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    • 9. 发明申请
    • A SECURE METHOD FOR CALCULATING A POLYNOMIAL CONVOLUTION OPERATION FOR AN NTRU CRYPTOSYSTEM
    • 一种用于计算NTRU CRYPTOSYSTEM的多项式转换操作的安全方法
    • WO2009084752A1
    • 2009-07-09
    • PCT/KR2007/006988
    • 2007-12-28
    • INHA-INDUSTRY PARTNERSHIP INSTITUTELEE, Mun-Kyu
    • LEE, Mun-Kyu
    • H04L9/30
    • H04L9/3093H04L9/003
    • A secure method is disclosed which calculates a polynomial convolution operation for an NTRU cryptosystem as a public-key cryptosystem. The secure method calculates a polynomial convolution operation with a first polynomial (which corresponds to a public key or a ciphertext) and a second polynomial arbitrarily selectable in NTRU encryption and decryption. The method comprising: (1) initializing respective elements of an array by an initial value that is not zero; and (2) storing the polynomial convolution operation result of the first and second polynomials in the array initialized by the initial value that is not zero. The secure method provides a secure cryptosystem designed so that a polynomial convolution operation, which is a primary operation of an NTRU cryptosystem, has resistance against power analysis attacks, and a method for blocking power analysis attacks, such as simple power analysis (SPA) and differential power attack (DPA). The secure method can prevent power analysis attacks without large overheads and thus efficiently perform a polynomial convolution operation, thereby maintaining the performance of a security system above a certain level.
    • 公开了一种安全方法,其计算作为公钥密码系统的NTRU密码系统的多项式卷积运算。 安全方法利用在NTRU加密和解密中任意选择的第一多项式(对应于公钥或密文)和第二多项式来计算多项式卷积运算。 该方法包括:(1)通过不为零的初始值初始化阵列的各个元素; 以及(2)将所述第一和第二多项式的多项式卷积运算结果存储在由不为零的初始值初始化的阵列中。 安全方法提供了一种安全密码系统,其设计使得作为NTRU密码系统的主要操作的多项式卷积运算具有抵抗功率分析攻击的阻力,以及用于阻断功率分析攻击的方法,诸如简单功率分析(SPA)和 差动力攻击(DPA)。 安全方法可以防止功率分析攻击,而无需大的开销,从而有效地执行多项式卷积运算,从而将安全系统的性能保持在一定程度以上。
    • 10. 发明申请
    • METHOD OF FABRICATING THREE-DIMENSIONAL PATTERNED STRUCTURE USING IMPRINTING LITHOGRAPHY PROCESS AND PHOTO LITHOGRAPHY PROCESS
    • 使用印刷光刻工艺制作三维图案结构的方法和照片平版印刷方法
    • WO2009069858A1
    • 2009-06-04
    • PCT/KR2008/001138
    • 2008-02-27
    • INHA-INDUSTRY PARTNERSHIP INSTITUTEPARK, Se GeunKIM, Han Hyoung
    • PARK, Se GeunKIM, Han Hyoung
    • H01L21/00H01L21/027
    • H01L21/0273B81C1/00031B81C2201/0153B82Y10/00B82Y40/00G03F7/0002
    • Disclosed herein is a method of fabricating a three-dimensional patterned structure using an imprint lithography process and a photolithography process, in which the height of a residual photoresist layer, which is problematic to control, is controlled by controlling only a process time in an imprint lithography process, and then a photolithography process is additionally performed, thus fabricating a new three-dimensional patterned structure without performing an additional process for removing the residual photoresist layer. The method of fabricating a three-dimensional patterned structure includes: (a) depositing a photoresist on a substrate through spin coating; (b) imprinting the deposited photoresist using a mold having a predetermined pattern at a predetermined temperature and pressure to fabricated a structure; and (c) providing a photo mask having a predetermined pattern on the fabricated structure and then exposing and developing the structure to form a three-dimensional patterned structure having a specific pattern.
    • 本文公开了使用压印光刻工艺和光刻工艺制造三维图案化结构的方法,其中通过仅控制压印中的处理时间来控制对控制有问题的残留光致抗蚀剂层的高度 然后再进行光刻工艺,由此制造新的三维图案结构,而不需要额外的去除残余光致抗蚀剂层的工艺。 制造三维图案结构的方法包括:(a)通过旋涂在衬底上沉积光致抗蚀剂; (b)使用具有预定图案的模具在预定温度和压力下印刷沉积的光致抗蚀剂以制造结构; 和(c)在所制造的结构上提供具有预定图案的光掩模,然后曝光和显影该结构以形成具有特定图案的三维图案结构。