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    • 1. 发明申请
    • MULTI-PART MASK FOR IMPLANTING WORKPIECES
    • 用于植入工作的多部分面罩
    • WO2015013606A1
    • 2015-01-29
    • PCT/US2014/048181
    • 2014-07-25
    • VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    • WEBB, Aaron P.CARLSON, Charles T.
    • H01L21/265
    • B32B37/18H01J2237/31711H01L21/266Y10T29/49895
    • A multi-part mask has a pattern plate, which includes a planar portion that has the desired aperture pattern to be used during workpiece processing. The multi-part mask also has a mounting frame, which is used to hold the pattern plate. Prior to assembly, the pattern plate has an aligning portion, which has one or more holes through which reusable alignment pins are inserted. These alignment pins enter kinematic joints disposed on the mounting frame, which serve to precisely align the pattern plate to the mounting frame. After the pattern plate has been secured to the mounting frame, the aligning portion can be detached from the pattern plate. The alignment pins can be reused at a later time. In some embodiments, the pattern plate can later be removed from the mounting frame, so that the mounting frame may be reused.
    • 多部分掩模具有图案板,其包括具有在工件加工期间使用的期望孔径图案的平面部分。 多部分面罩还具有用于固定图案板的安装框架。 在组装之前,图案板具有对准部分,其具有一个或多个孔,可重复使用的对准销插入该孔中。 这些对准销进入设置在安装框架上的运动接头,用于将图案板精确地对准安装框架。 在图案板已经固定到安装框架之后,对准部分可以从图案板分离。 对准引脚可以在以后再次使用。 在一些实施例中,可以稍后从安装框架移除图案板,使得安装框架可以重复使用。
    • 2. 发明申请
    • MASK ALIGNMENT SYSTEM FOR SEMICONDUCTOR PROCESSING
    • 用于半导体处理的掩模对准系统
    • WO2014093501A1
    • 2014-06-19
    • PCT/US2013/074423
    • 2013-12-11
    • VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    • WEBB, Aaron P.CARLSON, Charles T.WEAVER, William T.GRANT, Christopher N.
    • H01L21/68
    • H01L21/266H01L21/682
    • A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered onto the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.
    • 掩模对准系统,用于在离子注入掩模和工件之间提供精确和可重复的对准。 该系统包括具有松散地连接到其上的多个离子注入掩模的掩模框架。 掩模框架设置有多个框架对准空腔,并且每个掩模设置有多个掩模对准空腔。 该系统还包括用于保持工件的压板。 压板可以设置有多个掩模对准销和框架对准销,其被配置为分别接合掩模对准空腔和框架对准空腔。 面罩框架可以下降到台板上,框架对准空腔与框架定位销对齐,以在面罩和工件之间提供粗略对准。 然后将掩模对准空腔移动到与掩模对准销对准,从而将每个单独的掩模移动到与相应的工件精确对准。