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1. 发明授权

US07796249B2 Mask haze early detection 有权
标题翻译：面罩雾霭早期检测
公开(公告)号：US07796249B2
公开(公告)日：2010-09-14
申请号：US11866514
申请日：2007-10-03
申请人： Wen-Chuan Wang , Shy-Jay Lin , Te-Chih Huang , Chih-Ming Ke , Wei-Yu Su , Heng-Hsin Liu , Tsai-Sheng Gau , Chin-Hsiang Lin
发明人： Wen-Chuan Wang , Shy-Jay Lin , Te-Chih Huang , Chih-Ming Ke , Wei-Yu Su , Heng-Hsin Liu , Tsai-Sheng Gau , Chin-Hsiang Lin
IPC分类号： G01N21/00
CPC分类号： G03F1/84 , G03F1/82
摘要： Detecting haze formation on a mask by obtaining an optical property of the mask and determining progress of the haze formation based on the obtained optical property.
摘要翻译：通过获得掩模的光学特性并基于获得的光学性质来确定雾度形成的进展来检测掩模上的雾度形成。

2. 发明申请

US20050186488A1 Reticle with antistatic coating 有权
标题翻译：带防静电涂层的光罩
公开(公告)号：US20050186488A1
公开(公告)日：2005-08-25
申请号：US11092734
申请日：2005-03-28
申请人： Wei-Yu Su , Dong-Hsu Cheng , Li-Kong Turn
发明人： Wei-Yu Su , Dong-Hsu Cheng , Li-Kong Turn
IPC分类号： A47G1/12 , B44F1/00 , G03F1/14 , G03F9/00 , G03G16/00
CPC分类号： G03F1/40 , G03F1/62 , G03F1/64
摘要： A static resistant reticle comprises a substrate and a patterning layer and is covered by an antistatic conductive film of quaternary amine (R4N)+Cl−. A pellicle structure comprising an optically transparent membrane tightly stretched on a frame is also coated by an antistatic electro conductive film of a similar material. The reticle with the pellicle form a shielded structure isolating the reticle from ESD.
摘要翻译：防静电标线片包括基材和图案化层，并被季胺（R 4 N N）的抗静电导电膜覆盖。 >。包括在框架上紧密拉伸的光学透明膜的防护薄膜组件也用类似材料的抗静电导电膜涂覆。具有防护薄膜的掩模版形成将掩模版与ESD隔离的屏蔽结构。

3. 发明授权

US06869733B1 Pellicle with anti-static/dissipative material coating to prevent electrostatic damage on masks 失效
标题翻译：具有抗静电/消散材料涂层的防护薄膜，以防止对面罩的静电损伤
公开(公告)号：US06869733B1
公开(公告)日：2005-03-22
申请号：US10261289
申请日：2002-09-30
申请人： Wei-Yu Su
发明人： Wei-Yu Su
IPC分类号： A47G1/12 , G03F1/14 , G03F9/00
CPC分类号： G03F1/64 , G03F1/62
摘要： The present invention is a method of protecting reticles from electrostatic damage during their use in manufacturing lines and while patterning photoresist films on device substrates. An anti-static layer comprised of an ammonium salt is formed on both sides of a pellicle which is then attached to a metal frame that has been coated with an anti-static layer of the ammonium salt. The frame with attached pellicle is connected to a reticle by an adhesive. Any electrostatic charges that form on the surface of the anti-static layers or on the reticle are conducted into the metal frame where they are dissipated. The ammonium salt is preferably (RN4+) Cl— in which (RN4+) has the structure: where Y is an alkyl group or C6H4, m=1 to 10000, and X− is Cl−.
摘要翻译：本发明是一种在制造线路中使用时保护掩模版免受静电损伤并且在器件衬底上图案化光刻胶膜的方法。在防护薄膜组件的两侧形成由铵盐构成的防静电层，然后将其与已经涂覆有铵盐的防静电层的金属框架连接。具有附着防护薄膜的框架通过粘合剂连接到掩模版。在防静电层或掩模版的表面上形成的任何静电电荷被导入金属框架中，在其中它们被消散。铵盐优选为（RN4 +）Cl-，其中（RN4 +）具有以下结构：其中Y为烷基或C 6 H 4，m = 1至10000，X 1为Cl - 。

4. 发明申请

US20090063074A1 Mask Haze Early Detection 有权
标题翻译：面具阴霾早期检测
公开(公告)号：US20090063074A1
公开(公告)日：2009-03-05
申请号：US11866514
申请日：2007-10-03
申请人： Wen-Chuan Wang , Shy-Jay Lin , Te-Chih Huang , Chih-Ming Ke , Wei-Yu Su , Heng-Hsin Liu , Tsai-Sheng Gau , Chin-Hsiang Lin
发明人： Wen-Chuan Wang , Shy-Jay Lin , Te-Chih Huang , Chih-Ming Ke , Wei-Yu Su , Heng-Hsin Liu , Tsai-Sheng Gau , Chin-Hsiang Lin
IPC分类号： G06F19/00 , G03F1/00
CPC分类号： G03F1/84 , G03F1/82
摘要： Detecting haze formation on a mask by obtaining an optical property of the mask and determining progress of the haze formation based on the obtained optical property.
摘要翻译：通过获得掩模的光学特性并基于获得的光学性质来确定雾度形成的进展来检测掩模上的雾度形成。

5. 发明申请

US20070248895A1 METHOD FOR REDUCTION OF PHOTOMASK DEFECTS 审中-公开
标题翻译：减少光电子缺陷的方法
公开(公告)号：US20070248895A1
公开(公告)日：2007-10-25
申请号：US11767906
申请日：2007-06-25
申请人： Wei-Yu Su
发明人： Wei-Yu Su
IPC分类号： G03F1/00
CPC分类号： G03F1/82
摘要： A method for reducing defect levels in a photomask by employing a cleaning process which does not degrade the photomask after multiple cycles of cleaning. The method is suitable for patterned metal stencil photomasks and phase shift photomasks. The method employs an alkaline aqueous cleaning solution for a particular time in a particular temperature range. The method results in improved photomask yield after multiple cleaning cycles.
摘要翻译：一种降低光掩模中的缺陷水平的方法，该方法是通过采用在多次清洁之后不降解光掩模的清洁方法。该方法适用于图案化金属模板光掩模和相移光掩模。该方法在特定温度范围内使用碱性水性清洗溶液达特定时间。该方法导致多次清洁循环后光掩模产量提高。

6. 发明申请

US20070076292A1 Fully electric field shielding reticle pod 审中-公开
标题翻译：全电场屏蔽光罩荚
公开(公告)号：US20070076292A1
公开(公告)日：2007-04-05
申请号：US11236169
申请日：2005-09-27
申请人： Wei-Yu Su , Chuan-Chieh Lin
发明人： Wei-Yu Su , Chuan-Chieh Lin
IPC分类号： F21V9/04 , G02B5/08 , G02B5/20 , F21V9/06
CPC分类号： G03F7/70741 , G03F1/66
摘要： A container includes a top wall, side walls, and a bottom wall, designed to enclose a space for storing an insulating object, the top, side and bottom walls having internal surfaces facing the enclosed space and external surface facing away from the enclosed space; and a metallic coating layer disposed on and substantially covering external surfaces of the top, side and bottom walls.
摘要翻译：容器包括顶壁，侧壁和底壁，设计成封闭用于存储绝缘物体的空间，顶壁，侧壁和底壁具有面向封闭空间的内表面和背离封闭空间的外表面; 以及设置在顶壁，侧壁和底壁的外表面上并基本上覆盖顶壁，侧壁和底壁的外表面的金属涂层。

7. 发明申请

US20060257765A1 System and method for photolithography in semiconductor manufacturing 有权
标题翻译：半导体制造中的光刻系统和方法
公开(公告)号：US20060257765A1
公开(公告)日：2006-11-16
申请号：US11129968
申请日：2005-05-16
申请人： Wei-Yu Su , Yi-Ming Dai , Chi-Hung Liao , Chun-Hung Kung
发明人： Wei-Yu Su , Yi-Ming Dai , Chi-Hung Liao , Chun-Hung Kung
IPC分类号： G03F7/20
CPC分类号： G03F9/7026 , G03F9/7011 , G03F9/7019
摘要： A method for photolithography in semiconductor manufacturing includes providing one or more masks for a wafer; defining a reference focus plane of a first mask of the one or more masks; defining a reference focus plane of a second mask of the one or more masks; and determining the best focus for the second mask based on the best focus of the first mask and the Z direction difference of the first and second masks, using the reference focus planes of the first and second masks.
摘要翻译：半导体制造中的光刻方法包括：提供用于晶片的一个或多个掩模; 定义所述一个或多个掩模的第一掩模的参考聚焦平面; 定义所述一个或多个掩模的第二掩模的参考聚焦平面; 并且使用第一和第二掩模的参考聚焦平面，基于第一掩模的最佳焦点和第一和第二掩模的Z方向差确定第二掩模的最佳聚焦。

8. 发明授权

US07968258B2 System and method for photolithography in semiconductor manufacturing 有权
标题翻译：半导体制造中的光刻系统和方法
公开(公告)号：US07968258B2
公开(公告)日：2011-06-28
申请号：US11129968
申请日：2005-05-16
申请人： Wei-Yu Su , Yi-Ming Dai , Chi-Hung Liao , Chun-Hung Kung
发明人： Wei-Yu Su , Yi-Ming Dai , Chi-Hung Liao , Chun-Hung Kung
IPC分类号： G03F9/00 , G03F7/20
CPC分类号： G03F9/7026 , G03F9/7011 , G03F9/7019
摘要： A method for photolithography in semiconductor manufacturing includes providing one or more masks for a wafer; defining a reference focus plane of a first mask of the one or more masks; defining a reference focus plane of a second mask of the one or more masks; and determining the best focus for the second mask based on the best focus of the first mask and the Z direction difference of the first and second masks, using the reference focus planes of the first and second masks.
摘要翻译：半导体制造中的光刻方法包括：提供用于晶片的一个或多个掩模; 定义所述一个或多个掩模的第一掩模的参考聚焦平面; 定义所述一个或多个掩模的第二掩模的参考聚焦平面; 并且使用第一和第二掩模的参考聚焦平面，基于第一掩模的最佳焦点和第一和第二掩模的Z方向差确定第二掩模的最佳聚焦。

9. 发明授权

US07834837B2 Active matrix liquid crystal display and driving method thereof 有权
标题翻译：有源矩阵液晶显示及其驱动方法
公开(公告)号：US07834837B2
公开(公告)日：2010-11-16
申请号：US11645452
申请日：2006-12-26
申请人： Yi-Zhong Syu , Wei-Yu Su
发明人： Yi-Zhong Syu , Wei-Yu Su
IPC分类号： G09G3/36
CPC分类号： G09G3/3655 , G09G2300/043 , G09G2320/0219 , G09G2320/0247
摘要： An exemplary active matrix LCD (200) includes an LCD panel, a gate driver (211), a data driver (212), and a voltage compensating circuit (240). The LCD panel includes a plurality of gate lines (221) and a plurality of data lines (222) crossing the data lines to define a plurality of pixel units (230). Each pixel unit includes a liquid crystal capacitor (227) and a TFT (223). The liquid crystal capacitor includes a pixel electrode (224) and a common electrode (225). The voltage compensating circuit is configured for detecting a first voltage of a source electrode of one of the TFTs when the TFT turns on, detecting a second voltage of a drain electrode of the TFT when the TFT turns off, and then outputting a compensating voltage according to the first voltage and the second voltage for compensating a kick-back voltage of the TFT.
摘要翻译：示例性有源矩阵LCD（200）包括LCD面板，栅极驱动器（211），数据驱动器（212）和电压补偿电路（240）。 LCD面板包括与数据线交叉以限定多个像素单元（230）的多条栅极线（221）和多条数据线（222）。每个像素单元包括液晶电容器（227）和TFT（223）。液晶电容器包括像素电极（224）和公共电极（225）。电压补偿电路被配置为当TFT导通时检测TFT中的一个的源电极的第一电压，当TFT截止时检测TFT的漏电极的第二电压，然后输出补偿电压到第一电压和第二电压，用于补偿TFT的反冲电压。

10. 发明授权

US07514184B2 Reticle with antistatic coating 有权
标题翻译：带防静电涂层的光罩
公开(公告)号：US07514184B2
公开(公告)日：2009-04-07
申请号：US11092734
申请日：2005-03-28
申请人： Wei-Yu Su , Dong-Hsu Cheng , Li-Kong Turn
发明人： Wei-Yu Su , Dong-Hsu Cheng , Li-Kong Turn
IPC分类号： G03F1/00 , G03F1/14
CPC分类号： G03F1/40 , G03F1/62 , G03F1/64
摘要： A static resistant reticle comprises a substrate and a patterning layer and is covered by an antistatic conductive film of quaternary amine (R4N)+Cl−. A pellicle structure comprising an optically transparent membrane tightly stretched on a frame is also coated by an antistatic electro conductive film of a similar material. The reticle with the pellicle form a shielded structure isolating the reticle from ESD.
摘要翻译：防静电标线片包括基板和图案化层，并被季胺（R4N）+ Cl-的抗静电导电膜覆盖。包括在框架上紧密拉伸的光学透明膜的防护薄膜组件也用类似材料的抗静电导电膜涂覆。具有防护薄膜的掩模版形成将掩模版与ESD隔离的屏蔽结构。

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