专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2009069858A1 METHOD OF FABRICATING THREE-DIMENSIONAL PATTERNED STRUCTURE USING IMPRINTING LITHOGRAPHY PROCESS AND PHOTO LITHOGRAPHY PROCESS 审中-公开
标题翻译：使用印刷光刻工艺制作三维图案结构的方法和照片平版印刷方法
公开(公告)号：WO2009069858A1
公开(公告)日：2009-06-04
申请号：PCT/KR2008/001138
申请日：2008-02-27
申请人： INHA-INDUSTRY PARTNERSHIP INSTITUTE , PARK, Se Geun , KIM, Han Hyoung
发明人： PARK, Se Geun , KIM, Han Hyoung
IPC分类号： H01L21/00 , H01L21/027
CPC分类号： H01L21/0273 , B81C1/00031 , B81C2201/0153 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Disclosed herein is a method of fabricating a three-dimensional patterned structure using an imprint lithography process and a photolithography process, in which the height of a residual photoresist layer, which is problematic to control, is controlled by controlling only a process time in an imprint lithography process, and then a photolithography process is additionally performed, thus fabricating a new three-dimensional patterned structure without performing an additional process for removing the residual photoresist layer. The method of fabricating a three-dimensional patterned structure includes: (a) depositing a photoresist on a substrate through spin coating; (b) imprinting the deposited photoresist using a mold having a predetermined pattern at a predetermined temperature and pressure to fabricated a structure; and (c) providing a photo mask having a predetermined pattern on the fabricated structure and then exposing and developing the structure to form a three-dimensional patterned structure having a specific pattern.
摘要翻译：本文公开了使用压印光刻工艺和光刻工艺制造三维图案化结构的方法，其中通过仅控制压印中的处理时间来控制对控制有问题的残留光致抗蚀剂层的高度然后再进行光刻工艺，由此制造新的三维图案结构，而不需要额外的去除残余光致抗蚀剂层的工艺。制造三维图案结构的方法包括：（a）通过旋涂在衬底上沉积光致抗蚀剂; （b）使用具有预定图案的模具在预定温度和压力下印刷沉积的光致抗蚀剂以制造结构; 和（c）在所制造的结构上提供具有预定图案的光掩模，然后曝光和显影该结构以形成具有特定图案的三维图案结构。

IPRDB

热门服务

关于我们

友情链接

联系方式