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    • 4. 发明申请
    • A METHOD FOR DEPOSITING MULTILAYER COATINGS
    • 一种沉积多层涂层的方法
    • WO2004029324A1
    • 2004-04-08
    • PCT/GB2003/004189
    • 2003-09-26
    • APPLIED MULTILAYERS LTDTEER, Dennis
    • TEER, Dennis
    • C23C14/35
    • H01J37/3447C23C14/3492C23C14/352C23C14/505C23C14/568H01J37/3405
    • The invention relates to a method and apparatus for the generation of multilayered coatings onto substrates. Typically the apparatus used is a closed field unbalanced magnetron configuration in conjunction with one or more cylindrical and rotatable shields and a substrate carrier on which the substrates to be coated are carried. The shields and substrate holder are provided for rotation about a common axis of rotation. The shields are provided with apertures to allow the selective positioning of the apertures to define a passage or passages along which material from the targets can pass onto the substrates. The targets can be cleaned prior to the coating stage by operation of the targets with the shields selectively positioned to prevent the deposited material from reaching the substrates.
    • 本发明涉及一种用于在基底上产生多层涂层的方法和装置。 所使用的装置通常是与一个或多个圆柱形和可旋转的屏蔽件相结合的封闭场不平衡磁控管结构以及载置待涂覆的基板的基板载体。 屏蔽件和基板保持器设置成围绕公共旋转轴线旋转。 屏蔽件设置有孔,以允许孔的选择性定位以限定通道或通道,沿着该通道或通道将来自靶的材料沿着该通道或通道传播到基底上。 目标可以在涂覆阶段之前通过操作目标而被清洁,其中屏蔽件被选择性地定位以防止沉积的材料到达基底。
    • 5. 发明申请
    • CARBON COATINGS, METHOD AND APPARATUS FOR APPLYING THEM, AND ARTICLES BEARING SUCH COATINGS
    • 碳涂料,应用它们的方法和装置以及承载这种涂料的制品
    • WO9927893B1
    • 1999-10-07
    • PCT/GB9803596
    • 1998-12-02
    • TEER COATINGS LTDTEER DENNIS GERALDCAMINO DIDIERJONES ANDREW HARRY SPENCER
    • TEER DENNIS GERALDCAMINO DIDIERJONES ANDREW HARRY SPENCER
    • C23C14/06C23C14/32
    • C23C14/0605C23C14/32Y10T428/24975Y10T428/265Y10T428/30Y10T428/31678
    • Articles are disclosed which bear a carbon coating layer, wherein carbon-carbon bonding within the coating layer is mostly of the sp2 form: wherein the coating has a specific wear rate under wet conditions of less than 10 m /Nm: wherein the coating has an adhesion critical load of at least 70N: wherein the coating has a hardness of at least 1000 VHN: wherein the coating has a coefficient of friction (dry) of not more than 01. The coating may be a multi-layer coating containing successive metal-containing and carbon layers. The article may be constituted as a medical prosthesis. Methods are disclosed of forming hard wear resistant carbon coatings by sputter ion plating with at least one carbon target in which an ion current density of for example above 0.5mA/cm is applied at the substrate to be coated in order to deposit a carbon-containing coating layer and/or which comprise sputter ion plating with at least one carbon target and at least one metal target in order to deposit a carbon coating layer and a metal-containing coating layer. Coating apparatus suitably comprises magnetron sputter ion plating apparatus having at least one metal-donating target and at least one carbon-donating target. Such apparatus may include at least two magnetrons arranged to generate a magnetic field between them with field lines extending from one magnetron to the or another, and the magnetrons, and field lines extending directly from one magnetron to the or another, form a barrier which tends to prevent the escape of electrons from within a plasma-containing working space within which the substrate is coated.
    • 公开了一种具有碳涂层的制品,其中涂层内的碳 - 碳键合大部分为sp2形式:其中该涂层在湿度小于10 -6 m 3 / Nm:其中所述涂层具有至少70N的粘附临界载荷:其中所述涂层具有至少1000HVN的硬度:其中所述涂层具有不大于0.01的摩擦系数(干燥)。所述涂层可以是多 包含连续的含金属和碳层的层涂层。 该物品可以构成为医疗假体。 公开了通过溅射离子电镀形成硬质耐磨碳涂层的方法,其中至少一个碳靶,其中在待涂覆的基底上施加例如高于0.5mA / cm 2的离子电流密度以沉积 含碳涂层和/或包括用至少一种碳靶和至少一种金属靶溅射离子镀以沉积碳涂层和含金属的涂层。 涂布装置适合包括具有至少一种金属供体靶和至少一种碳供体靶的磁控溅射离子镀装置。 这样的装置可以包括至少两个磁控管,其布置成在它们之间产生磁场,其中磁场线从一个磁控管延伸到另一个磁控管,并且磁控管以及直接从一个磁控管延伸到另一磁控管的场线形成势垒 以防止电子从包含衬底的等离子体工作空间内逸出。
    • 9. 发明申请
    • CARBON COATINGS, METHOD AND APPARATUS FOR APPLYING THEM, AND ARTICLES BEARING SUCH COATINGS
    • 碳涂层,应用它们的方法和设备以及承载这种涂层的制品
    • WO9927893A3
    • 1999-09-02
    • PCT/GB9803596
    • 1998-12-02
    • TEER COATINGS LTDTEER DENNIS GERALDCAMINO DIDIERJONES ANDREW HARRY SPENCER
    • TEER DENNIS GERALDCAMINO DIDIERJONES ANDREW HARRY SPENCER
    • C23C14/06C23C14/32
    • C23C14/0605C23C14/32Y10T428/24975Y10T428/265Y10T428/30Y10T428/31678
    • Articles are disclosed which bear a carbon coating layer, wherein carbon-carbon bonding within the coating layer is mostly of the sp2 form: wherein the coating has a specific wear rate under wet conditions of less than 10 m /Nm: wherein the coating has an adhesion critical load of at least 70N: wherein the coating has a hardness of at least 1000 VHN: wherein the coating has a coefficient of friction (dry) of not more than 01. The coating may be a multi-layer coating containing successive metal-containing and carbon layers. The article may be constituted as a medical prosthesis. Methods are disclosed of forming hard wear resistant carbon coatings by sputter ion plating with at least one carbon target in which an ion current density of for example above 0.5mA/cm is applied at the substrate to be coated in order to deposit a carbon-containing coating layer and/or which comprise sputter ion plating with at least one carbon target and at least one metal target in order to deposit a carbon coating layer and a metal-containing coating layer. Coating apparatus suitably comprises magnetron sputter ion plating apparatus having at least one metal-donating target and at least one carbon-donating target. Such apparatus may include at least two magnetrons arranged to generate a magnetic field between them with field lines extending from one magnetron to the or another, and the magnetrons, and field lines extending directly from one magnetron to the or another, form a barrier which tends to prevent the escape of electrons from within a plasma-containing working space within which the substrate is coated.
    • 公开了带有碳涂层的制品,其中涂层内的碳 - 碳键主要为sp2形式:其中涂层在潮湿条件下的比磨损率小于10-16m3 / Nm:其中所述涂层具有至少70N的粘合临界负载:其中所述涂层具有至少1000VHN的硬度:其中所述涂层具有不大于01的摩擦系数(干)。所述涂层可以是多层 含有连续的含金属层和碳层的层涂层。 该物品可以构成为医疗假体。 公开了通过用至少一个碳靶进行溅射离子镀形成硬耐磨碳涂层的方法,其中在要涂覆的基板上施加例如0.5mA / cm 2以上的离子电流密度以沉积 含碳涂层和/或其包含用至少一个碳靶和至少一个金属靶进行溅射离子镀以沉积碳涂层和含金属涂层。 涂覆设备适合包括具有至少一个金属供体靶和至少一个供碳靶的磁控溅射离子镀设备。 这种装置可以包括至少两个磁控管,其被布置成在它们之间通过从一个磁控管延伸到另一个的磁场线产生磁场,并且磁控管和从一个磁控管直接延伸到另一个的磁场线形成势垒 以防止电子从衬底被涂覆的含等离子体的工作空间内逸出。