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1. 发明申请

US20080241707A1 METHOD AND SYSTEM FOR EXPOSURE OF A PHASE SHIFT MASK 有权
标题翻译：相移屏幕曝光方法与系统
公开(公告)号：US20080241707A1
公开(公告)日：2008-10-02
申请号：US11695186
申请日：2007-04-02
申请人： Chih-Ming Chen , Ya-Ping Tseng , Ming-Tao Ho
发明人： Chih-Ming Chen , Ya-Ping Tseng , Ming-Tao Ho
IPC分类号： G03F1/02
CPC分类号： G03F1/32
摘要： The present disclosure provides a method of making a mask. The method includes providing a substrate having a first attenuating layer on the substrate and a first imaging layer on the first attenuating layer; performing a first exposure to the first imaging layer using a first radiation energy in writing mode; performing a first etching to the first attenuating layer; performing a second etching to the substrate; forming a second imaging layer on the first attenuating layer and the substrate; performing a second exposure to the second imaging layer using a light energy and another mask; and performing a third etching to the first attenuating layer after the second exposure.
摘要翻译：本公开提供了制作掩模的方法。该方法包括提供在衬底上具有第一衰减层的衬底和在第一衰减层上的第一成像层; 在写入模式下使用第一辐射能量执行对第一成像层的第一曝光; 对所述第一衰减层进行第一蚀刻; 对衬底进行第二蚀刻; 在所述第一衰减层和所述衬底上形成第二成像层; 使用光能和另一掩模对所述第二成像层进行第二曝光; 以及在所述第二曝光之后对所述第一衰减层执行第三蚀刻。

2. 发明申请

US20060154153A1 Anti-ESD photomask blank 有权
标题翻译：防静电光掩模空白
公开(公告)号：US20060154153A1
公开(公告)日：2006-07-13
申请号：US11032793
申请日：2005-01-10
申请人： Eric Chiang , Hung-Chun Wang , Min-Chih Hsieh , Ming-Tao Ho
发明人： Eric Chiang , Hung-Chun Wang , Min-Chih Hsieh , Ming-Tao Ho
IPC分类号： B32B9/00 , B32B17/10 , B32B17/06 , G03F1/00
CPC分类号： G03F1/78 , G03F1/40 , G03F1/50 , Y10T428/31616
摘要： An anti-electrostatic discharge photomask blank for fabrication of an anti-electrostatic discharge photomask is disclosed. The anti-electrostatic discharge photomask blank includes a mask substrate, a conductive layer provided on the mask substrate and an opaque patterning layer provided on the conductive layer. The conductive layer prevents charges of opposite polarity from accumulating on a photomask fabricated from the photomask blank, thus preventing electrostatic discharges on the photomask.
摘要翻译：公开了一种用于制造防静电放电光掩模的抗静电放电光掩模坯料。防静电放电光掩模坯料包括掩模基板，设置在掩模基板上的导电层和设置在导电层上的不透明图案层。导电层防止相反极性的电荷积聚在由光掩模坯料制成的光掩模上，从而防止光掩模上的静电放电。

3. 发明申请

US20080044740A1 PHOTOMASK HAVING HAZE REDUCTION LAYER 审中-公开
标题翻译：具有减少雾度的薄膜
公开(公告)号：US20080044740A1
公开(公告)日：2008-02-21
申请号：US11466002
申请日：2006-08-21
申请人： Jiin-Hong Lin , Chin-Wang Hu , Ming-Tao Ho
发明人： Jiin-Hong Lin , Chin-Wang Hu , Ming-Tao Ho
IPC分类号： C23C14/00 , G21G5/00 , A61N5/00 , C23C14/32 , G03F1/00
CPC分类号： G03F1/48
摘要： A photomask is fabricated to have a patterned surface and a transparent layer formed on the patterned surface.
摘要翻译：制造光掩模以具有图案化表面和形成在图案化表面上的透明层。

4. 发明授权

US08724088B2 Pellicle mounting apparatus and assembly with pellicle mounted on mask 有权
标题翻译：防护薄膜组件安装装置和防护薄膜组件安装在面罩上
公开(公告)号：US08724088B2
公开(公告)日：2014-05-13
申请号：US13588844
申请日：2012-08-17
申请人： Jiin-Hong Lin , Chih-Chen Chen , Ming-Tao Ho
发明人： Jiin-Hong Lin , Chih-Chen Chen , Ming-Tao Ho
IPC分类号： G03B27/64 , G03F1/14
CPC分类号： G03F1/64
摘要： An apparatus is provided for mounting a pellicle to a photomask. A chamber has at least one port for filling the chamber with extreme clean dry air (XCDA) or an inert gas. A pellicle mounter is provided within the chamber. The mask is irradiated with a vacuum ultra violet (VUV) light in an atmosphere of the XCDA or inert gas, and the pellicle is mounted to the mask while the mask is in the atmosphere of the XCDA or inert gas and exposed to the VUV light. An assembly includes the mask attached to a pellicle frame by a pressure sensitive adhesive; and a pellicle joined to the pellicle frame, forming a sealed enclosure, the sealed enclosure being filled with extreme clean dry air (XCDA) or inert gas.
摘要翻译：提供了一种用于将防护薄膜组件安装到光掩模的装置。室具有至少一个端口，用于用极端干净的干燥空气（XCDA）或惰性气体填充室。在室内提供防护薄膜贴片机。在XCDA或惰性气体的气氛中用真空紫外线（VUV）照射掩模，并且将掩模安装在掩模上，同时掩模在XCDA或惰性气体的气氛中并暴露于VUV光。组件包括通过压敏粘合剂附着到防护薄膜框架上的面罩; 和防护薄膜组件连接到防护薄膜组件框架上，形成密封的外壳，密封的外壳装满极干净的干燥空气（XCDA）或惰性气体。

5. 发明申请

US20100190095A1 PELLICLE MOUNTING METHOD AND APPARATUS 有权
标题翻译：油墨安装方法和装置
公开(公告)号：US20100190095A1
公开(公告)日：2010-07-29
申请号：US12359752
申请日：2009-01-26
申请人： Jiin-Hong Lin , Chih-Chen Chen , Ming-Tao Ho
发明人： Jiin-Hong Lin , Chih-Chen Chen , Ming-Tao Ho
IPC分类号： G03F1/00 , G21K5/00
CPC分类号： G03F1/64
摘要： Apparatus is provided for mounting a pellicle to a photomask. A chamber has at least one port for filling the chamber with extreme clean dry air (XCDA) or an inert gas. A pellicle mounter is provided within the chamber. A vacuum ultra violet (VUV) light source is provided for irradiating a mask held by the pellicle mounter while the chamber is filled with the XCDA or inert gas. The mask is irradiated with the VUV light in an atmosphere of the XCDA or inert gas, and the pellicle is mounted to the mask while the mask is in the atmosphere of the XCDA or inert gas and exposed to the VUV light.
摘要翻译：提供用于将防护薄膜组件安装到光掩模的装置。室具有至少一个端口，用于用极端干净的干燥空气（XCDA）或惰性气体填充室。在室内提供防护薄膜贴片机。提供真空紫外线（VUV）光源，用于在室充满XCDA或惰性气体的同时照射由防护薄膜组件安装器保持的掩模。在XCDA或惰性气体的气氛中用VUV光照射掩模，并且当掩模处于XCDA或惰性气体的气氛中并暴露于VUV光时，将防护薄膜组件安装到掩模。

6. 发明申请

US20120308922A1 PELLICLE MOUNTING APPARATUS AND ASSEMBLY WITH PELLICLE MOUNTED ON MASK 有权
标题翻译：油墨安装装置和装配在面板上的油墨
公开(公告)号：US20120308922A1
公开(公告)日：2012-12-06
申请号：US13588844
申请日：2012-08-17
申请人： Jiin-Hong Lin , Chih-Chen Chen , Ming-Tao Ho
发明人： Jiin-Hong Lin , Chih-Chen Chen , Ming-Tao Ho
IPC分类号： G03F1/62 , B32B37/06
CPC分类号： G03F1/64
摘要： An apparatus is provided for mounting a pellicle to a photomask. A chamber has at least one port for filling the chamber with extreme clean dry air (XCDA) or an inert gas. A pellicle mounter is provided within the chamber. The mask is irradiated with a vacuum ultra violet (VUV) light in an atmosphere of the XCDA or inert gas, and the pellicle is mounted to the mask while the mask is in the atmosphere of the XCDA or inert gas and exposed to the VUV light. An assembly includes the mask attached to a pellicle frame by a pressure sensitive adhesive; and a pellicle joined to the pellicle frame, forming a sealed enclosure, the sealed enclosure being filled with extreme clean dry air (XCDA) or inert gas.
摘要翻译：提供了一种用于将防护薄膜组件安装到光掩模的装置。室具有至少一个端口，用于用极端干净的干燥空气（XCDA）或惰性气体填充室。在室内提供防护薄膜贴片机。在XCDA或惰性气体的气氛中用真空紫外线（VUV）照射掩模，并且将掩模安装在掩模上，同时掩模在XCDA或惰性气体的气氛中并暴露于VUV光。组件包括通过压敏粘合剂附着到防护薄膜框架上的面罩; 和防护薄膜组件连接到防护薄膜组件框架上，形成密封的外壳，密封的外壳装满极干净的干燥空气（XCDA）或惰性气体。

7. 发明授权

US08268514B2 Pellicle mounting method and apparatus 有权
标题翻译：薄膜安装方法和装置
公开(公告)号：US08268514B2
公开(公告)日：2012-09-18
申请号：US12359752
申请日：2009-01-26
申请人： Jiin-Hong Lin , Chih-Chen Chen , Ming-Tao Ho
发明人： Jiin-Hong Lin , Chih-Chen Chen , Ming-Tao Ho
IPC分类号： G03F1/14 , G03B27/64
CPC分类号： G03F1/64
摘要： Apparatus is provided for mounting a pellicle to a photomask. A chamber has at least one port for filling the chamber with extreme clean dry air (XCDA) or an inert gas. A pellicle mounter is provided within the chamber. A vacuum ultra violet (VUV) light source is provided for irradiating a mask held by the pellicle mounter while the chamber is filled with the XCDA or inert gas. The mask is irradiated with the VUV light in an atmosphere of the XCDA or inert gas, and the pellicle is mounted to the mask while the mask is in the atmosphere of the XCDA or inert gas and exposed to the VUV light.
摘要翻译：提供用于将防护薄膜组件安装到光掩模的装置。室具有至少一个端口，用于用极端干净的干燥空气（XCDA）或惰性气体填充室。在室内提供防护薄膜贴片机。提供真空紫外线（VUV）光源，用于在室充满XCDA或惰性气体的同时照射由防护薄膜组件安装器保持的掩模。在XCDA或惰性气体的气氛中用VUV光照射掩模，并且当掩模处于XCDA或惰性气体的气氛中并暴露于VUV光时，将防护薄膜组件安装到掩模。

8. 发明授权

US08288081B2 Method and system for exposure of a phase shift mask 有权
标题翻译：用于曝光相移掩模的方法和系统
公开(公告)号：US08288081B2
公开(公告)日：2012-10-16
申请号：US11695186
申请日：2007-04-02
申请人： Chih-Ming Chen , Ya-Ping Tseng , Ming-Tao Ho
发明人： Chih-Ming Chen , Ya-Ping Tseng , Ming-Tao Ho
IPC分类号： G03F1/00
CPC分类号： G03F1/32
摘要： The present disclosure provides a method of making a mask. The method includes providing a substrate having a first attenuating layer on the substrate and a first imaging layer on the first attenuating layer; performing a first exposure to the first imaging layer using a first radiation energy in writing mode; performing a first etching to the first attenuating layer; performing a second etching to the substrate; forming a second imaging layer on the first attenuating layer and the substrate; performing a second exposure to the second imaging layer using a light energy and another mask; and performing a third etching to the first attenuating layer after the second exposure.
摘要翻译：本公开提供了制作掩模的方法。该方法包括提供在衬底上具有第一衰减层的衬底和在第一衰减层上的第一成像层; 在写入模式下使用第一辐射能量执行对第一成像层的第一曝光; 对所述第一衰减层进行第一蚀刻; 对衬底进行第二蚀刻; 在所述第一衰减层和所述衬底上形成第二成像层; 使用光能和另一掩模对所述第二成像层进行第二曝光; 以及在所述第二曝光之后对所述第一衰减层执行第三蚀刻。

9. 发明授权

US07387855B2 Anti-ESD photomask blank 有权
标题翻译：防静电光掩模空白
公开(公告)号：US07387855B2
公开(公告)日：2008-06-17
申请号：US11032793
申请日：2005-01-10
申请人： Eric Chiang , Hung-Chun Wang , Min-Chih Hsieh , Ming-Tao Ho
发明人： Eric Chiang , Hung-Chun Wang , Min-Chih Hsieh , Ming-Tao Ho
IPC分类号： G03F1/00 , B32B17/10
CPC分类号： G03F1/78 , G03F1/40 , G03F1/50 , Y10T428/31616
摘要： An anti-electrostatic discharge photomask blank for fabrication of an anti-electrostatic discharge photomask is disclosed. The anti-electrostatic discharge photomask blank includes a mask substrate, a conductive layer provided on the mask substrate and an opaque patterning layer provided on the conductive layer. The conductive layer prevents charges of opposite polarity from accumulating on a photomask fabricated from the photomask blank, thus preventing electrostatic discharges on the photomask.
摘要翻译：公开了一种用于制造防静电放电光掩模的抗静电放电光掩模坯料。防静电放电光掩模坯料包括掩模基板，设置在掩模基板上的导电层和设置在导电层上的不透明图案层。导电层防止相反极性的电荷积聚在由光掩模坯料制成的光掩模上，从而防止光掩模上的静电放电。

10. 发明授权

US06765645B1 De-pellicle tool 失效
标题翻译：去皮工具
公开(公告)号：US06765645B1
公开(公告)日：2004-07-20
申请号：US10345633
申请日：2003-01-15
申请人： Kuang-Yang Lee , Chi-Chang Chang , Ming-Tao Ho , Bill Chiu
发明人： Kuang-Yang Lee , Chi-Chang Chang , Ming-Tao Ho , Bill Chiu
IPC分类号： G03B2752
CPC分类号： G03F7/70983
摘要： A de-pellicle tool for removing a pellicle from a reticle during the formation of circuit patterns on substrates in the fabrication of integrated circuits. The de-pellicle tool of the present invention comprises a support frame on which is mounted the reticle and the pellicle supported on the reticle. A pair of handle-actuated lift pins on opposite sides of the support frame are extended into respective pin openings in the pellicle frame, after which the handles are pushed downwardly to raise the lift pins and lift the pellicle frame from the reticle. Accordingly, no moving parts contact the reticle during the pellicle-removing procedure, preventing scratching or other damage to the reticle.
摘要翻译：用于在集成电路的制造中在衬底上形成电路图案期间从掩模版移除防护薄膜的去皮膜工具。本发明的防护薄膜工具包括支撑框架，其上安装有掩模版和支撑在掩模版上的防护薄膜组件。在支撑框架的相对侧上的一对手柄驱动的提升销延伸到防护薄膜组件框架中的相应的销开口中，然后将手柄向下推动以升高升降销并将防护膜框架从掩模版提起。因此，在防护薄膜组件除去过程中，没有移动部件接触掩模版，防止对掩模版划伤或其它损坏。

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