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    • 1. 发明申请
    • COMPOSITION FOR REGENERATING CONNECTIVE TISSUE, AND METHOD FOR REGENERATING CONNECTIVE TISSUE
    • 再生连接组织的组合物以及再生连接组织的方法
    • WO2012141536A3
    • 2013-02-21
    • PCT/KR2012002835
    • 2012-04-13
    • CATHOLIC UNIV IND ACAD COOPKIM SEOK-JUNG
    • KIM SEOK-JUNG
    • A61K31/55A61K31/728A61P7/00A61P7/02
    • A61K31/55A61K31/728
    • The present invention relates to a composition for regenerating connective tissue and to a method for regenerating connective tissue, and more particularly, to a composition for regenerating connective tissue and to a method for regenerating a connective tissue, wherein the composition is formed by mixing hyarulonic acid and fibrinogen with atelocollagen or a myelocyte, and injected into the damaged portion of connective tissue, to thereby regenerate the connective tissue of the damaged portion. The composition for regenerating connective tissue according to the present invention may effectively regenerate a damaged portion of connective tissue, and specifically may exhibit activity in regenerating cartilage having a low regenerative capacity. Further, the composition of the present invention uses a natural material and therefore is harmless to the human body. The composition of the present invention may regenerate tissue-engineered cartilage that is similar to natural cartilage, and therefore may be valuably used as a therapeutic agent for cartilage which can effectively repair damaged cartilage tissue.
    • 本发明涉及用于再生结缔组织的组合物和用于再生结缔组织的方法,并且更具体地涉及用于再生结缔组织的组合物和用于再生结缔组织的方法,其中所述组合物通过混合透明质酸 和纤维蛋白原与atelocollagen或myelocyte,并注射到结缔组织的受损部分,从而再生损伤部分的结缔组织。 根据本发明的用于再生结缔组织再生的组合物可以有效地再生结缔组织的损伤部分,并且具体地可以表现出再生能力低的软骨再生的活性。 此外,本发明的组合物使用天然材料,因此对人体无害。 本发明的组合物可以再生与天然软骨类似​​的组织工程软骨,因此可以有价值地用作能够有效修复受损软骨组织的软骨治疗剂。
    • 5. 发明申请
    • MARKER CLIP AND CLIP DEVICE FOR SURGERY
    • MARKER夹子和夹子设备为外科手术
    • WO2011078519A3
    • 2011-10-27
    • PCT/KR2010009053
    • 2010-12-17
    • NAT CANCER CTKIM SEOK-KIKIM TAE-SUNGKIM KWANG-GIJEONG CHANG-BU
    • KIM SEOK-KIKIM TAE-SUNGKIM KWANG-GIJEONG CHANG-BU
    • A61B17/122A61B19/00
    • A61B17/083A61B17/1227A61B17/1285A61B90/39A61B2090/392
    • Disclosed are a marker clip and clip device for surgery allowing the precise position of the site of incision to be found both easily and rapidly during an operation, by reinforcing functionality as a position marker in addition to the basic role of a body clip by installing a radioactive substance in the clip. The marker clip for surgery of the present invention may comprise: a self-spreadable main clip body; a radioactive marker part which is provided towards the base of the main clip body, comprises a radioactive substance and has a function whereby it shields the radioactive substance and releases the same from the shielding; and a clip-fastening part which fastens the main clip body occlusively while being moved in a sliding fashion on the main clip body by means of an external force from the position where it is attached to the radioactive marker part.
    • 本发明公开了一种用于外科手术的标记夹和夹子装置,通过在手术过程中通过增强作为位置标记的功能,除了通过安装一个身体夹的基本作用之外,还可以容易且迅速地找到切口部位的精确位置 放射性物质在夹子里。 本发明的用于外科手术的标记夹可以包括:可自行分开的主夹体; 朝向主夹体的基部设置的放射性标记部件包括放射性物质并且具有屏蔽放射性物质并将其从屏蔽释放的功能; 以及夹持紧固部件,该夹紧紧固部件通过从其被附接到放射性标记部件的位置处的外力以滑动的方式在主夹体上移动的同时闭锁地紧固主夹体。
    • 8. 发明申请
    • WASTE WATER TREATING APPARATUS USING PLASMA AND PHOTOCATALYST
    • 废水处理设备使用等离子体和光催化剂
    • WO2008062913A1
    • 2008-05-29
    • PCT/KR2006/004935
    • 2006-11-22
    • KIM, Young GyuKIM, Seok Kyu
    • KIM, Young GyuKIM, Seok Kyu
    • C02F1/72
    • C02F1/725C02F1/4608C02F1/48C02F1/727C02F1/78C02F2303/18C02F2305/023C02F2305/10
    • The present invention relates to a wastewater treatment apparatus using plasma and photocatalyst, and more particularly, to a wastewater treatment apparatus using plasma and photocatalyst, which comprises a means for supplying wastewater to said wastewater treatment apparatus, a plasma discharge tube connected to said wastewater supply means, in which plasma gas is produced by plasma discharge, an oxygen module connected to said plasma discharge tube to supply oxygen, a reactor connected to said plasma discharge tube, in which the wastewater is treated by plasma gas flowed from said plasma discharge tube, a photocatalyst system connected to said reactor, in which the wastewater is treated by photocatalyst, an inline mixer for recirculating unreacted plasma gas and wastewater of said reactor, a treated water outlet connected to said photocatalyst system and a discharge gas outlet located in an upper portion of said reactor.
    • 本发明涉及使用等离子体和光催化剂的废水处理装置,更具体地,涉及使用等离子体和光催化剂的废水处理装置,其包括向所述废水处理装置供给废水的装置,连接到所述废水源的等离子体放电管 其中等离子体气体通过等离子体放电产生,连接到所述等离子体放电管以供应氧的氧模块,连接到所述等离子体放电管的反应器,其中废水由从所述等离子体放电管流出的等离子体气体处理, 连接到所述反应器的光催化剂体系,其中废水由光催化剂处理,用于使未反应的等离子体气体再循环的反混混合器和所述反应器的废水,连接到所述光催化剂体系的处理水出口和位于上部的排出气体出口 的反应器。
    • 9. 发明申请
    • DEHUMIDIFIER
    • 除湿机
    • WO2006135168A2
    • 2006-12-21
    • PCT/KR2006/002213
    • 2006-06-09
    • LG ELECTRONICS INC.AHN, Byung YongKIM, Seok Hun
    • AHN, Byung YongKIM, Seok Hun
    • F24F3/14F24F5/00
    • F24F13/28F24F3/1423F24F2203/1004F24F2203/1012F24F2203/106F24F2203/1068F24F2203/1084
    • The present invention relates to a dehumidifier for improving dehumidifying efficiency and discharging dehumidified water to an outside of the dehumidifier easily. The dehumidifier includes a case, an inlet passed through the case for introduction of air from an outside of the case to an inside of the case, an outlet formed to pass through a top of the case for discharging air dehumidified in the case to the outside of the case, a desiccant assembly for absorbing moisture from air drawn into the case, a blower assembly for drawing air through the inlets and blowing the air to the outlet, a regenerator assembly for blowing hot air to the desiccant assembly for drying the desiccant assembly, a heat exchanger for condensing high temperature, humid air blown by the regenerator assembly through the desiccant assembly, to separate the moisture from the air, a top cover movably mounted on a top side of the case for opening/closing the top side of the case, and a water tank mounted beneath the top cover of the case at a top side thereof separable therefrom, for receiving, and holding water condensed at the heat exchanger.
    • 本发明涉及一种用于提高除湿效率并将除湿水排出到除湿机外部的除湿机。 除湿器包括壳体,通过壳体的入口,用于将空气从壳体的外部引入到壳体的内部,出口形成为穿过壳体的顶部,用于将外壳中除湿的空气排出到外部 一种用于从吸入壳体的空气吸收水分的干燥剂组件,用于通过入口抽吸空气并将空气吹送到出口的鼓风机组件,用于将热空气吹送到干燥剂组件以将干燥剂组件干燥的再生器组件 ,用于将由再生器组件吹过的高温湿空气通过干燥剂组件冷凝以将水分与空气分离的热交换器,可移动地安装在壳体的顶侧上的顶盖,用于打开/关闭壳体的顶侧 壳体和安装在壳体顶盖下方的水箱,其顶侧可分离,用于接收和保持在热交换器处冷凝的水。
    • 10. 发明申请
    • AUTO-STOPPING ABRASIVE COMPOSITION FOR POLISHING HIGH STEP HEIGHT OXIDE LAYER
    • 自动停止磨料组合物,用于抛光高温高氧化层
    • WO2006115393A1
    • 2006-11-02
    • PCT/KR2006/001619
    • 2006-04-28
    • TECHNO SEMICHEM CO., LTD.AHN, Jung-RyulPARK, Jong-KwanKIM, Seok-JuJEONG, Eun-IlHAN, Deok-SuPARK, Hyu-BumBAEK, Kui-JongLEE, Tae-Kyeong
    • AHN, Jung-RyulPARK, Jong-KwanKIM, Seok-JuJEONG, Eun-IlHAN, Deok-SuPARK, Hyu-BumBAEK, Kui-JongLEE, Tae-Kyeong
    • C09K3/14
    • C09K3/1463C09G1/02H01L21/31053
    • The present invention relates to a chemical - mechanical polishing composition which is employed in a process for chemical -mechanical polishing of silicon oxide layer having severe unevenness with large step-height in manufacturing technology of semiconductor device and a process for chemical -mechanical polishing using the same, which has auto- stopping function that the rate of polishing is much lowered after planarization by removing step-height, being characterized in that it comprises i) abrasive particles of metal oxide; and ii) at least one compound (s) selected from the group consisting of amino alcohols, hydroxycarboxylic acid having at least 3 of the total number of carboxylic acid group (s) and hydroxyl group (s) or their salts, or a mixture thereof . In the composition of the invention, a polymeric organic acid, a preservative, a lubricant and a surfactant may be further contained. The auto- stopping polishing composition according to the present invention provides effects of shortening the vapor -deposit ion time of a layer to be polished, saving the raw material to be vapor- deposited, shortening the chemical -mechanical polishing time, and saving the slurry employed. Thus, according to the present invention, the material cost is reduced and the process time is shortened, and increase of the process margin through the auto- stopping function of the polishing rate advantageously results in enhanced productivity.
    • 本发明涉及一种化学机械抛光组合物,该化学机械抛光组合物用于半导体器件的制造技术中具有大步长的具有严重不均匀性的氧化硅层的化学机械抛光方法和使用该半导体器件的化学机械抛光方法 相同的,具有自动停止功能,通过去除步骤高度,平面化后抛光速率大大降低,其特征在于它包括i)金属氧化物的磨料颗粒; 和ii)至少一种选自氨基醇,具有至少3个羧基基团和羟基或其盐的羟基羧酸的化合物或其混合物 。 在本发明的组合物中,可以进一步包含聚合有机酸,防腐剂,润滑剂和表面活性剂。 根据本发明的自动停止抛光组合物提供了缩短待抛光层的蒸气沉积离子时间的效果,节省了原料蒸汽沉积,缩短了化学机械抛光时间,并节省了浆料 采用。 因此,根据本发明,材料成本降低,处理时间缩短,并且通过抛光速度的自动停止功能增加工艺余量有利地提高了生产率。