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    • 1. 发明申请
    • Film/screen system and image-forming system for use in direct X-ray applications
    • 用于直接X射线应用的电影/屏幕系统和成像系统
    • US20020076640A1
    • 2002-06-20
    • US09955674
    • 2001-09-19
    • Marc Van Den ZegelMarleen De Vester
    • G03C001/035G03C001/36G03C001/46G03C005/16G03C005/18G03C005/30
    • G03C1/36G03C5/16G03C5/17G03C5/30G03C2001/0055G03C2005/3007G03C2007/3025Y10S430/143Y10S430/167Y10S430/168
    • A direct X-ray system for industrial radiography, like non-destructive testing applications, and personal monitoring, being particularly less sensitive to pressure phenomena, has been disclosed, said system consisting of a direct X-ray black-and-white negative-working radiographic film material, comprised of a transparent support coated on at least one side thereof with a tabular grain emulsion layer, substantially free from spectrally sensitizing dyes, in which at least 50 percent of total grain projected area of all grains is accounted for by silver bromoiodide tabular grains having an iodide content of less than 5 mole %, based on silver, having an average aspect ratio of at least 2, and having a volume greater than 0.03 nullm3, further characterized in that said tabular grain emulsion layer(s) comprise(s), in an amount of from 5 mg up to 100 mg per mole of coated silver bromoiodide at least one desensitizing agent having a hetero-aromatic part and an electron-withdrawing group and (2) disposed on opposite sides of the radiographic element, two intensifying screen sheets selected from the group consisting of lead, lead oxide, copper and steel, said screen sheets having been designed in order to emit electrons when exposed to X- or null-rays with an energy greater than or equal to 10 kVp.
    • 已经公开了用于工业射线照相的直接X射线系统,如非破坏性测试应用和个人监测,对压力现象特别不太敏感,该系统由直接X射线黑白负面工作 射线照相胶片材料,其包含至少一面上的透明支撑体与片状颗粒乳剂层基本上不含光谱增感染料,其中所有晶粒的总颗粒投影面积的至少50%由溴碘化银计算 具有基于银的碘含量小于5摩尔%,具有至少2的平均纵横比且体积大于0.03mum 3的片状颗粒,其特征还在于所述片状颗粒乳剂层包含( s),其量为每摩尔涂覆的溴碘化银至少一种具有杂芳族部分和吸电子基团的脱敏剂为5mg至100mg,和(2 ),设置在放射线照相元件的相对侧上的两个增强丝网片,其选自由铅,氧化铅,铜和钢组成的组中,所述筛板被设计为当暴露于X射线或γ射线时发射电子, 能量大于或等于10 kVp。