected one of the first electrode, the second electrode and the element is greater than the voltage threshold.
摘要翻译：一种用于RF发生源，第一电极，第二电极和元件的装置。 RF产生源可操作以向第一电极提供RF信号，从而在第一电极和第二电极之间产生电位。该装置包括连接部分和电流槽。连接部分可操作以电连接到第一电极，第二电极和元件之一。电流吸收器与连接部分和接地路径电连接。电流吸收器包括电压阈值。当第一电极，第二电极和元件上的电连接的电压上的电压大于电压阈值时，电流吸收器可操作以将电流从连接部分传导到地。

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