专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20030017418A1 Method of processing a lithographic printing plate precursor 失效
标题翻译：平版印刷版前体的处理方法
公开(公告)号：US20030017418A1
公开(公告)日：2003-01-23
申请号：US10174767
申请日：2002-06-19
申请人： AGFA-GEVAERT N.V.
发明人： Eric Verschueren , Joan Vermeersch
IPC分类号： G03F007/26
CPC分类号： G03F7/3042 , G03F7/3035 , G03F7/3057 , G03F7/3078
摘要： A method of making a lithographic image is disclosed, which comprises the steps of providing a lithographic imaging material comprising a support and a heat- or light-sensitive coating; image-wise exposure of the coating to heat or light, thereby obtaining a latent image in said coating, the latent image consisting of a set of exposed areas in the coating and a set of non-exposed areas in the coating; development of the latent image by supplying a processing liquid to the coating and evacuating, by means of a suction device, the processing liquid together with (i) substances removed from the exposed areas without removing such substances from the non-exposed areas or together with (ii) substances removed from the non-exposed areas without removing such substances from the exposed areas. The method is especially suitable for processing a lithographic printing plate while it is mounted in a plate-setter or a printing press, without the risk of damaging or contaminating electro-optical components of such equipment.
摘要翻译：公开了一种制备平版印刷图像的方法，其包括以下步骤：提供包含支持体和热敏感光涂层的光刻成像材料; 将涂层成像地暴露于热或光，从而在所述涂层中获得潜像，所述潜像由涂层中的一组暴露区域和涂层中的一组未曝光区域组成; 通过向涂层提供处理液体并通过抽吸装置抽空处理液体，以及（i）从暴露区域去除的物质而不从非暴露区域中除去这些物质或与（ii）从未暴露的地区移除的物质，而不会从暴露的地区清除这些物质。该方法特别适用于在平版印刷版安装在印版机或印刷机中时加工，而不会损坏或污染这种设备的电光部件。

2. 发明申请

US20180157176A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR AND USE 审中-公开
公开(公告)号：US20180157176A1
公开(公告)日：2018-06-07
申请号：US15788831
申请日：2017-10-20
申请人： Eastman Kodak Company
发明人： Masamichi Kamiya , Yuuki Torihata , Akira lgarashi , Koji Hayashi , Jianbing Huang
IPC分类号： G03F7/105 , G03F7/004 , G03F7/029 , G03F7/30
CPC分类号： G03F7/105 , B41C1/10 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/12 , B41C2210/04 , B41C2210/08 , B41N1/08 , B41N1/083 , B41N3/036 , B41N3/08 , G03F7/004 , G03F7/029 , G03F7/3035 , G03F7/3078
摘要： A lithographic printing plate precursor has a substrate comprising a hydrophilic surface and two opposing edges; a radiation-sensitive imagable layer, and optionally, a protective layer disposed over that layer. The precursor has a shear droop at each opposing edge, each shear droop having a shear droop depth Y of 20-200 μm and a shear droop width X of 500-2000 μm. The precursor also has a hydrophilic coating band extending from each of the two opposing edges inwardly along the hydrophilic surface independently to provide a hydrophilic coating band width A of at least 1.5 times the shear droop width X. This hydrophilic coating band comprises amphoteric surfactant(s) in an amount greater than all other surfactants. Such individual precursors are obtained by cutting a continuous radiation-sensitive web into strips and such cutting creates the shear droop that can result in edge staining if the hydrophilic coating band is not present.

3. 发明授权

US07638246B2 Photo development apparatus and method for fabricating a color filter substrate using the same 有权
标题翻译：照相显影装置及使用其的彩色滤光片基板的制造方法
公开(公告)号：US07638246B2
公开(公告)日：2009-12-29
申请号：US11152093
申请日：2005-06-15
申请人： Seung Han Paek
发明人： Seung Han Paek
IPC分类号： G02B5/20
CPC分类号： G03F7/0007 , G02F1/133516 , G03F7/023 , G03F7/3071 , G03F7/3078
摘要： A photo development apparatus for use in fabricating a color filter substrate for a display panel is disclosed. The disclosed photo apparatus includes a development solution supplier to supply a negative development solution. The photo apparatus also includes a first photo apparatus to form a positive photo-resist pattern to be used in forming a black matrix, wherein the positive photo-resist pattern is formed by patterning a light shielding layer formed on a substrate using the negative development solution and a positive photo-resist.
摘要翻译：公开了一种用于制造显示面板用滤色器基板的照相显影装置。所公开的照相装置包括提供负显影解决方案的开发解决方案供应商。该照相装置还包括形成用于形成黑矩阵的正光刻胶图案的第一照相装置，其中正光致抗蚀剂图案通过使用负显影液图案化形成在基板上的遮光层而形成和正光致抗蚀剂。

4. 发明申请

US20100054730A1 PHOTO DEVELOPMENT APPARATUS AND METHOD FOR FABRICATING A COLOR FILTER SUBSTRATE USING THE SAME 有权
标题翻译：使用其制造彩色滤光片的照相机开发装置和方法
公开(公告)号：US20100054730A1
公开(公告)日：2010-03-04
申请号：US12616571
申请日：2009-11-11
申请人： Seung Han PAEK
发明人： Seung Han PAEK
IPC分类号： G03D5/00
CPC分类号： G03F7/0007 , G02F1/133516 , G03F7/023 , G03F7/3071 , G03F7/3078
摘要： A photo development apparatus for use in fabricating a color filter substrate for a display panel is disclosed. The disclosed photo apparatus includes a development solution supplier to supply a negative development solution. The photo apparatus also includes a first photo apparatus to form a positive photo-resist pattern to be used in forming a black matrix, wherein the positive photo-resist pattern is formed by patterning a light shielding layer formed on a substrate using the negative development solution and a positive photo-resist.
摘要翻译：公开了一种用于制造显示面板用滤色器基板的照相显影装置。所公开的照相装置包括提供负显影解决方案的开发解决方案供应商。该照相装置还包括形成用于形成黑矩阵的正光刻胶图案的第一照相装置，其中正光致抗蚀剂图案通过使用负显影液图案化形成在基板上的遮光层而形成和正光致抗蚀剂。

5. 发明授权

US06645699B2 Method of processing a lithographic printing plate precursor 失效
标题翻译：平版印刷版前体的处理方法
公开(公告)号：US06645699B2
公开(公告)日：2003-11-11
申请号：US10174767
申请日：2002-06-19
申请人： Eric Verschueren , Joan Vermeersch
发明人： Eric Verschueren , Joan Vermeersch
IPC分类号： G03F730
CPC分类号： G03F7/3042 , G03F7/3035 , G03F7/3057 , G03F7/3078
摘要： A method of making a lithographic image is disclosed, which comprises the steps of providing a lithographic imaging material comprising a support and a heat- or light-sensitive coating; image-wise exposure of the coating to heat or light, thereby obtaining a latent image in said coating, the latent image consisting of a set of exposed areas in the coating and a set of non-exposed areas in the coating; development of the latent image by supplying a processing liquid to the coating and evacuating, by means of a suction device, the processing liquid together with (i) substances removed from the exposed areas without removing such substances from the non-exposed areas or together with (ii) substances removed from the non-exposed areas without removing such substances from the exposed areas. The method is especially suitable for processing a lithographic printing plate while it is mounted in a plate-setter or a printing press, without the risk of damaging or contaminating electro-optical components of such equipment.
摘要翻译：公开了一种制备平版印刷图像的方法，其包括以下步骤：提供包括支持体和热敏感或感光涂层的平版印刷成像材料;将涂层成像曝光于热或光，由此获得潜像所述涂层，所述潜像由所述涂层中的一组暴露区域和所述涂层中的一组未曝光区域组成;通过向所述涂层提供处理液体并通过抽吸装置排出来显影所述潜像; 处理液与（i）从暴露区域中除去的物质，而不从非暴露区域中除去这些物质，或者与（ii）从未暴露的区域去除的物质，而不从暴露的区域中除去这些物质。特别适用于将平版印刷版安装在印版机或印刷机中，而不会损坏或污染电光部件这样的设备。

6. 发明申请

US20190212652A1 POSITIVE TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PRODUCING SAME, AND METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE 审中-公开
公开(公告)号：US20190212652A1
公开(公告)日：2019-07-11
申请号：US16351513
申请日：2019-03-13
申请人： FUJIFILM CORPORATION
发明人： Takashi SATO , Rena MUKAIYAMA , Yuichi YASUHARA
IPC分类号： G03F7/30 , G03F7/033 , G03F7/035 , G03F7/095
CPC分类号： G03F7/3078 , B41C1/1016 , B41C2201/04 , B41C2201/14 , B41C2210/02 , B41C2210/06 , B41C2210/262 , G03F7/00 , G03F7/004 , G03F7/032 , G03F7/033 , G03F7/035 , G03F7/095 , G03F7/11
摘要： Provided is a positive type lithographic printing plate precursor including at least: a support which has a hydrophilic surface or a hydrophilic layer; and an underlayer, an interlayer, and an upper layer on the support in this order, in which the underlayer contains a polymer compound 1 which has at least one structure selected from the group consisting of a urethane bond, an acetal structure, and a urea bond in a main chain, the interlayer contains a polymer compound 2 which has at least one structure selected from the group consisting of a sulfonamide group, an active imide group, and a urea bond in a side chain, the upper layer contains a polymer compound 3 which has a phenolic hydroxy group, and one or more layers among the underlayer, the interlayer, and the upper layer contain an infrared absorbent. Further, provided are a method of producing the positive type lithographic printing plate precursor and a method of preparing a lithographic printing plate using the positive type lithographic printing plate precursor.

7. 发明授权

US07874748B2 Photo development apparatus and method for fabricating a color filter substrate using the same 有权
标题翻译：照相显影装置及使用其的彩色滤光片基板的制造方法
公开(公告)号：US07874748B2
公开(公告)日：2011-01-25
申请号：US12616571
申请日：2009-11-11
申请人： Seung Han Paek
发明人： Seung Han Paek
IPC分类号： G03D3/00 , G03D5/00
CPC分类号： G03F7/0007 , G02F1/133516 , G03F7/023 , G03F7/3071 , G03F7/3078
摘要： A photo development apparatus for use in fabricating a color filter substrate for a display panel is disclosed. The disclosed photo apparatus includes a development solution supplier to supply a negative development solution. The photo apparatus also includes a first photo apparatus to form a positive photo-resist pattern to be used in forming a black matrix, wherein the positive photo-resist pattern is formed by patterning a light shielding layer formed on a substrate using the negative development solution and a positive photo-resist.
摘要翻译：公开了一种用于制造显示面板用滤色器基板的照相显影装置。所公开的照相装置包括提供负显影解决方案的开发解决方案供应商。该照相装置还包括形成用于形成黑矩阵的正光刻胶图案的第一照相装置，其中正光致抗蚀剂图案通过使用负显影液图案化形成在基板上的遮光层而形成和正光致抗蚀剂。

8. 发明授权

US5335047A Printing plate making apparatus for two different kinds of masters 失效
标题翻译：两种不同种类的主机印版制版机
公开(公告)号：US5335047A
公开(公告)日：1994-08-02
申请号：US5396
申请日：1993-01-15
申请人： Masanori Kai , Satoshi Okabe , Nobuyoshi Hatori , Toshio Koike , Tamio Iwamoto
发明人： Masanori Kai , Satoshi Okabe , Nobuyoshi Hatori , Toshio Koike , Tamio Iwamoto
IPC分类号： G03G13/26 , G03F7/20 , G03F7/30 , G03G13/28 , G03G15/20 , G03G15/22 , G03G15/00 , G03D3/08 , G03G21/00
CPC分类号： G03F7/3078 , G03F7/2014 , G03G15/2003 , G03G15/2092 , G03G15/228
摘要： A printing-plate making apparatus is constructed such that a mode selecting switch adapted to change a master supplying process depending on properties of a master X is disposed on a housing 1 of the printing-plate making apparatus and various conditions, e.g., a master supplying process, locking member 4 for a master supplying roller 3, a temperature preset for a panel heater 33 and a compressing force given by press rollers 35a and 35b are automatically changed to optimal conditions corresponding to masters selected by the mode selecting switch. The printing-plate making apparatus is provided with a master heating switch on the housing 1 of the printing-plate making apparatus and when the master heating switch is actuated, applying of a certain voltage to at least a charger is stopped so that the panel heater 33 arranged at a fixing step is kept in the heated state so as to serve as a master heating unit.
摘要翻译：印版制作装置被构造成使得适于根据主机X的特性改变主供给过程的模式选择开关设置在印版制造装置的壳体1和各种条件上，例如主供应处理用于主供应辊3的锁定构件4，面板加热器33预设的温度和由压辊35a和35b给出的压缩力自动改变为与由模式选择开关选择的主体相对应的最佳条件。印版制作装置在印版制作装置的壳体1上设置有主加热开关，并且当主加热开关被致动时，停止向至少一个充电器施加一定电压，使得面板加热器 33被保持在加热状态，以作为主加热单元。

9. 发明授权

US5065174A Developing machine for photosensitive films and developing method for photosensitive films 失效
标题翻译：用于感光膜的发展机和用于感光膜的开发方法
公开(公告)号：US5065174A
公开(公告)日：1991-11-12
申请号：US466945
申请日：1990-01-18
申请人： Norio Yabe , Takeshi Iijima , Kazunori Itaya , Masahide Takano
发明人： Norio Yabe , Takeshi Iijima , Kazunori Itaya , Masahide Takano
IPC分类号： G03F7/30
CPC分类号： G03F7/3078
摘要： A developing machine for photosensitive films serviceable for both negative type and positive type films and exclusively usable for developing with water, comprising a warm water-dipping section consisting of warm water bath, a brush-developing section for developing by rubbing off the non-image area with a rotating brush roll while spraying water, and a drying section for drying with warm air, wherein the negative type photosensitive film, and non-image area being dissolved with ordinary temperature water for development, is passed through the brush-developing section and drying section, and the positive type photosensitive film, the non-image area being swollen with warm water and then rubbed off with brush for development, is passed through the warm water-dipping section, brush-developing section and drying section.
摘要翻译：一种用于感光薄膜的显影机，可用于负型和正型薄膜，并且仅用于与水一起显影，包括由温水浴组成的温水浸渍部分，用于通过摩擦非图像显影的刷显影部分具有旋转刷辊的区域，以及用暖风干燥的干燥部，其中负型感光膜和用于显影的常温水溶解的非图像区域通过刷显影部分，干燥部分和正型感光膜，用图像区域用温水溶胀，然后用刷子擦去显影，通过温水浸渍部分，刷显部分和干燥部分。

10. 发明申请

US20060003238A1 Photo development apparatus and method for fabricating a color filter substrate using the same 有权
公开(公告)号：US20060003238A1
公开(公告)日：2006-01-05
申请号：US11152093
申请日：2005-06-15
申请人： Seung Paek
发明人： Seung Paek
IPC分类号： G02B5/20 , G02F1/1335
CPC分类号： G03F7/0007 , G02F1/133516 , G03F7/023 , G03F7/3071 , G03F7/3078
摘要： A photo development apparatus for use in fabricating a color filter substrate for a display panel is disclosed. The disclosed photo apparatus includes a development solution supplier to supply a negative development solution. The photo apparatus also includes a first photo apparatus to form a positive photo-resist pattern to be used in forming a black matrix, wherein the positive photo-resist pattern is formed by patterning a light shielding layer formed on a substrate using the negative development solution and a positive photo-resist.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式