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1. 发明申请

US20170117227A1 LITHOGRAPHY ENGRAVING MACHINE 审中-公开
公开(公告)号：US20170117227A1
公开(公告)日：2017-04-27
申请号：US15154181
申请日：2016-05-13
申请人： Taiwan Semiconductor Manufacturing Co., Ltd.
发明人： Hu-Wei Lin , Chih-Hsien Hsu , Yu-Wei Chiu , Hai-Yin Chen , Ying-Hao Wang , Yu-Hen Wu
IPC分类号： H01L23/544 , G03F7/20 , H01L21/67 , H01L21/027 , H01L21/308
CPC分类号： H01L23/544 , G03F7/70141 , G03F7/70541 , H01L21/0274 , H01L21/3086 , H01L21/67282 , H01L2223/54426 , H01L2223/54433
摘要： In some embodiments, the present disclosure relates a lithographic substrate marking tool. The lithographic substrate marking tool has a first lithographic exposure tool arranged within a shared housing and configured to generate a first type of electromagnetic radiation during a plurality of exposures. A mobile reticle has a plurality of different reticle fields respectively configured to block a portion of the first type of electromagnetic radiation to expose a substrate identification mark within a photosensitive material overlying a semiconductor substrate. A transversal element is configured to move the mobile reticle so that separate ones of the plurality of reticle fields are exposed onto the photosensitive material during separate ones of the plurality of exposures. The mobile reticle therefore allows for different strings of substrate identification marks to be formed within the photoresistive material using a same reticle, thereby economically providing the benefits of lithographic substrate marking.

2. 发明授权

US09523920B2 Exposure device and exposure method 有权
标题翻译：曝光装置和曝光方法
公开(公告)号：US09523920B2
公开(公告)日：2016-12-20
申请号：US14386245
申请日：2013-12-09
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
发明人： Haitao Ma , Haisheng Zhao
IPC分类号： G03B27/62 , G03B27/42 , G03F7/20
CPC分类号： G03F7/2045 , G03F7/70541 , G03F7/70691 , G03F7/70716 , G03F7/70733
摘要： An exposure device and an exposure method are provided. The exposure device includes an exposure lamp, a mask plate and a marking equipment. The marking equipment includes a guide rail frame disposed on the mask plate, and at least one marking vehicle disposed on the guide rail frame, a controller. The controller acts to make the guide rail frame move to a corresponding exposure location on the mask plate earlier than the exposure lamp under its control, and to make the marking vehicle lie in a corresponding marking location by dint of its control, for displaying a corresponding marking identification.
摘要翻译：提供曝光装置和曝光方法。曝光装置包括曝光灯，掩模板和标记设备。标记设备包括设置在掩模板上的导轨框架和设置在导轨框架上的至少一个标记车辆，控制器。控制器用于使导轨框架比其控制下的曝光灯更早地移动到掩模板上相应的曝光位置，并且通过其控制使标记车辆位于相应的标记位置，以显示对应的标识识别。

3. 发明授权

US08715908B2 Process of using an imaging element having a photoluminescent tag 失效
标题翻译：使用具有光致发光标签的成像元件的方法
公开(公告)号：US08715908B2
公开(公告)日：2014-05-06
申请号：US13235887
申请日：2011-09-19
申请人： Adrian Lungu
发明人： Adrian Lungu
IPC分类号： G03F7/26 , G01N21/62
CPC分类号： G03F7/2004 , G03F7/027 , G03F7/105 , G03F7/70541 , G03F7/70608
摘要： The invention relates to an imaging element and a method of using the imaging element to form a recording element. The imaging element includes a composition sensitive to actinic radiation from a source of radiation having a range of wavelengths and a photoluminescent tag that is responsive to at least one wavelength from the source of radiation. The photoluminescent tag can be used to authenticate the identity of the element, provide information about the element, and/or to establish one or more conditions in a device used to prepare the recording element from the imaging element.
摘要翻译：本发明涉及成像元件和使用成像元件形成记录元件的方法。成像元件包括对具有波长范围的辐射源的光化辐射敏感的组合物和响应于来自辐射源的至少一个波长的光致发光标签。光致发光标签可用于认证元件的身份，提供关于元件的信息，和/或在用于从成像元件准备记录元件的设备中建立一个或多个条件。

4. 发明授权

US08575547B2 Electron beam measurement apparatus 有权
标题翻译：电子束测量装置
公开(公告)号：US08575547B2
公开(公告)日：2013-11-05
申请号：US12982202
申请日：2010-12-30
申请人： Yasunari Sohda , Shoji Hotta , Shinji Okazaki , Muneyuki Fukuda
发明人： Yasunari Sohda , Shoji Hotta , Shinji Okazaki , Muneyuki Fukuda
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： G03F7/7065 , G03F7/70541 , G03F7/70625 , G06T7/0006 , G06T2207/10056 , G06T2207/30148 , H01J2237/221 , H01J2237/24578 , H01J2237/2817 , H01L22/12
摘要： The present invention provides an electron beam measurement technique for measuring the shapes or sizes of portions of patterns on a sample, or detecting a defect or the like. An electron beam measurement apparatus has a unit for irradiating the patterns delineated on a substrate by a multi-exposure method, and classifying the patterns in an acquired image into multiple groups according to an exposure history record. The exposure history record is obtained based on brightness of the patterns and a difference between white bands of the patterns.
摘要翻译：本发明提供一种电子束测量技术，用于测量样品上图案的形状或尺寸，或检测缺陷等。电子束测量装置具有通过多曝光方法照射在基板上描绘的图案的单元，并且根据曝光历史记录将所获取的图像中的图案分类为多组。基于图案的亮度和图案的白色波段之间的差异获得曝光历史记录。

5. 发明授权

US08343716B2 Method of forming variable patterns using a reticle 有权
标题翻译：使用掩模版形成可变图案的方法
公开(公告)号：US08343716B2
公开(公告)日：2013-01-01
申请号：US12253025
申请日：2008-10-16
申请人： Lee J. Jacobson , Francis J. McNally , Zualfquar Mohammed , Robert Maher
发明人： Lee J. Jacobson , Francis J. McNally , Zualfquar Mohammed , Robert Maher
IPC分类号： G03C5/04
CPC分类号： G03F7/70425 , G03F7/70541
摘要： A method of forming a variable pattern across a wafer using a reticle forms a plurality of first patterns on the wafer. The first pattern is repeated across the wafer and each first pattern has a first readable element. The method also forms a plurality of second patterns on the wafer. The second patterns is repeated across the wafer and each second pattern has a second readable element. The second patterns are positioned relative to the first patterns by aligning a first second pattern relative to one portion of a corresponding first pattern and then incrementally misaligning each successive second pattern in a row or a column relative to its corresponding first pattern. Thus, each corresponding first readable element and second readable element form a corresponding variable pattern.
摘要翻译：使用掩模版在晶片上形成可变图案的方法在晶片上形成多个第一图案。跨晶片重复第一图案，并且每个第一图案具有第一可读元件。该方法还在晶片上形成多个第二图案。跨晶片重复第二图案，并且每个第二图案具有第二可读元件。通过使相对于对应的第一图案的一个部分相对于第一第二图案然后相对于其对应的第一图案逐行地将每个连续的第二图案与行或列相对错位，使第二图案相对于第一图案定位。因此，每个对应的第一可读元素和第二可读元素形成对应的可变模式。

6. 发明申请

US20110205508A1 Digital Exposure Method and Digital Exposure Device for Performing the Method 有权
标题翻译：用于执行该方法的数字曝光方法和数字曝光装置
公开(公告)号：US20110205508A1
公开(公告)日：2011-08-25
申请号：US12906623
申请日：2010-10-18
申请人： Sang-Hyun Yun , Hi-Kuk Lee , Sang-Woo Bae , Cha-Dong Kim , Jung-In Park
发明人： Sang-Hyun Yun , Hi-Kuk Lee , Sang-Woo Bae , Cha-Dong Kim , Jung-In Park
IPC分类号： G03B27/52
CPC分类号： G03B27/526 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70541
摘要： A digital exposure method and a digital exposure device for performing the method are disclosed. In the method, a graphic data system file is produced in correspondence with each of a plurality of patterns formed on a substrate. Then, a digital micromirror device on/off data is generated from the graphic data system file. Then, the substrate is exposed in response to the digital micromirror device on/off data. Thus, at least a first exposure for forming a first pattern of a display panel, and a second exposure for forming identification numbers of a substrate and each display panel and removing an edge portion of the substrate may be simultaneously performed, to simplify the exposure process decrease costs.
摘要翻译：公开了一种用于执行该方法的数字曝光方法和数字曝光装置。在该方法中，与形成在基板上的多个图案中的每一个对应地生成图形数据系统文件。然后，从图形数据系统文件生成数字微镜装置开/关数据。然后，响应于数字微镜装置的开/关数据曝光基板。因此，可以同时执行用于形成显示面板的第一图案的第一曝光和用于形成基板和每个显示面板的识别号和去除基板的边缘部分的第二曝光，以简化曝光过程降低成本

7. 发明授权

US07884325B2 Electron beam measurement apparatus 有权
标题翻译：电子束测量装置
公开(公告)号：US07884325B2
公开(公告)日：2011-02-08
申请号：US12328161
申请日：2008-12-04
申请人： Yasunari Sohda , Shoji Hotta , Shinji Okazaki , Muneyuki Fukuda
发明人： Yasunari Sohda , Shoji Hotta , Shinji Okazaki , Muneyuki Fukuda
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： G03F7/7065 , G03F7/70541 , G03F7/70625 , G06T7/0006 , G06T2207/10056 , G06T2207/30148 , H01J2237/221 , H01J2237/24578 , H01J2237/2817 , H01L22/12
摘要： The present invention provides an electron beam measurement technique for measuring the shapes or sizes of portions of patterns on a sample, or detecting a defect or the like. An electron beam measurement apparatus has a unit for irradiating the patterns delineated on a substrate by a multi-exposure method, and classifying the patterns in an acquired image into multiple groups according to an exposure history record. The exposure history record is obtained based on brightness of the patterns and a difference between white bands of the patterns.
摘要翻译：本发明提供一种电子束测量技术，用于测量样品上图案的形状或尺寸，或检测缺陷等。电子束测量装置具有通过多曝光方法照射在基板上描绘的图案的单元，并且根据曝光历史记录将所获取的图像中的图案分类为多组。基于图案的亮度和图案的白色波段之间的差异获得曝光历史记录。

8. 发明授权

US07846639B2 Imaging element having a photoluminescent tag and process of using the imaging element to form a recording element 有权
标题翻译：具有光致发光标签的成像元件和使用成像元件形成记录元件的过程
公开(公告)号：US07846639B2
公开(公告)日：2010-12-07
申请号：US11478950
申请日：2006-06-30
申请人： Adrian Lungu
发明人： Adrian Lungu
IPC分类号： C03F7/09 , C03F7/11
CPC分类号： G03F7/2004 , G03F7/027 , G03F7/105 , G03F7/70541 , G03F7/70608
摘要： The invention relates to an imaging element and a method of using the imaging element to form a recording element. The imaging element includes a composition sensitive to actinic radiation from a source of radiation having a range of wavelengths and a photoluminescent tag that is responsive to at least one wavelength from the source of radiation. The photoluminescent tag can be used to authenticate the identity of the element, provide information about the element, and/or to establish one or more conditions in a device used to prepare the recording element from the imaging element.
摘要翻译：本发明涉及成像元件和使用成像元件形成记录元件的方法。成像元件包括对具有波长范围的辐射源的光化辐射敏感的组合物和响应于来自辐射源的至少一个波长的光致发光标签。光致发光标签可用于认证元件的身份，提供关于元件的信息，和/或在用于从成像元件准备记录元件的设备中建立一个或多个条件。

9. 发明授权

US07842525B2 Method and apparatus for personalization of semiconductor 有权
标题翻译：用于半导体个性化的方法和装置
公开(公告)号：US07842525B2
公开(公告)日：2010-11-30
申请号：US11980432
申请日：2007-10-31
申请人： Torbjorn Sandstrom
发明人： Torbjorn Sandstrom
IPC分类号： H01L29/06
CPC分类号： G03F7/70541 , G03B27/44 , G03F7/70291 , G03F7/7045 , G03F7/70466 , G03F7/70575 , H01L22/34 , H01L23/544 , H01L23/57 , H01L2223/5444 , H01L2924/0002 , H01L2924/00
摘要： A system for making small modifications to the pattern in standard processed semiconductor devices. The modifications are made to create a small variable part of the pattern against a large constant part of the same pattern. In a preferred embodiment the exposure of the variable and constant parts are done with the same wavelength in the same combined stepper and code-writer. The invention devices a way of writing variable parts of the chip that is automatic, inexpensive and risk-free. A system for automatic design and production of die-unique patterns is also shown.
摘要翻译：用于对标准处理的半导体器件中的图案进行小的修改的系统。进行修改以针对相同图案的大常数部分创建图案的小变量部分。在优选实施例中，可变和恒定部分的曝光在相同的组合步进器和代码写入器中以相同的波长进行。本发明设备以自动，廉价和无风险的方式编写芯片的可变部分。还显示了一种用于自动设计和生产模具独特图案的系统。

10. 发明授权

US07689027B2 Reticle discerning device, exposure equipment comprising the same and exposure method 失效
标题翻译：掩模版识别装置，包含曝光方法的曝光设备
公开(公告)号：US07689027B2
公开(公告)日：2010-03-30
申请号：US11501076
申请日：2006-08-09
申请人： Myeong-Seok Lee
发明人： Myeong-Seok Lee
IPC分类号： G06K9/62
CPC分类号： G03F7/7085 , G03F7/70525 , G03F7/70541 , G03F7/70741
摘要： A reticle discerning device includes a memory in which images of to-be-illuminated patterns of a plurality of reticles are stored as reference pattern images, respectively, a detection unit comprising an optical image sensor, and a processing unit connected to the memory and to the detection unit. The processing unit is operative to compare the reference pattern images with images detected by the optical image sensor of the detection unit. The reticle discerning device is used in exposure equipment having a stocker in which the reticles are stocked, an exposure apparatus, and a reticle transfer robot that transfers a selected one of the reticles from the stocker to the exposure apparatus. The detection unit captures an image of the pattern of the selected reticle and uses the image to discern the reticle and ensure that the correct reticle is transferred to the exposure apparatus. Specifically, the processing unit compares the captured image to one of the reference images stored in the memory of the reticle discerning device.
摘要翻译：掩模版识别装置包括存储器，其中分别存储多个光罩图案的照明图案的图像作为参考图案图像;检测单元，包括光学图像传感器和连接到存储器的处理单元，检测单元。处理单元可操作以将参考图案图像与由检测单元的光学图像传感器检测到的图像进行比较。掩模版识别装置用于具有储存器的存放器的曝光设备中，掩模版被放置在其中，曝光设备和掩模版传送机器人将所选择的一个掩模版从储料器传送到曝光设备。检测单元捕获所选择的掩模版的图案的图像，并使用图像来辨别光罩，并确保正确的掩模版被转印到曝光装置。具体地，处理单元将捕获的图像与存储在标线仪识别装置的存储器中的参考图像中的一个进行比较。

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