会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明授权
    • Apparatus for treating an object using ultra-violet light
    • 用紫外光处理物体的装置
    • US06272768B1
    • 2001-08-14
    • US09442043
    • 1999-11-12
    • Michael J. Danese
    • Michael J. Danese
    • F26B334
    • H01L21/67086H01L21/67057
    • An apparatus for processing an object with ultra-violet light is provided. The apparatus generally comprises a container, a transducer, coupled to the container; and a source of ultraviolet light configured to deliver ultraviolet light to an object disposed within said container. The UV source is configured to deliver the ultraviolet light through the vapor to process the object. The vapor and UV light react with a surface of the object to process the object. The apparatus is particularly suited to wet processing substrates in a single substrate processing system having multiple wet processing chambers configured within a process bench. The apparatus can include a robot arm having a pick-up, such as a vacuum wand, that adheres to a back side of the substrate.
    • 提供一种用紫外光处理物体的装置。 该装置通常包括耦合到容器的容器,换能器; 以及构造成将紫外光输送到设置在所述容器内的物体的紫外线源。 紫外线源被配置为通过蒸汽传递紫外线以处理物体。 蒸汽和紫外光与物体的表面反应以处理物体。 该设备特别适用于在工艺台中配置有多个湿式处理室的单个基板处理系统中的湿法处理基板。 该装置可以包括具有附着到基板的背面的拾取器(例如真空棒)的机器人臂。
    • 4. 发明授权
    • Ultraviolet curing apparatus using an inert atmosphere chamber
    • 使用惰性气氛室的紫外线固化装置
    • US06223453B1
    • 2001-05-01
    • US09474079
    • 1999-12-29
    • Derek S. MathesonAndrew G. Moulthrop
    • Derek S. MathesonAndrew G. Moulthrop
    • F26B334
    • F26B21/14F26B3/283
    • A curing apparatus comprises a curing chamber for accommodating a controlled atmosphere for a product being treated and an irradiator for providing radiation directed at the product. The curing chamber has spaced inlet and outlet openings for the product establishing a path of travel underneath the irradiator. First and second nozzle assemblies are disposed adjacent respective inlet and outlet openings for supplying inert gas into the chamber and maintaining an inert atmosphere within the chamber. The nozzle assemblies are removably secured to the chamber. A pre-chamber is provided in the nozzle assemblies to moderate the pressure distribution of the gas within the nozzle assemblies.
    • 固化装置包括固化室,用于容纳被处理产品的受控气氛和用于提供针对产品的辐射的辐照器。 固化室具有间隔的入口和出口,用于产品在辐照器下方建立行进路径。 第一和第二喷嘴组件设置在相邻的入口和出口附近,用于将惰性气体供应到腔室中并在室内保持惰性气氛。 喷嘴组件可移除地固定到腔室。 在喷嘴组件中设置有预调节室,以缓和喷嘴组件内的气体的压力分布。
    • 5. 发明授权
    • Thermocapillary dryer
    • 热毛细干燥器
    • US06192600B1
    • 2001-02-27
    • US09392966
    • 1999-09-09
    • Eric J. Bergman
    • Eric J. Bergman
    • F26B334
    • H01L21/67034Y10S134/902
    • A process and apparatus for drying semiconductor wafers includes the controlled-rate extraction of a wafer immersed in rinsing liquid, irradiation of the wafer using high intensity lights or filaments along the wafer-liquid interface, and delivery of gas streams against the wafer along the wafer-liquid interface using a gas delivery system. Heating is controlled to create a temperature gradient without evaporating rinsing fluid adhering to surfaces of the wafer. Heating by the radiation sources creates a temperature gradient in the wafer in the irradiated region that simultaneously generates a surface tension gradient in the water adhering to the wafer. The gas delivery system removes the bulk of the water adhering to the wafer surface, and also suppresses the height of the rinsing liquid adhering to the wafer, providing faster extraction of dry and highly clean wafers from the rinsing liquid. A solvent vapor is optionally injected at the wafer-liquid interface, to reduce adhesion of the liquid to the vapor.
    • 用于干燥半导体晶片的工艺和设备包括浸入冲洗液中的晶片的受控速率提取,沿着晶片 - 液界面的高强度光或细丝照射晶片,以及沿着晶片向晶片的输送 - 使用气体输送系统的液体界面。 控制加热以产生温度梯度,而不会蒸发粘附到晶片表面的冲洗流体。 通过辐射源的加热在照射区域中的晶片中产生温度梯度,同时在附着于晶片的水中产生表面张力梯度。 气体输送系统除去附着在晶片表面上的大部分水,并且还抑制了附着在晶片上的冲洗液体的高度,从冲洗液体中更快地提取干燥且高度干净的晶片。 任选地在晶片 - 液体界面处注入溶剂蒸气,以减少液体对蒸气的粘附。
    • 9. 发明授权
    • Air ionizing drying apparatus
    • 空气电离干燥装置
    • US06651356B1
    • 2003-11-25
    • US10236173
    • 2002-09-06
    • Alice C. Buehring
    • Alice C. Buehring
    • F26B334
    • A47K10/48F26B21/001
    • An air ionizing drying includes an elongated housing that has an interior, an inlet opening, and an elongated outlet opening. A microcontroller is positioned in the interior of the housing. A control panel is coupled to the housing and operationally coupled to the microcontroller. An intake conduit is positioned in the housing and extends from the intake opening. A heating assembly is positioned in the interior of the housing for receiving air passing through the intake conduit. The heating assembly is operationally coupled to the microcontroller. A manifold is environmentally coupled to the heating assembly for receiving air passing through the heating assembly. A fan assembly has a plurality of fans and is coupled to the manifold for drawing air through the manifold. An outlet conduit extends between the fan assembly and the outlet opening. An ionizing assembly is coupled to the outlet conduit for ionizing air passing through the outlet conduit.
    • 空气电离干燥包括具有内部的细长壳体,入口开口和细长的出口开口。 微控制器位于外壳的内部。 控制面板耦合到壳体并且可操作地耦合到微控制器。 入口管道定位在壳体中并从进气口延伸。 加热组件定位在壳体的内部,用于接收通过进气管道的空气。 加热组件可操作地耦合到微控制器。 多个歧管环境耦合到加热组件,用于接收通过加热组件的空气。 风扇组件具有多个风扇并且联接到歧管以将空气抽吸通过歧管。 出口导管在风扇组件和出口之间延伸。 电离组件联接到出口导管,用于使通过出口导管的空气电离电离。