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    • 24. 发明申请
    • SEMICONDUCTOR APPARATUS WITH CRYSTAL DEFECTS AND PROCESS FOR ITS FABRICATION
    • 具有晶体缺陷的半导体器件及其制造工艺
    • WO1996026536A1
    • 1996-08-29
    • PCT/JP1996000368
    • 1996-02-19
    • ROHM CO., LTD.SAKAMOTO, Kazuhisa
    • ROHM CO., LTD.
    • H01L21/26
    • H01L29/7802H01L21/26H01L21/263H01L29/32H01L29/73H01L29/7322H01L29/78
    • It is an object to provide a semiconductor apparatus having both fast switching characteristics and high dielectric breakdown strength or small leakage current characteristics, as well as a process for fabricating such improved semiconductor apparatus. The apparatus comprises a semiconductor substrate; a semiconductor layer on said semiconductor substrate, said semiconductor layer having a pn junction formed along the surface of said semiconductor substrate, wherein crystal defects being formed by irradiation with particle rays to the only vertical direction of said pn junction; and a silicon nitride film provided on the substrate surface of said layer for restraining the exposure to particle rays being provided on the substrate surface of said element in the areas other than said pn junction.
    • 本发明的目的是提供具有快速开关特性和高介电击穿强度或小的漏电流特性的半导体装置,以及制造这种改进的半导体装置的方法。 该装置包括半导体衬底; 在所述半导体衬底上的半导体层,所述半导体层具有沿着所述半导体衬底的表面形成的pn结,其中通过用所述pn结的唯一垂直方向照射粒子射线形成晶体缺陷; 以及设置在所述层的衬底表面上的氮化硅膜,用于抑制在所述pn结以外的区域中的所述元件的衬底表面上提供的颗粒射线的暴露。