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1. 发明申请

US20180050961A1 UV PHOTOBLEACHING OF GLASS HAVING UV-INDUCED COLORIZATION 审中-公开
公开(公告)号：US20180050961A1
公开(公告)日：2018-02-22
申请号：US15799116
申请日：2017-10-31
申请人： CORNING INCORPORATED
发明人： Dana Craig Bookbinder , Nicholas Francis Borrelli , Timothy Michael Gross
IPC分类号： C03C23/00 , C23C14/34 , C03C17/00
CPC分类号： C03C23/002 , C03C17/002 , C03C23/0025 , C03C23/006 , C03C23/0075 , C03C2218/154 , C23C14/34
摘要： A method of UV photobleaching a glass sample having UV-induced colorization is disclosed. The processed includes first irradiating the glass sample with colorizing UV radiation having a colorizing wavelength of λC

2. 发明授权

US09604877B2 Method of strengthening glass using plasma torches and/or arc jets, and articles made according to the same 有权
公开(公告)号：US09604877B2
公开(公告)日：2017-03-28
申请号：US13137697
申请日：2011-09-02
申请人： Vijayen S. Veerasamy , Xuequn Hu , Glenn A. Cerny
发明人： Vijayen S. Veerasamy , Xuequn Hu , Glenn A. Cerny
IPC分类号： C23C14/48 , C03C23/00 , C03C25/60 , C23C16/513 , C03C25/62 , C03C21/00
CPC分类号： C03C21/007 , C03C23/0055 , C03C23/006 , C03C25/607 , C03C25/6286 , C23C14/48 , C23C16/513 , H01J37/32018 , H01J2237/327
摘要： Certain example embodiments relate to an improved method of strengthening glass substrates (e.g., soda lime silica glass substrates). In certain examples, a glass substrate may be chemically strengthened by creating an electric field within the glass. In certain cases, the chemical tempering may be performed by surrounding the substrate by a plasma including certain ions, such as Li+, K+, Mg2+, and/or the like. In some cases, these ions may be forced into the glass substrate due to the half-cycles of the electric field generated by the electrodes that formed the plasma. This may advantageously chemically strengthen a glass substrate on a substantially reduced time scale. In other example embodiments, an electric field may be set in a float bath such that sodium ions are driven from the molten glass ribbon into the tin bath, which may advantageously result in a stronger glass substrate with reduced sodium content.

3. 发明申请

US20170036419A1 ARTICLES AND METHODS FOR CONTROLLED BONDING OF THIN SHEETS WITH CARRIERS 审中-公开
标题翻译：用于与载体控制的薄片粘结的文章和方法
公开(公告)号：US20170036419A1
公开(公告)日：2017-02-09
申请号：US15122366
申请日：2015-01-26
申请人： CORNING INCORPORATED
发明人： Kaveh Adib , Robert Alan Bellman , Dana Craig Bookbinder , Theresa Chang , Shiwen Liu , Robert George Manley , Pantik Mazumder
IPC分类号： B32B7/06 , B32B37/26 , B32B7/02
CPC分类号： B32B7/06 , B32B7/02 , B32B17/06 , B32B17/064 , B32B37/26 , B32B2315/08 , B32B2457/20 , B32B2457/206 , C03C17/22 , C03C23/006 , C03C27/06 , C03C27/10 , C03C2217/28 , C03C2217/77 , C03C2218/153
摘要： A method of controllably bonding a thin sheet having a thin sheet bonding surface with a carrier having a carrier bonding surface, by depositing a carbonaceous surface modification layer onto at least one of the thin sheet bonding surface and the carrier bonding surface, incorporating polar groups with the surface modification layer, and then bonding the thin sheet bonding surface to the carrier bonding surface via the surface modification layer. The surface modification layer may include a bulk carbonaceous layer having a first polar group concentration and a surface layer having a second polar group concentration, wherein the second polar group concentration is higher than the first polar group concentration. The surface modification layer deposition and the treatment thereof may be performed by plasma polymerization techniques.
摘要翻译：一种将具有薄片接合面的薄片与具有载体接合面的载体可控地接合的方法，通过在至少一个薄片接合面和载体接合面上沉积碳质表面改性层，将极性基团与表面改性层，然后经由表面改性层将薄片接合表面粘合到载体接合表面。表面改性层可以包括具有第一极性基团浓度的块状碳层和具有第二极性基团浓度的表面层，其中第二极性基团浓度高于第一极性基团浓度。表面改性层沉积及其处理可以通过等离子体聚合技术进行。

4. 发明申请

US20160340236A1 SURFACE TREATMENT OF GLASS BUBBLES 有权
标题翻译：玻璃泡表面处理
公开(公告)号：US20160340236A1
公开(公告)日：2016-11-24
申请号：US14696521
申请日：2015-04-27
申请人： FORD GLOBAL TECHNOLOGIES, LLC
发明人： Haibo Zhao , Daniel Quinn Houston , Rick H. Wykoff
IPC分类号： C03C19/00 , C03C23/00 , B29C70/66
CPC分类号： C03C19/00 , B24B31/02 , B29C70/66 , B29K2509/08 , C03C11/002 , C03C23/006 , C08K7/28
摘要： A method is provided for treating the outer surfaces of a plurality of glass bubbles. That method includes loading a plurality of glass bubbles into a processing vessel having a roughened lining and displacing the processing vessel so that the plurality of glass bubbles move against the roughened lining to thereby roughen the outer surfaces. Alternatively, or in addition, the glass bubbles are subjected to air plasma treatment to increase the surface energy of the glass bubbles.
摘要翻译：提供了一种处理多个玻璃泡的外表面的方法。该方法包括将多个玻璃泡加载到具有粗糙衬里并移动处理容器的处理容器中，使得多个玻璃气泡抵靠粗糙衬里移动，从而粗糙化外表面。或者或另外，对玻璃泡进行空气等离子体处理以增加玻璃泡的表面能。

5. 发明申请

US20140315027A1 HYDROPHOBIC GLAZING 有权
公开(公告)号：US20140315027A1
公开(公告)日：2014-10-23
申请号：US14358496
申请日：2012-11-14
申请人： SAINT-GOBAIN GLASS FRANCE
发明人： Claire Thoumazet , Martin Melcher , Arnaud Huignard , Raphael Lante
IPC分类号： C03C17/42 , C03C17/34
CPC分类号： C03C17/42 , C03C17/3417 , C03C23/006 , C03C2217/76 , C03C2218/1525
摘要： The invention relates to a process for the manufacture of a hydrophobic glazing comprising the following successive stages:(a) formation of a carbon-rich silicon oxycarbide (SiOxCy) layer at the surface of a substrate made of mineral glass by chemical vapor deposition (CVD) over at least a portion of the surface of said substrate by bringing said surface into contact with a stream of reactive gases comprising ethylene (C2H4), silane (SiH4) and carbon dioxide (CO2) at a temperature of between 600° C. and 680° C., the ethylene/silane (C2H4/SiH4) ratio by volume during stage (a) being less than or equal to 3.3,(b) formation of an SiO2 layer on the silicon oxycarbide layer deposited in stage (a) or(b′) formation of a carbon-poor silicon oxycarbide layer exhibiting a mean C/Si ratio of less than 0.2,(c) annealing and/or shaping the substrate obtained on conclusion of stage (b) or (b′) at a temperature of between 580° C. and 700° C.,(d) activation of the silica layer, formed in stage (b), or of the silicon oxycarbide layer, formed in stage (b′), by plasma treatment or acidic or basic chemical treatment, and(e) grafting, by covalent bonding, a fluorinated hydrophobic agent.It also relates to a hydrophobic glazing, preferably a windshield, capable of being obtained by such a process.
摘要翻译：本发明涉及一种用于制造疏水玻璃的方法，其包括以下连续阶段：（a）通过化学气相沉积（CVD）在由矿物玻璃制成的基材的表面上形成富碳硅碳氧化物（SiO x C C）层）通过使所述表面与包含乙烯（C 2 H 4），硅烷（SiH 4）和二氧化碳（CO 2）的反应性气体流在600℃和...之间的温度下与所述基材的表面的至少一部分接触，（a）期间的乙烯/硅烷（C 2 H 4 / SiH 4）体积比小于或等于3.3，（b）在阶段（a）中沉积的碳氧化硅层上形成SiO 2层，或（b'）形成平均C / Si比小于0.2的碳不足的碳硅氧化物层，（c）在（b）或（b'）结束时获得的基板的退火和/或成形在温度在580℃至700℃之间，（d）二氧化硅层的活化阶段（b）或阶段（b'）中形成的碳氧化硅层，通过等离子体处理或酸性或碱性化学处理，和（e）通过共价键接枝氟化疏水剂。它还涉及能够通过这种方法获得的疏水性玻璃，优选挡风玻璃。

6. 发明申请

US20100101940A1 METHOD FOR REMOVING FOREIGN MATTER FROM GLASS SUBSTRATE SURFACE AND METHOD FOR PROCESSING GLASS SUBSTRATE SURFACE 审中-公开
标题翻译：从玻璃基板表面去除外来物质的方法及处理玻璃基板表面的方法
公开(公告)号：US20100101940A1
公开(公告)日：2010-04-29
申请号：US12648481
申请日：2009-12-29
申请人： Masabumi Ito , Kenji Okamura , Hiroshi Kojima
发明人： Masabumi Ito , Kenji Okamura , Hiroshi Kojima
IPC分类号： C23F1/00
CPC分类号： C03C15/02 , B82Y10/00 , B82Y40/00 , C03C23/0025 , C03C23/006 , C03C23/0075 , G03F1/24 , G03F1/82 , H01J2237/0812 , H01J2237/3151
摘要： An object of the invention is to provide a method for removing foreign matter from a glass substrate surface to be finish-processed by a method accompanied with beam irradiation or laser light irradiation on the glass substrate surface. The present invention relates to a method for removing foreign matter from a glass substrate surface, which includes subjecting the glass substrate surface to gas cluster ion beam etching at an accelerating voltage of from 5 to 15 keV.
摘要翻译：本发明的目的是提供一种通过伴随着在玻璃基板表面上的光束照射或激光照射的方法从待处理的玻璃基板表面去除异物的方法。本发明涉及一种从玻璃基板表面除去异物的方法，其包括以5至15keV的加速电压对玻璃基板表面进行气体簇离子束蚀刻。

7. 发明申请

US20100092767A1 BONDING METHOD AND BONDED BODY 审中-公开
标题翻译：结合方法和结合体
公开(公告)号：US20100092767A1
公开(公告)日：2010-04-15
申请号：US12577314
申请日：2009-10-12
申请人： Nobuhiro NAITO , Mitsuru SATO , Takatoshi YAMAMOTO , Minehiro IMAMURA
发明人： Nobuhiro NAITO , Mitsuru SATO , Takatoshi YAMAMOTO , Minehiro IMAMURA
IPC分类号： B32B9/04 , B65C9/25 , B29C65/14
CPC分类号： B32B7/12 , B29C35/02 , B29C35/0805 , B29C35/0866 , B29C59/14 , B29C65/14 , B29C65/1403 , B29C65/1406 , B29C65/482 , B29C65/4835 , B29C65/521 , B29C65/523 , B29C65/526 , B29C65/528 , B29C66/1122 , B29C66/45 , B29C66/71 , B29C66/731 , B29C66/73111 , B29C66/73112 , B29C66/7352 , B29C66/73921 , B29C66/73941 , B29C66/91411 , B29C66/919 , B29C66/9241 , B29C66/929 , B29C66/954 , B29C2035/0827 , B29C2035/0877 , B29D11/0073 , B29K2021/00 , B29K2023/00 , B29K2023/06 , B29K2023/083 , B29K2023/086 , B29K2023/12 , B29K2025/00 , B29K2027/06 , B29K2027/08 , B29K2027/12 , B29K2027/16 , B29K2027/18 , B29K2033/04 , B29K2033/08 , B29K2033/12 , B29K2055/02 , B29K2059/00 , B29K2063/00 , B29K2067/00 , B29K2067/006 , B29K2067/06 , B29K2069/00 , B29K2071/00 , B29K2071/12 , B29K2075/00 , B29K2077/00 , B29K2077/10 , B29K2079/08 , B29K2079/085 , B29K2081/06 , B29K2083/00 , B29K2083/005 , B29K2096/005 , B29K2105/0088 , B29K2995/0082 , B29L2031/767 , B32B9/04 , B32B15/04 , B32B15/18 , B32B15/20 , B32B17/06 , B32B27/06 , B32B27/36 , B41J2/14233 , B41J2/161 , B41J2/1623 , C03C23/006 , C03C27/10 , C09J5/06 , C09J183/04 , Y10T428/265 , B29K2081/04 , B29K2067/003 , B29K2031/04 , B29K2029/04 , B29K2025/06 , B29K2023/38 , B29K2023/18 , B29K2023/16 , B29K2021/006 , B29K2009/06
摘要： A bonding method includes applying a liquid material containing silicone materials to at least one of the first base member and the second base member so as to form a liquid film, drying the liquid film so as to obtain a bonding film on the at least one of the first base member and the second base member, heating the bonding film so as to cross-link the silicone materials contained in the bonding film to each other, and applying energy to the bonding film so as to develop adhesiveness around a surface of the bonding film so as to obtain a bonded body in which the first base member and the second base member are bonded to each other with the bonding film interposed between the first base member and the second base member.
摘要翻译：接合方法包括将含有硅酮材料的液体材料施加到第一基底构件和第二基底构件中的至少一个，以便形成液体膜，干燥该液体膜，以便在至少一个第一基底构件和第二基底构件，加热接合膜以将包含在接合膜中的硅氧烷材料彼此交联，并且向接合膜施加能量，以便在接合膜的表面周围形成粘附性以获得其中第一基底构件和第二基底构件彼此接合的接合体，其中接合膜介于第一基底构件和第二基底构件之间。

8. 发明申请

US20100080961A1 METHOD OF PROCESSING GLASS SUBSTRATE SURFACE 审中-公开
标题翻译：玻璃基板表面处理方法
公开(公告)号：US20100080961A1
公开(公告)日：2010-04-01
申请号：US12631304
申请日：2009-12-04
申请人： Kenji OKAMURA , Masabumi Ito
发明人： Kenji OKAMURA , Masabumi Ito
IPC分类号： B32B3/02 , B44C1/22 , B29D11/00
CPC分类号： C03C15/02 , C03C17/3665 , C03C23/0025 , C03C23/006 , C03C2204/08 , C03C2218/31 , Y10T428/24777
摘要： The present invention is to provide a method for processing the whole of a glass substrate surface so as to give a surface excellent in flatness and surface roughness. The present invention provides a method of processing a glass substrate surface using a processing technique selected from the group consisting of ion-beam etching, gas cluster ion-beam etching, plasma etching, and nano-ablation, wherein a frame element satisfying the following (1) and (2) is arranged along the periphery of the glass substrate before the glass substrate surface is processed: (1) the difference between the height of the frame element and the height of the glass substrate surface is 1 mm or smaller; and (2) the frame element has a width which is not smaller than one-half the beam diameter or laser light diameter to be used in the processing technique.
摘要翻译：本发明提供一种加工整个玻璃基板表面以提供平坦度和表面粗糙度优异的表面的方法。本发明提供一种使用选自离子束蚀刻，气体簇离子束蚀刻，等离子体蚀刻和纳米烧蚀的处理技术来处理玻璃基板表面的方法，其中满足以下（（1）和（2）在玻璃基板表面被处理之前沿着玻璃基板的周边布置：（1）框架元件的高度与玻璃基板表面的高度之间的差为1mm或更小; 和（2）框架元件具有不小于处理技术中使用的光束直径或激光光径的一半的宽度。

9. 发明申请

US20080305364A1 Magnetic Recording Media and Production Process Thereof 审中-公开
标题翻译：磁记录介质及其制作工艺
公开(公告)号：US20080305364A1
公开(公告)日：2008-12-11
申请号：US11660272
申请日：2005-08-17
申请人： Hiroshi Osawa , Gohei Kurokawa
发明人： Hiroshi Osawa , Gohei Kurokawa
IPC分类号： G11B5/66 , H05H1/24 , C23C14/02 , C23C16/02 , G11B5/33
CPC分类号： C03C17/36 , C03C17/3618 , C03C17/3649 , C03C23/006 , C03C2217/78 , C03C2218/32 , G11B5/82 , G11B5/8404 , Y10T428/1164
摘要： The present invention is a production method for a magnetic recording media in which at least a magnetic layer, a protective layer, and a lubricant layer are sequentially layered onto a non-magnetic substrate 1, and non-magnetic substrate 1 is surface treated using a gas activated by plasma generated at around atmospheric pressure. As a result of the present invention, it is possible to produce magnetic recording media with good yield that have few errors and superior head floating properties, by effectively removing foreign material and projections present on the surface of the magnetic recording media.
摘要翻译：本发明是一种磁记录介质的制造方法，其中至少将磁性层，保护层和润滑剂层依次层叠在非磁性基板1上，并且使用非磁性基板1对非磁性基板1进行表面处理在大气压下产生的等离子体激发的气体。作为本发明的结果，通过有效地去除存在于磁记录介质的表面上的异物和突起，可以制造出具有很小误差和优异的浮头性能的良好产率的磁记录介质。

10. 发明申请

US20080187724A1 Preparation method for nanomaterial, metal oxide nanomaterial formation composition used for the method,mold and metal oxide nanostructure 有权
标题翻译：用于该方法的纳米材料，金属氧化物纳米材料形成组合物的制备方法，模具和金属氧化物纳米结构
公开(公告)号：US20080187724A1
公开(公告)日：2008-08-07
申请号：US10840192
申请日：2004-05-06
申请人： Shigenori Fujikawa , Toyoki Kunitake
发明人： Shigenori Fujikawa , Toyoki Kunitake
IPC分类号： B05D1/32 , B32B5/00
CPC分类号： B29C59/02 , B82Y30/00 , C01G23/047 , C01P2004/13 , C01P2004/64 , C03C17/23 , C03C23/006 , C23C18/1216 , C23C18/1225 , C23C18/125 , C23C18/14 , Y10T428/24802
摘要： A production method for a nanomaterial comprising the steps of: forming a template on a solid substrate using a metal oxide nanomaterial forming composition including an organic compound with a phenolic hydroxyl group and a molecular weight of at least 500, forming a metal oxide layer on the template, and removing the template to generate a metal oxide nanostructure.
摘要翻译：一种纳米材料的制造方法，其特征在于，包括以下工序：使用含有酚羟基和分子量为500以上的有机化合物的金属氧化物纳米材料形成用组合物在固体基材上形成模板，在所述固体基材上形成金属氧化物层模板，并去除模板以产生金属氧化物纳米结构。

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