专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2012021321A3 COMPOSITE SUBSTRATES FOR DIRECT HEATING AND INCREASED TEMPERATURE UNIFORMITY 审中-公开
标题翻译：用于直接加热和增加温度均匀性的复合基材
公开(公告)号：WO2012021321A3
公开(公告)日：2012-06-28
申请号：PCT/US2011046116
申请日：2011-08-01
申请人： APPLIED MATERIALS INC , SU JIE , OLGADO DONALD J K , KUTNEY MICHAEL C
发明人： SU JIE , OLGADO DONALD J K , KUTNEY MICHAEL C
IPC分类号： H01L21/205 , H01L21/683
CPC分类号： F27B17/0025 , C23C16/4586 , C23C16/46 , C30B23/063 , C30B25/105 , H01L21/67115 , H01L21/68764 , H01L21/68771 , H01L21/68785
摘要： Embodiments of the present invention generally relate to apparatus and methods for uniformly heating substrates. The apparatus include a transferable puck having at least one electrode and a dielectric coating. The transferable puck can be biased with a biasing assembly relative to a substrate, and transferred independently of the biasing assembly during a fabrication process while maintaining the bias relative to the substrate. The puck absorbs radiant heat from a heat source and uniformly conducts the heat to a substrate coupled to the puck. The puck has high emissivity and high thermal conductivity for absorbing and transferring the radiant heat to the substrate. The high thermal conductivity allows for a uniform temperature profile across the substrate, thereby increasing deposition uniformity. The method includes disposing a light-absorbing material on an optically transparent substrate, and radiating the light-absorbing material with a radiant heat source to heat the optically transparent substrate.
摘要翻译：本发明的实施例一般涉及用于均匀加热衬底的装置和方法。该装置包括具有至少一个电极和介电涂层的可转移圆盘。可转移的圆盘可以相对于基板偏压组件偏置，并且在制造过程中独立于偏置组件传递，同时保持相对于基板的偏压。圆盘吸收来自热源的辐射热，并将热量均匀地传导到耦合到冰球的基底。圆盘具有高辐射率和高导热性，用于吸收并将辐射热传递到基底。高导热性允许跨基板的均匀温度分布，从而增加沉积均匀性。该方法包括将光吸收材料设置在光学透明基板上，并且用辐射热源辐射光吸收材料以加热光学透明基板。

2. 发明申请

WO2012036908A3 SPRAY DEPOSITION MODULE FOR AN IN-LINE PROCESSING SYSTEM 审中-公开
公开(公告)号：WO2012036908A3
公开(公告)日：2012-03-22
申请号：PCT/US2011/049984
申请日：2011-08-31
申请人： APPLIED MATERIALS, INC. , BACHRACH, Robert, Z. , WANG, Connie, P. , LOPATIN, Sergey, D. , BOLANDI, Hooman , BABAYANTS, Ruben , BROWN, Karl, M. , KUTNEY, Michael, C. , OLGADO, Donald, J., K.
发明人： BACHRACH, Robert, Z. , WANG, Connie, P. , LOPATIN, Sergey, D. , BOLANDI, Hooman , BABAYANTS, Ruben , BROWN, Karl, M. , KUTNEY, Michael, C. , OLGADO, Donald, J., K.
IPC分类号： H01M4/04 , B05C5/02 , B05D1/26 , H01M10/04 , H01M10/052
摘要： In one embodiment, an apparatus for simultaneously depositing an anodically or cathodically active material on opposing sides of a flexible conductive substrate is provided. The apparatus comprises a chamber body defining one or more processing regions in which a flexible conductive substrate is exposed to a dual sided spray deposition process, wherein each of the one or more processing regions are further divided into a first spray deposition region and a second spray deposition region for simultaneously spraying an anodically active or cathodically active material onto opposing sides of a portion of the flexible conductive substrate, wherein each of the first and second spray deposition regions comprise a spray dispenser cartridge for delivering the activated material toward the flexible conductive substrate and a movable collection shutter.

3. 发明申请

WO2012036908A2 SPRAY DEPOSITION MODULE FOR AN IN-LINE PROCESSING SYSTEM 审中-公开
标题翻译：用于在线处理系统的喷涂沉积模块
公开(公告)号：WO2012036908A2
公开(公告)日：2012-03-22
申请号：PCT/US2011049984
申请日：2011-08-31
申请人： APPLIED MATERIALS INC , BACHRACH ROBERT Z , WANG CONNIE P , LOPATIN SERGEY D , BOLANDI HOOMAN , BABAYANTS RUBEN , BROWN KARL M , KUTNEY MICHAEL C , OLGADO DONALD J K
发明人： BACHRACH ROBERT Z , WANG CONNIE P , LOPATIN SERGEY D , BOLANDI HOOMAN , BABAYANTS RUBEN , BROWN KARL M , KUTNEY MICHAEL C , OLGADO DONALD J K
IPC分类号： H01M4/04 , B05C5/02 , B05D1/26 , H01M10/04 , H01M10/052
CPC分类号： H01M4/0419 , H01M10/0404
摘要： In one embodiment, an apparatus for simultaneously depositing an anodically or cathodically active material on opposing sides of a flexible conductive substrate is provided. The apparatus comprises a chamber body defining one or more processing regions in which a flexible conductive substrate is exposed to a dual sided spray deposition process, wherein each of the one or more processing regions are further divided into a first spray deposition region and a second spray deposition region for simultaneously spraying an anodically active or cathodically active material onto opposing sides of a portion of the flexible conductive substrate, wherein each of the first and second spray deposition regions comprise a spray dispenser cartridge for delivering the activated material toward the flexible conductive substrate and a movable collection shutter.
摘要翻译：在一个实施例中，提供了一种用于在柔性导电衬底的相对侧上同时沉积阳极或阴极活性材料的装置。该设备包括限定一个或多个处理区域的腔室主体，其中柔性导电基板暴露于双面喷射沉积工艺，其中一个或多个处理区域中的每一个进一步分成第一喷射沉积区域和第二喷射用于将阳极活性材料或阴极活性材料同时喷射到柔性导电基底的一部分的相对侧上，其中第一和第二喷射沉积区中的每一个包括用于将活化材料输送到柔性导电基底的喷射分配器盒，以及可移动的收集快门。

4. 发明申请

WO2009126576A2 LOWER LINER WITH INTEGRATED FLOW EQUALIZER AND IMPROVED CONDUCTANCE 审中-公开
标题翻译：具有集成流量均衡器和改进的导体的下层
公开(公告)号：WO2009126576A2
公开(公告)日：2009-10-15
申请号：PCT/US2009/039662
申请日：2009-04-06
申请人： APPLIED MATERIALS, INC. , CARDUCCI, James, D. , NGUYEN, Andrew , BALAKRISHNA, Ajit , KUTNEY, Michael, C.
发明人： CARDUCCI, James, D. , NGUYEN, Andrew , BALAKRISHNA, Ajit , KUTNEY, Michael, C.
IPC分类号： H05H1/34 , H01L21/3065
CPC分类号： H01L21/67069 , H01J37/32082 , H01J37/32495 , H01J37/32623 , Y10T428/13
摘要： A plasma processing chamber has a lower liner with an integrated flow equalizer. In an etching process, the processing gases may be unevenly drawn from the processing chamber which may cause an uneven etching of the substrate. The integrated flow equalizer is configured to equalize the flow of the processing gases evacuated from the chamber via the lower liner.
摘要翻译：等离子体处理室具有具有集成流量均衡器的下衬套。在蚀刻工艺中，处理气体可能不均匀地从处理室抽出，这可能导致基板的不均匀蚀刻。集成流量均衡器被配置为使从腔室经由下衬套排出的处理气体的流量相等。

5. 发明申请

WO2009126576A3 LOWER LINER WITH INTEGRATED FLOW EQUALIZER AND IMPROVED CONDUCTANCE 审中-公开
标题翻译：具有集成流量均衡器和改进的导体的下层
公开(公告)号：WO2009126576A3
公开(公告)日：2010-03-18
申请号：PCT/US2009039662
申请日：2009-04-06
申请人： APPLIED MATERIALS INC , CARDUCCI JAMES D , NGUYEN ANDREW , BALAKRISHNA AJIT , KUTNEY MICHAEL C
发明人： CARDUCCI JAMES D , NGUYEN ANDREW , BALAKRISHNA AJIT , KUTNEY MICHAEL C
IPC分类号： H05H1/34 , H01L21/3065
CPC分类号： H01L21/67069 , H01J37/32082 , H01J37/32495 , H01J37/32623 , Y10T428/13
摘要： A plasma processing chamber has a lower liner with an integrated flow equalizer. In an etching process, the processing gases may be unevenly drawn from the processing chamber which may cause an uneven etching of the substrate. The integrated flow equalizer is configured to equalize the flow of the processing gases evacuated from the chamber via the lower liner.
摘要翻译：等离子体处理室具有具有集成流量均衡器的下衬套。在蚀刻工艺中，处理气体可能不均匀地从处理室抽出，这可能导致基板的不均匀蚀刻。集成流量均衡器被配置为使从腔室经由下衬套排出的处理气体的流量相等。

6. 发明申请

WO2009097181A3 ETCHING CHAMBER HAVING FLOW EQUALIZER AND LOWER LINER 审中-公开
标题翻译：具有流动均衡器和下衬的蚀刻室
公开(公告)号：WO2009097181A3
公开(公告)日：2009-12-03
申请号：PCT/US2009030708
申请日：2009-01-12
申请人： APPLIED MATERIALS INC , CARDUCCI JAMES D , LO KIN PONG , BERA KALLOL , KUTNEY MICHAEL C , MILLER MATTHEW L
发明人： CARDUCCI JAMES D , LO KIN PONG , BERA KALLOL , KUTNEY MICHAEL C , MILLER MATTHEW L
IPC分类号： H05H1/34 , H01L21/3065
CPC分类号： H01J37/32623 , H01J37/32467
摘要： A plasma processing chamber having a lowered flow equalizer and a lower chamber liner. In an etching process, the processing gases may be unevenly drawn from the processing chamber which may cause an uneven etching of the substrate. By equalizing the flow of the processing gases evacuated from the chamber, a more uniform etching may occur. By electrically coupling the flow equalizer to the chamber liners, the RF return path from the flow equalizer may run along the chamber liners and hence, reduce the amount of plasma drawn below the substrate during processing.
摘要翻译：等离子体处理室具有降低的流量均衡器和下部室内衬。在蚀刻过程中，处理气体可能会不均匀地从处理室中拉出，这可能导致衬底的不均匀蚀刻。通过均衡从腔室排出的处理气体的流量，可以发生更均匀的蚀刻。通过将流量均衡器电耦合到腔室衬套，来自流量均衡器的RF返回路径可以沿着腔室衬管延伸，并因此减少在处理期间在衬底之下抽取的等离子体的量。

7. 发明申请

WO2009097181A2 ETCHING CHAMBER HAVING FLOW EQUALIZER AND LOWER LINER 审中-公开
标题翻译：具有流量均衡器和下层的蚀刻室
公开(公告)号：WO2009097181A2
公开(公告)日：2009-08-06
申请号：PCT/US2009/030708
申请日：2009-01-12
申请人： APPLIED MATERIALS, INC. , CARDUCCI, James, D. , LO, Kin Pong , BERA, Kallol , KUTNEY, Michael, C. , MILLER, Matthew, L.
发明人： CARDUCCI, James, D. , LO, Kin Pong , BERA, Kallol , KUTNEY, Michael, C. , MILLER, Matthew, L.
CPC分类号： H01J37/32623 , H01J37/32467
摘要： A plasma processing chamber having a lowered flow equalizer and a lower chamber liner. In an etching process, the processing gases may be unevenly drawn from the processing chamber which may cause an uneven etching of the substrate. By equalizing the flow of the processing gases evacuated from the chamber, a more uniform etching may occur. By electrically coupling the flow equalizer to the chamber liners, the RF return path from the flow equalizer may run along the chamber liners and hence, reduce the amount of plasma drawn below the substrate during processing.
摘要翻译：具有降低的流量均衡器和下腔室衬套的等离子体处理室。在蚀刻工艺中，处理气体可能不均匀地从处理室抽出，这可能导致基板的不均匀蚀刻。通过均衡从室抽出的处理气体的流动，可能发生更均匀的蚀刻。通过将流量均衡器电耦合到室衬套，来自流量均衡器的RF返回路径可以沿着室衬套运行，并且因此减少在处理期间在衬底下方拉制的等离子体的量。

8. 发明申请

WO2012116067A3 LITHIUM ION CELL DESIGN APPARATUS AND METHOD 审中-公开
公开(公告)号：WO2012116067A3
公开(公告)日：2012-08-30
申请号：PCT/US2012/026124
申请日：2012-02-22
申请人： APPLIED MATERIALS, INC. , BOLANDI, Hooman , ORILALL, Mahendra C. , PEBENITO, Victor , BROWN, Karl M. , KUTNEY, Michael C. , WANG, Connie P. , BACHRACH, Robert Z.
发明人： BOLANDI, Hooman , ORILALL, Mahendra C. , PEBENITO, Victor , BROWN, Karl M. , KUTNEY, Michael C. , WANG, Connie P. , BACHRACH, Robert Z.
IPC分类号： H01M4/139 , H01M2/16 , H01M10/0525 , B05D1/02 , H01M10/058
摘要： A spray module for depositing an electro-active material over a flexible conductive substrate is provided. The spray module comprises a first heated roller for heating and transferring the flexible conductive substrate, a second heated roller for heating and transferring the flexible conductive substrate, a first spray dispenser positioned adjacent to the first heated roller for depositing electro-active material onto the flexible conductive substrate as the flexible conductive substrate is heated by the first heated roller, and a second spray dispenser positioned adjacent to the second heated roller for depositing electro-active material over the flexible conductive substrate as the flexible conductive substrate is heated by the second heated roller.

9. 发明申请

WO2012116067A2 LITHIUM ION CELL DESIGN APPARATUS AND METHOD 审中-公开
标题翻译：锂离子电池设计装置和方法
公开(公告)号：WO2012116067A2
公开(公告)日：2012-08-30
申请号：PCT/US2012026124
申请日：2012-02-22
申请人： APPLIED MATERIALS INC , BOLANDI HOOMAN , ORILALL MAHENDRA C , PEBENITO VICTOR , BROWN KARL M , KUTNEY MICHAEL C , WANG CONNIE P , BACHRACH ROBERT Z
发明人： BOLANDI HOOMAN , ORILALL MAHENDRA C , PEBENITO VICTOR , BROWN KARL M , KUTNEY MICHAEL C , WANG CONNIE P , BACHRACH ROBERT Z
IPC分类号： H01M4/139 , B05D1/02 , H01M2/16 , H01M10/0525 , H01M10/058
CPC分类号： C23C26/00 , H01M2/162 , H01M2/1686 , H01M4/0404 , H01M4/0419
摘要： A spray module for depositing an electro-active material over a flexible conductive substrate is provided. The spray module comprises a first heated roller for heating and transferring the flexible conductive substrate, a second heated roller for heating and transferring the flexible conductive substrate, a first spray dispenser positioned adjacent to the first heated roller for depositing electro-active material onto the flexible conductive substrate as the flexible conductive substrate is heated by the first heated roller, and a second spray dispenser positioned adjacent to the second heated roller for depositing electro-active material over the flexible conductive substrate as the flexible conductive substrate is heated by the second heated roller.
摘要翻译：提供了一种用于在柔性导电衬底上沉积电活性材料的喷射模块。喷射模块包括用于加热和转移柔性导电基底的第一加热辊，用于加热和转移柔性导电基底的第二加热辊，邻近第一加热辊定位的第一喷射分配器，用于将电活性材料沉积到柔性导电基底上作为柔性导电基板的导电基板被第一加热辊加热，以及邻近第二加热辊定位的第二喷射分配器，用于在柔性导电基板被第二加热辊加热时在柔性导电基板上沉积电活性材料。

10. 发明申请

WO2012021321A2 COMPOSITE SUBSTRATES FOR DIRECT HEATING AND INCREASED TEMPERATURE UNIFORMITY 审中-公开
标题翻译：用于直接加热和增加温度均匀性的复合材料
公开(公告)号：WO2012021321A2
公开(公告)日：2012-02-16
申请号：PCT/US2011/046116
申请日：2011-08-01
申请人： APPLIED MATERIALS, INC. , SU, Jie , OLGADO, Donald J.K. , KUTNEY, Michael C.
发明人： SU, Jie , OLGADO, Donald J.K. , KUTNEY, Michael C.
IPC分类号： H01L21/205 , H01L21/683
CPC分类号： F27B17/0025 , C23C16/4586 , C23C16/46 , C30B23/063 , C30B25/105 , H01L21/67115 , H01L21/68764 , H01L21/68771 , H01L21/68785
摘要： Embodiments of the present invention generally relate to apparatus and methods for uniformly heating substrates. The apparatus include a transferable puck having at least one electrode and a dielectric coating. The transferable puck can be biased with a biasing assembly relative to a substrate, and transferred independently of the biasing assembly during a fabrication process while maintaining the bias relative to the substrate. The puck absorbs radiant heat from a heat source and uniformly conducts the heat to a substrate coupled to the puck. The puck has high emissivity and high thermal conductivity for absorbing and transferring the radiant heat to the substrate. The high thermal conductivity allows for a uniform temperature profile across the substrate, thereby increasing deposition uniformity. The method includes disposing a light-absorbing material on an optically transparent substrate, and radiating the light-absorbing material with a radiant heat source to heat the optically transparent substrate.
摘要翻译：本发明的实施例总体涉及用于均匀地加热衬底的装置和方法。该设备包括具有至少一个电极和电介质涂层的可转移圆盘。可转移圆盘可以用偏置组件相对于衬底偏置，并且在制造过程期间独立于偏置组件而转移，同时相对于衬底保持偏置。冰球吸收来自热源的辐射热并将热量均匀地传导至与冰球连接的基板。该圆盘具有高发射率和高导热性，用于吸收辐射热量并将辐射热量传递给基板。高导热率允许横跨衬底的均匀温度分布，由此增加沉积均匀性。该方法包括将光吸收材料设置在光学透明衬底上，并用辐射热源辐射光吸收材料以加热光学透明衬底。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式