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    • 3. 发明申请
    • METHODS OF CONDUCTING WAFER LEVEL BURN-IN OF ELECTRONIC DEVICES
    • 电子器件引起晶片电平烧毁的方法
    • WO2003017326A2
    • 2003-02-27
    • PCT/US2002/025640
    • 2002-08-12
    • HONEYWELL INTERNATIONAL INC.HAJI-SHEIKH, Michael, J.BIARD, James, R.HAWKINS, Robert, M.RABINOVICH, SimonGUENTER, James, K.
    • HAJI-SHEIKH, Michael, J.BIARD, James, R.HAWKINS, Robert, M.RABINOVICH, SimonGUENTER, James, K.
    • H01L
    • G01R31/275G01R31/2831G01R31/2863G01R31/2872G01R31/2874G01R31/2884H01S5/0021H01S5/005H01S5/423
    • Methods of conducting wafer level burn-in (WLBI) of semiconductor devices are presented wherein systems are provided having at least two electrodes (210, 215). Electrical bias (920) and/or thermal power (925) is applied on each side of a wafer (100) having back and front electrical contacts for semiconductor devices borne by the wafer. A pliable conductive layer (910) is described for supplying pins on the device side of a wafer with electrical contact and/or also for providing protection to the wafer from mechanical pressure being applied to its surfaces. Use of a cooling system (950) is also described for enabling the application of a uniform temperature to a wafer undergoing burn-in. Wafer level burn-in is performed by applying electrical and physical contact (915) using an upper contact plate to individual contacts for the semiconductor devices ; applying electrical and physical contact using a lower contact plate (910) to a substrate surface of said semiconductor wafer ; providing electrical power (920) to said semiconductor devices through said upper and lower second contact plates from a power source coupled to said upper and lower contacts plates ; monitoring and controlling electrical power (935) to said semiconductor devices for a period in accordance with a specified burn-in criteria ; removing electrical power at completion of said period (955) ; and removing electrical and physical contact to said semiconductor wafer (965).
    • 介绍了进行半导体器件的晶圆级预烧(WLBI)的方法,其中提供了具有至少两个电极(210,215)的系统。 在晶片(100)的每一侧上施加电偏压(920)和/或热功率(925),该晶片具有由晶片承载的半导体器件的前后电触点。 描述了柔性导电层(910)用于通过电接触在晶片的器件侧上提供引脚,和/或还用于通过施加到其表面的机械压力来为晶片提供保护。 还描述了冷却系统(950)的使用,以使得能够对经历烧入的晶片施加均匀的温度。 通过使用上接触板对半导体器件的单个触点施加电和物理接触(915)来执行晶片级别老化; 使用下接触板(910)将电接触和物理接触施加到所述半导体晶片的衬底表面; 通过所述上部和下部第二接触板从耦合到所述上部和下部接触板的电源向所述半导体器件提供电力(920) 根据指定的老化标准在一段时间内监测和控制电力(935)到所述半导体器件; 在所述时间段结束时去除电力(955); 并去除与所述半导体晶片(965)的电和物理接触。
    • 5. 发明申请
    • PROCESSOR POWER MEASUREMENT
    • 处理器功率测量
    • WO2014160798A2
    • 2014-10-02
    • PCT/US2014/031904
    • 2014-03-26
    • TEXAS INSTRUMENTS INCORPORATEDTEXAS INSTRUMENTS JAPAN LIMITED
    • ALIBERTI, James, H.
    • G06F1/32
    • G06F11/24G01R31/275G01R31/28G01R31/3004G06F1/28G06F11/26
    • A system (2) can include a processing core (6) to execute machine readable instructions. The system (2) can also include a memory (8) accessible by the processor core (6). The memory (8) can include preprogrammed test data (10) that characterizes one of an impedance of a processor (3) and a current output to the processor (4) during execution of a test routine. The processor (4) can include the processing core (6) and the one of the impedance of the processor (4) and the current output to the processor (4) is based on a power measurement taken during execution of a test routine. The power measurement can be taken with a current sensor that is at least one of lossy or at least about 98% accurate.
    • 系统(2)可以包括执行机器可读指令的处理核心(6)。 系统(2)还可以包括可由处理器内核(6)访问的存储器(8)。 存储器(8)可以包括在执行测试例程期间表征处理器(3)的阻抗和到处理器(4)的电流输出中的一个的预编程测试数据(10)。 处理器(4)可以包括处理核心(6),并且处理器(4)的阻抗和输出到处理器(4)的电流中的一个是基于在执行测试例程期间获取的功率测量。 功率测量可以使用电流传感器进行测量,该电流传感器至少有一个损耗或至少约98%的准确度。
    • 7. 发明申请
    • SYSTEM AND METHOD FOR ELECTRICAL TESTING OF THROUGH SILICON VIAS (TSVs)
    • 通过硅(VIV)进行电气测试的系统和方法
    • WO2011101393A1
    • 2011-08-25
    • PCT/EP2011/052319
    • 2011-02-16
    • STMICROELECTRONICS S.R.L.PAGANI, Alberto
    • PAGANI, Alberto
    • H01L23/544
    • G01R31/275G01R31/2853H01L21/76898H01L22/34H01L23/481H01L2924/0002H01L2924/00
    • A testing system for carrying out electrical testing of at least a through via (10) extending, at least in part, through a substrate (3) of a body (2) of semiconductor material and having a first end (10b) buried within the substrate (3) and not accessible from the outside of the body (2). The testing system has an electrical test circuit (22) integrated in the body (2) and electrically coupled to the through via (10) and to electrical-connection elements (8) carried by the body (2) for electrical connection towards the outside; the electrical test circuit (22) has a buried microelectronic structure (28) integrated in the substrate (3) so as to be electrically coupled to the first end (10b) of the through via (10), thereby closing an electrical path within the substrate (3) and enabling detection of at least one electrical parameter of the through via (10) through the electrical-connection means (8).
    • 至少一个至少部分通过半导体材料的主体(2)的基板(3)延伸的通孔(10)进行电气测试的测试系统,并且具有埋在该半导体材料的第一端(10b)内的第一端 基板(3)并且不能从主体(2)的外部接近。 测试系统具有集成在主体(2)中并电耦合到通孔(10)的电测试电路(22)和由主体(2)承载的电连接元件(8),用于电连接到外部 ; 电测试电路(22)具有集成在基板(3)中的埋入微电子结构(28),以便电连接到通孔(10)的第一端(10b),从而封闭通孔 基板(3),并且能够通过电连接装置(8)检测通孔(10)的至少一个电参数。
    • 8. 发明申请
    • 半導体評価回路
    • 半导体评估电路
    • WO2009017223A1
    • 2009-02-05
    • PCT/JP2008/063867
    • 2008-08-01
    • 凸版印刷株式会社浅野 正通
    • 浅野 正通
    • H01L21/66
    • G01R31/275G11C11/41G11C29/50G11C2029/5006
    •  この半導体評価回路は、1つ若しくは複数の被測定トランジスタのドレイン端子にドレイン電源を供給するためのドレイン電源線と、ソース端子にソース電源を供給するためのソース電源線とを有し、前記ドレイン端子と前記ソース端子との少なくとも一方は、被測定トランジスタの選択時にオンとなるスイッチング素子を介して各々に対応する前記ドレイン電源線または前記ソース電源線と接続された半導体評価回路であって、非選択の被測定トランジスタにおける前記ドレイン端子と前記ソース端子との少なくとも一方に所定の基準電圧を印加する基準電圧印加回路を備える。
    • 半导体评估电路设置有用于向待测量的一个或多个晶体管的漏极端子提供漏极电源的漏极电源线以及用于向源极端子提供源极电源的源极电源线。 至少漏极端子或源极端子通过开关元件连接到相应的漏极电源线或源极电源线,该开关元件在被选择的晶体管被​​选择时导通。 半导体评估电路设置有用于向至少要测量的未选择晶体管的漏极端子或源极端子施加规定参考电压的参考电压施加电路。