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    • 5. 发明授权
    • Method of determining an overlap distance of an optical head and digital exposure device using the method
    • 使用该方法确定光学头和数字曝光装置的重叠距离的方法
    • US08625109B2
    • 2014-01-07
    • US12902745
    • 2010-10-12
    • Sang-Hyun YunHi-Kuk LeeSang-Woo BaeCha-Dong KimJung-In Park
    • Sang-Hyun YunHi-Kuk LeeSang-Woo BaeCha-Dong KimJung-In Park
    • G01B11/14G03B27/32G03F9/00G03C5/00
    • G01B11/14G03F7/70291G03F7/70475
    • An apparatus and a method for determining an overlap distance of an optical head is disclosed. Positions and light amount distributions of each light spot can be measured, which may be provided from an optical head to a substrate. Gaussian distribution may be applied to the positions and the light amount distributions to calculate a compensation model of each of the light spots. A first accumulated light amount corresponding to each first area of the substrate may be calculated if the optical head is scanning along a first direction of the substrate using the compensation model. A second accumulated light amount corresponding to each second area overlapped with the each first area is calculated if the optical head is scanning along the first direction, which is moved in a second direction by a first distance using the compensation model. An overlap distance may be determined based on a uniformity of summations of the first and second accumulated light amount.
    • 公开了一种用于确定光学头的重叠距离的装置和方法。 可以测量每个光点的位置和光量分布,其可以从光学头到基底提供。 高斯分布可以应用于位置和光量分布,以计算每个光点的补偿模型。 如果光头使用补偿模型沿着衬底的第一方向扫描,则可以计算对应于衬底的每个第一区域的第一累积光量。 如果光头沿着使用补偿模型在第二方向上以第一距离移动的第一方向进行扫描,则计算与每个第一区域重叠的每个第二区域对应的第二累积光量。 可以基于第一和第二累积光量的相加的均匀性来确定重叠距离。