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41. 发明申请

WO2009098401A1 INSTALLATION ET PROCEDE POUR LE DECAPAGE EN CONTINU DE BANDES D'ACIER 审中-公开
标题翻译：钢带连续采集的装置和方法
公开(公告)号：WO2009098401A1
公开(公告)日：2009-08-13
申请号：PCT/FR2008/001655
申请日：2008-11-28
申请人： SIEMENS VAI METALS TECHNOLOGIES SAS , CROWTHER, Sandra , BARBIERI, Philippe , LEROYER, Jacques , CLAVEL, Jean-François
发明人： CROWTHER, Sandra , BARBIERI, Philippe , LEROYER, Jacques , CLAVEL, Jean-François
IPC分类号： C23G1/02 , C23G3/02
CPC分类号： C23G1/02 , C23G3/02
摘要： L'invention concerne le décapage de bandes d'acier en défilement continu, et plus particulièrement un procédé de décapage comprenant un contrôle centralisé de l'ensemble des opérations de décapage et l'installation (1) pour sa mise en œuvre.
摘要翻译：本发明涉及连续运行的钢带的酸洗，更具体地涉及一种酸洗方法，其包括对所有酸洗操作的集中控制，以及用于实施它的设备（1）。

42. 发明申请

WO2007134056A3 SPRAY JET CLEANING APPARATUS AND METHOD 审中-公开
标题翻译：喷射喷射清洁装置和方法
公开(公告)号：WO2007134056A3
公开(公告)日：2009-04-09
申请号：PCT/US2007068478
申请日：2007-05-08
申请人： AKRION TECHNOLOGIES INC , FRANKLIN COLE , FAN YAN , ROUILLARD MARK
发明人： FRANKLIN COLE , FAN YAN , ROUILLARD MARK
IPC分类号： C03C23/00 , B08B7/00 , C23G1/00 , C23G1/02
CPC分类号： H01L21/67051 , B05B7/0483 , B08B3/02
摘要： A spray cleaning device having an atomizing unit with at least one gas passage and at least one cleaning fluid passage converging Into a atomizing area. The gas flowing though the gas passage and the cleaning fluid flowing through the cleaning fluid passages combine to form a mixture at the atomizing area. The accelerating unit has an acceleration passage for spraying the mixture onto a substrate surface. The gas passages are preferably angled with respect to the cleaning acceleration passage.
摘要翻译：一种喷雾清洁装置，具有具有至少一个气体通道的雾化单元和汇聚到雾化区域中的至少一个清洁流体通道。流过气体通道的气体和流过清洗流体通道的清洗流体在雾化区域结合形成混合物。加速单元具有用于将混合物喷射到基板表面上的加速通道。气体通道优选地相对于清洁加速通道成角度。

43. 发明申请

WO2008052103A1 REMOVAL OF HIGH-DOSE ION-IMPLANTED PHOTORESIST USING SELF-ASSEMBLED MONOLAYERS IN SOLVENT SYSTEMS 审中-公开
标题翻译：使用自组装单体在溶剂系统中去除高剂量离子胶片
公开(公告)号：WO2008052103A1
公开(公告)日：2008-05-02
申请号：PCT/US2007/082501
申请日：2007-10-25
申请人： ADVANCED TECHNOLOGY MATERIALS, INC. , KORZENSKI, Michael B. , VISINTIN, Pamela M. , BAUM, Thomas H.
发明人： KORZENSKI, Michael B. , VISINTIN, Pamela M. , BAUM, Thomas H.
IPC分类号： C23G1/02 , C23G1/00
CPC分类号： G03F7/422 , B82Y10/00 , B82Y30/00 , G03F7/427 , H01L21/31133
摘要： A method and self assembled monolayer (SAM)-containing compositions for removing bulk and hardened photoresist material from microelectronic devices have been developed. The SAM-containing composition includes at least one solvent, at least one catalyst, at least one SAM component, and optionally a surfactant. The SAM-containing compositions effectively remove the hardened photoresist material while simultaneously passivating the underlying silicon-containing layer(s) in a one step process.
摘要翻译：已经开发了用于从微电子器件去除体积和硬化的光致抗蚀剂材料的方法和自组装单层（SAM）组合物。含SAM的组合物包括至少一种溶剂，至少一种催化剂，至少一种SAM组分和任选的表面活性剂。含SAM的组合物有效地除去硬化的光致抗蚀剂材料，同时一步法将下面的含硅层钝化。

44. 发明申请

WO2006071552A3 CLEANING METHODS FOR SILICON ELECTRODE ASSEMBLY SURFACE CONTAMINATION REMOVAL 审中-公开
公开(公告)号：WO2006071552A3
公开(公告)日：2006-07-06
申请号：PCT/US2005/045460
申请日：2005-12-15
申请人： LAM RESEARCH CORPORATION , REN, Daxing , SHIH, Hong
发明人： REN, Daxing , SHIH, Hong
IPC分类号： H01L21/302 , C23G1/02
摘要： Silicon electrode assembly decontamination cleaning methods and solutions, which control or eliminate possible chemical attacks of electrode assembly bonding materials, comprise ammonium fluoride, hydrogen peroxide, acetic acid, optionally ammonium acetate, and deionized water.

45. 发明申请

WO2005010947A3 CLEANING MASKS 审中-公开
标题翻译：清洁面具
公开(公告)号：WO2005010947A3
公开(公告)日：2005-08-18
申请号：PCT/US2004023596
申请日：2004-07-22
申请人： CHEMTRACE PREC CLEANING INC
发明人： TAN SAMANTHA , WANG JIANQI
IPC分类号： B08B3/04 , B08B3/10 , C23G1/02 , C23G3/00 , H01L21/00 , B08B3/12 , B08B3/00 , B08B6/00 , C03C23/00
CPC分类号： C23F1/44 , B08B3/044 , B08B3/102 , C23G1/02 , C23G3/00 , H01L21/67057
摘要： A method and apparatus for cleaning masks is described. In one embodiment, the invention is a method of cleaning a mask. The method includes placing the mask in a cleaning solution. The method also includes agitating the cleaning solution at a predetermined agitation level for a predetermined period of time.
摘要翻译：描述了用于清洁口罩的方法和设备。在一个实施例中，本发明是一种清洁面罩的方法。该方法包括将掩模放入清洁溶液中。该方法还包括在预定搅拌水平下搅拌清洁溶液达预定时间段。

46. 发明申请

WO2003074764A1 チタン系膜及びチタン酸化物の除去方法审中-公开
标题翻译：用于去除钛酸钡的涂层膜或氧化钛的方法
公开(公告)号：WO2003074764A1
公开(公告)日：2003-09-12
申请号：PCT/JP2003/001501
申请日：2003-02-13
申请人：日本碍子株式会社 , 松本圭司 , 松岡進 , 浅井裕次
发明人：松本圭司 , 松岡進 , 浅井裕次
IPC分类号： C23G1/02
CPC分类号： C23G1/081 , B28B2003/203 , C23G1/02 , C23G1/085
摘要： A method for removing a titanium based coating film from a mouthpiece for forming a honeycomb member having a base material and, formed on the surface thereof, the titanium based coating film or for removing an oxide of titanium from a mouthpiece for forming a honeycomb member having the oxide of titanium attached or deposited on the surface of its base material, which comprises using a releasing solution comprising a mixture of an acid and hydrogen peroxide. The method allows a large amount of a titanium based coating film to be removed from the mouthpiece for forming a honeycomb member, with no erosion of the base material thereof and with the prevention of re-precipitation of a dissolved titanium ion onto the base material.
摘要翻译：一种从用于形成具有基材的蜂窝构件的接口部件中除去钛基涂膜的方法，并且在其表面上形成钛基涂膜或从用于形成蜂窝构件的接口管中除去钛的氧化物的方法，附着或沉积在其基材表面上的钛的氧化物，其包括使用包含酸和过氧化氢的混合物的释放溶液。该方法允许从用于形成蜂窝构件的接口管中除去大量的钛基涂膜，而不会损害其基材，并且防止溶解的钛离子再沉淀到基材上。

47. 发明申请

WO0248430A2 ENHANCED OXIDE-REDUCING AGENT COMPOSITION, SYSTEM AND PROCESS 审中-公开
标题翻译：增强氧化还原剂组合物，系统和工艺
公开(公告)号：WO0248430A2
公开(公告)日：2002-06-20
申请号：PCT/US0142223
申请日：2001-09-20
申请人： ROCKWELL TECH LLC
发明人： TENCH MORGAN D , ANDERSON DENNIS P , WHITE JOHN
IPC分类号： B23K1/20 , C23G1/02 , C23G1/36 , H05K3/34 , C25B
CPC分类号： C23G1/02 , B23K1/206 , C23G1/36 , H05K3/3489
摘要： An improved solution for reduction of oxide includes an oxide reduction agent and a halide or pseudo halide. The solution may be used to enhance a catholyte for an electrochemical system and process for regenerating reducing agents used in ancillary chemical or electrochemical processes such as restoring solderability in components having recalcitrant oxides. Such a system and process employs a cathode, an anode, and an electrolyte system that is separated by a semipermeable ionic barrier into the catholyte and an anolyte. The catholyte includes the reduced member of a redox couple, which can be regenerated electrochemically.
摘要翻译：用于还原氧化物的改进的溶液包括氧化物还原剂和卤化物或假卤化物。该溶液可用于增强用于电化学系统的阴极电解液和用于再生辅助化学或电化学方法中使用的还原剂的方法，例如恢复具有顽固氧化物的组分中的可焊性。这种系统和方法采用阴极，阳极和电解质系统，其被半渗透离子屏障分离成阴极电解液和阳极电解液。阴极电解质包括氧化还原对的还原成员，其可以电化学地再生。

48. 发明申请

WO0154181A3 PROCESS AND APPARATUS FOR CLEANING SILICON WAFERS 审中-公开
标题翻译：清洗硅砂的工艺和装置
公开(公告)号：WO0154181A3
公开(公告)日：2002-01-03
申请号：PCT/US0102119
申请日：2001-01-19
申请人： LOXLEY TED ALBERT
发明人： LOXLEY TED ALBERT
IPC分类号： H01L21/304 , B08B3/10 , C23G1/02 , C23G1/14 , C25F1/00 , H01L21/00 , H01L21/306
CPC分类号： H01L21/02052 , B08B3/10 , C23G1/02 , C23G1/14 , C25F1/00 , H01L21/6704 , H01L21/67051 , H01L21/67057
摘要： An effective electropurge process and apparatus for wet processing of semiconductor wafers applies electrical charges to the wafer surface with an ample voltage sufficient to provide an effective field intensity which can substantially eliminate intolerable sub-0.05 micron "killer" defects when making highly advanced microchips with a feature size or line width less than 0.15 micron. The process can be used with frequent voltage reversal for automated wet-batch cleaning operations using cassettes that hold 10 to 50 wafers at a time and in various other operations involving megasonic transducers, mechanical brush scrubbers, laser cleaners and CMP equipment. The electropurge process is primarily intended for Fab plants where large wafers with a diameter of 200 to 400 mm require 250 to 350 steps including many dry layering, patterning and doping operations and at least 30 wet processing steps.
摘要翻译：用于半导体晶片的湿法处理的有效的电镀工艺和设备以足够的电压向晶片表面施加电荷，该电压足以提供有效的场强，其可以在制造高度先进的微芯片时基本上消除不可耐受的亚0.05微米“杀手”缺陷特征尺寸或线宽小于0.15微米。该过程可以使用频繁的电压反转来进行自动化的湿批次清洁操作，使用一次可以容纳10到50个晶片的盒，以及涉及兆声波换能器，机械刷洗涤器，激光清洁器和CMP设备的各种其他操作。电镀工艺主要用于Fab工厂，其中直径为200至400mm的大晶片需要250至350个步骤，包括许多干层压，图案化和掺杂操作以及至少30个湿加工步骤。

49. 发明申请

WO0072684A3 A COMPOSITION AND METHOD FOR CLEANING SURFACES 审中-公开
标题翻译：用于清洁表面的组合物和方法
公开(公告)号：WO0072684A3
公开(公告)日：2001-08-16
申请号：PCT/US0014939
申请日：2000-06-01
申请人： WATER WHOLE INTERNATIONAL INC
发明人： SCHULHOFF JEFFREY , SCHALL CHRISTIAN
IPC分类号： A01N37/16 , A01N59/00 , A61L2/18 , C02F5/10 , C11D3/39 , C11D3/48 , C11D7/08 , C11D7/26 , C11D7/32 , C11D7/34 , C11D7/36 , C23G1/02 , A01N25/00 , A01N37/00 , A01N47/36 , A61L2/00 , C02F1/00 , C23F11/12
CPC分类号： A61L2/186 , A01N37/16 , A01N59/00 , A61L2202/17 , C02F5/105 , C11D3/3945 , C11D3/48 , C11D7/08 , C11D7/261 , C11D7/263 , C11D7/265 , C11D7/3227 , C11D7/34 , C11D7/36 , C23G1/02 , A01N59/26 , A01N2300/00
摘要： A composition and method for cleaning surfaces having deposits, such as drink water tanks, supply water wells, water filtration systems, and distributor water lines. The composition contains in combination a cleaning solution and a disinfectant, such as hydrogen peroxide or peracidic acid. The cleaning solution can include hydrochloric acid and/or phosphoric acid in combination with inhibitors, dyes and water. The composition is applied to deposits which have formed on these surfaces.
摘要翻译：用于清洁具有沉淀物的表面的组合物和方法，例如饮用水箱，供水井，水过滤系统和分配器水管线。组合物组合包含清洁溶液和消毒剂，例如过氧化氢或过酸。清洁溶液可以包括与抑制剂，染料和水组合的盐酸和/或磷酸。该组合物用于在这些表面上形成的沉积物。

50. 发明申请

WO01053567A1 PICKLING AGENT CONTAINING UREA AND METHOD OF PRODUCING IT 审中-公开
标题翻译：含有尿素的制剂及其生产方法
公开(公告)号：WO01053567A1
公开(公告)日：2001-07-26
申请号：PCT/SE2001/000060
申请日：2001-01-12
IPC分类号： C23F1/28 , C23G1/02 , C23G1/08 , C25F1/06
CPC分类号： C23G1/086 , C23G1/025
摘要： A long-time stable pickling agent for the removal of an oxide layer on a stainless steel after heat treatment, such as welding, which pickling agent comprises nitric acid and fillers and constitutes of a pickling paste or pickling gel to be coated on the heat treated stainless steel, or of a pickling liquid to be sprayed on the steel. According to the invention, the pickling agent also comprises urea for reduced formation of nitrous fumes when the pickling agent is used.
摘要翻译：一种长时间稳定的酸洗剂，用于在诸如焊接的热处理之后除去不锈钢上的氧化物层，该酸洗剂包括硝酸和填料，并且构成要涂覆在热处理过的层上的酸洗膏或酸洗胶不锈钢或喷涂在钢上的酸洗液。根据本发明，当使用酸洗剂时，酸洗剂还包含用于减少形成亚硝酸烟的尿素。

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