专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2008085280A3 HIGH TEMPERATURE AMMONIA SCR CATALYST AND METHOD OF USING THE CATALYST 审中-公开
标题翻译：高温氨氮SCR催化剂及使用催化剂的方法
公开(公告)号：WO2008085280A3
公开(公告)日：2008-12-24
申请号：PCT/US2007025566
申请日：2007-12-13
申请人： CATALYTIC SOLUTIONS INC , MALYALA RAJASHEKHARAM , IRETSKAYA SVETLANA , DEGUNS ERIC , GOLDEN STEPHEN J
发明人： MALYALA RAJASHEKHARAM , IRETSKAYA SVETLANA , DEGUNS ERIC , GOLDEN STEPHEN J
IPC分类号： B01D53/56
CPC分类号： B01J29/061 , B01D53/9418 , B01D2251/2062 , B01D2255/2065 , B01D2255/20738 , B01D2255/407 , B01D2255/502 , B01D2255/504 , B01D2255/908 , B01J23/002 , B01J29/072 , B01J29/076 , B01J29/40 , B01J29/405 , B01J29/7007 , B01J29/7057 , B01J29/80 , B01J37/0242 , B01J37/0246 , B01J2229/20 , B01J2523/36 , B01J2523/3706 , B01J2523/3712 , B01J2523/48 , Y02T10/24
摘要： A catalyst and a method for selectively reducing nitrogen oxides ("NOx") with ammonia are provided The catalyst includes a first component comprising a zeolite or mixture of zeolites a second component comprising at least one member selected from the group consisting of cerium, iron, copper, gallium, manganese, chromium, cobalt, molybdenum, tin, rhenium, tantalum, osmium, banum, boron, calcium, strontium, potassium, vanadium, nickel, tungsten, an actinide, mixtures of actinides, a lanthanide, mixtures of lanthamdes, and mixtures thereof, optionally an oxygen storage matepal and optionally an inorganic oxide The catalyst selectively reduces nitrogen oxides to nitrogen with ammoma at high temperatures The catalyst has high hydrothermal stability The catalyst has high activity for conversion of low levels of nitrogen oxides in exhaust streams
摘要翻译：提供催化剂和用氨选择性还原氮氧化物（“NOx”）的方法。催化剂包括包含沸石或沸石混合物的第一组分，第二组分包含选自铈，铁，铜，镓，锰，铬，钴，钼，锡，铼，钽，锇，um，硼，钙，锶，钾，钒，镍，钨，锕系元素，锕系元素，镧系元素的混合物，其混合物，任选的储氧物质和任选的无机氧化物催化剂在高温下选择性地将氨氧化物还原成氨。催化剂具有高的水热稳定性催化剂具有高的排放流中低水平的氮氧化物的转化活性

2. 发明申请

WO2011160004A1 METHOD AND APPARATUS FOR PRECURSOR DELIVERY 审中-公开
标题翻译：前置递送的方法和装置
公开(公告)号：WO2011160004A1
公开(公告)日：2011-12-22
申请号：PCT/US2011/040862
申请日：2011-06-17
申请人： CAMBRIDGE NANOTECH INC. , LIU, Guo , BERTUCH, Adam , DEGUNS, Eric, W. , SUNDARAM, Ganesh, M. , BHATIA, Ritwik , BECKER, Jill, Svenja , DALBERTH, Mark, J.
发明人： LIU, Guo , BERTUCH, Adam , DEGUNS, Eric, W. , SUNDARAM, Ganesh, M. , BHATIA, Ritwik , BECKER, Jill, Svenja , DALBERTH, Mark, J.
IPC分类号： C23C16/00
CPC分类号： C23C16/52 , C23C16/4481 , C23C16/45544
摘要： An improved precursor vaporization device and method for vaporizing liquid and solid precursors having a low vapor pressure at a desired precursor temperature includes elements and operating methods for injecting an inert gas boost pulse into a precursor container prior to releasing a precursor pulse to a reaction chamber. An improved ALD system and method for growing thin films having more thickness and thickness uniformity at lower precursor temperatures includes devices and operating methods for injecting an inert gas boost pulse into a precursor container prior to releasing a precursor pulse to a reaction chamber and for releasing a plurality of first precursor pulses into a reaction chamber to react with substrates before releasing a different second precursor pulse into the reaction chamber to react with the substrates.
摘要翻译：用于蒸发具有所需前体温度的低蒸汽压的液体和固体前体的改进的前体蒸发装置和方法包括在将前体脉冲释放到反应室之前将惰性气体升压脉冲注入前体容器中的元件和操作方法。用于生长在较低前体温度下具有更大厚度和厚度均匀性的薄膜的改进的ALD系统和方法包括用于在将前体脉冲释放到反应室之前将惰性气体升压脉冲注入前体容器的装置和操作方法，多个第一前体脉冲进入反应室以在将不同的第二前体脉冲释放到反应室中以与基板反应以与基板反应，以与基板反应。

3. 发明申请

WO2010098875A2 ALD SYSTEMS AND METHODS 审中-公开
标题翻译： ALD系统和方法
公开(公告)号：WO2010098875A2
公开(公告)日：2010-09-02
申请号：PCT/US2010/000590
申请日：2010-02-26
申请人： CAMBRIDGE NANOTECH INC. , DEGUNS, Eric, W. , SUNDARAM, Ganesh, M. , COUTU, Roger, R. , BECKER, Jill, Svenja
发明人： DEGUNS, Eric, W. , SUNDARAM, Ganesh, M. , COUTU, Roger, R. , BECKER, Jill, Svenja
IPC分类号： C23C16/44 , C23C16/00
CPC分类号： C23C16/4401 , C23C16/45504 , C23C16/45546 , C23C16/45582
摘要： A gas deposition system (1000) configured as a dual-chamber "tower" includes a frame (1140) for supporting two reaction chamber assemblies (3000) , one vertically above the other. Each chamber assembly (3000) includes an outer wall assembly surrounding a hollow chamber (3070) sized to receive a single generation 4.5 (GEN 4.5) glass plate substrate through a load port. The substrate is disposed horizontally inside the hollow chamber (3070) and the chamber assembly (3000) includes removable and cleanable triangular shaped input (3150) and output (3250) plenums disposed external to the hollow chamber (3070) and configured to produce substantially horizontally directed laminar gas flow over a top surface of the substrate. Each chamber includes a cleanable and removable chamber liner assembly (6000) disposed inside the hollow chamber (3070) to contain precursor gases therein thereby preventing contamination of chamber outer walls (3010, 3020, 3030, 3040).
摘要翻译：构造为双室“塔”的气体沉积系统（1000）包括用于支撑两个反应室组件（3000）的框架（1140），一个垂直地在另一个上方。每个室组件（3000）包括围绕中空室（3070）的外壁组件，该中空室（3070）的尺寸适于通过负载端口接纳单一的4.5（GEN 4.5）玻璃板基板。基板被水平地设置在中空室（3070）内，并且室组件（3000）包括设置在中空室（3070）外部的可移除和可清洁的三角形输入（3150）和输出（3250）增压室，并且构造成基本上水平地定向层流气体流过衬底的顶表面。每个室包括设置在中空室（3070）内部的可清洁且可移除的室衬套组件（6000），以在其中容纳前体气体，从而防止室外壁（3010,3020,3030,3040）的污染。

4. 发明申请

WO2010098875A3 ALD SYSTEMS AND METHODS 审中-公开
标题翻译： ALD系统和方法
公开(公告)号：WO2010098875A3
公开(公告)日：2010-10-21
申请号：PCT/US2010000590
申请日：2010-02-26
申请人： CAMBRIDGE NANOTECH INC , DEGUNS ERIC W , SUNDARAM GANESH M , COUTU ROGER R , BECKER JILL SVENJA
发明人： DEGUNS ERIC W , SUNDARAM GANESH M , COUTU ROGER R , BECKER JILL SVENJA
IPC分类号： H01L29/76 , C23C16/00
CPC分类号： C23C16/4401 , C23C16/45504 , C23C16/45546 , C23C16/45582
摘要： A gas deposition system (1000) configured as a dual-chamber "tower" includes a frame (1140) for supporting two reaction chamber assemblies (3000), one vertically above the other. Each chamber assembly (3000) includes an outer wall assembly surrounding a hollow chamber (3070) sized to receive a single generation 4.5 (GEN 4.5) glass plate substrate through a load port. The substrate is disposed horizontally inside the hollow chamber (3070) and the chamber assembly (3000) includes removable and cleanable triangular shaped input (3150) and output (3250) plenums disposed external to the hollow chamber (3070) and configured to produce substantially horizontally directed laminar gas flow over a top surface of the substrate. Each chamber includes a cleanable and removable chamber liner assembly (6000) disposed inside the hollow chamber (3070) to contain precursor gases therein thereby preventing contamination of chamber outer walls (3010, 3020, 3030, 3040).
摘要翻译：构造为双室“塔”的气体沉积系统（1000）包括用于支撑两个反应室组件（3000）的框架（1140），一个垂直地在另一个之上。每个腔室组件（3000）包括围绕中空腔室（3070）的外壁组件，所述中空腔室的尺寸被设计为通过加载端口接收单代4.5（GEN 4.5）玻璃板基底。基板水平地布置在中空室（3070）内部，并且室组件（3000）包括可移除且可清洁的三角形输入（3150）和输出（3250）增压室，其布置在中空室（3070）外部并且构造成基本上水平定向层流气体流过衬底的顶部表面。每个腔室包括设置在中空腔室（3070）内的可清洁和可移除的腔室衬里组件（6000），以在其中容纳前驱物气体，从而防止腔室外壁（3010,3020,3030,3040）的污染。

5. 发明申请

WO2008085280A2 HIGH TEMPERATURE AMMONIA SCR CATALYST AND METHOD OF USING THE CATALYST 审中-公开
标题翻译：高温氨氮SCR催化剂及使用催化剂的方法
公开(公告)号：WO2008085280A2
公开(公告)日：2008-07-17
申请号：PCT/US2007/025566
申请日：2007-12-13
申请人： CATALYTIC SOLUTIONS, INC. , MALYALA, Rajashekharam , IRETSKAYA, Svetlana , DEGUNS, Eric , GOLDEN, Stephen, J.
发明人： MALYALA, Rajashekharam , IRETSKAYA, Svetlana , DEGUNS, Eric , GOLDEN, Stephen, J.
IPC分类号： B01D53/56 , B01J29/00 , B01J8/00 , C01B21/00
CPC分类号： B01J29/061 , B01D53/9418 , B01D2251/2062 , B01D2255/2065 , B01D2255/20738 , B01D2255/407 , B01D2255/502 , B01D2255/504 , B01D2255/908 , B01J23/002 , B01J29/072 , B01J29/076 , B01J29/40 , B01J29/405 , B01J29/7007 , B01J29/7057 , B01J29/80 , B01J37/0242 , B01J37/0246 , B01J2229/20 , B01J2523/36 , B01J2523/3706 , B01J2523/3712 , B01J2523/48 , Y02T10/24
摘要： A catalyst and a method for selectively reducing nitrogen oxides ('"NO x ") with ammonia are provided. The catalyst includes a first component comprising a zeolite or mixture of zeolites selected from the group consisting of ZSM-5, ZSM-I l, ZSM-12, ZSM-18, ZSM-23, MCM-zeolites, mordenite, faujasite, ferrierite, zeolite beta, and mixtures thereof; a second component comprising at least one member selected from the group consisting of cerium, iron, copper, gallium, manganese, chromium, cobalt, molybdenum, tin, rhenium, tantalum, osmium, barium, boron, calcium, strontium, potassium, vanadium, nickel, tungsten, an actinide, mixtures of actinides, a lanthanide, mixtures of lanthanides, and mixtures thereof; optionally an oxygen storage material and optionally an inorganic oxide. The catalyst selectively reduces nitrogen oxides to nitrogen with ammonia at high temperatures. The catalyst has high hydrothermal stability. The catalyst has high activity for conversion of low levels of nitrogen oxides in exhaust streams. The catalyst and the method may have special application to selective reduction of nitrogen oxides in exhaust gas from gas turbines and gas engines, although the catalyst and the method have broad application to a wide range of gas streams that have excess oxygen and high temperatures. The temperature of exhaust gas from gas turbines and gas engines is high. Both the high temperature and the low levels of inlet NO x are challenging for selective catalytic reduction (SCR) catalysts.
摘要翻译：提供催化剂和用氨选择还原氮氧化物（“NO”x“）的方法。催化剂包括第一组分，其包含选自ZSM-5，ZSM-11，ZSM-12，ZSM-18，ZSM-23，MCM-沸石，丝光沸石，八面沸石，镁碱沸石的沸石或沸石混合物，沸石β及其混合物; 包含选自铈，铁，铜，镓，锰，铬，钴，钼，锡，铼，钽，锇，钡，硼，钙，锶，钾，钒中的至少一种的第二组分，镍，钨，锕系元素，锕系元素的混合物，镧系元素，镧系元素的混合物及其混合物; 任选的储氧材料和任选的无机氧化物。该催化剂在高温下用氨选择性还原氮氧化物至氮气。该催化剂具有很高的水热稳定性。该催化剂具有高的活性，用于转化废气流中低含量的氮氧化物。催化剂和方法可能特别适用于选择性还原来自燃气轮机和燃气发动机的废气中的氮氧化物，尽管催化剂和方法广泛应用于具有过量氧气和高温的大范围气流。燃气轮机和燃气发动机的废气温度高。进口NO x的高温和低水平对选择性催化还原（SCR）催化剂都是挑战的。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式