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11. 发明申请

WO2006049886A3 EUV COLLECTOR DEBRIS MANAGEMENT 审中-公开
标题翻译： EUV收集器破产管理
公开(公告)号：WO2006049886A3
公开(公告)日：2009-03-05
申请号：PCT/US2005037725
申请日：2005-10-20
申请人： CYMER INC , PARTLO WILLIAM N , FOMENKOV IGOR V , ERSHOV ALEXANDER I , OLDHAM WILLIAM , HEMBERG OSCAR , MARX WILLIAM F
发明人： PARTLO WILLIAM N , FOMENKOV IGOR V , ERSHOV ALEXANDER I , OLDHAM WILLIAM , HEMBERG OSCAR , MARX WILLIAM F
IPC分类号： H01L21/302 , H01L21/306
CPC分类号： B08B7/00
摘要： A method and apparatus that may comprise an EUV light producing mechanism utilizing an EUV plasma source material comprising a material that will form an etching compound, which plasma source material produces EUV light in a band around a selected center wavelength comprising: an EUV plasma generation chamber; an EUV light collector contained within the chamber having a reflective surface containing at least one layer comprising a material that does not form an etching compound and/or forms a compound layer that does not significantly reduce the reflectivity of the reflective surface in the band; an etchant source gas contained within the chamber comprising an etchant source material with which the plasma source material forms an etching compound, which etching compound has a vapor pressure that will allow etching of the etching compound from the reflective surface. The etchant source material may comprises a halogen or halogen compound. The etchant source material may be selected based upon the etching being stimulated in the presence of photons of EUV light and/or DUV light and/or any excited energetic photons with sufficient energy to stimulate the etching of the plasma source material. The apparatus may further comprise an etching stimulation plasma generator providing an etching stimulation plasma in the working vicinity of the reflective surface; and the etchant source material may be selected based upon the etching being stimulated by an etching stimulation plasma. There may also be an ion accelerator accelerating ions toward the reflective surface. The ions may comprise etchant source material. The apparatus and method may comprise a part of an EUV production subsystem with an optical element to be etched of plasma source material.
摘要翻译：可以包括使用EUV等离子体源材料的EUV发光机构的方法和装置，所述EUV等离子体源材料包括将形成蚀刻化合物的材料，所述等离子体源材料在所选择的中心波长周围的带内产生EUV光，包括：EUV等离子体产生室 ; 包含在室内的EUV光收集器具有反射表面，该反射表面包含至少一层，该层包含不形成蚀刻化合物的材料和/或形成不显着降低该带中的反射表面的反射率的化合物层; 包含在腔室内的蚀刻剂源气体包括蚀刻剂源材料，等离子体源材料与蚀刻剂源材料形成蚀刻化合物，该蚀刻化合物具有允许从反射表面蚀刻蚀刻化合物的蒸气压。蚀刻剂源材料可以包含卤素或卤素化合物。蚀刻剂源材料可以基于在存在EUV光和/或DUV光的光子和/或具有足够能量以激发等离子体源材料的蚀刻的任何激发能量光子的情况下被激发的蚀刻来选择。该装置还可以包括在反射表面的工作附近提供蚀刻刺激等离子体的蚀刻刺激等离子体发生器; 并且蚀刻剂源材料可以基于通过蚀刻刺激等离子体刺激的蚀刻来选择。还可以存在离子加速剂将离子朝向反射表面加速。离子可以包括蚀刻剂源材料。该装置和方法可以包括具有待蚀刻的等离子体源材料的光学元件的EUV生产子系统的一部分。

12. 发明申请

WO2007002374A3 EUV LIGHT SOURCE COLLECTOR EROSION MITIGATION 审中-公开
标题翻译： EUV光源收集器腐蚀减轻
公开(公告)号：WO2007002374A3
公开(公告)日：2007-06-14
申请号：PCT/US2006024446
申请日：2006-06-23
申请人： CYMER INC , PARTLO WILLIAM N , ERSHOV ALEXANDER I , FOMENKOV IGOR V
发明人： PARTLO WILLIAM N , ERSHOV ALEXANDER I , FOMENKOV IGOR V
IPC分类号： G21K1/00 , H01J35/00
CPC分类号： G03F7/70916 , B82Y10/00 , G01J1/429 , G03F7/70033 , G03F7/70175 , G03F7/70983 , G21K1/062 , G21K2201/067 , H05G2/003
摘要： An extreme ultraviolet light source collector erosion mitigation system and method may include a multilayered mirror having an outer surface. The outer surface of the mirror can have a capping material subject to erosion due to interaction with materials created in an extreme ultraviolet light-creating plasma. The system may include a replacement material generator, positioned to deliver a replacement material including the capping material to the collector outer surface at a rate sufficient to compensate for the erosion. Replacement material generators may include generators positioned to deliver replacement material to a selected portion of the collector outer surface. The generators may use a mechanism to sputter the replacement material to the collector outer surface.
摘要翻译：极紫外光源收集器侵蚀缓解系统和方法可以包括具有外表面的多层反射镜。由于与在极紫外光产生等离子体中产生的材料的相互作用，反射镜的外表面可以具有受到侵蚀的封盖材料。该系统可以包括替换材料发生器，其被定位成以足以补偿侵蚀的速率将包括封盖材料的替换材料输送到收集器外表面。替代材料发生器可以包括定位成将替代材料递送到收集器外表面的选定部分的发生器。发生器可以使用机构将替换材料溅射到收集器外表面。

13. 发明申请

WO2006093781A2 SYSTEMS FOR PROTECTING INTERNAL COMPONENTS OF AN EUV LIGHT SOURCE FROM PLASMA-GENERATED DEBRIS 审中-公开
标题翻译：用于保护来自等离子体生物反应器的EUV光源的内部组分的系统
公开(公告)号：WO2006093781A2
公开(公告)日：2006-09-08
申请号：PCT/US2006006408
申请日：2006-02-24
申请人： CYMER INC , BOWERING NORBERT R , HANSSON BJORN A M , BYKANOV ALEXANDER N , KHODYKIN OLEH , ERSHOV ALEXANDER I , PARTLO WILLIAM N
发明人： BOWERING NORBERT R , HANSSON BJORN A M , BYKANOV ALEXANDER N , KHODYKIN OLEH , ERSHOV ALEXANDER I , PARTLO WILLIAM N
CPC分类号： G03F7/70925 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.
摘要翻译：公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。

14. 发明申请

WO2008105989A3 LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：激光生产等离子体光源
公开(公告)号：WO2008105989A3
公开(公告)日：2009-02-19
申请号：PCT/US2008001349
申请日：2008-02-01
申请人： CYMER INC , BYKANOV ALEXANDER N , BOWERING NORBERT R , FOMENKOV IGOR V , BRANDT DAVID C , ERSHOV ALEXANDER I , KHODYKIN OLEH V , PARTLO WILLIAM N
发明人： BYKANOV ALEXANDER N , BOWERING NORBERT R , FOMENKOV IGOR V , BRANDT DAVID C , ERSHOV ALEXANDER I , KHODYKIN OLEH V , PARTLO WILLIAM N
IPC分类号： G01J3/10
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70908 , G03F7/70983 , H05G2/003 , H05G2/008
摘要： A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic, hi one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.
摘要翻译：公开了一种可以包括在等离子体位置处产生等离子体的系统，等离子体产生EUV辐射和离开等离子体的离子的装置。该装置还可以包括一个光学元件，例如多个远离现场的多层反射镜，以及设置在等离子体和光学元件之间的流动气体，该气体建立足以在该距离上操作的气体压力， d，在离子到达光学器件之前，将离子能量降低到预选值以下。在一个实施方案中，气体可以包含氢气，并且在特定的实施方案中，气体可以包含大于50体积％的氢气。

15. 发明申请

WO2005091879A2 EUV LIGHT SOURCE 审中-公开
标题翻译： EUV光源
公开(公告)号：WO2005091879A2
公开(公告)日：2005-10-06
申请号：PCT/US2005005935
申请日：2005-02-24
申请人： CYMER INC , PARTLO WILLIAM N , BOWERING NORBERT R , ERSHOV ALEXANDER I , FOMENKOV IGOR V , OLIVER I ROGER , VIATELLA JOHN , JACQUES ROBERT N
发明人： PARTLO WILLIAM N , BOWERING NORBERT R , ERSHOV ALEXANDER I , FOMENKOV IGOR V , OLIVER I ROGER , VIATELLA JOHN , JACQUES ROBERT N
IPC分类号： G03F7/20 , G21K1/06 , H01J35/20 , H05G2/00
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70175 , G03F7/70916 , G21K1/062 , G21K2201/061 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma ("LPP") extreme ultraviolet ("EUV") light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.
摘要翻译：公开了一种用于EUV光产生的装置和方法，其可以包括激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统，其包括适于递送移动等离子体引发靶的目标传送系统和EUV光收集光学元件具有限定期望的等离子体起始位置的焦点，包括：目标跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出，其中，所述目标流轨迹来自所述目标流轨迹的成像速度摄像机太慢，不能成像形成被作为目标流轨迹成像的目标流的各个等离子体形成目标; 流轨迹误差检测器，从与期望的等离子体起始位置相交的期望的流轨道检测在大致垂直于目标流轨迹的至少一个轴上的目标流轨迹位置的误差。至少一个目标交叉检测器可以瞄准目标轨道并且检测等离子体形成目标通过目标轨道中的选定点的通过。驱动激光触发机构利用目标交叉检测器的输出来确定驱动激光触发的定时，以便驱动激光输出脉冲在等离子体引发目标处沿着目标轨道在一般最接近的等离子体起始位置处相交接近所需的等离子体引发位点。等离子体起始检测器可以瞄准目标轨道并且检测针对相应目标的等离子体起始位置沿着目标轨迹的位置。中间焦点照明器可以照亮形成在中间焦点处的孔，以对至少一个成像装置中的孔进行成像。所述至少一个成像装置可以是至少两个成像装置，每个成像装置基于对所述中间焦点的图像的图像的分析，提供与所述目标轨道与所述中间焦点的图像的垂直中心线轴线分离相关的误差信号所述至少两个成像装置。目标传送反馈和控制系统可以包括目标传送单元; 目标传送位移控制机构至少在对应于从第一成像装置中的图像的分析导出的第一位移误差信号的轴上移动目标传送机构，并且至少在与由第二位移误差信号对第二成像装置中的图像进行分析。

16. 发明申请

WO2004092693A3 COLLECTOR FOR EUV LIGHT SOURCE 审中-公开
标题翻译： EUV光源收集器
公开(公告)号：WO2004092693A3
公开(公告)日：2005-05-19
申请号：PCT/US2004010972
申请日：2004-04-07
申请人： CYMER INC , PARTLO WILLIAM N , ALGOTS J MARTIN , BLUMENSTOCK GERRY M , BOWERING NORBERT , ERSHOV ALEXANDER I , FOMENKOV IGOR V , PAN XIAOJIANG J
发明人： PARTLO WILLIAM N , ALGOTS J MARTIN , BLUMENSTOCK GERRY M , BOWERING NORBERT , ERSHOV ALEXANDER I , FOMENKOV IGOR V , PAN XIAOJIANG J
IPC分类号： G02B5/00 , G03F7/20 , G21C11/00 , G21K1/06 , H01J1/50 , A61N5/00
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062
摘要： A debris removable system (20) for removing a plasma produced residue debris on a reflecting surface (360) of an EUV source (26), which includes a stimulating mechanism (72) for exciting and ionizing the atoms to clean the reflecting surface (360): a collecting mirror (370); a filter (150); and a debris shield (202).
摘要翻译：一种用于去除在EUV源（26）的反射表面（360）上产生的残余物碎屑的碎片可移除系统（20），其包括用于激发和电离原子以清洁反射表面的刺激机构（360））：收集镜（370）; 过滤器（150）; 和碎片护罩（202）。

17. 发明申请

WO2007002386A2 EUV LIGHT SOURCE COLLECTOR LIFETIME IMPROVEMENTS 审中-公开
标题翻译： EUV光源收集器生命周期改进
公开(公告)号：WO2007002386A2
公开(公告)日：2007-01-04
申请号：PCT/US2006024463
申请日：2006-06-23
申请人： CYMER INC , PARTLO WILLIAM N , ERSHOV ALEXANDER I , FOMENKOV IGOR V , KHODYKIN OLEH
发明人： PARTLO WILLIAM N , ERSHOV ALEXANDER I , FOMENKOV IGOR V , KHODYKIN OLEH
IPC分类号： G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70925 , G21K1/062 , H05G2/005
摘要： An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plasma source material contained in the plasma source material compound on the collector optic. The method may further comprise initiating the reacting by introducing hydrogen into a plasma formation chamber containing the collector optic, and may further comprise removing the hydride from the collector optic, e.g., by cleaning plasma action and/or plasma source material sputtering, or other means as may be determined to be effective. An apparatus and method of extending the useful life of a plasma produced EUV light source collector coating layer may comprise in situ replacement of the material of the coating layer by deposition of the coating layer material onto the coating layer.
摘要翻译：一种用于从等离子体产生的EUV光源收集器光学元件清洗等离子体源材料化合物的装置和方法，其可以包括使等离子体源材料化合物与氢反应以从等离子体源中包含的等离子体源材料形成等离子体源材料的氢化物集光器上的材料化合物。该方法还可以包括通过将氢引入到包含收集器光学元件的等离子体形成室中来引发反应，并且还可以包括例如通过清洗等离子体作用和/或等离子体源材料溅射或其它方法从收集器光学元件中去除氢化物可能被确定为有效。延长等离子体产生的EUV光源集电器涂层的使用寿命的装置和方法可包括通过将涂层材料沉积到涂层上来原位置换涂层的材料。

18. 发明申请

WO03100826A8 LITHOGRAPHY LASER WITH BEAM DELIVERY AND BEAM POINTING CONTROL 审中-公开
标题翻译：光束传输和光束控制的光刻激光器
公开(公告)号：WO03100826A8
公开(公告)日：2004-11-25
申请号：PCT/US0314387
申请日：2003-05-05
申请人： CYMER INC , DAS PALASH P , WEBB R KYLE , GIOVANARDI MARCO , FRANCIS GREGORY , DORN HUCKLEBERRY B , ERLANDSEN KYLE P , NELSON JOHN W , SANDSTROM RICHARD L , ERSHOV ALEXANDER I
发明人： DAS PALASH P , WEBB R KYLE , GIOVANARDI MARCO , FRANCIS GREGORY , DORN HUCKLEBERRY B , ERLANDSEN KYLE P , NELSON JOHN W , SANDSTROM RICHARD L , ERSHOV ALEXANDER I
IPC分类号： H01L21/027 , G02B26/08 , G02B27/09 , G03F7/20 , H01L20060101 , H01L21/00 , H01S3/00 , H01S3/034 , H01S3/036 , H01S3/04 , H01S3/041 , H01S3/0971 , H01S3/10 , H01S3/13 , H01S3/134 , H01S3/136 , H01S3/137 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G03F7/7055 , G02B26/0816 , G02B27/0972 , G03F7/70025 , G03F7/70041 , G03F7/70058 , H01S3/005 , H01S3/0057 , H01S3/036 , H01S3/041 , H01S3/0971 , H01S3/136 , H01S3/137 , H01S3/225 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source (Fig. 1) with a beam delivery to a production line machine (2). The system includes an enclosed (4) and purged beam path (14C) with a beam pointing control (40A) (40B) (6) for delivery of the laser beam to a desired location such as the entrance port of the production line machine (2). In preferred embodiments, the production line machine is a lithography machine (2) and two separate discharge chambers (8)(10) are provided, one of which is a part of a master oscillator (8) producing a very narrow band seed beam (14A), which is amplified in the second discharge chamber (10). This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
摘要翻译：本发明提供了一种模块化的高重复频率紫外线气体放电激光光源（图1），光束传输到生产线机器（2）。该系统包括具有光束指向控制器（40A）（40B）（6）的封闭（4）和清洗光束路径（14C），用于将激光束传送到期望位置，例如生产线机器的入口 2）。在优选实施例中，生产线机器是光刻机器（2），并且提供两个单独的放电室（8）（10），其中一个是主振荡器（8）的一部分，产生非常窄带的种子束在第二放电室（10）中被放大。该MOPA系统的输出脉冲能量大约是可比较的单腔激光系统的两倍，大大改善了光束质量。

19. 发明申请

WO2009117048A3 SYSTEM AND METHODS FOR TARGET MATERIAL DELIVERY IN A LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：激光生产等离子体光源的目标物质输送系统与方法
公开(公告)号：WO2009117048A3
公开(公告)日：2009-12-30
申请号：PCT/US2009000994
申请日：2009-02-17
申请人： CYMER INC , VASCHENKO GEORGIY O , BYKANOV ALEXANDER N , BOWERING NORBERT R , BRANDT DAVID C , ERSHOV ALEXANDER I , SIMMONS RODNEY D , KHODYKIN OLEH V , FOMENKOV IGOR V
发明人： VASCHENKO GEORGIY O , BYKANOV ALEXANDER N , BOWERING NORBERT R , BRANDT DAVID C , ERSHOV ALEXANDER I , SIMMONS RODNEY D , KHODYKIN OLEH V , FOMENKOV IGOR V
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/006 , H05G2/008
摘要： Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.
摘要翻译：本文公开的装置可以包括具有限定旋转轴线和圆形周边的旋转表面的EUV反射光学元件。光学元件可以被定位成相对于水平面以非零角度倾斜轴，并且在水平面中建立周边的垂直投影，其中周边突起界定水平面中的一个区域。该装置还可以包括传送目标材料的系统，该系统具有位于水平面内的区域外的外围突起的边界材料释放点和产生用于照射目标材料产生的激光束的系统 EUV排放。

20. 发明申请

WO2005050795A3 LASER OUTPUT LIGHT PULSE STRETCHER 审中-公开
标题翻译：激光输出光脉冲拉伸器
公开(公告)号：WO2005050795A3
公开(公告)日：2006-04-13
申请号：PCT/US2004036371
申请日：2004-11-01
申请人： CYMER INC , SMITH SCOT T , ERSHOV ALEXANDER I , LUKASHEV ALEXEI
发明人： SMITH SCOT T , ERSHOV ALEXANDER I , LUKASHEV ALEXEI
IPC分类号： H01S3/00 , H01S3/225 , H01S3/223
CPC分类号： G03F7/7055 , H01S3/0057 , H01S3/225
摘要： An apparatus and method for providing a high peak power short pulse duration gas discharge laser comprising a pulse stretcher which may comprise a laser output pulse optical delay initiating optic diverting a portion of the output laser pulse into an optical delay having an optical delay path and comprising; a plurality of confocal resonators in series aligned to deliver an output of the optical delay to the laser output pulse optical delay initiating optic. The plurality of confocal resonators comprises four confocal resonators may comprise a first spherical having a radius of curvature a second concave spherical mirror having the same radius of curvature and separated from the first concave spherical mirror by the radius of curvature and receiving the first reflected beam at a first point on a face of the second concave spherical mirror and generating a second reflected beam incident on a second point on the face of the first concave spherical mirror, the second reflected beam being reflected by the first concave spherical mirror from the second point on the first mirror to form an output beam from the first confocal resonator cell; and, a second confocal resonator cell receiving the output beam of the first confocal resonator cell as an input beam of the second confocal resonator cell. The apparatus and method may comprise a plurality, e.g., two pulse stretchers in series and may include spatial coherency metrology.
摘要翻译：一种用于提供高峰值功率短脉冲持续时间气体放电激光器的装置和方法，包括脉冲展宽器，其可以包括激光输出脉冲光学延迟启动光学，将输出激光脉冲的一部分转移到具有光学延迟路径的光学延迟中，并且包括 ; 串联的多个共焦共振器对准以将光延迟的输出传递到激光输出脉冲光延迟启动光学元件。多个共焦共振器包括四个共聚焦共振器可以包括具有曲率半径的第一球形，第二凹球面镜具有相同的曲率半径，并且通过曲率半径与第一凹球面镜分离，并将第一反射光束在第二凹球面镜的表面上的第一点并且产生入射在第一凹球面的表面上的第二点上的第二反射光束，第二反射光束被第一凹球面镜从第二点反射所述第一反射镜从所述第一共焦共振腔形成输出光束; 以及接收第一共焦共振器单元的输出光束作为第二共焦共振器单元的输入光束的第二共焦共振器单元。该装置和方法可以包括多个例如串联的两个脉冲担架，并且可以包括空间相干度度量。

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