专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2007047055A2 REACTION CHAMBER WITH OPPOSING POCKETS FOR GAS INJECTION AND EXHAUST 审中-公开
标题翻译：反应室与反对袋用于气体注射和排气
公开(公告)号：WO2007047055A2
公开(公告)日：2007-04-26
申请号：PCT/US2006/037818
申请日：2006-09-27
申请人： APPLIED MATERIALS, INC. , YUDOVSKY, Joseph , COOK, Robert C. , KIM, Yeong K. , TAM, Alexander , MAHAJANI, Maitreyee , BRAILOVE, Adam A. , GHANAYEM, Steve G.
发明人： YUDOVSKY, Joseph , COOK, Robert C. , KIM, Yeong K. , TAM, Alexander , MAHAJANI, Maitreyee , BRAILOVE, Adam A. , GHANAYEM, Steve G.
IPC分类号： C23F1/00 , C23C16/00
CPC分类号： C23C16/45578 , C23C16/46 , H01L21/67109
摘要： The present invention generally provides a batch processing chamber having a quartz chamber, at least one heater block, an inject assembly coupled to one side of the quartz chamber, and an exhaust assembly coupled to an opposite side of the quartz chamber. In one embodiment, the inject assembly is independently temperature controlled. In another embodiment, at least one temperature sensor is disposed outside the quartz chamber.
摘要翻译：本发明通常提供一种批处理室，其具有石英室，至少一个加热器块，耦合到石英室的一侧的注入组件以及耦合到石英室的相对侧的排气组件石英室。在一个实施例中，注射组件是独立温度控制的。在另一个实施例中，至少一个温度传感器设置在石英室的外部。

2. 发明申请

WO2007041012A2 BATCH WAFER HANDLING SYSTEM 审中-公开
标题翻译：批量处理系统
公开(公告)号：WO2007041012A2
公开(公告)日：2007-04-12
申请号：PCT/US2006/036866
申请日：2006-09-21
申请人： APPLIED MATERIALS, INC. , BRAILOVE, Adam A , WEBB, Aaron
发明人： BRAILOVE, Adam A , WEBB, Aaron
IPC分类号： C23C16/00
CPC分类号： H01L21/67781 , H01L21/67757
摘要： The present invention generally provides a batch processing system having a processing chamber and a loading chamber. Substrates are transferred in and out the processing chamber in a batch by a substrate boat. A batch handling tool of the present invention is generally used in the loading chamber to load and unload the structured substrate support by group. The batch handling tool generally comprises a support member, which is configured to host at least two sets of support blades. The at least two sets of substrate supports are generally mounted on the support member and their positions are switchable when the support member rotates. Each set of the support blades is configured to load (unload) at least two substrates into(from) the substrate boat.
摘要翻译：本发明通常提供具有处理室和装载室的批处理系统。基板通过基板舟皿一批地进出处理室。本发明的批处理工具通常用于装载室中，以组合装载和卸载结构化基板支撑件。批处理工具通常包括支撑构件，其被构造成承载至少两组支撑叶片。至少两组基板支撑件通常安装在支撑构件上，并且当支撑构件旋转时它们的位置可切换。每组支撑叶片被配置为将至少两个基板装载（卸载）到（从）基板舟皿中。

3. 发明申请

WO2006055984A2 SUBSTRATE PROCESSING APPARATUS USING A BATCH PROCESSING CHAMBER 审中-公开
标题翻译：使用批处理室的基板处理装置
公开(公告)号：WO2006055984A2
公开(公告)日：2006-05-26
申请号：PCT/US2005/042762
申请日：2005-11-22
申请人： APPLIED MATERIALS, INC. , THAKUR, Randhir, P.s. , GHANAYEM, Steve, G. , YUDOVSKY, Joseph , WEBB, Aaron , BRAILOVE, Adam, A. , MERRY, Nir , SHAH, Vinay, K. , HEGEDUS, Andreas, G.
发明人： THAKUR, Randhir, P.s. , GHANAYEM, Steve, G. , YUDOVSKY, Joseph , WEBB, Aaron , BRAILOVE, Adam, A. , MERRY, Nir , SHAH, Vinay, K. , HEGEDUS, Andreas, G.
IPC分类号： C12M3/00
CPC分类号： H01L21/67109 , C23C16/4412 , C23C16/45546 , C23C16/45593 , C23C16/4584 , C23C16/481 , C23C16/54 , H01L21/67017 , H01L21/67115 , H01L21/67167 , H01L21/6719 , H01L21/67207 , H01L21/67745 , H01L21/67757 , H01L21/67781
摘要： Aspects of the invention include a method and apparatus for processing a substrate using a multi-chamber processing system ( e.g., a cluster tool) adapted to process substrates in one or more batch and/or single substrate processing chambers to increase the system throughput. In one embodiment, a system is configured to perform a substrate processing sequence that contains batch processing chambers only, or batch and single substrate processing chambers, to optimize throughput and minimize processing defects. In one embodiment, a batch processing chamber is used to increase the system throughput by performing a process recipe step that is disproportionately long compared to other process recipe steps in the substrate processing sequence. Aspects of the invention also include an apparatus and method for delivering a precursor to a processing chamber so that a repeatable ALD or CVD deposition process can be performed.
摘要翻译：本发明的方面包括使用适于在一个或多个批次和/或单个基板处理室中处理基板以增加系统吞吐量的多室处理系统（例如，集群工具）来处理基板的方法和装置。在一个实施例中，系统被配置为执行仅包含批处理室的衬底处理序列，或批处理和单个衬底处理室，以优化生产量并最小化处理缺陷。在一个实施例中，批处理室用于通过执行与衬底处理序列中的其它工艺配方步骤相比长度不成比例的工艺配方步骤来增加系统通过量。本发明的方面还包括用于将前体输送到处理室的装置和方法，使得可以执行可重复的ALD或CVD沉积工艺。

4. 发明申请

WO2007131053A3 BATCH PROCESSING CHAMBER WITH DIFFUSER PLATE AND INJECTOR ASSEMBLY 审中-公开
公开(公告)号：WO2007131053A3
公开(公告)日：2007-11-15
申请号：PCT/US2007/068059
申请日：2007-05-02
申请人： APPLIED MATERIALS, INC. , YUDOVSKY, Joseph , NGO, Tai T. , TEJAMO, Cesar , MAHAJANI, Maitreyee , MCDOUGALL, Brendan , HUANG, Yi-chiau , COOK, Robert C. , KIM, Yeong K. , TAM, Alexander , BRAILOVE, Adam A. , GHANAYEM, Steve G.
发明人： YUDOVSKY, Joseph , NGO, Tai T. , TEJAMO, Cesar , MAHAJANI, Maitreyee , MCDOUGALL, Brendan , HUANG, Yi-chiau , COOK, Robert C. , KIM, Yeong K. , TAM, Alexander , BRAILOVE, Adam A. , GHANAYEM, Steve G.
IPC分类号： C23C16/00
摘要： An apparatus (300) for batch processing of a wafer is disclosed. In one embodiment the batch processing apparatus includes a bell jar furnace having a diffuser disposed between gas inlets (326) and the substrate positioned within the furnace to direct flows within the chamber around the perimeter of the substrate (321).

5. 发明申请

WO2007041012A3 BATCH WAFER HANDLING SYSTEM 审中-公开
标题翻译：批量晶圆处理系统
公开(公告)号：WO2007041012A3
公开(公告)日：2007-11-01
申请号：PCT/US2006036866
申请日：2006-09-21
申请人： APPLIED MATERIALS INC , BRAILOVE ADAM A , WEBB AARON
发明人： BRAILOVE ADAM A , WEBB AARON
IPC分类号： C23C16/00
CPC分类号： H01L21/67781 , H01L21/67757
摘要： The present invention generally provides a batch processing system having a processing chamber and a loading chamber. Substrates are transferred in and out the processing chamber in a batch by a substrate boat. A batch handling tool of the present invention is generally used in the loading chamber to load and unload the structured substrate support by group. The batch handling tool generally comprises a support member, which is configured to host at least two sets of support blades. The at least two sets of substrate supports are generally mounted on the support member and their positions are switchable when the support member rotates. Each set of the support blades is configured to load (unload) at least two substrates into(from) the substrate boat.
摘要翻译：本发明通常提供具有处理室和装载室的批处理系统。基板通过基板船一批一批地转入和转出处理室。通常在装载室中使用本发明的批量处理工具来逐组装载和卸载结构化衬底支撑件。批量处理工具通常包括支撑构件，该支撑构件构造成容纳至少两组支撑叶片。至少两组基底支撑件通常安装在支撑构件上，并且当支撑构件旋转时它们的位置是可切换的。每组支撑刀片被构造成将至少两个衬底加载（卸载）到衬底舟中（从）衬底舟。

6. 发明申请

WO2007047055A3 REACTION CHAMBER WITH OPPOSING POCKETS FOR GAS INJECTION AND EXHAUST 审中-公开
标题翻译：用于气体注入和排气的反应室
公开(公告)号：WO2007047055A3
公开(公告)日：2007-10-25
申请号：PCT/US2006037818
申请日：2006-09-27
申请人： APPLIED MATERIALS INC , YUDOVSKY JOSEPH , COOK ROBERT C , KIM YEONG K , TAM ALEXANDER , MAHAJANI MAITREYEE , BRAILOVE ADAM A , GHANAYEM STEVE G
发明人： YUDOVSKY JOSEPH , COOK ROBERT C , KIM YEONG K , TAM ALEXANDER , MAHAJANI MAITREYEE , BRAILOVE ADAM A , GHANAYEM STEVE G
IPC分类号： C23F1/00
CPC分类号： C23C16/45578 , C23C16/46 , H01L21/67109
摘要： The present invention generally provides a batch processing chamber having a quartz chamber, at least one heater block, an inject assembly coupled to one side of the quartz chamber, and an exhaust assembly coupled to an opposite side of the quartz chamber. In one embodiment, the inject assembly is independently temperature controlled. In another embodiment, at least one temperature sensor is disposed outside the quartz chamber.
摘要翻译：本发明通常提供了具有石英室，至少一个加热器块，耦合到石英腔的一侧的注射组件以及耦合到石英腔的相对侧的排气组件的批处理室。在一个实施例中，注射组件是独立温度控制的。在另一个实施例中，至少一个温度传感器设置在石英腔外部。

7. 发明申请

WO2007131053B1 BATCH PROCESSING CHAMBER WITH DIFFUSER PLATE AND INJECTOR ASSEMBLY 审中-公开
标题翻译：具有扩散板和注射器组件的批处理室
公开(公告)号：WO2007131053B1
公开(公告)日：2008-08-21
申请号：PCT/US2007068059
申请日：2007-05-02
申请人： APPLIED MATERIALS INC , YUDOVSKY JOSEPH , NGO TAI T , TEJAMO CESAR , MAHAJANI MAITREYEE , MCDOUGALL BRENDAN , HUANG YI-CHIAU , COOK ROBERT C , KIM YEONG K , TAM ALEXANDER , BRAILOVE ADAM A , GHANAYEM STEVE G
发明人： YUDOVSKY JOSEPH , NGO TAI T , TEJAMO CESAR , MAHAJANI MAITREYEE , MCDOUGALL BRENDAN , HUANG YI-CHIAU , COOK ROBERT C , KIM YEONG K , TAM ALEXANDER , BRAILOVE ADAM A , GHANAYEM STEVE G
IPC分类号： C23C16/00
CPC分类号： C23C16/46 , C23C16/45578 , H01L21/67109
摘要： An apparatus (300) for batch processing of a wafer is disclosed. In one embodiment the batch processing apparatus includes a bell jar furnace having a diffuser disposed between gas inlets (326) and the substrate positioned within the furnace to direct flows within the chamber around the perimeter of the substrate (321).
摘要翻译：公开了一种用于晶片批量处理的设备（300）。在一个实施方案中，批处理设备包括钟罩式炉，其具有设置在气体入口（326）和位于炉内的基板之间的扩散器，以引导室内围绕衬底（321）的周边的流动。

8. 发明申请

WO2007131053A2 BATCH PROCESSING CHAMBER WITH DIFFUSER PLATE AND INJECTOR ASSEMBLY 审中-公开
标题翻译：具有扩散板和注射器组件的批处理室
公开(公告)号：WO2007131053A2
公开(公告)日：2007-11-15
申请号：PCT/US2007068059
申请日：2007-05-02
申请人： APPLIED MATERIALS INC , YUDOVSKY JOSEPH , NGO TAI T , TEJAMO CESAR , MAHAJANI MAITREYEE , MCDOUGALL BRENDAN , HUANG YI-CHIAU , COOK ROBERT C , KIM YEONG K , TAM ALEXANDER , BRAILOVE ADAM A , GHANAYEM STEVE G
发明人： YUDOVSKY JOSEPH , NGO TAI T , TEJAMO CESAR , MAHAJANI MAITREYEE , MCDOUGALL BRENDAN , HUANG YI-CHIAU , COOK ROBERT C , KIM YEONG K , TAM ALEXANDER , BRAILOVE ADAM A , GHANAYEM STEVE G
IPC分类号： C23C16/00
CPC分类号： C23C16/46 , C23C16/45578 , H01L21/67109
摘要： An apparatus for batch processing of a wafer is disclosed. In one embodiment the batch processing apparatus includes a bell jar furnace having a diffuser disposed between gas inlets and the substrate positioned within the furnace to direct flows within the chamber around the perimeter of the substrate.
摘要翻译：公开了一种用于批处理晶片的设备。在一个实施例中，批处理设备包括钟罩式炉，其具有设置在气体入口之间的扩散器和位于炉内的基板，以引导室内围绕衬底周边的流动。

9. 发明申请

WO2006055984A3 SUBSTRATE PROCESSING APPARATUS USING A BATCH PROCESSING CHAMBER 审中-公开
标题翻译：使用分批处理室的基板处理装置
公开(公告)号：WO2006055984A3
公开(公告)日：2006-08-24
申请号：PCT/US2005042762
申请日：2005-11-22
申请人： APPLIED MATERIALS INC , THAKUR RANDHIR P S , GHANAYEM STEVE G , YUDOVSKY JOSEPH , WEBB AARON , BRAILOVE ADAM A , MERRY NIR , SHAH VINAY K , HEGEDUS ANDREAS G
发明人： THAKUR RANDHIR P S , GHANAYEM STEVE G , YUDOVSKY JOSEPH , WEBB AARON , BRAILOVE ADAM A , MERRY NIR , SHAH VINAY K , HEGEDUS ANDREAS G
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01L21/67109 , C23C16/45546 , C23C16/45593 , C23C16/4584 , C23C16/481 , C23C16/54 , H01L21/67017 , H01L21/67115 , H01L21/67167 , H01L21/6719 , H01L21/67207 , H01L21/67745 , H01L21/67757 , H01L21/67781
摘要： Aspects of the invention include a method and apparatus for processing a substrate using a multi-chamber processing system (e.g., a cluster tool) adapted to process substrates in one or more batch and/or single substrate processing chambers to increase the system throughput. In one embodiment, a system is configured to perform a substrate processing sequence that contains batch processing chambers only, or batch and single substrate processing chambers, to optimize throughput and minimize processing defects. In one embodiment, a batch processing chamber is used to increase the system throughput by performing a process recipe step that is disproportionately long compared to other process recipe steps in the substrate processing sequence. Aspects of the invention also include an apparatus and method for delivering a precursor to a processing chamber so that a repeatable ALD or CVD deposition process can be performed.
摘要翻译：本发明的各方面包括一种用于使用适合于在一个或多个批处理和/或单个基板处理室中处理基板以提高系统处理量的多室处理系统（例如，群集工具）来处理基板的方法和装置。在一个实施例中，系统被配置为执行仅包含批量处理室或批量和单个衬底处理室的衬底处理序列，以优化吞吐量并最小化处理缺陷。在一个实施例中，批处理室用于通过执行与衬底处理序列中的其他处理配方步骤相比不成比例地长的处理配方步骤来增加系统处理量。本发明的各方面还包括用于将前体传送到处理室的设备和方法，以便可以执行可重复的ALD或CVD沉积过程。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式