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1. 发明申请

US20120273691A1 CHARGED PARTICLE SYSTEM FOR PROCESSING A TARGET SURFACE 有权
标题翻译：用于处理目标表面的充电颗粒系统
公开(公告)号：US20120273691A1
公开(公告)日：2012-11-01
申请号：US13458936
申请日：2012-04-27
申请人： Alrik van den Brom , Stijn Willem Herman Karel Steenbrink , Marco Jan-Jaco Wieland , Guido De Boer , Pieter Kappelhof
发明人： Alrik van den Brom , Stijn Willem Herman Karel Steenbrink , Marco Jan-Jaco Wieland , Guido De Boer , Pieter Kappelhof
IPC分类号： H01J3/14
CPC分类号： H01J37/20 , B82Y10/00 , B82Y40/00 , G03F7/708 , G03F7/70825 , G03F7/70975 , H01J37/3174 , H01J37/3177 , H01J2237/024 , H01J2237/03 , H01J2237/0437 , H01J2237/1502 , H01J2237/153
摘要： The invention relates to a charged particle system for processing a target surface with at least one charged particle beam. The system comprises an optical column with a beam generator module for generating a plurality of charged particle beams, a beam modulator module for switching on and off said plurality of beams and a beam projector module for projecting beams or subbeams on said target surface. The system further comprises a frame supporting each of said modules in a fixed position and alignment elements for aligning at least one of beams and/or subbeams with a downstream module element.
摘要翻译：本发明涉及一种用至少一个带电粒子束来处理目标表面的带电粒子系统。该系统包括具有用于产生多个带电粒子束的光束发生器模块的光学柱，用于接通和关闭所述多个光束的光束调制器模块和用于在所述目标表面上投射光束或子光束的光束投影器模块。该系统还包括支撑固定位置的每个模块的框架和用于将梁和/或子梁中的至少一个与下游模块元件对准的对准元件。

2. 发明授权

US09362084B2 Electro-optical element for multiple beam alignment 有权
标题翻译：用于多光束对准的电光元件
公开(公告)号：US09362084B2
公开(公告)日：2016-06-07
申请号：US13458936
申请日：2012-04-27
申请人： Alrik van den Brom , Stijn Willem Herman Karel Steenbrink , Marco Jan-Jaco Wieland , Guido De Boer , Pieter Kappelhof
发明人： Alrik van den Brom , Stijn Willem Herman Karel Steenbrink , Marco Jan-Jaco Wieland , Guido De Boer , Pieter Kappelhof
IPC分类号： H01J37/20 , H01J37/317
CPC分类号： H01J37/20 , B82Y10/00 , B82Y40/00 , G03F7/708 , G03F7/70825 , G03F7/70975 , H01J37/3174 , H01J37/3177 , H01J2237/024 , H01J2237/03 , H01J2237/0437 , H01J2237/1502 , H01J2237/153
摘要： The invention relates to a charged particle system for processing a target surface with at least one charged particle beam. The system comprises an optical column with a beam generator module for generating a plurality of charged particle beams, a beam modulator module for switching on and off said plurality of beams and a beam projector module for projecting beams or subbeams on said target surface. The system further comprises a frame supporting each of said modules in a fixed position and alignment elements for aligning at least one of beams and/or subbeams with a downstream module element.
摘要翻译：本发明涉及一种用至少一个带电粒子束来处理目标表面的带电粒子系统。该系统包括具有用于产生多个带电粒子束的光束发生器模块的光学柱，用于接通和关闭所述多个光束的光束调制器模块和用于在所述目标表面上投射光束或子光束的光束投影器模块。该系统还包括支撑固定位置的每个模块的框架和用于将梁和/或子梁中的至少一个与下游模块元件对准的对准元件。

3. 发明授权

US08710461B2 Assembly for providing an aligned stack of two or more modules and a lithography system or a microscopy system comprising such an assembly 有权
标题翻译：用于提供两个或多个模块的对准堆叠的组件以及包括这种组件的光刻系统或显微镜系统
公开(公告)号：US08710461B2
公开(公告)日：2014-04-29
申请号：US13612498
申请日：2012-09-12
申请人： Pieter Kappelhof
发明人： Pieter Kappelhof
IPC分类号： H01J3/14
CPC分类号： A47B55/00 , B82Y10/00 , B82Y40/00 , G21K1/065 , H01J37/023 , H01J37/26 , H01J37/3177 , H01J2237/032 , H01J2237/036
摘要： The invention relates to an assembly, preferably for use in a lithography system or a microscopy system, for providing an accurately aligned stack of two or more modules in a stacking direction. Each of the two or more modules comprises three support members. The assembly comprises a frame comprising three planar alignment surfaces which extend in the stacking direction and which are angularly off-set with respect to each other. In addition each of the three support members of each one of the two or more modules, when arranged in said frame, abuts against a corresponding one of the three alignment surfaces. The frame is provided with an opening between two of the three planar alignment surfaces for inserting a module in the assembly, said two planar alignment surfaces on either side of the opening are arranged at least partially facing said opening.
摘要翻译：本发明涉及一种组件，优选用于光刻系统或显微镜系统，用于在层叠方向上提供两个或多个模块的精确对准的堆叠。两个或更多个模块中的每一个包括三个支撑构件。组件包括框架，该框架包括在层叠方向上延伸并相对于彼此成角度偏移的三个平面对准表面。此外，当布置在所述框架中时，两个或更多个模块中的每一个的三个支撑构件中的每一个抵靠三个对准表面中的对应的一个。框架设置有三个平面对准表面中的两个之间的开口，用于将模块插入组件中，开口任一侧上的两个平面对准表面布置成至少部分地面对所述开口。

4. 发明申请

US20130087702A1 ASSEMBLY FOR PROVIDING AN ALIGNED STACK OF TWO OR MORE MODULES AND A LITHOGRAPHY SYSTEM OR A MICROSCOPY SYSTEM COMPRISING SUCH AN ASSEMBLY 有权
标题翻译：用于提供两个或更多个模块的对齐堆叠的组件以及包含这样组装的显微系统或显微系统
公开(公告)号：US20130087702A1
公开(公告)日：2013-04-11
申请号：US13612498
申请日：2012-09-12
申请人： Pieter Kappelhof
发明人： Pieter Kappelhof
IPC分类号： A47B55/00 , G21K1/06
CPC分类号： A47B55/00 , B82Y10/00 , B82Y40/00 , G21K1/065 , H01J37/023 , H01J37/26 , H01J37/3177 , H01J2237/032 , H01J2237/036
摘要： The invention relates to an assembly, preferably for use in a lithography system or a microscopy system, for providing an accurately aligned stack of two or more modules in a stacking direction. Each of the two or more modules comprises three support members. The assembly comprises a frame comprising three planar alignment surfaces which extend in the stacking direction and which are angularly off-set with respect to each other. In addition each of the three support members of each one of the two or more modules, when arranged in said frame, abuts against a corresponding one of the three alignment surfaces. The frame is provided with an opening between two of the three planar alignment surfaces for inserting a module in the assembly, said two planar alignment surfaces on either side of the opening are arranged at least partially facing said opening.
摘要翻译：本发明涉及一种组件，优选用于光刻系统或显微镜系统，用于在层叠方向上提供两个或多个模块的精确对准的堆叠。两个或更多个模块中的每一个包括三个支撑构件。组件包括框架，该框架包括在层叠方向上延伸并相对于彼此成角度偏移的三个平面对准表面。此外，当布置在所述框架中时，两个或更多个模块中的每一个的三个支撑构件中的每一个抵靠三个对准表面中的对应的一个。框架设置有三个平面对准表面中的两个之间的开口，用于将模块插入组件中，开口任一侧上的两个平面对准表面布置成至少部分地面对所述开口。

5. 发明授权

US09146480B2 Support structure for wafer table 有权
标题翻译：晶圆台支撑结构
公开(公告)号：US09146480B2
公开(公告)日：2015-09-29
申请号：US13607469
申请日：2012-09-07
申请人： Pieter Kappelhof , Jerry Johannes Martinus Peijster , Dennis Kemperman
发明人： Pieter Kappelhof , Jerry Johannes Martinus Peijster , Dennis Kemperman
IPC分类号： G03B27/58 , G03F7/20
CPC分类号： G03F7/707 , G03F7/70783
摘要： The invention relates to a support structure for supporting a wafer table in a lithography system, said support structure comprising: a base comprising a reference surface, an interface member, made from a low thermal expansion material, arranged on top of said base and adapted for positioning said wafer table on the support structure, wherein said interface member is connected to said reference surface via at least one strut, and wherein the at least one strut is made from a low thermal expansion material. The invention further relates to a lithography system comprising such a support structure.
摘要翻译：本发明涉及一种用于在光刻系统中支撑晶片台的支撑结构，所述支撑结构包括：底座，包括参考表面，由低热膨胀材料制成的接口构件，该接口构件布置在所述基座的顶部上，将所述晶片台定位在所述支撑结构上，其中所述接口构件经由至少一个支柱连接到所述参考表面，并且其中所述至少一个支柱由低热膨胀材料制成。本发明还涉及包括这种支撑结构的光刻系统。

6. 发明申请

US20130063712A1 SUPPORT STRUCTURE FOR WAFER TABLE 有权
标题翻译： WAFER TABLE支撑结构
公开(公告)号：US20130063712A1
公开(公告)日：2013-03-14
申请号：US13607469
申请日：2012-09-07
申请人： Pieter Kappelhof , Jerry Johannes Martinus Peijster , Dennis Kemperman
发明人： Pieter Kappelhof , Jerry Johannes Martinus Peijster , Dennis Kemperman
IPC分类号： G03B27/58
CPC分类号： G03F7/707 , G03F7/70783
摘要： The invention relates to a support structure for supporting a wafer table in a lithography system, said support structure comprising: a base comprising a reference surface, an interface member, made from a low thermal expansion material, arranged on top of said base and adapted for positioning said wafer table on the support structure, wherein said interface member is connected to said reference surface via at least one strut, and wherein the at least one strut is made from a low thermal expansion material. The invention further relates to a lithography system comprising such a support structure.
摘要翻译：本发明涉及一种用于在光刻系统中支撑晶片台的支撑结构，所述支撑结构包括：底座，包括参考表面，由低热膨胀材料制成的接口构件，该接口构件布置在所述基座的顶部上，将所述晶片台定位在所述支撑结构上，其中所述接口构件经由至少一个支柱连接到所述参考表面，并且其中所述至少一个支柱由低热膨胀材料制成。本发明还涉及包括这种支撑结构的光刻系统。

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