会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 31. 发明申请
    • 有機廃棄物の処理装置及び処理方法,該処理方法によって得られる有機資材
    • 用于处理有机废物和有机材料的设备和方法
    • WO2008117342A1
    • 2008-10-02
    • PCT/JP2007/001402
    • 2007-12-14
    • 有限会社国友環境プラント小倉邦夫
    • 小倉邦夫
    • B09B3/00F26B3/06F26B3/20F26B5/04F26B9/06F26B11/16
    • B09B3/00B09B3/0091F26B5/04F26B11/16
    •  本発明の課題は各種の有機廃棄物を容易に且つ再利用可能に処理出来る技術を提供することにある。  かかる課題を解決するために、有機廃棄物18が内部に収容される収容容器20に、有機廃棄物18を撹拌するための撹拌手段82,92,98を設けると共に、高温高圧蒸気を収容容器20内に供給する蒸気供給手段62,64,66を設け、更に、収容容器20内を減圧する減圧手段77,78,80と収容容器20内の有機廃棄物18を加熱する加熱手段24,68,64,66とを設けて、それらを利用しつつ、収容容器20内の有機廃棄物18に対する加水分解や熱分解による分解処理と真空乾燥処理とを行うように構成した。
    • 可以容易地处理各种有机废物以获得可重复使用的材料的技术。 提供了一种装置,其包括用于将有机废物(18)引入其中的容器(20),所述容器装备有用于搅拌有机废物(18)的搅拌装置(82),(92)和(98)。 向容器(20)供应高温高压蒸汽的蒸汽供应装置(62),(64)和(66); 减压装置(77),(78)和(80),其排出容器(20); 以及加热容器(20)中存在的有机废物(18)的加热装置(24),(68),(64)和(66)。 该装置具有这样的结构,其中容器(20)中的有机废物(18)通过水解和热解而分解,并使用这些方法在真空下干燥。
    • 34. 发明申请
    • VAPOR ASSISTED ROTARY DRYING METHOD AND APPARATUS
    • 蒸气辅助旋转干燥方法和装置
    • WO01025706A1
    • 2001-04-12
    • PCT/US2000/026706
    • 2000-09-28
    • F26B5/08F26B9/06F26B11/04F26B21/00H01L21/00H01L21/304H01L21/306F26B17/24
    • H01L21/02052H01L21/67034Y10S134/902
    • A process for drying semiconductor wafers includes loading a wafer (160) wetted with rinsing fluid into a rotor (152) and orientating the wafer along a substantially vertical plane. A gas saturated with a solvent vapor (135) is passed over the wafer surfaces until condensation forms on the wafer (160) and displaces residual fluid. The rotation of the wafer (160) by the rotor (152) at a first rotational speed aids the flushing and displacement of residual fluid. The passage of a dry gas over the wafer (160) combined with the rotation of the wafer (160) at a second rotation speed promotes drying of solvent condensed on the wafer (160). The first rotational speed is limited to a rate that does not cause the condensed solvent film to evaporate as quickly as it forms. The second rotation speed may exceed that of the first rotation speed to complete the drying of the wafer (160). The rotor (152) and process chamber (150) are optionally pre-saturated with condensed solvent vapor prior to the introduction of a wafer (160) to hasten the drying process. The process is suitable for quickly and cleanly drying patterned wafers having both hydrophobic and hydrophilic surfaces.
    • 干燥半导体晶片的方法包括将浸有冲洗流体的晶片(160)装载到转子(152)中并沿着基本上垂直的平面定向晶片。 用溶剂蒸气(135)饱和的气体通过晶片表面,直到在晶片(160)上形成冷凝并移动残余流体。 转子(152)以第一转速旋转晶片(160)有助于残留流体的冲洗和移位。 干燥气体在晶片(160)上的转动与晶片(160)的旋转结合在一起,以第二转速促进在晶片(160)上凝结的溶剂的干燥。 第一旋转速度被限制在不会使冷凝的溶剂膜在其形成时迅速蒸发的速率。 第二转速可以超过第一转速,以完成晶片(160)的干燥。 在引入晶片(160)以加速干燥过程之前,转子(152)和处理室(150)可选地被冷凝的溶剂蒸气预饱和。 该方法适用于快速且干净地干燥具有疏水和亲水表面的图案化晶片。
    • 36. 发明申请
    • METHOD AND APPARATUS FOR DRYING SUBSTRATES
    • 用于干燥基材的方法和设备
    • WO9908057A3
    • 1999-06-17
    • PCT/US9816298
    • 1998-08-05
    • APPLIED MATERIALS INC
    • FISHKIN BORISHEARNE JOHN SLOWRANCE ROBERT B
    • F26B5/00F26B9/06F26B21/00H01L21/00H01L21/304H01L21/687
    • H01L21/68728H01L21/67034Y10S134/902
    • A drying apparatus (20) for removing residual liquid from a substrate surface comprises a vapor chamber (25) having a vapor distributor (30) for introducing vapor into the chamber. The drying apparatus (20) further comprises a fluid system (35) comprising (i) a reservoir (40), (ii) a fluid dispenser (45) for introducing fluid into the reservoir, and (iii) a fluid level adjuster (50) for lowering a fluid surface level in the reservoir (40). A multi-point holder (62) is used for holding the substrate (55) at different holding points (63) on the substrate, while the fluid surface level is lowered relative to the substrate, so that residual liquid flows off the substrate surface without intersection of the lowering fluid surface level with holding points (63) on the substrate. The drying apparatus (20) dries substrates (55) substantially without forming stains or streaks, or causing contamination or liquid residue to remain on the substrate (55).
    • 一种用于从基底表面去除残留液体的干燥设备(20)包括具有蒸气分配器(30)的蒸气室(25),蒸气分配器(30)用于将蒸气引入室中。 (20)还包括流体系统(35),该流体系统包括(i)储存器(40),(ii)用于将流体引入储存器中的流体分配器(45),以及(iii)流体水平调节器 )用于降低储存器(40)中的流体表面水平。 多点支架(62)用于将基板(55)保持在基板上的不同保持点(63)处,同时流体表面高度相对于基板降低,使得残余液体从基板表面流出而没有 下降流体表面水平与基板上的保持点(63)相交。 干燥设备(20)基本上不形成污点或条纹或使污染物或液体残留物保留在基底(55)上而干燥基底(55)。
    • 38. 发明申请
    • HEATING WITH STEAM
    • 加热蒸汽
    • WO99010078A1
    • 1999-03-04
    • PCT/AU1998/000688
    • 1998-08-25
    • F26B3/20B01J3/00B01J8/02C10B49/00C10B57/10C10F5/00F26B7/00F26B9/06F26B21/04F26B23/10B01D43/00F26B3/06F26B21/00
    • F26B23/10C10F5/00F26B7/00
    • A method and an apparatus for heating a solid material in a process vessel are disclosed. The method includes the steps of: (a) supplying a charge of the solid material to the vessel to form a packed bed; (b) supplying a fluid to the packed bed to pressurise the contents of the vessel; (c) supplying steam to the vessel to heat the solid material in the packed bed by indirect heat exchange while maintaining the contents of the vessel under pressure; and (d) controlling the operating conditions in step (c). The operating conditions in step (c) are controlled to transfer heat to the solid material and allow water in the solid material to be removed as a liquid phase in a first "wet" stage of the method and to transfer heat to the solid material to boil at least a part of the remaining water from the solid material as a vapour phase in a second "dry" stage of the method.
    • 公开了一种用于加热处理容器中的固体材料的方法和装置。 该方法包括以下步骤:(a)将固体材料的装料供应至容器以形成填充床; (b)向填充床供应流体以对容器的内容物进行加压; (c)通过间接热交换向容器供应蒸汽以加热填充床中的固体物质,同时保持容器的内容物处于压力下; 和(d)控制步骤(c)中的操作条件。 控制步骤(c)中的操作条件以将热量传递到固体材料,并使固体材料中的水作为液相在该方法的第一“湿”阶段中被去除并将热量传递到固体材料 在该方法的第二“干”阶段,将来自固体材料的剩余水的至少一部分作为蒸汽相沸腾。
    • 40. 发明申请
    • SEED DRYER WITH AUTOMATIC CONTROL OF TEMPERATURE, AIR FLOW DIRECTION AND RATE
    • 具有温度,空气流动方向和速率自动控制的种子干燥机
    • WO98046951A1
    • 1998-10-22
    • PCT/US1998/007203
    • 1998-04-14
    • F26B9/06F26B21/02F26B21/10
    • F26B21/10F26B9/063F26B21/028
    • An automatically controlled seed dryer (30) of the present invention is adapted to efficiently and precisely dry seed by automatically controlling the temperature, direction, and air flow rate, of air flow through the seed within the bin (32, 34). The invention includes an upper plenum (66) for supplying a source of hot air, a lower plenum (68) for supplying a source of ambient air, and a mixing plenum (70) for mixing various proportions of hot and ambient air from the upper and lower plenums (66, 68). The mixing plenum (70) has upper and lower supply doors (72, 74) formed between the mixing plenum (70) and the bin (32, 34) for supplying the mixed air to the bin either above or below the seed. Upper and lower exhaust doors (52, 54) are formed in the bin above and below the seed such that by controlling the operation of the supply and exhaust doors (62, 64, 52,54), the direction and air flow rate of the mixed air through the seed can be precisely controlled by an electronic controller. A plurality of actuators (58, 60, 82, 96) control the operation of the doors.
    • 本发明的自动控制的种子干燥器(30)适于通过自动控制通过料仓(32,34)内的种子的气流的温度,方向和空气流速来有效和精确地干燥种子。 本发明包括用于供应热空气源的上部增压室(66),用于供应环境空气源的下部增压室(68)和用于混合来自上部的各种比例的热和环境空气的混合增压室(70) 和下部增压室(66,68)。 混合气室(70)具有形成在混合气室(70)和料箱(32,34)之间的上部和下部供应门(72,74),用于将混合空气供给到种子上方或下方的仓。 上下排气门(52,54)形成在种子上方和下方的箱中,以便通过控制供排气门(62,64,52,54)的操作,使排气门的方向和空气流速 通过种子的混合空气可以由电子控制器精确控制。 多个致动器(58,60,82,96)控制门的操作。