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1. 发明申请

WO2008022350A2 SYSTEM AND METHOD FOR PROCESSING A SUBSTRATE UTILIZING A GAS STREAM FOR PARTICLE REMOVAL 审中-公开
标题翻译：用于处理使用气体流进行颗粒物去除的基板的系统和方法
公开(公告)号：WO2008022350A2
公开(公告)日：2008-02-21
申请号：PCT/US2007076324
申请日：2007-08-20
申请人： AKRION TECHNOLOGIES INC , FRANKLIN COLE , ROUILLARD MARK , FAN YAN
发明人： FRANKLIN COLE , ROUILLARD MARK , FAN YAN
IPC分类号： B08B3/10 , B08B3/12
CPC分类号： H01L21/67051 , H01L21/02057
摘要： A system and method of processing a substrate. The method and system applies a liquid to a surface of the substrate so as to form a film of the liquid on the surface of the substrate, wherein a boundary layer exists at the interface of the surface and the film of the liquid. The cleaning system then applies a force that penetrates the boundary layer so as to create a localized area on the surface of the substrate that is substantially free of the liquid. The application of the force in combination with the liquid removes particles from the surface of the substrate.
摘要翻译：一种处理衬底的系统和方法。该方法和系统将液体施加到基板的表面，以在基板的表面上形成液体的膜，其中边界层存在于液体的表面和膜的界面处。清洁系统然后施加穿透边界层的力，以便在基本上不含液体的基底表面上产生局部区域。与液体组合施加的力从基板表面去除颗粒。

2. 发明申请

WO2007134056A3 SPRAY JET CLEANING APPARATUS AND METHOD 审中-公开
标题翻译：喷射喷射清洁装置和方法
公开(公告)号：WO2007134056A3
公开(公告)日：2009-04-09
申请号：PCT/US2007068478
申请日：2007-05-08
申请人： AKRION TECHNOLOGIES INC , FRANKLIN COLE , FAN YAN , ROUILLARD MARK
发明人： FRANKLIN COLE , FAN YAN , ROUILLARD MARK
IPC分类号： C03C23/00 , B08B7/00 , C23G1/00 , C23G1/02
CPC分类号： H01L21/67051 , B05B7/0483 , B08B3/02
摘要： A spray cleaning device having an atomizing unit with at least one gas passage and at least one cleaning fluid passage converging Into a atomizing area. The gas flowing though the gas passage and the cleaning fluid flowing through the cleaning fluid passages combine to form a mixture at the atomizing area. The accelerating unit has an acceleration passage for spraying the mixture onto a substrate surface. The gas passages are preferably angled with respect to the cleaning acceleration passage.
摘要翻译：一种喷雾清洁装置，具有具有至少一个气体通道的雾化单元和汇聚到雾化区域中的至少一个清洁流体通道。流过气体通道的气体和流过清洗流体通道的清洗流体在雾化区域结合形成混合物。加速单元具有用于将混合物喷射到基板表面上的加速通道。气体通道优选地相对于清洁加速通道成角度。

3. 发明申请

WO2007134056A2 SPRAY JET CLEANING APPARATUS AND METHOD 审中-公开
标题翻译：喷射喷射清洁装置和方法
公开(公告)号：WO2007134056A2
公开(公告)日：2007-11-22
申请号：PCT/US2007/068478
申请日：2007-05-08
申请人： AKRION TECHNOLOGIES, INC. , FRANKLIN, Cole , FAN, Yan , ROUILLARD, Mark
发明人： FRANKLIN, Cole , FAN, Yan , ROUILLARD, Mark
IPC分类号： G06F15/16
CPC分类号： H01L21/67051 , B05B7/0483 , B08B3/02
摘要： A spray cleaning device having an atomizing unit with at least one gas passage and at least one cleaning fluid passage converging Into a atomizing area. The gas flowing though the gas passage and the cleaning fluid flowing through the cleaning fluid passages combine to form a mixture at. ihe atomizing area. The accelerating unit has an acceleration passage for spraying the mixture onto a substrate surface. The gas passages are preferably angled with respect to the cleaning acceleration passage.
摘要翻译：一种喷雾清洁装置，具有具有至少一个气体通道的雾化单元和汇聚到雾化区域中的至少一个清洁流体通道。流过气体通道的气体和流过清洁流体通道的清洁流体结合在一起形成混合物。雾化区域加速单元具有用于将混合物喷射到基板表面上的加速通道。气体通道优选地相对于清洁加速通道成角度。

4. 发明申请

WO2005006396A2 MEGASONIC CLEANING USING SUPERSATURATED CLEANING SOLUTION 审中-公开
标题翻译：超声波清洗使用过滤清洗液
公开(公告)号：WO2005006396A2
公开(公告)日：2005-01-20
申请号：PCT/US2004018464
申请日：2004-06-10
申请人： GOLDFINGER TECHNOLOGIES LLC , FRANKLIN COLE S , WU YI , FRASER BRIAN
发明人： FRANKLIN COLE S , WU YI , FRASER BRIAN
IPC分类号： B08B3/00 , B08B3/12 , B08B6/00 , B08B7/04 , H01L20060101 , H01L
CPC分类号： B08B3/12 , H01L21/67051
摘要： A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning liquid in such amounts that the carbon dioxide gas is at a supersaturated concentration for the conditions within the process chamber. Megasonic energy is then transmitted to the substrate. The cleaning solution provides protection from damage resulting from the application of megasonic/acoustical energy. In another aspect, the invention is a system for carrying out the method. The invention is not limited to carbon dioxide but can be used in conjunction with any gas that, when so dissolved in a cleaning liquid, protects substrates from being damaged by the application of megasonic/acoustical energy.
摘要翻译：一种用于超声波清洗一个或多个基板的方法和系统，所述方法和系统减少由兆频超声波能量引起的对基板的损坏。衬底被支撑在处理室中并与包含溶解在清洁液体中的二氧化碳气体的清洁液体接触，其量使得二氧化碳气体在处理室内的条件下处于过饱和浓度。兆声波能量然后被传输到衬底。清洁解决方案可防止应用兆声波/声学能量造成的损坏。另一方面，本发明是用于执行该方法的系统。本发明不限于二氧化碳，而是可以与任何气体结合使用，当溶解在清洁液体中时，该气体保护基材免于因施加兆声波/声学能量而受损。

5. 发明申请

WO2008008921A3 TRANDUCER ASSEMBLY INCORPORATING A TRANSMITTER HAVING THROUGH HOLES, AND METHOD OF CLEANING 审中-公开
标题翻译：装有通过孔的发射器的TRANDUCER组件和清洁方法
公开(公告)号：WO2008008921A3
公开(公告)日：2008-07-17
申请号：PCT/US2007073402
申请日：2007-07-12
申请人： AKRION TECHNOLOGIES INC , FRANKLIN COLE
发明人： FRANKLIN COLE
IPC分类号： B08B3/04 , B08B3/10 , B08B3/12 , G01V1/38
CPC分类号： B08B3/12
摘要： An apparatus, system and method for processing a substrate utilizing sonic energy In one aspect, the invention utilizes a transmitter (104) having through holes (16) to dampen sonic energy that may damage the substrate In other aspects, the through holes of the transmitter (104) can be adapted to introduce a liquid solution having bubbles of a controlled size into the meniscus that couples the transmitter (104) to the surface of a substrate to be cleaned to further dampen the sonic energy IN one embodiment, the invention is a system for processing a substrate comprising a rotary support (108) for supporting a substrate in a substantially horizontal orientation, a transducer (140) assembly comprising a transmitter (104) and a transducer (140) adapted to generate sonic energy, the transducer (140) acoustically coupled to the transmitter (104) a plurality of internal passageways (16) extending through the transmitter from holes (16) in a first outer surface of the transmitter to holes (16) in a second outer surface of the transmitter (104), and the transducer (140) assembly positioned so that so that a portion of the vibration transmitter (104) is adjacent to and spaced from a surface of a substrate on the rotary support (16) so that when a liquid is applied to the surface of the substrate, a film of the liquid couples the portion of the transmitter (104) to the surface of the substrate
摘要翻译：利用声能处理衬底的装置，系统和方法在一个方面，本发明利用具有通孔（16）的发射器（104）来抑制可能损坏衬底的声能。在其他方面，发射器的通孔（104）可以适于将具有受控尺寸的气泡的液体溶液引入弯液面，所述弯月面将发射器（104）耦合到待清洁的基底的表面，以进一步抑制声能。在一个实施例中，本发明是用于处理基板的系统，包括用于以基本水平的方向支撑基板的旋转支撑件（108），包括适于产生声能的发射器（104）和换能器（140）的换能器（140）组件，所述换能器）与所述发射器（104）声学耦合，多个内部通道（16）从所述发射器的第一外表面中的孔（16）延伸穿过所述发射器到孔（16）），并且所述换能器（140）组件定位成使得所述振动发射器（104）的一部分与所述旋转支撑件上的基板的表面相邻并间隔开（ 16），使得当液体施加到基板的表面时，液体的膜将发射器（104）的部分耦合到基板的表面

6. 发明申请

WO2008022350A3 SYSTEM AND METHOD FOR PROCESSING A SUBSTRATE UTILIZING A GAS STREAM FOR PARTICLE REMOVAL 审中-公开
公开(公告)号：WO2008022350A3
公开(公告)日：2008-02-21
申请号：PCT/US2007/076324
申请日：2007-08-20
申请人： AKRION TECHNOLOGIES, INC. , FRANKLIN, Cole , ROUILLARD, Mark , FAN, Yan
发明人： FRANKLIN, Cole , ROUILLARD, Mark , FAN, Yan
IPC分类号： B08B3/00 , B08B5/00
摘要： A system and method of processing a substrate. The method and system applies a liquid to a surface of the substrate so as to form a film of the liquid on the surface of the substrate, wherein a boundary layer exists at the interface of the surface and the film of the liquid. The cleaning system then applies a force that penetrates the boundary layer so as to create a localized area on the surface of the substrate that is substantially free of the liquid. The application of the force in combination with the liquid removes particles from the surface of the substrate.

7. 发明申请

WO2008008921A2 TRANSDUCER ASSEMBLY INCORPORATING A TRANSMITTER HAVING THROUGH HOLES, AND METHOD AND SYSTEM FOR CLEANING A SUBSTRATE UTILIZING THE SAME 审中-公开
标题翻译：包含通过孔的发射器的传感器组件以及用于清洁使用其的基板的方法和系统
公开(公告)号：WO2008008921A2
公开(公告)日：2008-01-17
申请号：PCT/US2007/073402
申请日：2007-07-12
申请人： AKRION TECHNOLOGIES, INC. , FRANKLIN, Cole
发明人： FRANKLIN, Cole
IPC分类号： B08B3/12 , H04R1/00
CPC分类号： B08B3/12
摘要： An apparatus, system and method for processing a substrate utilizing sonic energy. In one aspect, the invention utilizes a transmitter having through holes to dampen sonic energy that may damage the substrate, In other aspects, the through holes of the transmitter can be adapted to introduce a liquid solution having bubbles of a controlled size into the meniscus that couples the transmitter to the surface of a substrate to be cleaned to further dampen the sonic energy. In one embodiment the invention is a system for processing a substrate comprising: a rotary support for supporting a substrate in a substantially horizontal orientation; a transducer assembly comprising a transmitter and a transducer adapted to generate sonic energy, the transducer acoustically coupled to the transmitter; a plurality of internal passageways extending through the transmitter from holes in a first outer surface of the transmitter to holes in a second outer surface of the transmitter, and the transducer assembly positioned so that so that a portion of the vibration transmitter is adjacent to and spaced from a surface of a substrate on the rotary support so that when a liquid is applied to the surface of the substrate, a film of the liquid couples the portion of the transmitter to the surface of the substrate.
摘要翻译：一种利用声能处理衬底的装置，系统和方法。在一个方面，本发明利用具有通孔的发射器来抑制可能损坏衬底的声能。在其他方面，变送器的通孔可以适于将具有受控尺寸的气泡的液体溶液引入到半月板中，将发射器耦合到待清洁的基底的表面以进一步抑制声能。在一个实施例中，本发明是用于处理衬底的系统，包括：用于以基本上水平的方向支撑衬底的旋转支撑件; 传感器组件，包括发射器和适于产生声能的换能器，所述换能器声耦合到所述发射器; 多个内部通道，其从所述发射器的第一外表面中的孔延伸穿过所述发射器到所述发射器的第二外表面中的孔，并且所述换能器组件被定位成使得所述振动发射器的一部分相邻并间隔开从旋转支撑体上的基板的表面，使得当液体被施加到基板的表面时，液体的膜将发射器的该部分耦合到基板的表面。

8. 发明申请

WO2005006396A3 MEGASONIC CLEANING USING SUPERSATURATED CLEANING SOLUTION 审中-公开
公开(公告)号：WO2005006396A3
公开(公告)日：2005-01-20
申请号：PCT/US2004/018464
申请日：2004-06-10
申请人： GOLDFINGER TECHNOLOGIES, LLC , FRANKLIN, Cole, S. , WU, Yi , FRASER, Brian
发明人： FRANKLIN, Cole, S. , WU, Yi , FRASER, Brian
IPC分类号： B08B3/12
摘要： A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning liquid in such amounts that the carbon dioxide gas is at a supersaturated concentration for the conditions within the process chamber. Megasonic energy is then transmitted to the substrate. The cleaning solution provides protection from damage resulting from the application of megasonic/acoustical energy. In another aspect, the invention is a system for carrying out the method. The invention is not limited to carbon dioxide but can be used in conjunction with any gas that, when so dissolved in a cleaning liquid, protects substrates from being damaged by the application of megasonic/acoustical energy.

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