专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2006111766A2 METHODS AND APPARATUS FOR THE MANUFACTURE OF MICROSTRUCTURES 审中-公开
标题翻译：制备微结构的方法和装置
公开(公告)号：WO2006111766A2
公开(公告)日：2006-10-26
申请号：PCT/GB2006/001468
申请日：2006-04-21
申请人： 3T TECHNOLOGIES LIMITED , SPEAKMAN, Stuart, Philip
发明人： SPEAKMAN, Stuart, Philip
CPC分类号： G03F7/12 , B81C1/00428 , H01L27/1292 , H01L29/41733 , H01L29/42384 , H01L29/4908 , H01L29/66757 , H01L29/66765 , H01L29/78603 , H01L29/7869 , H01L51/0017
摘要： A method of manufacturing microstructures is disclosed, the method comprising a applying a mask to substrate; forming a pattern in the mask; processing the substrate according to the pattern; and mechanically removing the mask from the substrate. A polymer mask is disclosed for manufacturing micro scale structure, the polymer mask comprising a thin, preferably ultra thin flexible film. A method of manufacturing an integrated circuit is disclosed, the method comprising forming a plurality of isolated semiconductor devices on a common substrate; and connecting some of the devices. Apparatus for manufacturing microstructures is disclosed comprising: a mechanism for coating a mass substrate to create a structure; a mechanism for removing a mask from the substrate; and processing apparatus. A thin film transistor is disclosed comprising drain source and gate electrodes, the drain and source electrode being separated by a semiconductor, and the gate electrode being separated from the semiconductor by an insulator, comprising a bandgap alignment layer disposed between a semiconductor and the insulator.
摘要翻译：公开了一种制造微结构的方法，所述方法包括将掩模施加于基底; 在面具中形成图案; 根据图案处理基板; 并从衬底机械地去除掩模。公开了用于制造微尺度结构的聚合物掩模，聚合物掩模包括薄的，优选超薄的柔性膜。公开了一种制造集成电路的方法，所述方法包括在公共基板上形成多个隔离半导体器件; 并连接一些设备。公开了用于制造微结构的装置，包括：用于涂覆质量基底以产生结构的机构; 用于从基板去除掩模的机构; 和处理装置。公开了一种薄膜晶体管，其包括漏源极和栅电极，漏极和源极由半导体分隔开，并且栅电极通过绝缘体与半导体分离，包括设置在半导体和绝缘体之间的带隙对准层。

2. 发明申请

WO9919900A3 METHOD OF FORMING AN ELECTRONIC DEVICE 审中-公开
标题翻译：形成电子设备的方法
公开(公告)号：WO9919900A3
公开(公告)日：1999-08-05
申请号：PCT/GB9803087
申请日：1998-10-14
申请人： PATTERNING TECHNOLOGIES LTD , THIN FILM TECHNOLOGY CONSULTAN , SPEAKMAN STUART
发明人： SPEAKMAN STUART
IPC分类号： B41J2/01 , B41J2/14 , B41J3/407 , H01G4/06 , H01L21/00 , H01L21/44 , H01L27/00 , H01L27/32 , H01L29/49 , H01L35/34 , H01L51/00 , H01L51/05 , H01L51/10 , H01L51/30 , H01L51/40 , H01L51/42 , H01L51/50 , H01L51/52 , H01M2/10 , H01M6/18 , H01M6/40 , H01M10/052 , H01M10/0565 , H05K3/10 , H05K3/12 , C12Q1/00 , G02B6/30 , G02F1/136 , H01F10/00 , H01L21/3205 , H01L21/768 , H01L37/02 , H01L51/20
CPC分类号： H05K3/125 , B33Y10/00 , B33Y40/00 , B33Y70/00 , B33Y80/00 , B41J2/01 , B41J2/14233 , B41J3/407 , B41J3/4073 , H01L27/32 , H01L29/4908 , H01L35/34 , H01L51/0004 , H01L51/0005 , H01L51/0026 , H01L51/0508 , H01L51/0575 , H01L51/42 , H01L51/4213 , H01L51/424 , H01L51/4253 , H01L51/5012 , H01L51/5262 , H01L2251/308 , H01L2924/0002 , H01M2/1066 , H01M6/188 , H01M6/40 , H01M10/052 , H01M10/0565 , H05K3/102 , Y02E10/549 , Y02E60/122 , H01L2924/00
摘要： A method of forming an electronic device using the technique of drop on demand (ink-jet) printing to deposit droplets of deposition material, said method comprising depositing a plurality of droplets on a surface to form a patterned electronic device comprising multiple discrete portions.
摘要翻译：一种使用按需喷墨（喷墨）打印技术形成电子装置的方法，以沉积沉积材料的液滴，所述方法包括在表面上沉积多个液滴以形成包括多个分立部分的图案化电子装置。

3. 发明申请

WO1995007820A1 PASSIVATION OF CERAMIC PIEZOELECTRIC INK JET PRINT HEADS 审中-公开
标题翻译：陶瓷压电喷墨打印头的钝化
公开(公告)号：WO1995007820A1
公开(公告)日：1995-03-23
申请号：PCT/GB1994001977
申请日：1994-09-12
申请人： XAAR LIMITED , ASHE, James , PHILLIPS, Christopher, David , SPEAKMAN, Stuart
发明人： XAAR LIMITED
IPC分类号： B41J02/16
CPC分类号： B41J2/1642 , B41J2/1606 , B41J2/1609 , B41J2/1646
摘要： A process for the passivation of the channel walls of an ink jet print head channel of ceramic piezoelectric material and which enables the deposition of a continuous coating on the walls of a deep channel without depolarising the material comprises depositing a coating comprising inorganic material by: (a) providing an ink jet print head component containing said channel and (b) while maintaining the bulk temperature of the actuating component which contains said channel at a temperature of below 200 DEG C and at which not more than 30 % depolarisation of the material occurs during passivation, exposing the surface of the channel walls to be passivated to a homogenised vapour of the coating material, said vapour having undergone multiple scattering during transport thereof from the source of the vapour to said surface. The process may be employed to deposit a plurality of layers which may be of differing composition, and the invention also provides ceramic piezoelectric ink jet print heads the channels walls of which have been coated with particular combinations of layers of differing compositions.
摘要翻译：用于钝化陶瓷压电材料的喷墨打印头通道的通道壁的方法，其能够在深通道的壁上沉积连续涂层而不使材料去极化包括通过以下步骤沉积包含无机材料的涂层：（ a）提供包含所述通道的喷墨打印头部件，和（b）同时保持在低于200℃的温度下包含所述通道的致动部件的体温，并且在该温度下不发生不超过30％的材料去极化在钝化期间，将要钝化的通道壁的表面暴露于涂覆材料的均质蒸汽，所述蒸气在从蒸气源运送到所述表面的过程中经历了多次散射。该方法可以用于沉积可能具有不同组成的多个层，并且本发明还提供陶瓷压电喷墨打印头，其通道壁已经涂覆有不同组成的层的特定组合。

4. 发明申请

WO2006111766A3 METHODS AND APPARATUS FOR THE MANUFACTURE OF MICROSTRUCTURES 审中-公开
标题翻译：制备微结构的方法和装置
公开(公告)号：WO2006111766A3
公开(公告)日：2007-01-18
申请号：PCT/GB2006001468
申请日：2006-04-21
申请人： 3T TECHNOLOGIES LTD , SPEAKMAN STUART PHILIP
发明人： SPEAKMAN STUART PHILIP
IPC分类号： G03F7/12 , C23C14/04
CPC分类号： G03F7/12 , B81C1/00428 , H01L27/1292 , H01L29/41733 , H01L29/42384 , H01L29/4908 , H01L29/66757 , H01L29/66765 , H01L29/78603 , H01L29/7869 , H01L51/0017
摘要： A method of manufacturing microstructures is disclosed, the method comprising a applying a mask to substrate; forming a pattern in the mask; processing the substrate according to the pattern; and mechanically removing the mask from the substrate. A polymer mask is disclosed for manufacturing micro scale structure, the polymer mask comprising a thin, preferably ultra thin flexible film. A method of manufacturing an integrated circuit is disclosed, the method comprising forming a plurality of isolated semiconductor devices on a common substrate; and connecting some of the devices. Apparatus for manufacturing microstructures is disclosed comprising: a mechanism for coating a mass substrate to create a structure; a mechanism for removing a mask from the substrate; and processing apparatus. A thin film transistor is disclosed comprising drain source and gate electrodes, the drain and source electrode being separated by a semiconductor, and the gate electrode being separated from the semiconductor by an insulator, comprising a bandgap alignment layer disposed between a semiconductor and the insulator.
摘要翻译：公开了一种制造微结构的方法，所述方法包括将掩模施加于基底; 在面具中形成图案; 根据图案处理基板; 并从衬底机械地去除掩模。公开了用于制造微尺度结构的聚合物掩模，聚合物掩模包括薄的，优选超薄的柔性膜。公开了一种制造集成电路的方法，所述方法包括在公共基板上形成多个隔离半导体器件; 并连接一些设备。公开了用于制造微结构的装置，包括：用于涂覆质量基底以产生结构的机构; 用于从基板去除掩模的机构; 和处理装置。公开了一种薄膜晶体管，其包括漏源极和栅电极，漏极和源极由半导体分隔开，并且栅电极通过绝缘体与半导体分离，包括设置在半导体和绝缘体之间的带隙对准层。

5. 发明申请

WO2004112151A2 TRANSPARENT CONDUCTING STRUCTURES AND METHODS OF PRODUCTION THEREOF 审中-公开
标题翻译：透明导电结构及其生产方法
公开(公告)号：WO2004112151A2
公开(公告)日：2004-12-23
申请号：PCT/GB2004002545
申请日：2004-06-11
申请人： PATTERNING TECHNOLOGIES LTD , SPEAKMAN STUART
发明人： SPEAKMAN STUART
IPC分类号： B41J2/04 , G02F1/1343 , H01L31/0224 , H01L51/44 , H05K1/02 , H05K3/12 , H01L31/00
CPC分类号： H05K1/0265 , B82Y30/00 , G02F1/13439 , H01L31/022466 , H01L51/442 , H05K3/1241 , H05K2201/0108 , H05K2201/0257 , H05K2201/0326 , H05K2201/0391 , Y02E10/549
摘要： Transparent electrical conductors comprising regions of high transparency and regions of lower transparency, but higher conductivity. This allows electrical connection through the conductor, while retaining its transparency for such applications as hand-held device display screens or transparent antennas, for example.
摘要翻译：透明电导体包括具有高透明度的区域和较低透明度的区域，但是具有较高的导电性。这允许例如通过导体的电连接，同时保持用于例如手持式设备显示屏或透明天线的应用的透明度。

6. 发明申请

WO1997048557A2 3D PRINTING AND FORMING OF STRUCTURES 审中-公开
标题翻译： 3D打印和结构形成
公开(公告)号：WO1997048557A2
公开(公告)日：1997-12-24
申请号：PCT/GB1997001509
申请日：1997-06-04
申请人： THIN FILM TECHNOLOGY (CONSULTANCY) LIMITED , PATTERNING TECHNOLOGIES LIMITED , SPEAKMAN, Stuart
发明人： THIN FILM TECHNOLOGY (CONSULTANCY) LIMITED , PATTERNING TECHNOLOGIES LIMITED
IPC分类号： B41J00/00
CPC分类号： B41J11/002 , B29C64/112 , B33Y10/00 , B41J2/01 , B41J2/2125 , B41J3/32 , B41M3/16 , B41M7/0081 , B41M7/009
摘要： A method of forming a three-dimensional feature on a surface using the technique of drop ejection to deposit droplets of deposition material. The method comprises depositing a plurality of droplets on the surface to form a feature comprising multiple discrete portions, adjoining portions being formed from different deposition material. Examples of such a feature include a Braille character and a multi-layer optical device.
摘要翻译：使用液滴喷射技术在表面上形成三维特征以沉积沉积材料的液滴的方法。该方法包括在表面上沉积多个液滴以形成包括多个分立部分的特征，邻接部分由不同的沉积材料形成。这种特征的示例包括盲文字符和多层光学装置。

7. 发明申请

WO1992016822A2 FLUID COOLED CONTACT MASK 审中-公开
标题翻译：流体冷却接触面罩
公开(公告)号：WO1992016822A2
公开(公告)日：1992-10-01
申请号：PCT/GB1992000513
申请日：1992-03-20
申请人： XAAR LIMITED , PATON, Anthony, David , SPEAKMAN, Stuart, Philip , HARVEY, Robert, Alan
发明人： XAAR LIMITED
IPC分类号： G01L25/00
CPC分类号： B23K26/0661 , B23K26/066 , B23K26/703 , B41J2/162 , B41J2/1623 , B41J2/1634 , B41J2202/08
摘要： A mask (17) for use in forming features in a surface (12) by high energy pulses of laser radiation is disclosed which comprises a base plate (19) which is located adjacent said surface and has apertures (20) in it through which locations of said surface are exposed to the laser radiation. Channel means (21) formed in a cover (23) of the mask lie in adjoining regions of the mask exposed to the radiation and during ablation of said surface having cooling fluid circulated through there. The mask is described in use for making nozzles (25) in the nozzle plate (13) of an ink jet printhead.
摘要翻译：公开了一种用于通过激光辐射的高能量脉冲在表面（12）中形成特征的掩模（17），其包括位于邻近所述表面的基板（19），其中具有孔（20），位于其中的位置的所述表面暴露于激光辐射。形成在掩模的盖（23）中的通道装置（21）位于暴露于辐射的掩模的相邻区域中，并且在具有在其中循环的冷却流体的所述表面的消融期间。描述了用于在喷墨打印头的喷嘴板（13）中制造喷嘴（25）的掩模。

8. 发明申请

WO1998017477A1 PASSIVATION OF INK-JET PRINTHEADS 审中-公开
标题翻译：喷嘴喷头钝化
公开(公告)号：WO1998017477A1
公开(公告)日：1998-04-30
申请号：PCT/GB1997002878
申请日：1997-10-17
申请人： XAAR TECHNOLOGY LIMITED , ASHE, James , PHILLIPS, Christopher, David , LEE, Andrew , SPEAKMAN, Stuart
发明人： XAAR TECHNOLOGY LIMITED
IPC分类号： B41J02/16
CPC分类号： B41J2/1642 , B41J2/1609 , B41J2/1632 , B41J2/1635 , B41J2/1643 , B41J2002/14379 , C23C16/042 , C23C16/463 , Y10T29/42 , Y10T29/49401
摘要： A process for the selective passivation of the channel walls (210, 220) of a channelled ink-jet printhead component (100) by the chemical vapour deposition of a passivant coating, the process comprising mounting said component in a support (130) in registration with a datum location (175) therein, the support having masking means (170) for masking selected areas of the component, and depositing the passivant coating on unmasked portions of the channel walls.
摘要翻译：通过钝化涂层的化学气相沉积来选择性钝化通道喷墨打印头部件（100）的通道壁（210,220）的方法，该方法包括将所述部件安装在配准的支撑件（130）中其中具有基准位置（175），所述支撑件具有掩蔽装置（170），用于掩蔽所述部件的选定区域，以及将所述钝化涂层沉积在所述通道壁的未遮蔽部分上。

9. 发明申请

WO9748557A3 3D printing and forming of structures 审中-公开
标题翻译： 3D打印和结构的形成
公开(公告)号：WO9748557A3
公开(公告)日：1998-03-12
申请号：PCT/GB9701509
申请日：1997-06-04
申请人： THIN FILM TECHNOLOGY CONSULTAN , PATTERNING TECHNOLOGIES LTD , SPEAKMAN STUART
发明人： SPEAKMAN STUART
IPC分类号： B29C67/00 , B41J2/01 , B41J2/21 , B41J3/32 , B41M3/00 , B41M3/16 , B41M7/00 , B41J2/045 , B41J2/14
CPC分类号： B41J11/002 , B29C64/112 , B33Y10/00 , B41J2/01 , B41J2/2125 , B41J3/32 , B41M3/16 , B41M7/0081 , B41M7/009
摘要： A method of forming a three-dimensional feature on a surface using the technique of drop ejection to deposit droplets of deposition material. The method comprises depositing a plurality of droplets on the surface to form a feature comprising multiple discrete portions, adjoining portions being formed from different deposition material. Examples of such a feature include a Braille character and a multi-layer optical device.
摘要翻译： PCT No.PCT / GB97 / 01509 Sec。 371日期1999年6月28日第 102（e）1999年6月28日PCT 1997年6月4日PCT公布。出版物WO97 / 48557 日期1997年12月24日使用液滴喷射技术在表面上形成三维特征以沉积沉积材料的液滴的方法。该方法包括在表面上沉积多个液滴以形成包括多个分立部分的特征，邻接部分由不同的沉积材料形成。这种特征的示例包括盲文字符和多层光学装置。

10. 发明申请

WO2008047144A1 METHODS AND APPARATUS FOR THE MANUFACTURE OF MICROSTRUCTURES 审中-公开
标题翻译：用于制造微结构的方法和装置
公开(公告)号：WO2008047144A1
公开(公告)日：2008-04-24
申请号：PCT/GB2007/004012
申请日：2007-10-19
申请人： 3T TECHNOLOGIES LIMITED , SPEAKMAN, Stuart, Philip
发明人： SPEAKMAN, Stuart, Philip
IPC分类号： H01L51/00 , G03F7/42
CPC分类号： H01L51/0016 , H01L27/283 , H01L51/0011 , H01L51/0545
摘要： A method of manufacturing microstructures is disclosed, the method comprising a applying a mask to substrate; forming a pattern in the mask; processing the substrate according to the pattern; and mechanically removing the mask from the substrate. A polymer mask is disclosed for manufacturing micro scale structure, the polymer mask comprising a thin, preferably ultra thin flexible film. A method of manufacturing an integrated circuit is disclosed, the method comprising forming a plurality of isolated semiconductor devices on a common substrate; and connecting some of the devices. Apparatus for manufacturing microstructures is disclosed comprising: a mechanism for coating a mass substrate to create a structure; a mechanism for removing a mask from the substrate; and processing apparatus. A thin film transistor is disclosed comprising drain source and gate electrodes, the drain and source electrode being separated by a semiconductor, and the gate electrode being separated from the semiconductor by an insulator, comprising a bandgap alignment layer disposed between a semiconductor and the insulator.
摘要翻译：公开了一种制造微结构的方法，所述方法包括将掩模施加到基底上; 在面具中形成图案; 根据图案处理基板; 并从衬底机械地去除掩模。公开了用于制造微尺度结构的聚合物掩模，聚合物掩模包括薄的，优选超薄的柔性膜。公开了一种制造集成电路的方法，所述方法包括在公共基板上形成多个隔离半导体器件; 并连接一些设备。公开了用于制造微结构的装置，包括：用于涂覆质量基底以产生结构的机构; 用于从衬底去除掩模的机构; 和处理装置。公开了一种薄膜晶体管，其包括漏极源极和栅极电极，漏极和源极由半导体分隔开，并且栅电极通过绝缘体与半导体分离，包括设置在半导体和绝缘体之间的带隙对准层。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式