会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明申请
    • ELECTRODE ORIENTATION AND PARALLELISM ADJUSTMENT MECHANISM FOR PLASMA PROCESSING SYSTEMS
    • 用于等离子体处理系统的电极定向和平行调整机制
    • WO2009100288A2
    • 2009-08-13
    • PCT/US2009/033318
    • 2009-02-06
    • LAM RESEARCH CORPORATIONTAPPAN, James E.
    • TAPPAN, James E.
    • H05H1/34H01L21/30
    • H01J37/32568H01J37/32091
    • A mechanism for adjusting an orientation of an electrode in a plasma processing chamber is disclosed. The plasma processing chamber may be utilized to process at least a substrate, which may be inserted into the plasma processing chamber in an insertion direction. The mechanism may include a support plate disposed outside a chamber wall of the plasma processing chamber and pivoted relative to the chamber wall. The support plate may have a first thread. The mechanism may also include an adjustment screw having a second thread that engages the first thread. Turning the adjustment screw may cause translation of a portion of the support plate relative to the adjustment screw. The translation of the portion of the support plate may cause rotation of the support plate relative to the chamber wall, thereby rotating the electrode with respect to an axis that is orthogonal to the insertion direction.
    • 公开了一种用于调整等离子体处理室中的电极取向的机构。 等离子体处理室可以用于处理至少一个可以在插入方向上插入到等离子体处理室中的衬底。 该机构可以包括设置在等离子体处理室的室壁外部并相对于室壁枢转的支撑板。 支撑板可以具有第一螺纹。 该机构还可以包括具有接合第一螺纹的第二螺纹的调节螺钉。 转动调节螺钉可能导致支撑板的一部分相对于调节螺丝的平移。 支撑板的部分的平移可能导致支撑板相对于室壁的旋转,从而相对于与插入方向正交的轴线旋转电极。
    • 6. 发明申请
    • PLASMA PROCESSING SYSTEMS WITH MECHANISMS FOR CONTROLLING TEMPERATURES OF COMPONENTS
    • 具有控制组件温度的机构的等离子体处理系统
    • WO2009152259A2
    • 2009-12-17
    • PCT/US2009/046931
    • 2009-06-10
    • LAM RESEARCH CORPORATIONTAPPAN, James E.
    • TAPPAN, James E.
    • H01J37/32568H01J37/32522H01J37/32623
    • A plasma processing system with improved component temperature control is disclosed. The system may include a plasma processing chamber having a chamber wall. The system may also include an electrode disposed inside the plasma processing chamber. The system may also include a support member disposed inside the plasma processing chamber for supporting the electrode. The system may also include a support plate disposed outside the chamber wall. The system may also include a cantilever disposed through the chamber wall for coupling the support member with the support plate. The system may also include a lift plate disposed between the chamber wall and the support plate. The system may also include thermally resistive coupling mechanisms for mechanically coupling the lift plate with the support plate.
    • 公开了一种具有改进的部件温度控制的等离子体处理系统。 该系统可以包括具有室壁的等离子体处理室。 该系统还可以包括设置在等离子体处理室内部的电极。 该系统还可以包括设置在等离子体处理室内部用于支撑电极的支撑构件。 该系统还可以包括设置在室壁外部的支撑板。 该系统还可以包括通过室壁设置的用于将支撑构件与支撑板联接的悬臂。 该系统还可以包括设置在室壁和支撑板之间的提升板。 该系统还可以包括用于将升降板与支撑板机械联接的热阻耦合机构。
    • 7. 发明申请
    • ELECTRODE ORIENTATION AND PARALLELISM ADJUSTMENT MECHANISM FOR PLASMA PROCESSING SYSTEMS
    • 等离子体处理系统的电极取向和平行调节机制
    • WO2009100288A3
    • 2009-10-15
    • PCT/US2009033318
    • 2009-02-06
    • LAM RES CORPTAPPAN JAMES E
    • TAPPAN JAMES E
    • H05H1/34H01L21/3065
    • H01J37/32568H01J37/32091
    • A mechanism for adjusting an orientation of an electrode in a plasma processing chamber is disclosed. The plasma processing chamber may be utilized to process at least a substrate, which may be inserted into the plasma processing chamber in an insertion direction. The mechanism may include a support plate disposed outside a chamber wall of the plasma processing chamber and pivoted relative to the chamber wall. The support plate may have a first thread. The mechanism may also include an adjustment screw having a second thread that engages the first thread. Turning the adjustment screw may cause translation of a portion of the support plate relative to the adjustment screw. The translation of the portion of the support plate may cause rotation of the support plate relative to the chamber wall, thereby rotating the electrode with respect to an axis that is orthogonal to the insertion direction.
    • 公开了一种用于调整等离子体处理室中的电极的取向的机构。 等离子体处理室可以用于处理至少一个基板,该基板可以沿插入方向插入等离子体处理室中。 该机构可以包括设置在等离子体处理室的室壁外部并且相对于室壁枢转的支撑板。 支撑板可以具有第一螺纹。 该机构还可以包括具有接合第一螺纹的第二螺纹的调整螺钉。 转动调节螺钉可以引起支撑板的一部分相对于调节螺钉的平移。 支撑板的该部分的平移可以引起支撑板相对于腔室壁旋转,从而相对于与插入方向正交的轴旋转电极。
    • 9. 发明申请
    • PLASMA PROCESSING SYSTEMS WITH MECHANISMS FOR CONTROLLING TEMPERATURES OF COMPONENTS
    • 具有控制组件温度的机构的等离子体处理系统
    • WO2009152259A3
    • 2010-04-15
    • PCT/US2009046931
    • 2009-06-10
    • LAM RES CORPTAPPAN JAMES E
    • TAPPAN JAMES E
    • H01L21/3065
    • H01J37/32568H01J37/32522H01J37/32623
    • A plasma processing system with improved component temperature control is disclosed. The system may include a plasma processing chamber having a chamber wall. The system may also include an electrode disposed inside the plasma processing chamber. The system may also include a support member disposed inside the plasma processing chamber for supporting the electrode. The system may also include a support plate disposed outside the chamber wall. The system may also include a cantilever disposed through the chamber wall for coupling the support member with the support plate. The system may also include a lift plate disposed between the chamber wall and the support plate. The system may also include thermally resistive coupling mechanisms for mechanically coupling the lift plate with the support plate.
    • 公开了一种具有改进的部件温度控制的等离子体处理系统。 该系统可以包括具有室壁的等离子体处理室。 该系统还可以包括设置在等离子体处理室内部的电极。 该系统还可以包括设置在等离子体处理室内部用于支撑电极的支撑构件。 该系统还可以包括设置在室壁外部的支撑板。 该系统还可以包括通过室壁设置的用于将支撑构件与支撑板联接的悬臂。 该系统还可以包括设置在室壁和支撑板之间的提升板。 该系统还可以包括用于将升降板与支撑板机械联接的热阻耦合机构。