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1. 发明授权

US4701399A Photosensitive composition with 2-halomethyl-5-substituted-1,3,4-oxadiazole 失效
标题翻译：具有2-卤代甲基-5-取代-1,3,4-恶二唑的光敏组合物
公开(公告)号：US4701399A
公开(公告)日：1987-10-20
申请号：US705265
申请日：1985-02-25
申请人： Teruo Nagano , Tadao Toyama , Akira Nagashima
发明人： Teruo Nagano , Tadao Toyama , Akira Nagashima
IPC分类号： G03C1/00 , C07C45/68 , C07C47/548 , C07C51/347 , C07C57/42 , C07C205/43 , C07D271/10 , G03C1/675 , G03C1/72 , G03C1/73 , G03F7/004 , G03F7/029 , G03F7/031 , G03F7/039 , G03F7/105 , G03C1/60 , G03C1/70 , G03C1/71 , G03C1/727
CPC分类号： C07D271/10 , C07C205/43 , C07C45/68 , C07C47/548 , C07C51/347 , C07C57/42 , G03F7/0295 , G03F7/105 , Y10S430/121 , Y10S430/126
摘要： A photosensitive composition containing a 2-halomethyl-5-substituted-1,3,4-oxadiazole compound represented by the following general formula (I): ##STR1## wherein A represents a substituted or unsubstituted aromatic residue; X represents a hydrogen atom, a cyano group, an alkyl group or an aryl group; Y represents a chlorine atom or a bromine atom; and n represents an integer of 1 to 3.The free radical generating agent represented by the general formula (I) has a photosensitive wavelength range from near ultraviolet range to visible range, high photo-decomposition sensitivity and good compatibility with other components present in the photosensitive composition.The photosensitive composition is suitable for use in light-sensitive printing plates or photo-resists.
摘要翻译：含有下述通式（I）表示的2-卤代甲基-5-取代-1,3,4-恶二唑化合物的光敏组合物：其中A表示取代或未取代的芳族残基; X表示氢原子，氰基，烷基或芳基; Y表示氯原子或溴原子; n表示1〜3的整数。由通式（I）表示的自由基发生剂具有从近紫外范围到可见光范围的光敏波长范围，高光分解灵敏度和与其中存在的其它成分的良好相容性感光组合物。感光性组合物适用于感光印版或光致抗蚀剂。

2. 发明授权

US4663275A Photolithographic method and combination including barrier layer 失效
标题翻译：光刻方法和组合包括阻挡层
公开(公告)号：US4663275A
公开(公告)日：1987-05-05
申请号：US647295
申请日：1984-09-04
申请人： Paul R. West , Gary C. Davis
发明人： Paul R. West , Gary C. Davis
IPC分类号： G03F7/095 , G03C1/00 , G03C5/00 , G03F7/09 , G03F7/11 , G03F7/26 , H01L21/027 , G03C1/495 , G03C1/727
CPC分类号： G03F7/091
摘要： Photolithographic methods employing a photoresist layer and a contrast enhancing photobleachable layer deposited thereon have certain disadvantages including compatibility and the tendency toward scum formation during stripping of the photobleachable layer. These problems are alleviated by the deposition of an aqueous alkali-soluble polymeric barrier layer such as poly(vinyl alcohol), which is removed simultaneously with the alkaline development step for the photoresist. In a preferred embodiment, the polymeric binder for the photobleachable layer is also water-soluble and is also removed simultaneously with development.
摘要翻译：使用沉积在其上的光致抗蚀剂层和对比度增强的光致漂白层的光刻方法具有某些缺点，包括相容性和剥离光可漂白层期间浮渣形成的趋势。这些问题通过沉积碱性可溶性聚合物阻挡层例如聚（乙烯醇）来缓解，其与用于光致抗蚀剂的碱性显影步骤同时除去。在优选的实施方案中，用于光致漂白层的聚合物粘合剂也是水溶性的，并且与显影同时被除去。

3. 发明授权

US4452883A Barrier resin for photothermographic color separation 失效
标题翻译：光刻胶分离屏障树脂
公开(公告)号：US4452883A
公开(公告)日：1984-06-05
申请号：US495468
申请日：1983-05-17
申请人： Robert A. Frenchik , Kristen A. Hoff
发明人： Robert A. Frenchik , Kristen A. Hoff
IPC分类号： G03C7/00 , G03C1/498 , G03C8/40 , G03C8/52 , G03C1/00 , G03C1/727
CPC分类号： G03C1/49872
摘要： A photothermographic color construction is disclosed, the construction having at least two color-forming layers comprising:a. a first, spectrally-sensitized, color-forming layer coated out of a solvent system selected from lower alkyl alcohols (up to 4 carbon atoms) ketones (up to 6 carbon atoms), aromatic hydrocarbons (up to 10 carbon atoms), or mixtures thereof,b. an upper, second, different, spectrally-sensitized color-forming layer coated out of a toluene or acetone solvent system, andc. a barrier layer comprising a polymer and a color developer coated between said first and second color-forming layers, said polymer being impervious to toluene or acetone, said polymer being an admixture of a first polymer, polyvinylpyrrolidone (PVP), and a second polymer which is (i) a neutralized and (ii) a hydrolyzed or lower alkyl-esterfied form of a poly(methyl vinyl ether/maleic anhydride) copolymer, in the range of 30 weight percent PVP/70 weight percent neutralized second polymer to 75 weight percent PVP/25 weight percent neutralized second polymer (the weight percentages being of the solventless admixture) said barrier layer is impervious to the solvent system of an overlaying color-forming layer; andfurther wherein each color-forming layer is sensitized to a portion of the spectrum at least 60 nm different from the other color-forming layer, and each color-forming layer contains a leuco dye (colorless) which when oxidized forms a dye (colored) having a maximum absorbance at least 60 nm different from that of the dye (colored) formed in the other color-forming layer.
摘要翻译：公开了光热成像技术的彩色结构，该结构具有至少两个成色层，包括：a。由选自低级烷基醇（至多4个碳原子）酮（最多6个碳原子），芳族烃（至多10个碳原子）或混合物（混合物）的溶剂体系涂覆的第一种光谱敏化的成色层其中，b。由甲苯或丙酮溶剂系统涂覆的上，第二，不同的光谱增感层，以及c。包含聚合物和涂覆在所述第一和第二着色层之间的彩色显影剂的阻挡层，所述聚合物不透于甲苯或丙酮，所述聚合物是第一聚合物，聚乙烯吡咯烷酮（PVP）和第二聚合物的混合物，是（i）中和的和（ii）聚（甲基乙烯基醚/马来酸酐）共聚物的水解或低级烷基酯化形式，在30重量％PVP / 70重量％中和的第二聚合物至75重量％的范围内 PVP / 25重量百分比中和的第二聚合物（重量百分比是无溶剂混合物）所述阻挡层对覆盖着色层的溶剂体系是不渗透的; 并且其中每个成色层对与其它成色层不同的至少60nm的光谱的一部分敏化，并且每个着色层含有无色染料（无色），当被氧化时形成染料（着色），其具有与在另一个形成颜色层中形成的染料（着色）不同的至少60nm的最大吸光度。

4. 发明授权

US4258128A Tellurium(II) compounds and complexes having organic moieties containing silicon containing compositions, articles and photoimaging processes 失效
标题翻译：碲（II）化合物和具有含硅组合物的有机部分的复合物，制品和光成像方法
公开(公告)号：US4258128A
公开(公告)日：1981-03-24
申请号：US965712
申请日：1978-12-01
申请人： Henry J. Gysling
发明人： Henry J. Gysling
IPC分类号： C07F11/00 , C07F7/08 , C07F15/00 , G03C1/73 , G03C1/735 , G03C1/72 , G03C1/727
CPC分类号： C07F7/0809 , C07F15/0066 , C07F7/082 , G03C1/734
摘要： Nonpolar, organic solvent-soluble tellurium compounds and complexes are disclosed. The compounds are tellurium(II) compounds and are represented by the formula:Te----CH.sub.2).sub.n SiRR'R"].sub.2wherein:n is an integer from 1 to 10 andR, R' and R" are independently selected from the group consisting of alkyl, aryl and neterocyclic radicals. Photosensitive complexes of these compounds with transition metals, as well as photographic elements having layers comprising these complexes, are also disclosed.
摘要翻译：公开了非极性有机溶剂可溶性碲化合物和络合物。化合物是碲（II）化合物，并由下式表示：Te-CH2）nSiRR'R“] 2其中：n是1至10的整数，R，R'和R”独立地选自由烷基，芳基和杂环基组成的组。还公开了这些化合物与过渡金属的光敏复合物，以及具有包含这些络合物的层的照相元件。

5. 发明授权

US4050942A Nitroso-dimer-containing compositions and photoimaging process 失效
标题翻译：含亚硝基二聚体的组合物和光成像方法
公开(公告)号：US4050942A
公开(公告)日：1977-09-27
申请号：US688931
申请日：1976-05-21
申请人： George Raymond Nacci
发明人： George Raymond Nacci
IPC分类号： G03F7/027 , G03C1/70 , G03C1/727
CPC分类号： G03F7/027 , Y10S430/118
摘要： Described are photopolymerizable compositions containingA. an ethylenically unsaturated compound,B. about 3-95% by weight of an organic polymeric binder,C. about 0.1-5% by weight of a nitroso dimer which is a noninhibitor of free-radical polymerization but thermally dissociates to nitroso monomer which is an inhibitor of free-radical polymerization, andD. about 0.1-2% by weight of an organic, radiation-sensitive, free-radical generating system.Positive-working, contour images are formed by applying a layer of this composition to a substrate, imagewise exposing the photopolymerizable layer to actinic radiation through an image-bearing transparency at about 20.degree.-65.degree. C, whereby free-radicals are consumed by nitroso monomer, deactivating the nitroso dimer inhibitor system, reexposing at least the unexposed portion of the photopolymerizable layer to actinic radiation while continuing to maintain the nitroso dimer inhibitor system in the deactivated state, and developing the resulting image. The nitroso dimer inhibitor system may be deactivated by cooling the photopolymerizable layer to below about 10.degree. C, and reexposing the layer to radiation that does not appreciably dissociate the nitroso dimer at a temperature below about 10.degree. C, or by heating the photopolymerizable layer at about 80.degree.-150.degree. C thereby destroying the nitroso dimer inhibitor system, and reexposing the layer to actinic radiation at about 20.degree.-60.degree. C.
摘要翻译：描述的是含有A的可光聚合组合物。乙二醇不饱和化合物B.关于3-95重量％的有机聚合物粘合剂的重量百分比C.关于作为无机自由基聚合的非硝基苯胺的硝基二异丙酯的重量的0.1-5％对作为自由基聚合抑制剂的硝基单体的热分解，和D.约0.1-2％的有机，辐射敏感，自由放电系统的重量。

6. 发明授权

US4791039A Visible ray-recording hologram material 失效
标题翻译：可见光线记录全息图材料
公开(公告)号：US4791039A
公开(公告)日：1988-12-13
申请号：US14695
申请日：1987-02-13
申请人： Takeshi Ishitsuka , Yasuo Yamagishi , Akihiro Mochizuki
发明人： Takeshi Ishitsuka , Yasuo Yamagishi , Akihiro Mochizuki
IPC分类号： G03C1/675 , G03F7/00 , G03C1/727
CPC分类号： G03F7/001 , G03C1/675 , Y10S430/116 , Y10S430/126 , Y10S430/146
摘要： A visible ray-recording hologram material comprising a polymer containing a carbazole ring, iodoform, and an aromatic colorant having a fused ring system. This material enables recording with rays having a wavelength of 450 to 550 nm.
摘要翻译：包括含有咔唑环的聚合物，碘仿型和具有稠环体系的芳族着色剂的可见光线记录全息图材料。该材料能够使用波长为450至550nm的光线进行记录。

7. 发明授权

US4772541A Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same 失效
标题翻译：含有染料硼酸盐络合物和使用其的感光材料的可光硬化组合物
公开(公告)号：US4772541A
公开(公告)日：1988-09-20
申请号：US917873
申请日：1986-10-10
申请人： Peter Gottschalk , Gary B. Schuster
发明人： Peter Gottschalk , Gary B. Schuster
IPC分类号： C09B17/00 , A61C19/00 , B29C67/00 , C08F2/50 , C09B17/02 , C09B21/00 , C09B23/00 , C09B23/04 , C09B23/06 , C09B23/08 , C09B69/02 , C09B69/10 , G03C1/00 , G03F7/00 , G03F7/004 , G03F7/027 , G03F7/029 , G03C1/72 , G03C1/727 , G03C5/00
CPC分类号： C08F2/50 , G03F7/002 , G03F7/027 , G03F7/029 , A61C13/0013 , A61C19/003 , B29C67/0051 , Y10S430/115 , Y10S430/117 , Y10S430/128
摘要： A photohardenable composition comprising a free radical addition polymerizable or crosslinkable compound and a cationic dye-borate anion complex, said complex being capable of absorbing actinic radiation and producing free radicals which initiate free radical polymerization or crosslinking of said compound; and photosensitive materials employing the composition where in one embodiment the composition is microencapsulated.
摘要翻译：一种包含自由基加成聚合或可交联化合物和阳离子染料 - 硼酸盐阴离子络合物的可光硬化组合物，所述络合物能够吸收光化辐射并产生引发所述化合物的自由基聚合或交联的自由基; 以及使用该组合物的感光材料，其中在一个实施方案中组合物被微胶囊化。

8. 发明授权

US4701402A Oxidative imaging 失效
公开(公告)号：US4701402A
公开(公告)日：1987-10-20
申请号：US814635
申请日：1985-12-30
申请人： Ranjan C. Patel , Ian J. Ferguson , Herbert J. Pennicott
发明人： Ranjan C. Patel , Ian J. Ferguson , Herbert J. Pennicott
IPC分类号： G03C7/02 , G03C1/727
CPC分类号： G03C7/02
摘要： A radiation-sensitive element capable of recording an image upon image-wise exposure to radiation of selected wavelength, the element comprising, as the image-forming components, an effective amount of a bleachable dye in reactive association with an iodonium ion. Suitable dyes include polymethine dyes having an oxidation potential between 0 and +1 volt.

9. 发明授权

US4677049A Spin castable photobleachable layer forming compositions 失效
标题翻译：可旋转光滑漂白层形成组合物
公开(公告)号：US4677049A
公开(公告)日：1987-06-30
申请号：US675915
申请日：1984-11-28
申请人： Bruce F. Griffing , Paul R. West
发明人： Bruce F. Griffing , Paul R. West
IPC分类号： G03F7/09 , G03C1/727
CPC分类号： G03F7/091 , Y10S430/129
摘要： Spin castable mixtures having aryl nitrones are provided which are useful in making photobleachable layers for use in contrast enhanced photolithography.
摘要翻译：提供了具有芳基硝酮的可旋转浇注混合物，其可用于制备用于对比度增强光刻的光致漂白层。

10. 发明授权

US4557996A Method for providing a pattern-wise photoresist layer on a substrate plate and a surface-protected substrate plate therefor 失效
标题翻译：在基板上提供图案化的光致抗蚀剂层的方法和用于其的表面保护的基板
公开(公告)号：US4557996A
公开(公告)日：1985-12-10
申请号：US614655
申请日：1984-05-29
申请人： Toshimi Aoyama , Hiroyuki Tohda , Kazuo Kato , Hisashi Nakane
发明人： Toshimi Aoyama , Hiroyuki Tohda , Kazuo Kato , Hisashi Nakane
IPC分类号： G03F7/11 , G03F7/09 , G03F7/095 , G03F7/30 , H03K3/06 , H05K3/06 , G03C5/44 , G03C1/727
CPC分类号： G03F7/095 , G03F7/091 , H05K3/064 , H05K2203/0577 , H05K2203/066
摘要： The invention provides an improved method for the so-called dry-film process for forming a pattern-wise photoresist layer on the substrate surface in which a substrate is overlaid and laminated with a preformed film of a photosensitive composition called a dry film and photolithographically processed. In the inventive method, different from conventional dry-film processes, the substrate plate is first provided with a protecting layer of a photosensitive composition containing a halation inhibitor and the lamination with a dry film is performed without removing the protecting layer. After pattern-wise exposure to light, development of the photosensitive layer is undertaken by use of a developer solvent capable of dissolving both of the protecting layer and the pattern-forming layer. Despite the intervention of the protecting layer, the resolving power and image reproducibility are excellent.
摘要翻译：本发明提供了一种用于在衬底表面上形成图案化光致抗蚀剂层的所谓干膜工艺的改进方法，其中衬底被覆盖并与预先形成的称为干膜的感光组合物的膜层压并且光刻加工。在本发明的方法中，与传统的干膜工艺不同，首先提供含有防晕抑制剂的感光组合物的保护层，并且在不除去保护层的情况下进行与干膜的层压。在图案曝光之后，通过使用能够溶解保护层和图案形成层两者的显影剂溶剂进行感光层的显影。尽管保护层的干预，分辨率和图像再现性都很好。

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