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    • 2. 发明申请
    • HIGH-THROUGHPUT PRINTING OF CHALCOGEN LAYER AND THE USE OF AN INTER-METALLIC MATERIAL
    • CHALCOGEN层的高通量印刷和金属间材料的使用
    • WO2007101099A2
    • 2007-09-07
    • PCT/US2007/062694
    • 2007-02-23
    • VAN DUREN, Jeroen, K.j.LEIDHOLM, Craig, R.ROBINSON, Matthew, R.
    • VAN DUREN, Jeroen, K.j.LEIDHOLM, Craig, R.ROBINSON, Matthew, R.
    • C23C18/1283C23C18/1204C23C18/1225C23C18/1241C23C18/127H01L31/0322H01L31/06H01L31/0749H01L31/18Y02E10/541
    • Methods and devices for high-throughput printing of a precursor material for forming a film of a group IB-IIIA- chalcogenide compound are disclosed. In one embodiment, the method comprises forming a precursor layer on a substrate, wherein the precursor layer comprises one or more discrete layers. The layers may include at least a first layer containing one or more group IB elements and two or more different group IDA elements and at least a second layer containing elemental chalcogen particles. The precursor layer may be heated to a temperature sufficient to melt the chalcogen particles and to react the chalcogen particles with the one or more group IB elements and group IDA elements in the precursor layer to form a film of a group IB-IIIA- chalcogenide compound. At least one set of the particles in the precursor layer are inter-metallic particles containing at least one group IB-IIIA inter-metallic alloy phase. The method may also include making a film of group IB-IIIA- chalcogenide compound that includes mixing the nanoparticles and/or nanoglobules and/or nanodroplets to form an ink, depositing the ink on a substrate, heating to melt the extra chalcogen and to react the chalcogen with the group IB and group IIIA elements and/or chalcogenides to form a dense film.
    • 公开了用于形成IB-III族 - 硫族化合物化合物的膜的前体材料的高通量印刷的方法和装置。 在一个实施例中,该方法包括在衬底上形成前体层,其中前体层包含一个或多个离散层。 这些层可以包括至少包含一个或多个IB族元件和两个或更多个不同组IDA元件的第一层和至少包含元素硫族元素颗粒的第二层。 可以将前体层加热到足以熔化硫族元素颗粒的温度,并使硫族元素颗粒与前体层中的一种或多种IB族元素和基团IDA元素反应以形成IB-III族 - 硫族化合物化合物 。 前体层中至少有一组颗粒是含有至少一个IB-IIIA族金属间相合金相的金属间颗粒。 该方法还可以包括制备IB-III族 - 硫族化合物化合物的膜,其包括混合纳米颗粒和/或纳米金属和/或纳米质子以形成油墨,将油墨沉积在基材上,加热以熔化额外的硫属元素并进行反应 具有IB族和IIIA族元素和/或硫族化物的硫族化合物以形成致密膜。