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    • 9. 发明申请
    • SUPER-SATURATION CURRENT FIELD EFFECT TRANSISTOR AND TRANS-IMPEDANCE MOS DEVICE
    • 超饱和电流场效应晶体管和TRANS-IMPEDANCE MOS器件
    • WO2017105554A1
    • 2017-06-22
    • PCT/US2016/044800
    • 2016-07-29
    • CIRCUIT SEED, LLC
    • SCHOBER, Susan, MaryaSCHOBER, Robert, C.
    • H01L21/8238H01L27/092
    • H01L27/092H01L21/823814H01L27/0207H03F1/086H03F3/04H03F3/45179H03F2203/45246
    • The present invention relates to an improvement to a current field effect transistor and trans-impedance MOS devices based on a novel and inventive compound device structure, enabling a charge-based approach that takes advantage of sub-threshold operation, for designing analog CMOS circuits. The present invention further relates to a super-saturation current field effect transistor (xiFET), having a source, a drain, a diffusion, a first gate, and a second gate terminals, in which a source channel is defined between the source and diffusion terminals, a drain channel is defined between the drain and diffusion terminals. The first gate terminal is capacitively coupled to the source channel; and the second gate terminal is capacitively coupled to said drain channel. The diffusion terminal receives a current causing change in diffused charge density throughout said source and drain channel. The xiFET provides a fundamental building block for designing various analog circuites.
    • 本发明涉及基于新颖且创造性的复合器件结构对当前场效应晶体管和跨阻抗MOS器件的改进,使得能够利用基于电荷的方法利用亚阈值 操作,用于设计模拟CMOS电路。 本发明进一步涉及具有源极,漏极,扩散,第一栅极和第二栅极端子的超饱和电流场效应晶体管(xiFET),其中源极沟道被限定在源极和扩散极之间 在漏极和扩散端子之间限定漏极沟道。 第一栅极端子电容耦合到源极沟道; 并且第二栅极端子电容耦合到所述漏极沟道。 扩散终端接收电流,引起遍及所述源极和漏极沟道的扩散电荷密度的变化。 xiFET为设计各种模拟电路提供了一个基本构建模块。